专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20090293909A1 ARRANGEMENT AND METHOD FOR REMOVING ALKALI- OR ALKALINE EARTH-METALS FROM A VACUUM COATING CHAMBER 有权
标题翻译：从真空涂料室中除去碱金属或碱土金属的方法和方法
公开(公告)号：US20090293909A1
公开(公告)日：2009-12-03
申请号：US12130572
申请日：2008-05-30
申请人： STEFAN BANGERT , Jose Manuel Dieguez-Campo , Michael Koenig , Nety M. Krishna , Byung-Sung Leo Kwak
发明人： STEFAN BANGERT , Jose Manuel Dieguez-Campo , Michael Koenig , Nety M. Krishna , Byung-Sung Leo Kwak
IPC分类号： B08B7/00 , B08B3/12
CPC分类号： C23C14/564
摘要： The invention relates to a cleaning method in which from a vacuum coating chamber (3) of a coating installation (1) for the coating of substrates (2) with alkali- or alkaline earth-metals, residues of alkali- or alkaline earth-metals are removed. For this purpose into the chamber (3) a gas from the group of N2, O2 or air is introduced, which reacts with the alkali- or alkaline earth-metals to form the corresponding solid compounds. Water can additionally be introduced into the vacuum coating chamber (3).After the alkali- or alkaline earth-metals have reacted with the gas, the corresponding solid compound is removed from the vacuum coating chamber.
摘要翻译：本发明涉及一种清洁方法，其中从用碱性或碱土金属涂覆底物（2）的涂覆装置（1）的真空涂敷室（3），碱金属或碱土金属的残留物被删除。为此，在室（3）中，引入来自N2，O2或空气的气体，其与碱金属或碱土金属反应形成相应的固体化合物。另外可以将水引入真空涂敷室（3）。碱金属或碱土金属与气体反应后，从真空镀膜室中除去相应的固体化合物。

2. 发明授权

US08083859B2 Arrangement and method for removing alkali- or alkaline earth-metals from a vacuum coating chamber 有权
标题翻译：从真空镀膜室中除去碱金属或碱土金属的方法和装置
公开(公告)号：US08083859B2
公开(公告)日：2011-12-27
申请号：US12130572
申请日：2008-05-30
申请人： Stefan Bangert , Jose Manuel Dieguez-Campo , Michael Koenig , Nety M. Krishna , Byung-Sung Leo Kwak
发明人： Stefan Bangert , Jose Manuel Dieguez-Campo , Michael Koenig , Nety M. Krishna , Byung-Sung Leo Kwak
IPC分类号： B08B7/00 , B08B5/04
CPC分类号： C23C14/564
摘要： The invention relates to a cleaning method in which from a vacuum coating chamber (3) of a coating installation (1) for the coating of substrates (2) with alkali- or alkaline earth-metals, residues of alkali- or alkaline earth-metals are removed. For this purpose into the chamber (3) a gas from the group of N2, O2 or air is introduced, which reacts with the alkali- or alkaline earth-metals to form the corresponding solid compounds. Water can additionally be introduced into the vacuum coating chamber (3).After the alkali- or alkaline earth-metals have reacted with the gas, the corresponding solid compound is removed from the vacuum coating chamber.
摘要翻译：本发明涉及一种清洁方法，其中从用碱性或碱土金属涂覆底物（2）的涂覆装置（1）的真空涂敷室（3），碱金属或碱土金属的残留物被删除。为此，在室（3）中，引入来自N2，O2或空气的气体，其与碱金属或碱土金属反应形成相应的固体化合物。另外可以将水引入真空涂敷室（3）。碱金属或碱土金属与气体反应后，从真空镀膜室中除去相应的固体化合物。

3. 发明申请

US20090293810A1 ARRANGEMENT FOR COATING A SUBSTRATE 审中-公开
标题翻译：涂层基材的布置
公开(公告)号：US20090293810A1
公开(公告)日：2009-12-03
申请号：US12130118
申请日：2008-05-30
申请人： STEFAN BANGERT , Jose Manuel Dieguez-Campo , Michael Koenig , Nety M. Krishna , Byung-Sung Leo Kwak
发明人： STEFAN BANGERT , Jose Manuel Dieguez-Campo , Michael Koenig , Nety M. Krishna , Byung-Sung Leo Kwak
IPC分类号： C23C16/00
CPC分类号： C23C14/243 , C23C14/246 , H01M4/0421
摘要： The invention relates to an arrangement for coating a substrate (4) by means of a vapor distributor (3). This vapor distributor (3) is connected with a vaporizer crucible (7) via an inlet (5). At least one valve (13) is disposed between the crucible (7) and the inlet (5). The vaporizer crucible (7) is located in a chamber (12) which can be evacuated or flooded by means of a vacuum valve (11).
摘要翻译：本发明涉及一种通过蒸气分配器（3）涂覆基底（4）的装置。该蒸汽分配器（3）通过入口（5）与蒸发器坩埚（7）连接。至少一个阀（13）设置在坩埚（7）和入口（5）之间。蒸发器坩埚（7）位于可以通过真空阀（11）排空或溢流的室（12）中。

4. 发明授权

US09293706B2 Method for encapsulating an organic light emitting diode 有权
标题翻译：封装有机发光二极管的方法
公开(公告)号：US09293706B2
公开(公告)日：2016-03-22
申请号：US13366109
申请日：2012-02-03
申请人： Dieter Haas , John M. White , Byung-sung Leo Kwak , Soo Young Choi , Jrjyan Jerry Chen , Jose Manuel Dieguez-Campo
发明人： Dieter Haas , John M. White , Byung-sung Leo Kwak , Soo Young Choi , Jrjyan Jerry Chen , Jose Manuel Dieguez-Campo
IPC分类号： H01L33/52 , H01L51/00 , H01L51/52
CPC分类号： H01L51/0014 , H01L51/5253
摘要： Methods for encapsulating OLED structures disposed on a substrate using a soft/polymer mask technique are provided. The soft/polymer mask technique can efficiently provide a simple and low cost OLED encapsulation method, as compared to convention hard mask patterning techniques. The soft/polymer mask technique can utilize a single polymer mask to complete the entire encapsulation process with low cost and without alignment issues present when using conventional metal masks. Rather than utilizing a soft/polymer mask, the encapsulation layers may be blanked deposited and then laser ablated such that no masks are utilized during the encapsulation process.
摘要翻译：提供了使用软/聚合物掩模技术封装设置在基板上的OLED结构的方法。与常规的硬掩模图案化技术相比，软/聚合物掩模技术可以有效地提供简单且低成本的OLED封装方法。软/聚合物掩模技术可以利用单个聚合物掩模以低成本完成整个封装工艺，并且在使用常规金属掩模时不存在对准问题。不是使用软/聚合物掩模，而是可以将封装层消隐沉积，然后激光烧蚀，使得在封装过程中不使用掩模。

5. 发明申请

US20090317562A1 PROCESSING SYSTEM AND METHOD FOR PROCESSING A SUBSTRATE 审中-公开
标题翻译：用于处理衬底的处理系统和方法
公开(公告)号：US20090317562A1
公开(公告)日：2009-12-24
申请号：US12244527
申请日：2008-10-02
申请人： Jose Manuel Dieguez-Campo , Michael Koenig , Frank Stahr
发明人： Jose Manuel Dieguez-Campo , Michael Koenig , Frank Stahr
IPC分类号： C23C14/22 , C23C16/54 , C23C14/34 , C23C14/56
CPC分类号： C23C14/56 , C23C14/042 , C23C16/042 , C23C16/54
摘要： A processing system for processing a substrate includes a process chamber for receiving the substrate, a patterning device installed within the process chamber, and a mechanism for transferring the substrate into the process chamber and for aligning the substrate relative to the patterning device.
摘要翻译：用于处理衬底的处理系统包括用于接收衬底的处理室，安装在处理室内的图案形成装置，以及用于将衬底转移到处理室中并使衬底相对于图案形成装置对准的机构。

6. 发明授权

US07518142B2 Encapsulation for organic device 失效
标题翻译：有机装置封装
公开(公告)号：US07518142B2
公开(公告)日：2009-04-14
申请号：US11761770
申请日：2007-06-12
申请人： Uwe Hoffmann , Jose Manuel Dieguez-Campo , Frank Stahr , Klaus Schade
发明人： Uwe Hoffmann , Jose Manuel Dieguez-Campo , Frank Stahr , Klaus Schade
IPC分类号： H01L35/24
CPC分类号： H01L51/5253 , H01L2251/558
摘要： The present invention concerns a thin-film encapsulation structure for electronic devices with organic substances, especially OLEDs or other organic optoelectronic devices as well as corresponding components and a process for the production with a primary, inorganic barrier layer (5), which is directly arranged on the device or the surface to be encapsulated; a planarization layer (6) arranged on the primary, inorganic barrier layer, the thickness of said planarization layer selected such that it is thicker than the simple value of the distance between highest peak and deepest valley of the surface of the primary barrier layer or the surface of the device under the primary barrier layer or the surface to be encapsulated, as well as a secondary barrier layer (14) arranged on the planarization layer.
摘要翻译：本发明涉及一种具有有机物质的电子器件的薄膜封装结构，特别是OLED或其它有机光电子器件以及相应的部件，以及用于生产具有主要无机阻挡层（5）的方法，其直接布置在要封装的设备或表面上; 布置在初级无机阻挡层上的平坦化层（6），所述平坦化层的厚度被选择为比主要阻挡层的表面的最高峰和最深谷之间的距离的简单值主要阻挡层或待封装表面下的器件表面，以及布置在平坦化层上的次级阻挡层（14）。

7. 发明授权

US08192548B2 Arrangement for coating a substrate 有权
标题翻译：涂布基板的布置
公开(公告)号：US08192548B2
公开(公告)日：2012-06-05
申请号：US11254425
申请日：2005-10-20
申请人： Uwe Hoffmann , Manfred Schreil , Jose Manuel Dieguez-Campo , Marcus Bender
发明人： Uwe Hoffmann , Manfred Schreil , Jose Manuel Dieguez-Campo , Marcus Bender
IPC分类号： C23C14/00 , C23C16/00
CPC分类号： C23C14/24 , F16K1/14
摘要： The invention relates to an arrangement for the coating of substrates, which comprises an evaporation source and a vapor barrier between the evaporation source and the substrate. The vapor barrier is maintained at a temperature which is at least equal to or above the vaporization temperature of the material to be vaporized. The vapor barrier is implemented as a quartz valve, which includes a spherical closure part connected with a movable rod. In a first position this spherical closure part closes a vapor conducting tube, which is connected with the evaporation source, and, in a second position, the spherical closure part abuts a spherical calotte which seals off a quartz tube.
摘要翻译：本发明涉及一种用于涂覆基底的布置，其包括蒸发源和蒸发源与基底之间的蒸汽屏障。蒸汽屏障保持在至少等于或高于要蒸发的材料的蒸发温度的温度。蒸汽屏障被实施为石英阀，其包括与可动杆连接的球形封闭部件。在第一位置，该球形封闭部分封闭与蒸发源连接的蒸气导管，并且在第二位置，球形封闭部分邻接密封石英管的球形电缆。

8. 发明申请

US20090317927A1 METHOD OF CLEANING A PATTERNING DEVICE, METHOD OF DEPOSITING A LAYER SYSTEM ON A SUBSTRATE, SYSTEM FOR CLEANING A PATTERNING DEVICE, AND COATING SYSTEM FOR DEPOSITING A LAYER SYSTEM ON A SUBSTRATE 有权
标题翻译：清洁图案装置的方法，在基板上沉积层系统的方法，用于清洁图案装置的系统和用于在基板上沉积层系统的涂层系统
公开(公告)号：US20090317927A1
公开(公告)日：2009-12-24
申请号：US12109067
申请日：2008-04-24
申请人： Uwe Hoffmann , Jose Manuel Dieguez-Campo
发明人： Uwe Hoffmann , Jose Manuel Dieguez-Campo
IPC分类号： H01L51/56 , H01L21/306 , B05C11/00
CPC分类号： H01L51/0011 , C23C14/042 , C23C14/12 , H01L51/56
摘要： A method of cleaning a patterning device, the patterning device having at least organic coating material (OLED material) deposited thereon, comprises the step of providing a cleaning plasma for removing the coating material from the patterning device by means of a plasma etching process. During the step of removing the coating material from the patterning device, the temperature of the patterning device does not exceed a critical temperature causing damage to the patterning device, while maintaining a plasma etching rate of at least 0.2 μm/min. In order to generate a pulsed cleaning plasma, pulsed energy is provided. The method can be carried out in a direct plasma etching process or in a remote plasma etching process. Different etching processes may be combined or carried out subsequently.
摘要翻译：一种清洁图案形成装置的方法，至少具有沉积在其上的有机涂层材料（OLED材料）的图案形成装置包括提供清洁等离子体的步骤，其通过等离子体蚀刻工艺从图案形成装置中去除涂层材料。在从图案形成装置去除涂料的步骤中，图案形成装置的温度不超过引起图案形成装置损坏的临界温度，同时保持等离子体蚀刻速率至少为0.2mum / min。为了产生脉冲清洁等离子体，提供脉冲能量。该方法可以在直接等离子体蚀刻工艺中或在远程等离子体蚀刻工艺中进行。可以随后组合或执行不同的蚀刻工艺。

9. 发明申请

US20090098293A1 METHOD OF PROVIDING AN ENCAPSULATION LAYER STACK, COATING DEVICE AND COATING SYSTEM 审中-公开
标题翻译：提供封装层堆叠，涂层器件和涂层系统的方法
公开(公告)号：US20090098293A1
公开(公告)日：2009-04-16
申请号：US11872545
申请日：2007-10-15
申请人： Uwe Hoffmann , Jose Manuel Dieguez-Campo
发明人： Uwe Hoffmann , Jose Manuel Dieguez-Campo
IPC分类号： B05D1/36 , C23C14/00 , C23C16/00 , C23C14/34
CPC分类号： H01L21/67207 , H01L21/56 , H01L21/6715 , H01L51/5256 , H01L51/56 , H01L2924/0002 , H01L2924/00
摘要： A coating system or encapsulation module 1 is coupled with a substrate handling module 2, wherein substrates 3a to be encapsulated and substrates 3b that already have an encapsulation layer stack deposited thereon are handled in a nitrogen atmosphere. The substrate handling module 2 comprises a magazine 4 for storing substrates 3a to be coated and encapsulated substrates 3b. A handling device 5 unloads the substrates 3a to be coated from the magazine 4 and loads encapsulated substrates 3b into the magazine 4. The encapsulation module 1 has a first ink-jet coating chamber 10a. In said first ink-jet coating chamber 10a a photoresist layer is deposited on the substrate 3a by means of an ink-jet printing method. The ink-jet printing method is carried out in an atmosphere of about 10 mbar. Then the substrate 3a is transported into a first CVD (chemical vapor deposition) coating chamber 11a. In the CVD coating chamber 11a a first silicon nitride layer is deposited on the substrate 3a, i.e. on the photoresist layer, by using a CVD coating method at a pressure of about 10−2 mbar to 10−3 mbar. This process is repeated in second and third ink-jet coating chambers 10b, 10c and second and third CVD coating chambers 11b, 11c, respectively.
摘要翻译：涂覆系统或封装模块1与衬底处理模块2耦合，其中待封装的衬底3a和已经具有沉积在其上的封装层堆叠的衬底3b在氮气气氛中处理。基板处理模块2包括用于存储待涂覆的基板3a和封装的基板3b的盒4。处理装置5将要被涂布的基板3a从盒体4卸载，并将封装的基板3b装载到盒体4中。封装模块1具有第一喷墨涂布室10a。在所述第一喷墨涂布室10a中，通过喷墨打印方法将光致抗蚀剂层沉积在基板3a上。喷墨打印方法在约10毫巴的气氛中进行。然后将基板3a输送到第一CVD（化学气相沉积）涂覆室11a中。在CVD涂覆室11a中，通过在大约10-2毫巴至10-3毫巴的压力下使用CVD涂覆法，在衬底3a上，即在光致抗蚀剂层上沉积第一氮化硅层。在第二和第三喷墨涂布室10b，10c和第二和第三CVD涂层室11b，11c中分别重复该过程。

10. 发明申请

US20080261409A1 PROCESSING DEVICE AND METHOD FOR PROCESSING A SUBSTRATE 审中-公开
标题翻译：处理装置和处理基板的方法
公开(公告)号：US20080261409A1
公开(公告)日：2008-10-23
申请号：US12056934
申请日：2008-03-27
申请人： Uwe Hoffmann , Jose Manuel Dieguez-Campo
发明人： Uwe Hoffmann , Jose Manuel Dieguez-Campo
IPC分类号： H01L21/31
CPC分类号： H01L51/56 , C23C14/12 , C23C14/564 , C23C14/568 , H01L51/5253
摘要： A processing device for producing a layer system including at least one layer of an organic light emitting semiconductor material (OLED), comprises (1) a configuration of one or more treatment stations for processing the substrate in the treatment stations and (2) a first encapsulation module for providing an encapsulation element on the layer system deposited on the substrate. Furthermore, the processing device comprises at least a second encapsulation module, and is configured to provide the encapsulation element on the coated substrate in the first or second encapsulation module alternatively. By providing two encapsulation modules, the second module may be cleaned during a continuous operation of the processing device, while the first encapsulation module is generating an encapsulation on a coated substrate. In this way, a continuous operation of a coating device for depositing an OLED coating and an encapsulation element on the OLED coating is provided.
摘要翻译：一种用于生产包括至少一层有机发光半导体材料（OLED）的层系统的处理装置，包括（1）用于处理处理站中的衬底的一个或多个处理站的配置，以及（2）封装模块，用于在沉积在基板上的层系统上提供封装元件。此外，处理装置至少包括第二封装模块，并且被配置为可替换地在第一封装模块或第二封装模块中的涂覆基板上提供封装元件。通过提供两个封装模块，第二模块可以在处理装置的连续操作期间被清洁，而第一封装模块在涂覆的基板上产生封装。以这种方式，提供了用于在OLED涂层上沉积OLED涂层和封装元件的涂覆装置的连续操作。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式