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    • 3. 发明申请
    • Chemically amplified resist composition
    • 化学放大抗蚀剂组合物
    • US20080213695A1
    • 2008-09-04
    • US11987672
    • 2007-12-03
    • Satoshi YamaguchiSatoshi YamamotoNobuo Ando
    • Satoshi YamaguchiSatoshi YamamotoNobuo Ando
    • G03F7/004
    • G03F7/0045G03F7/0046G03F7/0397Y10S430/106Y10S430/111Y10S430/122Y10S430/123
    • The present invention provides a chemically amplified resist composition comprising: (A) a salt represented by (I): wherein R21 represents a C1-C30 hydrocarbon group, Q1 and Q2 each represent a fluorine atom, and A+ represents at least one organic cation represented by (Ia): wherein P1-P3 each represent C1-C30 alkyl group, a cation represented by (Ib): wherein P4 and P5 each represent a hydrogen atom, and a cation represented by (Ic): wherein P10-P21 each represent hydrogen atom, B represents sulfur or oxygen atom and m represents 0 or 1; (B) a salt (II): wherein R22 represents C1-C30 hydrocarbon group, Q3 and Q4 each represent fluorine atom, and A′+ represents an organic cation (IIa): wherein P6 and P7 are each a C1-C12 alkyl group, P8 represents hydrogen atom, P9 represents C1-C12 alkyl group; and (C) a resin which contains a structural unit having an acid-labile group.
    • 本发明提供一种化学放大抗蚀剂组合物,其包含:(A)由(I)表示的盐:其中R 21表示C 1 -C 30烃基,Q 1和 Q 2各自表示氟原子,A 0 +表示由(Ia)表示的至少一种有机阳离子:其中P 1〜 SUP> 3各自表示C1-C30烷基,由(Ib)表示的阳离子:其中P 4和P 5各自表示氢原子,和 由(Ic)表示的阳离子:其中P为10〜21个,各自表示氢原子,B表示硫或氧原子,m表示0或1; (B)盐(II):其中R 22表示C 1 -C 30烃基,Q 3和Q 4各自表示氟原子, 并且A' +表示有机阳离子(IIa):其中P 6和P 7各自为C 1 -C 12烷基, SUP> 8表示氢原子,P 9表示C1-C12烷基; 和(C)含有具有酸不稳定基团的结构单元的树脂。
    • 4. 发明申请
    • RESIST PROCESSING METHOD
    • 电阻加工方法
    • US20110189618A1
    • 2011-08-04
    • US13062180
    • 2009-09-01
    • Mitsuhiro HataNobuo AndoSatoshi YamamotoJunji ShigematsuAkira Kamabuchi
    • Mitsuhiro HataNobuo AndoSatoshi YamamotoJunji ShigematsuAkira Kamabuchi
    • G03F7/20
    • G03F7/0035G03F7/0045G03F7/0046G03F7/0397G03F7/40
    • A resist processing method comprises the steps of: (1) forming a first resist film by applying a first resist composition comprising: a resin (A) having an acid-labile group, being insoluble or poorly soluble in alkali aqueous solution, and being rendered soluble in alkali aqueous solution through the action of an acid, a photo acid generator (B), a cross-linking agent (C) and an acid amplifier (D) onto a substrate and drying; (2) prebaking the first resist film; (3) exposing to the first resist film; (4) post-exposure baking of the first resist film; (5) developing with a first alkali developer to obtain a first resist pattern; (6) hard-baking the first resist pattern, (7) obtaining a second resist film by applying a second resist composition onto the first resist pattern, and drying; (8) pre-baking the second resist film; (9) exposing the second resist film; (10) post-exposure baking the second resist film; and (11) developing with a second alkali developer to obtain a second resist pattern.
    • 抗蚀剂处理方法包括以下步骤:(1)通过施加第一抗蚀剂组合物形成第一抗蚀剂膜,所述第一抗蚀剂组合物包含:具有酸不稳定基团的树脂(A),其在碱性水溶液中不溶或难溶,并且呈现 通过酸,光酸产生剂(B),交联剂(C)和酸放大器(D)的作用将其溶于碱水溶液中并干燥; (2)预烘第一抗蚀膜; (3)暴露于第一抗蚀膜; (4)第一抗蚀剂膜的曝光后烘烤; (5)用第一碱性显影剂显影以获得第一抗蚀剂图案; (6)硬烘烤第一抗蚀剂图案,(7)通过将第二抗蚀剂组合物施加到第一抗蚀剂图案上并干燥获得第二抗蚀剂膜; (8)预烘烤第二抗蚀剂膜; (9)使第二抗蚀剂膜曝光; (10)曝光后烘烤第二抗蚀膜; 和(11)用第二碱性显影剂显影以获得第二抗蚀剂图案。
    • 7. 发明授权
    • Photoresist composition
    • 光刻胶组成
    • US08524440B2
    • 2013-09-03
    • US12983729
    • 2011-01-03
    • Yuko YamashitaNobuo Ando
    • Yuko YamashitaNobuo Ando
    • G03F7/26
    • G03F7/0045G03F7/0046G03F7/0397
    • The present invention provides a photoresist composition comprisinga resin which comprises a structural unit represented by the formula (I): wherein Q1 and Q2 independently represent a fluorine atom etc., U represents a C1-C20 divalent hydrocarbon group etc., X1 represents —O—CO— etc., and A+ represents an organic counter ion, and a compound represented by the formula (D′): wherein R51, R52, R53 and R54 independently represent a C1-C20 alkyl group etc., and A11 represents a C1-C36 saturated cyclic hydrocarbon group which may have one or more substituents and which may contain one or more heteroatoms.
    • 本发明提供了包含树脂的光致抗蚀剂组合物,其包含式(I)表示的结构单元:其中Q1和Q2独立地表示氟原子等,U表示C1-C20二价烃基等,X 1表示 - O-CO-等,A +表示有机抗衡离子,由式(D')表示的化合物:其中R51,R52,R53和R54独立地表示C1-C20烷基等,A11表示 可以具有一个或多个取代基且可以含有一个或多个杂原子的C 1 -C 36饱和环烃基。
    • 9. 发明申请
    • ACCUMULATOR DEVICE
    • 累加器装置
    • US20130017438A1
    • 2013-01-17
    • US13637385
    • 2011-02-24
    • Makoto TaguchiYuu WatanabeNobuo AndoHidenori Takagi
    • Makoto TaguchiYuu WatanabeNobuo AndoHidenori Takagi
    • H01M2/06H01G9/025H01G9/155
    • H01M2/30H01G11/06H01G11/12H01G11/74H01M2/021H01M2/0212H01M2/06H01M2/08H01M2/26H01M4/661H01M4/667H01M10/0413H01M10/0585Y02E60/13
    • An accumulator device includes: an outer container with mutually overlapped outer films bonded air-tightly to each other at a bonding portion formed along respective outer peripheral edge portions; an electrode unit accommodated inside the outer container and including positive and negative electrode sheets stacked one on another with a separator disposed therebetween, the positive and negative electrode sheets each including a current collector on which an electrode layer is formed; positive and negative electrode terminals provided to protrude from inside the outer container to outside through the bonding portion; and an electrolytic solution injected in the outer container. The positive electrode terminal includes an aluminum terminal substrate and a nickel-plating coating formed on a surface of an outer end portion of the terminal substrate located outside the outer container; an inner edge of the nickel-plating coating is located within the bonding portion.
    • 一种蓄电装置,包括:外部容器,其具有相互重叠的外部膜,其沿相应的外周边缘部形成的接合部气密地彼此粘合; 容纳在外容器内部的电极单元,并且包括彼此层叠的正电极片和负电极片,隔着配置有隔膜的正极片和负极片,每个包括形成有电极层的集电体; 正极端子和负极端子,其设置成通过接合部从外部容器内部突出到外部; 以及注入到外容器中的电解液。 正极端子包括铝端子基板和形成在位于外部容器外部的端子基板的外端部的表面上的镀镍涂层; 镍镀层的内边缘位于接合部分内。