专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08734915B2 Film-formation method and manufacturing method of light-emitting device 有权
标题翻译：发光装置的成膜方法和制造方法
公开(公告)号：US08734915B2
公开(公告)日：2014-05-27
申请号：US12391840
申请日：2009-02-24
申请人： Shunpei Yamazaki , Takahiro Ibe , Takuya Tsurume , Koichiro Tanaka , Satoshi Seo
发明人： Shunpei Yamazaki , Takahiro Ibe , Takuya Tsurume , Koichiro Tanaka , Satoshi Seo
IPC分类号： B05D3/06 , B05D5/12 , C23C14/32 , C23C14/28
CPC分类号： C23C14/28 , C23C14/048 , H01L27/3211 , H01L51/0013 , H01L51/56
摘要： A film-formation method whereby a minute pattern thin film can be formed on a deposition substrate, without provision of a mask between a material and the deposition substrate. Moreover, a light-emitting element is formed by such a film-formation method, and a high-definition light-emitting device can be manufactured. Through a film-formation substrate in which a reflective layer, a light-absorbing layer and a material layer are formed, the light-absorbing layer is irradiated with light, so that a material contained in the material layer is deposited on a deposition substrate which is disposed to face the film-formation substrate. Since the reflective layer is selectively formed, a film to be deposited on the deposition substrate can be selectively formed with a minute pattern reflecting the pattern of the reflective layer. A wet process can be employed for formation of the material layer.
摘要翻译：可以在沉积基板上形成微图案薄膜而不在材料和沉积基板之间设置掩模的成膜方法。此外，通过这样的成膜方法形成发光元件，并且可以制造高清晰度发光器件。通过形成反射层，光吸收层和材料层的成膜基板，对光吸收层照射光，使得包含在材料层中的材料沉积在沉积基板上配置成面对成膜基板。由于选择性地形成反射层，所以可以以反射层的图案的微小图案选择性地形成沉积在沉积基板上的膜。可以采用湿法来形成材料层。

2. 发明申请

US20090221107A1 Deposition Method and Manufacturing Method of Light-Emitting Device 有权
标题翻译：发光装置的沉积方法和制造方法
公开(公告)号：US20090221107A1
公开(公告)日：2009-09-03
申请号：US12391785
申请日：2009-02-24
申请人： Shunpei Yamazaki , Koichiro Tanaka , Takahiro Ibe , Satoshi Seo
发明人： Shunpei Yamazaki , Koichiro Tanaka , Takahiro Ibe , Satoshi Seo
IPC分类号： H01L21/30 , H01L33/00
CPC分类号： H01L51/0013 , C23C14/048 , H01L51/56
摘要： Part of a material layer is deposited on a deposition target surface of a second substrate by steps of providing a first substrate having a light absorption layer and a material layer in contact with the light absorption layer over one of surfaces; making a surface of the first substrate over which the material layer is formed and a deposition target surface of a second substrate face to each other; depositing part of the material layer on the deposition target surface of the second substrate in such a manner that irradiation with laser light of which repetition rate is greater than or equal to 10 MHz and pulse width is greater than or equal to 100 fs and less than or equal to 10 ns is performed from the other surface side of the first substrate to selectively heat part of the material layer overlapping with the light absorption layer.
摘要翻译：材料层的一部分通过以下步骤沉积在第二衬底的沉积靶表面上：通过提供具有光吸收层的第一衬底和与光吸收层接触的材料层在一个表面上的步骤; 制作形成材料层的第一基板的表面和第二基板的沉积目标表面彼此面对; 在第二基板的沉积靶表面上沉积材料层的一部分，使得以重复率大于或等于10MHz的激光照射并且脉冲宽度大于或等于100fs并小于或者等于10ns从第一基板的另一表面侧进行选择性地加热与光吸收层重叠的材料层的一部分。

3. 发明申请

US20090220706A1 Film-Formation Method and Manufacturing Method of Light-Emitting Device 有权
标题翻译：发光装置的成膜方法及制造方法
公开(公告)号：US20090220706A1
公开(公告)日：2009-09-03
申请号：US12391840
申请日：2009-02-24
申请人： Shunpei Yamazaki , Takahiro Ibe , Takuya Tsurume , Koichiro Tanaka , Satoshi Seo
发明人： Shunpei Yamazaki , Takahiro Ibe , Takuya Tsurume , Koichiro Tanaka , Satoshi Seo
IPC分类号： C23C14/28
CPC分类号： C23C14/28 , C23C14/048 , H01L27/3211 , H01L51/0013 , H01L51/56
摘要： A film-formation method whereby a minute pattern thin film can be formed on a deposition substrate, without provision of a mask between a material and the deposition substrate. Moreover, a light-emitting element is formed by such a film-formation method, and a high-definition light-emitting device can be manufactured. Through a film-formation substrate in which a reflective layer, a light-absorbing layer and a material layer are formed, the light-absorbing layer is irradiated with light, so that a material contained in the material layer is deposited on a deposition substrate which is disposed to face the film-formation substrate. Since the reflective layer is selectively formed, a film to be deposited on the deposition substrate can be selectively formed with a minute pattern reflecting the pattern of the reflective layer. A wet process can be employed for formation of the material layer.
摘要翻译：可以在沉积基板上形成微图案薄膜而不在材料和沉积基板之间设置掩模的成膜方法。此外，通过这样的成膜方法形成发光元件，并且可以制造高清晰度发光器件。通过形成反射层，光吸收层和材料层的成膜基板，对光吸收层照射光，使得包含在材料层中的材料沉积在沉积基板上配置成面对成膜基板。由于选择性地形成反射层，所以可以以反射层的图案的微小图案选择性地形成沉积在沉积基板上的膜。可以采用湿法来形成材料层。

4. 发明授权

US08581234B2 Deposition method and manufacturing method of light-emitting device 有权
标题翻译：发光装置的沉积方法和制造方法
公开(公告)号：US08581234B2
公开(公告)日：2013-11-12
申请号：US12391785
申请日：2009-02-24
申请人： Shunpei Yamazaki , Koichiro Tanaka , Takahiro Ibe , Satoshi Seo
发明人： Shunpei Yamazaki , Koichiro Tanaka , Takahiro Ibe , Satoshi Seo
IPC分类号： H01L33/02
CPC分类号： H01L51/0013 , C23C14/048 , H01L51/56
摘要： Part of a material layer is deposited on a deposition target surface of a second substrate by steps of providing a first substrate having a light absorption layer and a material layer in contact with the light absorption layer over one of surfaces; making a surface of the first substrate over which the material layer is formed and a deposition target surface of a second substrate face to each other; depositing part of the material layer on the deposition target surface of the second substrate in such a manner that irradiation with laser light of which repetition rate is greater than or equal to 10 MHz and pulse width is greater than or equal to 100 fs and less than or equal to 10 ns is performed from the other surface side of the first substrate to selectively heat part of the material layer overlapping with the light absorption layer.
摘要翻译：材料层的一部分通过以下步骤沉积在第二衬底的沉积靶表面上：通过提供具有光吸收层的第一衬底和与光吸收层接触的材料层在一个表面上的步骤; 制作形成材料层的第一基板的表面和第二基板的沉积目标表面彼此面对; 在第二基板的沉积靶表面上沉积材料层的一部分，使得以重复率大于或等于10MHz的激光照射并且脉冲宽度大于或等于100fs并小于或者等于10ns从第一基板的另一表面侧进行选择性地加热与光吸收层重叠的材料层的一部分。

5. 发明授权

US08802185B2 Deposition method and method for manufacturing light-emitting device 有权
标题翻译：沉积方法和制造发光器件的方法
公开(公告)号：US08802185B2
公开(公告)日：2014-08-12
申请号：US12472562
申请日：2009-05-27
申请人： Shunpei Yamazaki , Koichiro Tanaka , Hisao Ikeda , Satoshi Seo
发明人： Shunpei Yamazaki , Koichiro Tanaka , Hisao Ikeda , Satoshi Seo
IPC分类号： B05D5/12
CPC分类号： H01L51/0005 , H01L27/3211 , H01L51/56
摘要： An object is to provide a deposition method for smoothly obtaining desired pattern shapes of material layers and a method for manufacturing a light-emitting device while throughput is improved when a plurality of different material layers is stacked on a substrate. A material layer is selectively formed in advance in a position overlapped with a light absorption layer over a first substrate by pump feeding. Three kinds of light-emitting layers are deposited on one deposition substrate. This first substrate and a second substrate that is to be a deposition target substrate are arranged to face each other, and the light absorption layer is heated by being irradiated with light, whereby a film is deposited on the second substrate. Three kinds of light-emitting layers can be deposited with positional accuracy by performing only one position alignment before light irradiation.
摘要翻译：本发明的目的是提供一种用于平滑地获得材料层的期望图案形状的沉积方法，以及当多个不同的材料层堆叠在基底上时，提高生产能力的方法。预先在与第一基板上的光吸收层重叠的位置通过泵送来选择性地形成材料层。在一个沉积衬底上沉积三种发光层。该第一基板和作为沉积靶基板的第二基板被布置为彼此面对，并且通过照射光来加热光吸收层，由此在第二基板上沉积膜。可以通过在光照射之前仅进行一个位置对准来以位置精度沉积三种发光层。

6. 发明授权

US08071404B2 Method for fabricating light emitting device 有权
标题翻译：制造发光器件的方法
公开(公告)号：US08071404B2
公开(公告)日：2011-12-06
申请号：US12536069
申请日：2009-08-05
申请人： Shunpei Yamazaki , Koichiro Tanaka , Hisao Ikeda , Satoshi Seo
发明人： Shunpei Yamazaki , Koichiro Tanaka , Hisao Ikeda , Satoshi Seo
IPC分类号： H01L21/00
CPC分类号： H01L51/0009 , C23C14/048 , C23C14/12 , C23C14/28 , H01L51/0013 , H01L51/56
摘要： By using a first substrate which has a light-transmitting property and whose first face is provided with a light-absorbing layer, a mixture including an organic compound and an inorganic material is irradiated with light having a wavelength, which is absorbed by the inorganic material to heat the mixture, and thereby a film of the organic compound included in the mixture is formed on the first face of the first substrate. Then, the first face of the first substrate and a deposition surface of a second substrate are arranged to be adjacent to or in contact with each other, irradiation with light having a wavelength, which is absorbed by the light-absorbing layer is conducted from a second face side of the first substrate, to heat the organic compound, and thereby at least part of the organic compound is formed as a film on the deposition surface of the second substrate.
摘要翻译：通过使用具有透光性的第一基板，其第一面设置有光吸收层，将由有机化合物和无机材料构成的混合物照射由无机材料吸收的波长的光加热混合物，由此在第一基板的第一面上形成包含在混合物中的有机化合物的膜。然后，第一基板的第一面和第二基板的沉积表面被布置成彼此相邻或彼此接触，用由光吸收层吸收的具有波长的光的照射从第一基板的第二面侧，以加热有机化合物，由此至少部分有机化合物在第二基板的沉积表面上形成为膜。

7. 发明申请

US20100035371A1 Method for Fabricating Light Emitting Device 有权
标题翻译：制造发光装置的方法
公开(公告)号：US20100035371A1
公开(公告)日：2010-02-11
申请号：US12536069
申请日：2009-08-05
申请人： Shunpei Yamazaki , Koichiro Tanaka , Hisao Ikeda , Satoshi Seo
发明人： Shunpei Yamazaki , Koichiro Tanaka , Hisao Ikeda , Satoshi Seo
IPC分类号： H01L21/26
CPC分类号： H01L51/0009 , C23C14/048 , C23C14/12 , C23C14/28 , H01L51/0013 , H01L51/56
摘要： By using a first substrate which has a light-transmitting property and whose first face is provided with a light-absorbing layer, a mixture including an organic compound and an inorganic material is irradiated with light having a wavelength, which is absorbed by the inorganic material to heat the mixture, and thereby a film of the organic compound included in the mixture is formed on the first face of the first substrate. Then, the first face of the first substrate and a deposition surface of a second substrate are arranged to be adjacent to or in contact with each other, irradiation with light having a wavelength, which is absorbed by the light-absorbing layer is conducted from a second face side of the first substrate, to heat the organic compound, and thereby at least part of the organic compound is formed as a film on the deposition surface of the second substrate.
摘要翻译：通过使用具有透光性的第一基板，其第一面设置有光吸收层，将由有机化合物和无机材料构成的混合物照射由无机材料吸收的波长的光加热混合物，由此在第一基板的第一面上形成包含在混合物中的有机化合物的膜。然后，第一基板的第一面和第二基板的沉积表面被布置成彼此相邻或彼此接触，用由光吸收层吸收的具有波长的光的照射从第一基板的第二面侧，以加热有机化合物，由此至少部分有机化合物在第二基板的沉积表面上形成为膜。

8. 发明申请

US20090297694A1 Deposition Method and Method for Manufacturing Light-Emitting Device 有权
标题翻译：制造发光装置的沉积方法和方法
公开(公告)号：US20090297694A1
公开(公告)日：2009-12-03
申请号：US12472562
申请日：2009-05-27
申请人： Shunpei Yamazaki , Koichiro Tanaka , Hisao Ikeda , Satoshi Seo
发明人： Shunpei Yamazaki , Koichiro Tanaka , Hisao Ikeda , Satoshi Seo
IPC分类号： B05D5/12
CPC分类号： H01L51/0005 , H01L27/3211 , H01L51/56
摘要： An object is to provide a deposition method for smoothly obtaining desired pattern shapes of material layers and a method for manufacturing a light-emitting device while throughput is improved when a plurality of different material layers is stacked on a substrate. A material layer is selectively formed in advance in a position overlapped with a light absorption layer over a first substrate by pump feeding. Three kinds of light-emitting layers are deposited on one deposition substrate. This first substrate and a second substrate that is to be a deposition target substrate are arranged to face each other, and the light absorption layer is heated by being irradiated with light, whereby a film is deposited on the second substrate. Three kinds of light-emitting layers can be deposited with positional accuracy by performing only one position alignment before light irradiation.
摘要翻译：本发明的目的是提供一种用于平滑地获得材料层的期望图案形状的沉积方法，以及当多个不同的材料层堆叠在基底上时，提高生产能力的方法。预先在与第一基板上的光吸收层重叠的位置通过泵送来选择性地形成材料层。在一个沉积衬底上沉积三种发光层。该第一基板和作为沉积靶基板的第二基板被布置为彼此面对，并且通过照射光来加热光吸收层，由此在第二基板上沉积膜。可以通过在光照射之前仅进行一个位置对准来以位置精度沉积三种发光层。

9. 发明授权

US08313603B2 Film formation apparatus, film formation method, manufacturing apparatus, and method for manufacturing light-emitting device 有权
标题翻译：成膜装置，成膜方法，制造装置以及发光装置的制造方法
公开(公告)号：US08313603B2
公开(公告)日：2012-11-20
申请号：US11949217
申请日：2007-12-03
申请人： Hisao Ikeda , Tomoya Aoyama , Takahiro Ibe , Yoshiharu Hirakata , Shunpei Yamazaki
发明人： Hisao Ikeda , Tomoya Aoyama , Takahiro Ibe , Yoshiharu Hirakata , Shunpei Yamazaki
IPC分类号： C23C14/04 , C23C14/08
CPC分类号： B05C11/00 , C23C14/042 , C23C14/12 , C23C14/26 , C23C14/28 , C23C14/568 , H01L51/0081 , H01L51/56
摘要： An object is to improve use efficiency of an evaporation material, to reduce manufacturing cost of a light-emitting device, and to reduce manufacturing time needed for a light-emitting device including a layer containing an organic compound. The pressure of a film formation chamber is reduced, a plate is rapidly heated by heat conduction or heat radiation by using a heat source, a material layer on a plate is vaporized in a short time to be evaporated to a substrate on which the material layer is to be formed (formation substrate), and then the material layer is formed on the formation substrate. The area of the plate that is heated rapidly is set to have the same size as the formation substrate and film formation on the formation substrate is completed by one application of heat.
摘要翻译：本发明的目的在于提高蒸发材料的使用效率，降低发光元件的制造成本，减少含有有机化合物的层的发光元件所需的制造时间。成膜室的压力减小，通过使用热源的热传导或热辐射快速加热板，在短时间内蒸发板上的材料层以蒸发到其上的材料层（形成衬底），然后在形成衬底上形成材料层。将快速加热的板的面积设定为与形成基板相同的尺寸，并且通过一次加热完成在形成基板上的成膜。

10. 发明申请

US20080299496A1 Manufacturing Apparatus and Manufacturing Method of Light-Emitting Device 有权
标题翻译：发光装置的制造装置及制造方法
公开(公告)号：US20080299496A1
公开(公告)日：2008-12-04
申请号：US12123902
申请日：2008-05-20
申请人： Yoshiharu Hirakata , Hisao Ikeda , Takahiro Ibe , Shunpei Yamazaki
发明人： Yoshiharu Hirakata , Hisao Ikeda , Takahiro Ibe , Shunpei Yamazaki
IPC分类号： G03F7/00 , G03B27/54
CPC分类号： H01L51/0013 , B23K26/042 , B23K26/0661 , B23K26/0732 , C23C14/048 , H01L27/3218 , H01L51/56
摘要： Demands such as higher definition, higher opening aperture, and higher reliability on a full-color flat panel display have been increased. Such demands are big objects in advancing higher definition (increase in the number of pixels) of a light-emitting device and miniaturization of each display pixel pitch with reduction in size of the light-emitting device. An organic compound-containing layer is selectively deposited using a laser beam which passes through openings of a mask. An irradiated substrate provided with a light absorption layer and a material layer containing an organic compound and a deposition substrate provided with first electrodes are placed so as to face each other. The light absorption layer is heated by a laser beam which has passed through the openings of the mask, and the organic compound at a position overlapping with the heated region is vaporized, and accordingly the organic compound is selectively deposited over the deposition substrate.
摘要翻译：已经提高了在全色平板显示器上的诸如更高清晰度，更高开口孔径和更高可靠性的要求。这种要求是通过减少发光装置的尺寸来提高发光装置的高清晰度（增加像素数）和每个显示像素间距的小型化的大目标。使用穿过掩模的开口的激光束选择性地沉积含有机化合物的层。设置有光吸收层的照射基板和含有有机化合物的材料层和设置有第一电极的沉积基板被放置成彼此面对。光吸收层被通过掩模开口的激光束加热，与加热区域重叠的位置上的有机化合物被蒸发，因此有机化合物选择性地沉积在沉积基板上。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式