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1. 发明申请

US20090221107A1 Deposition Method and Manufacturing Method of Light-Emitting Device 有权
标题翻译：发光装置的沉积方法和制造方法
公开(公告)号：US20090221107A1
公开(公告)日：2009-09-03
申请号：US12391785
申请日：2009-02-24
申请人： Shunpei Yamazaki , Koichiro Tanaka , Takahiro Ibe , Satoshi Seo
发明人： Shunpei Yamazaki , Koichiro Tanaka , Takahiro Ibe , Satoshi Seo
IPC分类号： H01L21/30 , H01L33/00
CPC分类号： H01L51/0013 , C23C14/048 , H01L51/56
摘要： Part of a material layer is deposited on a deposition target surface of a second substrate by steps of providing a first substrate having a light absorption layer and a material layer in contact with the light absorption layer over one of surfaces; making a surface of the first substrate over which the material layer is formed and a deposition target surface of a second substrate face to each other; depositing part of the material layer on the deposition target surface of the second substrate in such a manner that irradiation with laser light of which repetition rate is greater than or equal to 10 MHz and pulse width is greater than or equal to 100 fs and less than or equal to 10 ns is performed from the other surface side of the first substrate to selectively heat part of the material layer overlapping with the light absorption layer.
摘要翻译：材料层的一部分通过以下步骤沉积在第二衬底的沉积靶表面上：通过提供具有光吸收层的第一衬底和与光吸收层接触的材料层在一个表面上的步骤; 制作形成材料层的第一基板的表面和第二基板的沉积目标表面彼此面对; 在第二基板的沉积靶表面上沉积材料层的一部分，使得以重复率大于或等于10MHz的激光照射并且脉冲宽度大于或等于100fs并小于或者等于10ns从第一基板的另一表面侧进行选择性地加热与光吸收层重叠的材料层的一部分。

2. 发明申请

US20090220706A1 Film-Formation Method and Manufacturing Method of Light-Emitting Device 有权
标题翻译：发光装置的成膜方法及制造方法
公开(公告)号：US20090220706A1
公开(公告)日：2009-09-03
申请号：US12391840
申请日：2009-02-24
申请人： Shunpei Yamazaki , Takahiro Ibe , Takuya Tsurume , Koichiro Tanaka , Satoshi Seo
发明人： Shunpei Yamazaki , Takahiro Ibe , Takuya Tsurume , Koichiro Tanaka , Satoshi Seo
IPC分类号： C23C14/28
CPC分类号： C23C14/28 , C23C14/048 , H01L27/3211 , H01L51/0013 , H01L51/56
摘要： A film-formation method whereby a minute pattern thin film can be formed on a deposition substrate, without provision of a mask between a material and the deposition substrate. Moreover, a light-emitting element is formed by such a film-formation method, and a high-definition light-emitting device can be manufactured. Through a film-formation substrate in which a reflective layer, a light-absorbing layer and a material layer are formed, the light-absorbing layer is irradiated with light, so that a material contained in the material layer is deposited on a deposition substrate which is disposed to face the film-formation substrate. Since the reflective layer is selectively formed, a film to be deposited on the deposition substrate can be selectively formed with a minute pattern reflecting the pattern of the reflective layer. A wet process can be employed for formation of the material layer.
摘要翻译：可以在沉积基板上形成微图案薄膜而不在材料和沉积基板之间设置掩模的成膜方法。此外，通过这样的成膜方法形成发光元件，并且可以制造高清晰度发光器件。通过形成反射层，光吸收层和材料层的成膜基板，对光吸收层照射光，使得包含在材料层中的材料沉积在沉积基板上配置成面对成膜基板。由于选择性地形成反射层，所以可以以反射层的图案的微小图案选择性地形成沉积在沉积基板上的膜。可以采用湿法来形成材料层。

3. 发明授权

US08734915B2 Film-formation method and manufacturing method of light-emitting device 有权
标题翻译：发光装置的成膜方法和制造方法
公开(公告)号：US08734915B2
公开(公告)日：2014-05-27
申请号：US12391840
申请日：2009-02-24
申请人： Shunpei Yamazaki , Takahiro Ibe , Takuya Tsurume , Koichiro Tanaka , Satoshi Seo
发明人： Shunpei Yamazaki , Takahiro Ibe , Takuya Tsurume , Koichiro Tanaka , Satoshi Seo
IPC分类号： B05D3/06 , B05D5/12 , C23C14/32 , C23C14/28
CPC分类号： C23C14/28 , C23C14/048 , H01L27/3211 , H01L51/0013 , H01L51/56
摘要： A film-formation method whereby a minute pattern thin film can be formed on a deposition substrate, without provision of a mask between a material and the deposition substrate. Moreover, a light-emitting element is formed by such a film-formation method, and a high-definition light-emitting device can be manufactured. Through a film-formation substrate in which a reflective layer, a light-absorbing layer and a material layer are formed, the light-absorbing layer is irradiated with light, so that a material contained in the material layer is deposited on a deposition substrate which is disposed to face the film-formation substrate. Since the reflective layer is selectively formed, a film to be deposited on the deposition substrate can be selectively formed with a minute pattern reflecting the pattern of the reflective layer. A wet process can be employed for formation of the material layer.
摘要翻译：可以在沉积基板上形成微图案薄膜而不在材料和沉积基板之间设置掩模的成膜方法。此外，通过这样的成膜方法形成发光元件，并且可以制造高清晰度发光器件。通过形成反射层，光吸收层和材料层的成膜基板，对光吸收层照射光，使得包含在材料层中的材料沉积在沉积基板上配置成面对成膜基板。由于选择性地形成反射层，所以可以以反射层的图案的微小图案选择性地形成沉积在沉积基板上的膜。可以采用湿法来形成材料层。

4. 发明授权

US08581234B2 Deposition method and manufacturing method of light-emitting device 有权
标题翻译：发光装置的沉积方法和制造方法
公开(公告)号：US08581234B2
公开(公告)日：2013-11-12
申请号：US12391785
申请日：2009-02-24
申请人： Shunpei Yamazaki , Koichiro Tanaka , Takahiro Ibe , Satoshi Seo
发明人： Shunpei Yamazaki , Koichiro Tanaka , Takahiro Ibe , Satoshi Seo
IPC分类号： H01L33/02
CPC分类号： H01L51/0013 , C23C14/048 , H01L51/56
摘要： Part of a material layer is deposited on a deposition target surface of a second substrate by steps of providing a first substrate having a light absorption layer and a material layer in contact with the light absorption layer over one of surfaces; making a surface of the first substrate over which the material layer is formed and a deposition target surface of a second substrate face to each other; depositing part of the material layer on the deposition target surface of the second substrate in such a manner that irradiation with laser light of which repetition rate is greater than or equal to 10 MHz and pulse width is greater than or equal to 100 fs and less than or equal to 10 ns is performed from the other surface side of the first substrate to selectively heat part of the material layer overlapping with the light absorption layer.
摘要翻译：材料层的一部分通过以下步骤沉积在第二衬底的沉积靶表面上：通过提供具有光吸收层的第一衬底和与光吸收层接触的材料层在一个表面上的步骤; 制作形成材料层的第一基板的表面和第二基板的沉积目标表面彼此面对; 在第二基板的沉积靶表面上沉积材料层的一部分，使得以重复率大于或等于10MHz的激光照射并且脉冲宽度大于或等于100fs并小于或者等于10ns从第一基板的另一表面侧进行选择性地加热与光吸收层重叠的材料层的一部分。

5. 发明授权

US08802185B2 Deposition method and method for manufacturing light-emitting device 有权
标题翻译：沉积方法和制造发光器件的方法
公开(公告)号：US08802185B2
公开(公告)日：2014-08-12
申请号：US12472562
申请日：2009-05-27
申请人： Shunpei Yamazaki , Koichiro Tanaka , Hisao Ikeda , Satoshi Seo
发明人： Shunpei Yamazaki , Koichiro Tanaka , Hisao Ikeda , Satoshi Seo
IPC分类号： B05D5/12
CPC分类号： H01L51/0005 , H01L27/3211 , H01L51/56
摘要： An object is to provide a deposition method for smoothly obtaining desired pattern shapes of material layers and a method for manufacturing a light-emitting device while throughput is improved when a plurality of different material layers is stacked on a substrate. A material layer is selectively formed in advance in a position overlapped with a light absorption layer over a first substrate by pump feeding. Three kinds of light-emitting layers are deposited on one deposition substrate. This first substrate and a second substrate that is to be a deposition target substrate are arranged to face each other, and the light absorption layer is heated by being irradiated with light, whereby a film is deposited on the second substrate. Three kinds of light-emitting layers can be deposited with positional accuracy by performing only one position alignment before light irradiation.
摘要翻译：本发明的目的是提供一种用于平滑地获得材料层的期望图案形状的沉积方法，以及当多个不同的材料层堆叠在基底上时，提高生产能力的方法。预先在与第一基板上的光吸收层重叠的位置通过泵送来选择性地形成材料层。在一个沉积衬底上沉积三种发光层。该第一基板和作为沉积靶基板的第二基板被布置为彼此面对，并且通过照射光来加热光吸收层，由此在第二基板上沉积膜。可以通过在光照射之前仅进行一个位置对准来以位置精度沉积三种发光层。

6. 发明授权

US08071404B2 Method for fabricating light emitting device 有权
标题翻译：制造发光器件的方法
公开(公告)号：US08071404B2
公开(公告)日：2011-12-06
申请号：US12536069
申请日：2009-08-05
申请人： Shunpei Yamazaki , Koichiro Tanaka , Hisao Ikeda , Satoshi Seo
发明人： Shunpei Yamazaki , Koichiro Tanaka , Hisao Ikeda , Satoshi Seo
IPC分类号： H01L21/00
CPC分类号： H01L51/0009 , C23C14/048 , C23C14/12 , C23C14/28 , H01L51/0013 , H01L51/56
摘要： By using a first substrate which has a light-transmitting property and whose first face is provided with a light-absorbing layer, a mixture including an organic compound and an inorganic material is irradiated with light having a wavelength, which is absorbed by the inorganic material to heat the mixture, and thereby a film of the organic compound included in the mixture is formed on the first face of the first substrate. Then, the first face of the first substrate and a deposition surface of a second substrate are arranged to be adjacent to or in contact with each other, irradiation with light having a wavelength, which is absorbed by the light-absorbing layer is conducted from a second face side of the first substrate, to heat the organic compound, and thereby at least part of the organic compound is formed as a film on the deposition surface of the second substrate.
摘要翻译：通过使用具有透光性的第一基板，其第一面设置有光吸收层，将由有机化合物和无机材料构成的混合物照射由无机材料吸收的波长的光加热混合物，由此在第一基板的第一面上形成包含在混合物中的有机化合物的膜。然后，第一基板的第一面和第二基板的沉积表面被布置成彼此相邻或彼此接触，用由光吸收层吸收的具有波长的光的照射从第一基板的第二面侧，以加热有机化合物，由此至少部分有机化合物在第二基板的沉积表面上形成为膜。

7. 发明申请

US20100035371A1 Method for Fabricating Light Emitting Device 有权
标题翻译：制造发光装置的方法
公开(公告)号：US20100035371A1
公开(公告)日：2010-02-11
申请号：US12536069
申请日：2009-08-05
申请人： Shunpei Yamazaki , Koichiro Tanaka , Hisao Ikeda , Satoshi Seo
发明人： Shunpei Yamazaki , Koichiro Tanaka , Hisao Ikeda , Satoshi Seo
IPC分类号： H01L21/26
CPC分类号： H01L51/0009 , C23C14/048 , C23C14/12 , C23C14/28 , H01L51/0013 , H01L51/56
摘要： By using a first substrate which has a light-transmitting property and whose first face is provided with a light-absorbing layer, a mixture including an organic compound and an inorganic material is irradiated with light having a wavelength, which is absorbed by the inorganic material to heat the mixture, and thereby a film of the organic compound included in the mixture is formed on the first face of the first substrate. Then, the first face of the first substrate and a deposition surface of a second substrate are arranged to be adjacent to or in contact with each other, irradiation with light having a wavelength, which is absorbed by the light-absorbing layer is conducted from a second face side of the first substrate, to heat the organic compound, and thereby at least part of the organic compound is formed as a film on the deposition surface of the second substrate.
摘要翻译：通过使用具有透光性的第一基板，其第一面设置有光吸收层，将由有机化合物和无机材料构成的混合物照射由无机材料吸收的波长的光加热混合物，由此在第一基板的第一面上形成包含在混合物中的有机化合物的膜。然后，第一基板的第一面和第二基板的沉积表面被布置成彼此相邻或彼此接触，用由光吸收层吸收的具有波长的光的照射从第一基板的第二面侧，以加热有机化合物，由此至少部分有机化合物在第二基板的沉积表面上形成为膜。

8. 发明申请

US20090297694A1 Deposition Method and Method for Manufacturing Light-Emitting Device 有权
标题翻译：制造发光装置的沉积方法和方法
公开(公告)号：US20090297694A1
公开(公告)日：2009-12-03
申请号：US12472562
申请日：2009-05-27
申请人： Shunpei Yamazaki , Koichiro Tanaka , Hisao Ikeda , Satoshi Seo
发明人： Shunpei Yamazaki , Koichiro Tanaka , Hisao Ikeda , Satoshi Seo
IPC分类号： B05D5/12
CPC分类号： H01L51/0005 , H01L27/3211 , H01L51/56
摘要： An object is to provide a deposition method for smoothly obtaining desired pattern shapes of material layers and a method for manufacturing a light-emitting device while throughput is improved when a plurality of different material layers is stacked on a substrate. A material layer is selectively formed in advance in a position overlapped with a light absorption layer over a first substrate by pump feeding. Three kinds of light-emitting layers are deposited on one deposition substrate. This first substrate and a second substrate that is to be a deposition target substrate are arranged to face each other, and the light absorption layer is heated by being irradiated with light, whereby a film is deposited on the second substrate. Three kinds of light-emitting layers can be deposited with positional accuracy by performing only one position alignment before light irradiation.
摘要翻译：本发明的目的是提供一种用于平滑地获得材料层的期望图案形状的沉积方法，以及当多个不同的材料层堆叠在基底上时，提高生产能力的方法。预先在与第一基板上的光吸收层重叠的位置通过泵送来选择性地形成材料层。在一个沉积衬底上沉积三种发光层。该第一基板和作为沉积靶基板的第二基板被布置为彼此面对，并且通过照射光来加热光吸收层，由此在第二基板上沉积膜。可以通过在光照射之前仅进行一个位置对准来以位置精度沉积三种发光层。

9. 发明授权

US09905809B2 Light emitting device 有权
公开(公告)号：US09905809B2
公开(公告)日：2018-02-27
申请号：US13205872
申请日：2011-08-09
申请人： Satoshi Seo , Takeshi Noda , Shunpei Yamazaki
发明人： Satoshi Seo , Takeshi Noda , Shunpei Yamazaki
IPC分类号： H01L33/60 , H01L51/52 , H01L51/50 , H01L27/32
CPC分类号： H01L51/5278 , H01L27/3211 , H01L27/3244 , H01L51/5044 , H01L51/5218 , H01L51/5265
摘要： It is an object of the invention to provide a light emitting device which can display a superior image in which luminescent color from each light emitting layer is beautifully displayed and power consumption is lowered in a light emitting element in which light emitting layers are stacked. One feature of the invention is that, in a light emitting element which comprises light emitting layers stacked between electrodes, each distance between each light emitting layer and an electrode is approximately oddly multiplied ¼ wavelength by controlling a thickness of a layer provided therebetween to enhance luminous output efficiency. Another feature of the invention is that a drive voltage is lowered using a high conductive material for the layer compared with a conventional element.

10. 发明授权

US09088002B2 Light-emitting device and manufacturing method thereof 有权
标题翻译：发光元件及其制造方法
公开(公告)号：US09088002B2
公开(公告)日：2015-07-21
申请号：US13370958
申请日：2012-02-10
申请人： Hisao Ikeda , Satoshi Seo , Shunpei Yamazaki
发明人： Hisao Ikeda , Satoshi Seo , Shunpei Yamazaki
IPC分类号： H01L29/08 , H01L51/50
CPC分类号： H01L51/5056 , H01L51/50 , H01L2251/552
摘要： An object of the present invention is to decrease the conductivity of a hole-injection layer (or a hole-transport layer) containing molybdenum oxide without decreasing the amount of molybdenum oxide so that crosstalk is prevented from occurring. A light-emitting element includes, between an anode and a cathode, an EL layer including at least a hole-injection layer and a light-emitting layer. In the light-emitting element, the hole-injection layer is provided between the anode and the light-emitting layer, and the hole-injection layer contains molybdenum oxide and an additive. The additive may be an alkali metal, an alkaline earth metal, a substance having a HOMO level of lower than or equal to −5.8 eV, or a substance having a hole mobility of lower than or equal to 10−7 cm2/Vs.
摘要翻译：本发明的目的是降低含有氧化钼的空穴注入层（或空穴传输层）的导电性，而不会减少氧化钼的量，从而防止发生串扰。发光元件在阳极和阴极之间包括至少包括空穴注入层和发光层的EL层。在发光元件中，空穴注入层设置在阳极和发光层之间，空穴注入层含有氧化钼和添加剂。添加剂可以是碱金属，碱土金属，HOMO含量低于或等于-5.8eV的物质或具有低于或等于10-7cm 2 / Vs的空穴迁移率的物质。

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