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1. 发明授权

US07988815B2 Plasma reactor with reduced electrical skew using electrical bypass elements 有权
标题翻译：使用电旁路元件减少电偏斜的等离子体反应器
公开(公告)号：US07988815B2
公开(公告)日：2011-08-02
申请号：US11828568
申请日：2007-07-26
申请人： Shahid Rauf , Kenneth S. Collins , Kallol Bera , Kartik Ramaswamy , Hiroji Hanawa , Andrew Nguyen , Steven C. Shannon , Lawrence Wong , Satoru Kobayashi , Troy S. Detrick , James P. Cruse
发明人： Shahid Rauf , Kenneth S. Collins , Kallol Bera , Kartik Ramaswamy , Hiroji Hanawa , Andrew Nguyen , Steven C. Shannon , Lawrence Wong , Satoru Kobayashi , Troy S. Detrick , James P. Cruse
IPC分类号： C23C16/00 , H01L21/306
CPC分类号： H01J37/16 , H01J37/20 , H01J37/32082 , H01J37/32623 , H01J37/32697 , H01J37/32834
摘要： RF ground return current flow is diverted away from asymmetrical features of the reactor chamber by providing bypass current flow paths. One bypass current flow path avoids the pumping port in the chamber floor, and comprises a conductive symmetrical grill extending from the side wall to the grounded pedestal base. Another bypass current flow path avoids the wafer slit valve, and comprises an array of conductive straps bridging the section of the sidewall occupied by the slit valve.
摘要翻译：通过提供旁路电流流动路径，RF接地回流电流从反应室的不对称特征转向。一个旁路电流流动路径避免了室底部中的泵送端口，并且包括从侧壁延伸到接地基座的导电对称格栅。另一个旁路电流流动路径避免了晶片狭缝阀，并且包括桥接由狭缝阀占据的侧壁部分的导电带阵列。

2. 发明申请

US20090025878A1 PLASMA REACTOR WITH REDUCED ELECTRICAL SKEW USING ELECTRICAL BYPASS ELEMENTS 有权
标题翻译：使用电子旁路元件的减少电机的等离子体反应器
公开(公告)号：US20090025878A1
公开(公告)日：2009-01-29
申请号：US11828568
申请日：2007-07-26
申请人： Shahid Rauf , Kenneth S. Collins , Kallol Bera , Kartik Ramaswamy , Andrew Nguyen , Steven C. Shannon , Lawrence Wong , Satoru Kobayashi , Troy S. Detrick , James P. Cruse
发明人： Shahid Rauf , Kenneth S. Collins , Kallol Bera , Kartik Ramaswamy , Andrew Nguyen , Steven C. Shannon , Lawrence Wong , Satoru Kobayashi , Troy S. Detrick , James P. Cruse
IPC分类号： H01L21/306
CPC分类号： H01J37/16 , H01J37/20 , H01J37/32082 , H01J37/32623 , H01J37/32697 , H01J37/32834
摘要： RF ground return current flow is diverted away from asymmetrical features of the reactor chamber by providing bypass current flow paths. One bypass current flow path avoids the pumping port in the chamber floor, and comprises a conductive symmetrical grill extending from the side wall to the grounded pedestal base. Another bypass current flow path avoids the wafer slit valve, and comprises an array of conductive straps bridging the section of the sidewall occupied by the slit valve.
摘要翻译：通过提供旁路电流流动路径，RF接地回流电流从反应室的不对称特征转向。一个旁路电流流动路径避免了室底部中的泵送端口，并且包括从侧壁延伸到接地基座的导电对称格栅。另一个旁路电流流动路径避免了晶片狭缝阀，并且包括桥接由狭缝阀占据的侧壁部分的导电带阵列。

3. 发明申请

US20090025879A1 PLASMA REACTOR WITH REDUCED ELECTRICAL SKEW USING A CONDUCTIVE BAFFLE 审中-公开
标题翻译：等离子体反应器与减少电动机使用导电的宝石
公开(公告)号：US20090025879A1
公开(公告)日：2009-01-29
申请号：US11828713
申请日：2007-07-26
申请人： Shahid Rauf , Kenneth S. Collins , Kallol Bera , Kartik Ramaswamy , Andrew Nguyen , Steven C. Shannon , Lawrence Wong , Satoru Kobayashi , Troy S. Detrick , James P. Cruse
发明人： Shahid Rauf , Kenneth S. Collins , Kallol Bera , Kartik Ramaswamy , Andrew Nguyen , Steven C. Shannon , Lawrence Wong , Satoru Kobayashi , Troy S. Detrick , James P. Cruse
IPC分类号： H01L21/306
CPC分类号： H01J37/20 , H01J37/16 , H01J37/32082 , H01J37/32633 , H01J37/32697 , H01J37/32834
摘要： RF ground return current flow is diverted away from asymmetrical features of the reactor chamber by providing a bypass current flow path. The bypass current flow path avoids the pumping port in the chamber floor and avoids the wafer slit valve, and is provided by a conductive annular baffle grounded to and extending from the wafer pedestal. Current flow below the level of the annular baffle can be blocked by providing one or more insulating rings in the sidewall or by providing a dielectric sidewall.
摘要翻译： RF接地回流电流通过提供旁路电流流动路径而被转移离开反应室的非对称特征。旁路电流流动路径避免了室底部中的泵送口，避免了晶片狭缝阀，并且由接合到晶片基座并从晶片基座延伸的导电环形挡板提供。可以通过在侧壁中提供一个或多个绝缘环或通过提供电介质侧壁来阻止低于环形挡板水平面的电流。

4. 发明授权

US08513939B2 In-situ VHF voltage sensor for a plasma reactor 有权
标题翻译：用于等离子体反应器的原位VHF电压传感器
公开(公告)号：US08513939B2
公开(公告)日：2013-08-20
申请号：US13052280
申请日：2011-03-21
申请人： Hiroji Hanawa , Satoru Kobayashi , Kartik Ramaswamy , Shahid Rauf
发明人： Hiroji Hanawa , Satoru Kobayashi , Kartik Ramaswamy , Shahid Rauf
IPC分类号： G01R31/02 , G01R27/08
CPC分类号： G01R27/32 , G01R19/0061 , H05H1/0081
摘要： An RF voltage probe is adapted to have a long coaxial cable to permit a measuring device to be connected remotely from the probe without distorting the voltage measurement.
摘要翻译： RF电压探头适于具有长同轴电缆，以允许测量设备远离探头连接，而不会使电压测量失真。

5. 发明申请

US20120086464A1 IN-SITU VHF VOLTAGE/CURRENT SENSORS FOR A PLASMA REACTOR 有权
标题翻译：用于等离子体反应器的现场甚高频电压/电流传感器
公开(公告)号：US20120086464A1
公开(公告)日：2012-04-12
申请号：US13052280
申请日：2011-03-21
申请人： Hiroji Hanawa , Satoru Kobayashi , Kartik Ramaswamy , Shahid Rauf
发明人： Hiroji Hanawa , Satoru Kobayashi , Kartik Ramaswamy , Shahid Rauf
IPC分类号： G01R27/04
CPC分类号： G01R27/32 , G01R19/0061 , H05H1/0081
摘要： An RE voltage probe is adapted to have a long coaxial cable to permit a measuring device to be connected remotely from the probe without distorting the voltage measurement. An RF current probe is encapsulated in a conductive housing to permit its placement inside a plasma reactor chamber.
摘要翻译： RE电压探头适于具有长同轴电缆，以允许测量装置远离探头连接，而不会使电压测量失真。 RF电流探针被封装在导电壳体中以允许其放置在等离子体反应器室内。

6. 发明申请

US20110005679A1 PLASMA UNIFORMITY CONTROL THROUGH VHF CATHODE GROUND RETURN WITH FEEDBACK STABILIZATION OF VHF CATHODE IMPEDANCE 审中-公开
标题翻译：通过VHF阴极接地回路等离子体均匀控制，具有反馈稳定甚高频阴极阻抗
公开(公告)号：US20110005679A1
公开(公告)日：2011-01-13
申请号：US12502005
申请日：2009-07-13
申请人： HIROJI HANAWA , Kartik Ramaswamy , Satoru Kobayashi
发明人： HIROJI HANAWA , Kartik Ramaswamy , Satoru Kobayashi
IPC分类号： H01L21/3065 , H05K3/07
CPC分类号： H01J37/32174 , H01J37/32091 , H01J37/32165 , H01J37/32183
摘要： Plasma process uniformity is controlled by maintaining near an optimum value an impedance of a ground return path for VHF source power from an overhead electrode through a workpiece support. A feedback control loop controls a variable reactance element of a reactive circuit that provides isolation between the VHF source power and a lower frequency bias power match circuit.
摘要翻译：等离子体工艺均匀性通过保持靠近最佳值的方式来控制，该距离来自顶置电极通过工件支撑件的VHF源功率的接地返回路径的阻抗。反馈控制回路控制提供VHF源功率与较低频偏置功率匹配电路之间的隔离的无功电路的可变电抗元件。

7. 发明授权

US10576123B2 Tissue occluding agent comprising an IEIKIEIKIEIKI peptide 有权
公开(公告)号：US10576123B2
公开(公告)日：2020-03-03
申请号：US13122758
申请日：2009-10-06
申请人： Kentaro Takamura , Satoshi Gojo , Satoru Kobayashi
发明人： Kentaro Takamura , Satoshi Gojo , Satoru Kobayashi
IPC分类号： A61K38/10 , C07K7/08 , A61K38/16 , A61L31/14 , A61L31/04 , A61K31/7004 , A61K31/7016 , A61K38/08 , C07K7/06
摘要： There is provided a bioabsorbable peptide tissue occluding agent that can be applied to large mammals including humans, the peptide tissue occluding agent being obtained by artificial synthesis to avoid concerns of infection by viruses and the like. The tissue occluding agent contains a peptide, wherein the peptide is an amphiphilic peptide having 8-200 amino acid residues with the hydrophilic amino acids and hydrophobic amino acids alternately bonded, and is a self-assembling peptide exhibiting a β-structure in aqueous solution in the presence of physiological pH and/or a cation.

8. 发明授权

US09042447B2 Image coding apparatus and image coding method 有权
标题翻译：图像编码装置和图像编码方法
公开(公告)号：US09042447B2
公开(公告)日：2015-05-26
申请号：US13227369
申请日：2011-09-07
申请人： Satoru Kobayashi
发明人： Satoru Kobayashi
IPC分类号： H04N7/18 , H04N5/262 , H04N5/232 , H04N19/46 , H04N19/114
CPC分类号： H04N5/262 , H04N5/232 , H04N5/23248 , H04N5/23254 , H04N5/23264 , H04N19/114 , H04N19/46
摘要： There is provided an image coding apparatus for outputting an image stream in which random access and easy editing are possible without reducing encoding efficiency. The image coding apparatus sets, in the image stream, a picture in which the random access is possible based on camera control data or correlation between the images.
摘要翻译：提供了一种用于输出图像流的图像编码装置，其中随机访问和易于编辑是可能的，而不降低编码效率。图像编码装置基于相机控制数据或图像之间的相关性，在图像流中设置可以进行随机访问的图像。

9. 发明授权

US08982232B2 Image processing apparatus and image processing method 有权
标题翻译：图像处理装置和图像处理方法
公开(公告)号：US08982232B2
公开(公告)日：2015-03-17
申请号：US13543528
申请日：2012-07-06
申请人： Satoru Kobayashi
发明人： Satoru Kobayashi
IPC分类号： H04N5/235 , H04N5/238 , H04N5/272 , H04N5/357 , H04N5/365
CPC分类号： H04N5/272 , H04N5/357 , H04N5/3656
摘要： An image processing apparatus that, when combining a plurality of images, improves image quality by reducing noise in a region in which movement is detected, wherein a noise in the moving region is reduced by replacing the region in which movement is detected, with a low-noise image.
摘要翻译：一种图像处理装置，当组合多个图像时，通过降低检测到移动的区域中的噪声来提高图像质量，其中通过用检测到移动的区域替换来减少移动区域中的噪声，其中低 - 不好的形象。

10. 发明授权

US08287385B2 Game device, game processing method, information recording medium, and program 有权
标题翻译：游戏装置，游戏处理方法，信息记录介质和程序
公开(公告)号：US08287385B2
公开(公告)日：2012-10-16
申请号：US12441134
申请日：2007-02-01
申请人： Satoru Kobayashi
发明人： Satoru Kobayashi
IPC分类号： A63F13/00 , A63F9/24 , G06F17/00 , G06F19/00
CPC分类号： A63F13/56 , A63F13/10 , A63F2300/307 , A63F2300/6018 , A63F2300/636 , A63F2300/638 , A63F2300/64 , A63F2300/807
摘要： In a game device (200), a storage unit (201) stores a position of a player character, a position of an enemy character, and candidate positions for new enemy character appearance. A measuring unit (202) measures an elapsed time from the start of the game. The calculating unit (203) calculates a reference distance for determining a position where the new enemy character is to be produced based on the elapsed time measured by the measuring unit (202). The reference distance monotonically increases with respect to the elapsed time measured by the measuring unit (202). When a new enemy character is to be produced in the game, an appearance setting unit (204) selects from among the candidates stored in the storage unit (201) the candidate having a distance to the player character that is closest to the reference distance, and sets the selected position as the appearance position of the new enemy character.
摘要翻译：在游戏装置（200）中，存储单元（201）存储玩家角色的位置，敌人角色的位置和新敌人角色的候选位置。测量单元（202）测量从游戏开始起的经过时间。计算单元（203）基于由测量单元（202）测量的经过时间，计算用于确定要产生新的敌人角色的位置的参考距离。参考距离相对于由测量单元（202）测量的经过时间单调地增加。当在游戏中产生新的敌人角色时，出现设置单元（204）从存储在存储单元（201）中的候选者中选择距离参考距离最近的玩家角色的距离的候选者，并将所选位置设置为新敌人角色的出现位置。

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