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1. 发明授权

US09020237B2 Method for optimizing observed image classification criterion and image classification apparatus 有权
标题翻译：优化观察图像分类标准和图像分类装置的方法
公开(公告)号：US09020237B2
公开(公告)日：2015-04-28
申请号：US13702674
申请日：2011-05-13
申请人： Takehiro Hirai , Kozo Miyake , Junko Konishi
发明人： Takehiro Hirai , Kozo Miyake , Junko Konishi
IPC分类号： G06K9/00 , G06T7/00
CPC分类号： G06T7/0004 , G06T2200/24 , G06T2207/10061 , G06T2207/30148
摘要： A first object is to use both ADC (automatic defect classification) and MDC (manual defect classification) and reduce the amount of MDC operation. A second object is to prevent a DOI (defect of interest) from being missed.The first object is achieved by displaying judgment information on a screen. The judgment information is necessary when part of the classification is performed by ADC and part of the classification is performed by MDC and used to judge which classification is used, ADC or MDC. In the display operation, ADC classification results and MDC classification results are also displayed in the form of matrix. Further, a missed DOI rate is calculated for each classification threshold used in the defect classification and displayed on the screen.
摘要翻译：第一个目的是使用ADC（自动缺陷分类）和MDC（手动缺陷分类），并减少MDC操作的数量。第二个目的是防止DOI（感兴趣的缺陷）被遗漏。通过在屏幕上显示判断信息来实现第一个目的。当部分分类由ADC执行时，判断信息是必需的，部分分类由MDC执行，用于判断使用哪种分类，ADC或MDC。在显示操作中，ADC分类结果和MDC分类结果也以矩阵的形式显示。此外，针对在缺陷分类中使用并显示在屏幕上的每个分类阈值计算错失的DOI率。

2. 发明授权

US08779360B2 Charged particle beam device, defect observation device, and management server 有权
标题翻译：带电粒子束装置，缺陷观察装置和管理服务器
公开(公告)号：US08779360B2
公开(公告)日：2014-07-15
申请号：US13809923
申请日：2011-06-22
申请人： Kozo Miyake , Junko Konishi , Takehiro Hirai , Kenji Obara
发明人： Kozo Miyake , Junko Konishi , Takehiro Hirai , Kenji Obara
IPC分类号： H01J37/153
CPC分类号： H01J37/153 , G01N23/00 , H01J37/28 , H01J2237/24592 , H01J2237/2817
摘要： Provided is a charged particle beam device that prevents the increase in processing trouble caused by deterioration in the reviewing performance (e.g., overlooking of defects) by detecting an operation abnormality affecting the performance of the device or a possibility of such an abnormality in the middle of a processing sequence of a sample and giving a feedback in real time. In each processing step of the charged particle beam device, monitoring items representing the operating status of the device (control status of the electron beam, an offset amount at the time of wafer positioning, a defect coordinate error offset amount, etc.) are monitored during the processing sequence of a sample and stored as history information. In the middle of the processing sequence, a comparative judgment between the value of each monitoring item and the past history information corresponding to the monitoring item is made according to preset judgment criteria. When the width of fluctuation from the past history information deviates from a reference range, an alert is issued.
摘要翻译：提供了一种带电粒子束装置，其通过检测影响装置的性能的操作异常或在中间的这种异常的可能性来防止由于检查性能的劣化（例如，忽视缺陷）引起的加工故障的增加样品的处理顺序并实时提供反馈。在带电粒子束装置的每个处理步骤中，监视表示装置的运行状态（电子束的控制状态，晶片定位时的偏移量，缺陷坐标误差偏移量等）的监视项目在样品的处理顺序期间并存储为历史信息。在处理顺序的中间，根据预先设定的判断基准，进行各监视项目的值与对应于监视项目的过去历史信息的比较判断。当过去历史信息的波动宽度偏离参考范围时，发出警报。

3. 发明申请

US20130112893A1 CHARGED PARTICLE BEAM DEVICE, DEFECT OBSERVATION DEVICE, AND MANAGEMENT SERVER 有权
标题翻译：充电颗粒光束装置，缺陷观察装置和管理服务器
公开(公告)号：US20130112893A1
公开(公告)日：2013-05-09
申请号：US13809923
申请日：2011-06-22
申请人： Kozo Miyake , Junko Konishi , Takehiro Hirai , Kenji Obara
发明人： Kozo Miyake , Junko Konishi , Takehiro Hirai , Kenji Obara
IPC分类号： G01N23/00
CPC分类号： H01J37/153 , G01N23/00 , H01J37/28 , H01J2237/24592 , H01J2237/2817
摘要： Provided is a charged particle beam device that prevents the increase in processing trouble caused by deterioration in the reviewing performance (e.g., overlooking of defects) by detecting an operation abnormality affecting the performance of the device or a possibility of such an abnormality in the middle of a processing sequence of a sample and giving a feedback in real time. In each processing step of the charged particle beam device, monitoring items representing the operating status of the device (control status of the electron beam, an offset amount at the time of wafer positioning, a defect coordinate error offset amount, etc.) are monitored during the processing sequence of a sample and stored as history information. In the middle of the processing sequence, a comparative judgment between the value of each monitoring item and the past history information corresponding to the monitoring item is made according to preset judgment criteria. When the width of fluctuation from the past history information deviates from a reference range, an alert is issued.
摘要翻译：提供了一种带电粒子束装置，其通过检测影响装置的性能的操作异常或在中间的这种异常的可能性来防止由于检查性能的劣化（例如，忽视缺陷）引起的加工故障的增加样品的处理顺序并实时提供反馈。在带电粒子束装置的每个处理步骤中，监视表示装置的运行状态（电子束的控制状态，晶片定位时的偏移量，缺陷坐标误差偏移量等）的监视项目在样品的处理顺序期间并存储为历史信息。在处理顺序的中间，根据预先设定的判断基准，进行各监视项目的值与对应于监视项目的过去历史信息的比较判断。当过去历史信息的波动宽度偏离参考范围时，发出警报。

4. 发明申请

US20130077850A1 METHOD FOR OPTIMIZING OBSERVED IMAGE CLASSIFICATION CRITERION AND IMAGE CLASSIFICATION APPARATUS 有权
标题翻译：用于优化观察图像分类标准和图像分类设备的方法
公开(公告)号：US20130077850A1
公开(公告)日：2013-03-28
申请号：US13702674
申请日：2011-05-13
申请人： Takehiro Hirai , Kozo Miyake , Junko Konishi
发明人： Takehiro Hirai , Kozo Miyake , Junko Konishi
IPC分类号： G06T7/00
CPC分类号： G06T7/0004 , G06T2200/24 , G06T2207/10061 , G06T2207/30148
摘要： A first object is to use both ADC (automatic defect classification) and MDC (manual defect classification) and reduce the amount of MDC operation. A second object is to prevent a DOI (defect of interest) from being missed.The first object is achieved by displaying judgment information on a screen. The judgment information is necessary when part of the classification is performed by ADC and part of the classification is performed by MDC and used to judge which classification is used, ADC or MDC. In the display operation, ADC classification results and MDC classification results are also displayed in the form of matrix. Further, a missed DOI rate is calculated for each classification threshold used in the defect classification and displayed on the screen.
摘要翻译：第一个目的是使用ADC（自动缺陷分类）和MDC（手动缺陷分类），并减少MDC操作的数量。第二个目的是防止DOI（感兴趣的缺陷）被遗漏。通过在屏幕上显示判断信息来实现第一个目的。当部分分类由ADC执行时，判断信息是必需的，部分分类由MDC执行，用于判断使用哪种分类，ADC或MDC。在显示操作中，ADC分类结果和MDC分类结果也以矩阵的形式显示。此外，针对在缺陷分类中使用并显示在屏幕上的每个分类阈值计算错失的DOI率。

5. 发明申请

US20120117010A1 DEVICE FOR CLASSIFYING DEFECTS AND METHOD FOR ADJUSTING CLASSIFICATION 有权
标题翻译：用于分类缺陷的装置和调整分类的方法
公开(公告)号：US20120117010A1
公开(公告)日：2012-05-10
申请号：US13376390
申请日：2010-07-08
申请人： Makoto Ono , Yohei Minekawa , Junko Konishi , Takehiro Hirai , Yuya Isomae
发明人： Makoto Ono , Yohei Minekawa , Junko Konishi , Takehiro Hirai , Yuya Isomae
IPC分类号： G06F15/18
CPC分类号： G06T7/001 , G06T2207/10056 , G06T2207/20076 , G06T2207/30148
摘要： Disclosed is a technique wherein an object that requires adjustment in order to increase the reliability of automatic classification can be easily identified. A device (140) for adjusting classification classifies defects into a first class group according to the feature amount of the defects that are obtained from image data obtained from an electron microscope (110), and classifies the defects into a second class group according to the feature amount of the defects classified into the first class group. And, the device (140) for adjusting the classification calculates classification performance by comparing the defects that have been classified into the second class group, and outputs the calculated classification performance in a predetermined display format to an output unit (180).
摘要翻译：公开了一种技术，其中可以容易地识别为了增加自动分类的可靠性而需要调整的对象。用于调整分类的装置（140）根据从电子显微镜（110）获得的图像数据获得的缺陷的特征量，将缺陷分类为第一类别组，并根据分类为第一类组的缺陷的特征量。并且，用于调整分类的装置（140）通过比较已分类为第二类组的缺陷，并将计算出的分类性能以预定显示格式输出到输出单元（180）来计算分类性能。

6. 发明授权

US08892494B2 Device for classifying defects and method for adjusting classification 有权
标题翻译：分类缺陷的设备和分类调整方法
公开(公告)号：US08892494B2
公开(公告)日：2014-11-18
申请号：US13376390
申请日：2010-07-08
申请人： Makoto Ono , Yohei Minekawa , Junko Konishi , Takehiro Hirai , Yuya Isomae
发明人： Makoto Ono , Yohei Minekawa , Junko Konishi , Takehiro Hirai , Yuya Isomae
IPC分类号： G06F15/18 , G06T7/00
CPC分类号： G06T7/001 , G06T2207/10056 , G06T2207/20076 , G06T2207/30148
摘要： Disclosed is a technique wherein an object that requires adjustment in order to increase the reliability of automatic classification can be easily identified. A device (140) for adjusting classification classifies defects into a first class group according to the feature amount of the defects that are obtained from image data obtained from an electron microscope (110), and classifies the defects into a second class group according to the feature amount of the defects classified into the first class group. And, the device (140) for adjusting the classification calculates classification performance by comparing the defects that have been classified into the second class group, and outputs the calculated classification performance in a predetermined display format to an output unit (180).
摘要翻译：公开了一种技术，其中可以容易地识别为了增加自动分类的可靠性而需要调整的对象。用于调整分类的装置（140）根据从电子显微镜（110）获得的图像数据获得的缺陷的特征量，将缺陷分类为第一类别组，并根据分类为第一类组的缺陷的特征量。并且，用于调整分类的装置（140）通过比较已分类为第二类组的缺陷，并将计算出的分类性能以预定显示格式输出到输出单元（180）来计算分类性能。

7. 发明授权

US09280814B2 Charged particle beam apparatus that performs image classification assistance 有权
标题翻译：执行图像分类辅助的带电粒子束装置
公开(公告)号：US09280814B2
公开(公告)日：2016-03-08
申请号：US14238561
申请日：2012-07-04
申请人： Takehiro Hirai , Kenji Obara , Kozo Miyake
发明人： Takehiro Hirai , Kenji Obara , Kozo Miyake
IPC分类号： G06K9/00 , G06T7/00 , H01L21/66
CPC分类号： G06T7/0004 , H01J2237/2817 , H01L22/12 , H01L22/20
摘要： The charged particle beam apparatus automatically judges the good or bad of an observation object on the basis of information obtained from an image of the observation object on a wafer; displays a judgment result on a screen; displays the observation object, extracted from the judgment result, that requires to be corrected on the basis of the good or bad of the observation object from a user; and corrects the judgment result to the extracted and displayed observation object on the basis of an instruction from the user.
摘要翻译：带电粒子束装置基于从晶片上的观察对象的图像获得的信息自动判断观察对象的好坏; 在屏幕上显示判断结果; 根据用户的观察对象的好坏显示需要根据判断结果提取的观察对象的需要进行校正的观察对象; 并且根据来自用户的指示将判断结果校正到所提取和显示的观察对象。

8. 发明申请

US20140185918A1 CHARGED PARTICLE BEAM APPARATUS THAT PERFORMS IMAGE CLASSIFICATION ASSISTANCE 有权
标题翻译：执行图像分类协助的充电颗粒光束装置
公开(公告)号：US20140185918A1
公开(公告)日：2014-07-03
申请号：US14238561
申请日：2012-07-04
申请人： Takehiro Hirai , Kenji Obara , Kozo Miyake
发明人： Takehiro Hirai , Kenji Obara , Kozo Miyake
IPC分类号： G06T7/00
CPC分类号： G06T7/0004 , H01J2237/2817 , H01L22/12 , H01L22/20
摘要： An increase in the number of evaluation points of a semiconductor wafer is effective in improving evaluation accuracy of a manufacturing process. However, a method of automatically evaluating and classifying of these evaluation points by a defect review apparatus is lower in accuracy as compared with a manual work, and it is difficult to perfectly automate the method by these apparatuses. Therefore, the judgment as to whether the evaluation point is actually a defect is entrusted to manual evaluation, limiting the number of evaluable points. The present invention aims at lightening a burden of the manual work in process margin evaluation in a semiconductor manufacturing process.The present invention automatically judges the good or bad of an observation object on the basis of information obtained from an image of the observation object on a wafer; displays a judgment result on a screen; displays the observation object, extracted from the judgment result, that requires to be corrected on the basis of the good or bad of the observation object from a user; and corrects the judgment result to the extracted and displayed observation object on the basis of an instruction from the user.
摘要翻译：半导体晶片的评价点的数量的增加对提高制造工序的评价精度是有效的。然而，与手动工作相比，通过缺陷检查装置自动评估和分类这些评估点的方法的准确度较低，并且难以通过这些装置完美地自动化该方法。因此，评估点是否实际上是缺陷的判断被委托给手动评估，限制了可评价点的数量。本发明旨在减轻半导体制造过程中的工艺边缘评估中的手工工作的负担。本发明基于从晶片上的观察对象的图像获得的信息自动判断观察对象的好坏; 在屏幕上显示判断结果; 根据用户的观察对象的好坏显示需要根据判断结果提取的观察对象的需要进行校正的观察对象; 并且根据来自用户的指示将判断结果校正到所提取和显示的观察对象。

9. 发明授权

US09342879B2 Method and apparatus for reviewing defect 有权
标题翻译：检查缺陷的方法和装置
公开(公告)号：US09342879B2
公开(公告)日：2016-05-17
申请号：US14347127
申请日：2012-07-06
申请人： Yohei Minekawa , Kenji Nakahira , Minoru Harada , Takehiro Hirai , Ryo Nakagaki
发明人： Yohei Minekawa , Kenji Nakahira , Minoru Harada , Takehiro Hirai , Ryo Nakagaki
IPC分类号： G06K9/00 , G06T7/00
CPC分类号： G06T7/0004 , G06T7/001 , G06T2207/10061 , G06T2207/20016 , G06T2207/30148
摘要： A method for reviewing defect, comprising the steps of: as an image acquisition step, imaging a surface of a sample using arbitrary image acquisition condition selected from a plurality of image acquisition conditions and obtaining a defect image; as a defect position calculation step, proceeding the defect image obtained by the image acquisition step and calculating a defect position on the surface of the sample; as a defect detection accuracy calculation step, obtaining a defect detection accuracy of the defect position calculated by the defect position calculation step; and as a conclusion determination step, determinating whether the defect detection accuracy obtained by the defect detection accuracy calculation step meets a predetermined requirement or not; wherein until it is determined that the defect detection accuracy obtained by the defect detection accuracy calculation step meets a predetermined in the conclusion determination step, the image acquisition condition is selected from the plurality of image acquisition conditions once again and the image acquisition step, the defect position calculation step, the defect detection accuracy calculation step and the conclusion determination step are repeated.
摘要翻译：一种检查缺陷的方法，包括以下步骤：作为图像获取步骤，使用从多个图像获取条件中选择的任意图像获取条件对样本的表面进行成像并获得缺陷图像; 作为缺陷位置计算步骤，进行通过图像获取步骤获得的缺陷图像，并计算样本表面上的缺陷位置; 作为缺陷检测精度计算步骤，获得由缺陷位置计算步骤计算的缺陷位置的缺陷检测精度; 以及作为结论确定步骤，确定由缺陷检测精度计算步骤获得的缺陷检测精度是否满足预定要求; 其中直到确定由缺陷检测精度计算步骤获得的缺陷检测精度在结论确定步骤中达到预定值时，再次从多个图像获取条件中选择图像获取条件，并且图像获取步骤，缺陷位置计算步骤，重复缺陷检测精度计算步骤和结论确定步骤。

10. 发明授权

US09342878B2 Charged particle beam apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US09342878B2
公开(公告)日：2016-05-17
申请号：US13991948
申请日：2011-10-24
申请人： Kohei Yamaguchi , Takehiro Hirai , Fumihiko Fukunaga
发明人： Kohei Yamaguchi , Takehiro Hirai , Fumihiko Fukunaga
IPC分类号： H04N9/47 , H04N7/18 , G06T7/00 , H01J37/22 , H01J37/28
CPC分类号： G06T7/0002 , G06T7/001 , G06T2200/24 , G06T2207/30148 , H01J37/222 , H01J37/28 , H01J2237/221 , H01J2237/24578 , H01J2237/24592 , H01J2237/2817
摘要： For inspection of a pattern such as a semiconductor device, it is useful to selectively detect a defect on the specific pattern in order to estimate the cause of the occurrence of the defect. An object of the invention is to provide a charged particle beam apparatus capable of setting, on the basis of the shape of the pattern on a sample, a region to be inspected. The invention is characterized in that the contour of the pattern on the sample is extracted using a template image obtained on the basis of an image of the sample, the region to be inspected is set on the basis of the contour of the pattern, a defect candidate is detected by comparing the image to be inspected with a comparative image, and the sample is inspected using a positional relationship between the region to be inspected and the defect candidate included in the region to be inspected.
摘要翻译：为了检查诸如半导体器件的图案，有选择地检测特定图案上的缺陷以估计缺陷发生的原因。本发明的目的是提供一种能够根据样品上的图案的形状来设定要检查的区域的带电粒子束装置。本发明的特征在于，使用基于样本的图像获得的模板图像来提取样本上的图案的轮廓，基于图案的轮廓设置待检查的区域，缺陷通过将待检查的图像与比较图像进行比较来检测候选物，并且使用待检查区域和包括在待检查区域中的缺陷候选物之间的位置关系来检查样品。

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