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1. 发明申请

US20180119284A1 MAINTENANCE DEVICE AND METHOD OF USING THE SAME 审中-公开
公开(公告)号：US20180119284A1
公开(公告)日：2018-05-03
申请号：US15503877
申请日：2016-09-13
申请人： BOE TECHNOLOGY GROUP CO., LTD. , HEFEI BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
发明人： Haitao WANG , Niu TIAN , Wenyuan SUN , Song GAO
IPC分类号： C23C16/52 , C23C16/455 , C23C16/44
CPC分类号： C23C16/52 , C23C14/048 , C23C16/047 , C23C16/4401 , C23C16/455
摘要： An apparatus includes a powder storage tank (21) and a gas chamber (14), the powder storage tank (21) being provided with an outlet duct (23) in communication with the gas chamber (14). The apparatus further includes a monitoring device (24), a first switch (25) and a second switch (26). The monitoring device (24) is provided between the powder storage tank (21) and the gas chamber (14) while communicating with the outlet duct, and configured to monitor the powder content per unit volume in the outlet duct when the gas path between the monitoring device and the gas chamber is in the close state. The first switch (25) is provided between the monitoring device (24) and the outlet duct (23), and the second switch (26) is provided between the monitoring device (24) and the gas chamber (14). A method of using the apparatus is also provided.

2. 发明申请

US20170248842A1 METHOD AND DEVICE FOR PERMANENTLY REPAIRING DEFECTS OF ABSENT MATERIAL OF A PHOTOLITHOGRAPHIC MASK 审中-公开
公开(公告)号：US20170248842A1
公开(公告)日：2017-08-31
申请号：US15441678
申请日：2017-02-24
申请人： Carl Zeiss SMT GmbH
发明人： Jens Oster , Kinga Kornilov , Tristan Bret , Horst Schneider , Thorsten Hofmann
IPC分类号： G03F1/72 , C23C14/04 , C23C14/22 , C23C14/54 , C23C14/58 , C23C14/08 , G03F1/26 , C23C14/10
CPC分类号： G03F1/72 , C23C14/048 , C23C14/083 , C23C14/085 , C23C14/10 , C23C14/221 , C23C14/28 , C23C14/30 , C23C14/548 , C23C14/5873 , C23C16/047 , C23C16/16 , C23C16/18 , C23C16/402 , C23C16/405 , C23C16/483 , C23C16/486 , C23C16/56 , G03F1/26 , G03F1/74 , H01J37/30
摘要： The present application relates to a method for permanently repairing defects of absent material of a photolithographic mask, comprising the following steps: (a) providing at least one carbon-containing precursor gas and at least one oxidizing agent at a location to be repaired of the photolithographic mask; (b) initiating a reaction of the at least one carbon-containing precursor gas with the aid of at least one energy source at the location of absent material in order to deposit material at the location of absent material, wherein the deposited material comprises at least one reaction product of the reacted at least one carbon-containing precursor gas; and (c) controlling a gas volumetric flow rate of the at least one oxidizing agent in order to minimize a carbon proportion of the deposited material.

3. 发明授权

US09689068B2 Deposition and patterning using emitted electrons 有权
公开(公告)号：US09689068B2
公开(公告)日：2017-06-27
申请号：US14713366
申请日：2015-05-15
申请人： NanoEdit, LLC
发明人： John Mark Anthony
IPC分类号： B05D3/06 , C23C14/22 , C23C14/04
CPC分类号： C23C14/221 , C23C14/04 , C23C14/048
摘要： A method of creating a localized deposition on a sample in a vacuum chamber having an ion source generating a positively-charged beam of ions and a separate source of primary radiation generating a beam of radiation. An ion beam from the ion source is directed toward the sample, and the primary radiation beam is applied to the sample to generate emitted electrons from the sample. The ion beam and the primary radiation beam are positioned so that the paths of at least some of the ions in the ion beam and the paths of at least some of the emitted electrons from the sample substantially overlap in space near the sample surface. The energy of the ions in the ion beam and the electric potential of the sample are adjusted to substantially prevent deposition of ions on the sample. The energy of the ions in the ion beam and the electric potential of the sample are adjusted so that a portion of the ions in the ion beam are neutralized by the emitted electrons from the sample, and such neutralized ions continue in their respective paths to deposit on the sample.

4. 发明授权

US09674966B2 Process of depositing a metallic pattern on a medium 有权
公开(公告)号：US09674966B2
公开(公告)日：2017-06-06
申请号：US14647377
申请日：2013-11-27
申请人： DSM IP ASSETS B.V.
发明人： Franciscus Wilhelmus Maria Gelissen , Raul Marcelino Perez Graterol
IPC分类号： H05K1/00 , H05K3/38 , C23C14/04 , C23C14/28 , C23C14/58 , C23C18/16 , C23C18/18 , H05K1/03 , H05K3/00 , H05K3/18
CPC分类号： H05K3/387 , B41M2205/08 , C23C14/048 , C23C14/28 , C23C14/584 , C23C18/1608 , C23C18/1612 , C23C18/1868 , C23C18/1882 , H05K1/0353 , H05K3/0032 , H05K3/182 , H05K3/381 , H05K3/388 , H05K2201/0108 , H05K2203/072 , H05K2203/107
摘要： Process of depositing a metallic pattern on a medium, said process comprising: generating pulsed laser beams from a pulsed laser source, wherein the laser beams have a wavelength for which the medium is substantially transparent, focussing the laser beams onto a target layer comprising inorganic particles, dispersed in a laser light degradable/combustible organic matrix, said target layer producing ejecta in response to an interaction of said laser beams and said target layer, accumulating at least a portion of said ejecta on said medium within the desired pattern, providing the pattern by electroless metal plating. The invention further relates to a transparent medium comprising a metallic pattern wherein the adhesion between the metallic pattern and the medium is at least 5N/cm.

5. 发明授权

US09543548B2 Deposition donor substrate and method for manufacturing light-emitting device 有权
标题翻译：沉积施主基板和制造发光器件的方法
公开(公告)号：US09543548B2
公开(公告)日：2017-01-10
申请号：US14070062
申请日：2013-11-01
申请人： Semiconductor Energy Laboratory Co., Ltd.
发明人： Satoshi Seo , Kohei Yokoyama
IPC分类号： H01L51/56 , H01L51/00 , C23C14/04
CPC分类号： H01L51/56 , C23C14/048 , H01L51/0013 , Y10T428/2495 , Y10T428/24975
摘要： One surface of a first substrate provided with at least light-absorbing layers separately formed, partition layers each formed between the light-absorbing layers and having an inverse taper shape, and material layers formed on the light-absorbing layers and on the partition layers so that the material layers are separated from each other is disposed to face a deposition target surface of a second substrate; light irradiation is performed from the other surface of the first substrate, only the material layers in regions overlapped with the light-absorbing layers are heated and evaporated to the deposition target surface of the second substrate.
摘要翻译：第一基板的一个表面至少设置有分开形成的光吸收层，分别形成在光吸收层之间并具有倒锥形的分隔层以及形成在光吸收层和分隔层上的材料层材料层彼此分离设置为面对第二基板的沉积目标表面; 从第一基板的另一个表面进行光照射，只有与光吸收层重叠的区域中的材料层被加热并蒸发到第二基板的沉积靶表面。

6. 发明授权

US09434197B2 Laser engraved reflective surface structures 有权
标题翻译：激光雕刻反光表面结构
公开(公告)号：US09434197B2
公开(公告)日：2016-09-06
申请号：US13921136
申请日：2013-06-18
申请人： Apple Inc.
发明人： Michael S. Nashner , Peter N. Russell-Clarke
IPC分类号： H05K5/02 , H05K5/00 , H05K5/04 , B32B3/00 , B32B15/00 , B41M5/24 , C23C14/58 , C23C14/02 , C23C14/04 , B32B3/02 , B32B15/01
CPC分类号： B41M5/24 , B32B3/00 , B32B3/02 , B32B15/00 , B32B15/01 , B41M5/245 , C23C14/028 , C23C14/048 , C23C14/58 , C23C14/5813 , Y10T428/12389 , Y10T428/12611 , Y10T428/12618 , Y10T428/12736 , Y10T428/12764 , Y10T428/12806 , Y10T428/12979 , Y10T428/12993
摘要： Markings on products are disclosed. In one embodiment, the products have housings and the markings are to be provided on the housings. For example, a housing for a particular product can include an outer housing surface and the markings can be provided on the outer housing surface so as to be visible from the outside of the housing. The markings may be precisely formed using a laser. Processing may be used to increase reflectivity of the markings.
摘要翻译：披露产品上的标记。在一个实施例中，产品具有外壳，并且标记将设置在外壳上。例如，用于特定产品的壳体可以包括外部壳体表面，并且标记可以设置在外部壳体表面上，以便从壳体的外部可见。标记可以使用激光精确地形成。处理可以用于增加标记的反射率。

7. 发明申请

US20150132875A1 MASK FOR FORMING LAYER, FORMING METHOD OF LAYER, AND MANUFACTURING METHOD OF ORGANIC LIGHT-EMITTING DIODE (OLED) DISPLAY USING THE SAME 审中-公开
标题翻译：用于形成层的掩模，层的形成方法和使用其的有机发光二极管（OLED）显示器的制造方法
公开(公告)号：US20150132875A1
公开(公告)日：2015-05-14
申请号：US14289171
申请日：2014-05-28
申请人： Samsung Display Co., Ltd.
发明人： Yeon Hwa LEE , Hyun Sung BANG , Joon Gu LEE , Ji Young CHOUNG , Jin Baek CHOI , Kyu Hwan HWANG , Young Woo SONG
IPC分类号： H01L51/00 , H01L51/52 , B05C21/00
CPC分类号： H01L51/0012 , B05C21/005 , C23C14/048 , H01L27/3216 , H01L27/3218 , H01L51/0011 , H01L51/0013
摘要： A mask for forming a layer, a method of forming a layer, and a manufacturing method of an organic light-emitting diode (OLED) display are disclosed. In one aspect, the mask includes at least one light absorption portion and at least one reflection portion that are formed in a unit region, the unit region corresponding to a region where a continuous layer is formed, wherein the light absorption portion and the reflection portion in the unit region are formed at different areas from each other.
摘要翻译：公开了用于形成层的掩模，形成层的方法和有机发光二极管（OLED）显示器的制造方法。在一个方面中，掩模包括形成在单位区域中的至少一个光吸收部分和至少一个反射部分，该单元区域对应于形成连续层的区域，其中光吸收部分和反射部分在单位区域中形成在彼此不同的区域。

8. 发明授权

US08993071B2 Method for manufacturing magnetic recording medium 有权
公开(公告)号：US08993071B2
公开(公告)日：2015-03-31
申请号：US12288538
申请日：2008-10-20
申请人： Hiroshi Inaba , Hiroshi Kanai , Nobuto Yasui , Toshinori Ono
发明人： Hiroshi Inaba , Hiroshi Kanai , Nobuto Yasui , Toshinori Ono
IPC分类号： G11B5/855 , C23C14/04 , C23C14/16 , C23C14/46 , C23C14/06
CPC分类号： G11B5/855 , C23C14/042 , C23C14/048 , C23C14/0605 , C23C14/16 , C23C14/46
摘要： Embodiments of the present invention provide a manufacturing method that can form a track guide separation area of a magnetic disk substrate constituting a patterned medium represented by a discrete track medium or bit patterned medium suitable for high recording density, uniformly on the whole surface of the magnetic disk substrate, and accurately according to the mask. According to one embodiment, a soft magnetic film, an under coating film, and a magnetic film are formed on a substrate. A mask having an arbitrary pattern shape provided for forming the track guide separation area in the magnetic film is formed on the magnetic film, and the track guide separation area is formed by irradiating ions and electrons onto the surface of the magnetic film and applying an intermittent voltage to the substrate, thereby non-magnetizing the area irradiated.

9. 发明申请

US20150001495A1 DONOR SUBSTRATE FOR TRANSFER AND MANUFACTURING METHOD OF ORGANIC LIGHT EMITTING DIODE DISPLAY 审中-公开
标题翻译：用于有机发光二极管显示器的转移和制造方法的基底
公开(公告)号：US20150001495A1
公开(公告)日：2015-01-01
申请号：US14276327
申请日：2014-05-13
申请人： Samsung Display Co., Ltd.
发明人： Ji-Young CHOUNG , Hyun-Sung BANG , Yeon-Hwa LEE , Joon-Gu LEE , Jin-Baek CHOI , Young-Woo SONG , Jong-Hyuk LEE
IPC分类号： H01L27/32 , H01L51/56 , H01L51/52
CPC分类号： H01L51/0013 , C23C14/048
摘要： A donor substrate for transfer and a manufacturing method of an organic light emitting diode (OLED) display, the donor substrate including a transparent support layer; a light-to-heat conversion layer on one side of the support layer, the light to heat conversion layer being in the form of a first pattern; a transfer layer covering the light-to-heat conversion layer; and a reflection layer on another side of the support layer, the other side being opposite to the one side of the support layer, the reflection layer being in the form of a second pattern.
摘要翻译：用于转移的供体衬底和有机发光二极管（OLED）显示器的制造方法，所述施主衬底包括透明支撑层; 在所述支撑层的一侧上的光热转换层，所述光热转换层为第一图案的形式; 覆盖所述光热转换层的转印层; 以及在支撑层的另一侧上的反射层，另一侧与支撑层的一侧相对，反射层为第二图案的形式。

10. 发明授权

US08840972B2 Deposition method and method for manufacturing light-emitting device 有权
标题翻译：沉积方法和制造发光器件的方法
公开(公告)号：US08840972B2
公开(公告)日：2014-09-23
申请号：US12396636
申请日：2009-03-03
申请人： Shunpei Yamazaki
发明人： Shunpei Yamazaki
IPC分类号： B05D3/00 , C08J7/18 , C23C14/30 , C23C14/04 , C23C14/28
CPC分类号： C23C14/048 , B82Y20/00 , B82Y30/00 , C23C14/28 , H01L27/3281 , H01L51/0013 , H01L51/56 , H01L2251/5369
摘要： An object is to provide a deposition method of forming a film in a minute pattern on a deposition target substrate as well as reducing waste of material and increasing material use efficiency. Another object is to manufacture a high-definition light-emitting device at low cost by such a deposition method. Particles containing an organic compound material are dispersed over a deposition substrate having a light-absorbing layer formed over the deposition substrate and are fixed by heat treatment to form a material layer. The light-absorbing layer is irradiated with light which is transmitted through the deposition substrate, so that a material contained in the material layer is selectively deposited onto a deposition target substrate placed facing the deposition substrate. By selective formation of the light-absorbing layer, a film can be selectively deposited in a minute pattern reflecting a pattern of the light-absorbing layer onto the deposition target substrate.
摘要翻译：本发明的目的是提供一种在沉积靶基板上以微小的图案形成薄膜并减少材料浪费并提高材料使用效率的沉积方法。另一个目的是通过这种沉积方法以低成本制造高分辨率发光器件。含有有机化合物材料的颗粒分散在具有形成在沉积基板上的光吸收层的沉积基板上，并通过热处理固定以形成材料层。用透过沉积基板的光照射光吸收层，使得包含在材料层中的材料被选择性地沉积到面向沉积基板的沉积靶基板上。通过选择性地形成光吸收层，可以以反射光吸收层的图案的微小图案选择性地沉积到沉积靶基板上。

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