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1. 发明授权

US5113277A Fiber optic distributed temperature sensor system 失效
标题翻译：光纤分布式温度传感器系统
公开(公告)号：US5113277A
公开(公告)日：1992-05-12
申请号：US542610
申请日：1990-06-22
申请人： Yasuo Ozawa , Nobuo Ando , Satoshi Yamamoto , Toshio Fukahori , Hiroyuki Kunugiyama , Kouichi Sugiyama , Teruaki Tsutsui , Keiichi Hashiba , Shigehiro Endoh , Hiroshi Kawakami , Akira Tokushima , Kaoru Yamazaki
发明人： Yasuo Ozawa , Nobuo Ando , Satoshi Yamamoto , Toshio Fukahori , Hiroyuki Kunugiyama , Kouichi Sugiyama , Teruaki Tsutsui , Keiichi Hashiba , Shigehiro Endoh , Hiroshi Kawakami , Akira Tokushima , Kaoru Yamazaki
IPC分类号： G01K11/32 , G02B6/24 , G02B6/34
CPC分类号： G02B6/2938 , G01K11/32 , G02B6/243 , G02B6/29362
摘要： A fiber optic distributed temperature sensor system outputs a temperature distribution along the longitudinal direction of a sensor optical fiber by measuring the temperature dependency of Raman scattered light intensity produced in an optical fiber by use of the OTDR technique. The system is characterized in that a light output from a light source is input to the sensor (optical fiber) via an optical wavelength division demultiplexer, that among the reflected light of back scattered light returning from the sensor optical fiber, light of a particular wavelength range is reflected or transmitted by at least one optical filter of the optical wavelength division demultiplexer to separate the light of the particular wavelength range and that signal of the light of the particular wavelength range is guided to a detector of an optical measuring system.
摘要翻译：光纤分布式温度传感器系统通过使用OTDR技术测量在光纤中产生的拉曼散射光强度的温度依赖性，输出沿传感器光纤纵向的温度分布。该系统的特征在于，从光源输出的光经由光波分复用器输入到传感器（光纤），在从传感器光纤返回的反射散射光的反射光中，特定波长的光范围由光波分复用器的至少一个滤光器反射或透射以分离特定波长范围的光，并且将特定波长范围的光的信号引导到光学测量系统的检测器。

2. 发明申请

US20110189618A1 RESIST PROCESSING METHOD 审中-公开
标题翻译：电阻加工方法
公开(公告)号：US20110189618A1
公开(公告)日：2011-08-04
申请号：US13062180
申请日：2009-09-01
申请人： Mitsuhiro Hata , Nobuo Ando , Satoshi Yamamoto , Junji Shigematsu , Akira Kamabuchi
发明人： Mitsuhiro Hata , Nobuo Ando , Satoshi Yamamoto , Junji Shigematsu , Akira Kamabuchi
IPC分类号： G03F7/20
CPC分类号： G03F7/0035 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/40
摘要： A resist processing method comprises the steps of: (1) forming a first resist film by applying a first resist composition comprising: a resin (A) having an acid-labile group, being insoluble or poorly soluble in alkali aqueous solution, and being rendered soluble in alkali aqueous solution through the action of an acid, a photo acid generator (B), a cross-linking agent (C) and an acid amplifier (D) onto a substrate and drying; (2) prebaking the first resist film; (3) exposing to the first resist film; (4) post-exposure baking of the first resist film; (5) developing with a first alkali developer to obtain a first resist pattern; (6) hard-baking the first resist pattern, (7) obtaining a second resist film by applying a second resist composition onto the first resist pattern, and drying; (8) pre-baking the second resist film; (9) exposing the second resist film; (10) post-exposure baking the second resist film; and (11) developing with a second alkali developer to obtain a second resist pattern.
摘要翻译：抗蚀剂处理方法包括以下步骤：（1）通过施加第一抗蚀剂组合物形成第一抗蚀剂膜，所述第一抗蚀剂组合物包含：具有酸不稳定基团的树脂（A），其在碱性水溶液中不溶或难溶，并且呈现通过酸，光酸产生剂（B），交联剂（C）和酸放大器（D）的作用将其溶于碱水溶液中并干燥; （2）预烘第一抗蚀膜; （3）暴露于第一抗蚀膜; （4）第一抗蚀剂膜的曝光后烘烤; （5）用第一碱性显影剂显影以获得第一抗蚀剂图案; （6）硬烘烤第一抗蚀剂图案，（7）通过将第二抗蚀剂组合物施加到第一抗蚀剂图案上并干燥获得第二抗蚀剂膜; （8）预烘烤第二抗蚀剂膜; （9）使第二抗蚀剂膜曝光; （10）曝光后烘烤第二抗蚀膜; 和（11）用第二碱性显影剂显影以获得第二抗蚀剂图案。

3. 发明申请

US20080213695A1 Chemically amplified resist composition 有权
标题翻译：化学放大抗蚀剂组合物
公开(公告)号：US20080213695A1
公开(公告)日：2008-09-04
申请号：US11987672
申请日：2007-12-03
申请人： Satoshi Yamaguchi , Satoshi Yamamoto , Nobuo Ando
发明人： Satoshi Yamaguchi , Satoshi Yamamoto , Nobuo Ando
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要： The present invention provides a chemically amplified resist composition comprising: (A) a salt represented by (I): wherein R21 represents a C1-C30 hydrocarbon group, Q1 and Q2 each represent a fluorine atom, and A+ represents at least one organic cation represented by (Ia): wherein P1-P3 each represent C1-C30 alkyl group, a cation represented by (Ib): wherein P4 and P5 each represent a hydrogen atom, and a cation represented by (Ic): wherein P10-P21 each represent hydrogen atom, B represents sulfur or oxygen atom and m represents 0 or 1; (B) a salt (II): wherein R22 represents C1-C30 hydrocarbon group, Q3 and Q4 each represent fluorine atom, and A′+ represents an organic cation (IIa): wherein P6 and P7 are each a C1-C12 alkyl group, P8 represents hydrogen atom, P9 represents C1-C12 alkyl group; and (C) a resin which contains a structural unit having an acid-labile group.
摘要翻译：本发明提供一种化学放大抗蚀剂组合物，其包含：（A）由（I）表示的盐：其中R 21表示C 1 -C 30烃基，Q 1和 Q 2各自表示氟原子，A 0 +表示由（Ia）表示的至少一种有机阳离子：其中P 1〜 SUP> 3各自表示C1-C30烷基，由（Ib）表示的阳离子：其中P 4和P 5各自表示氢原子，和由（Ic）表示的阳离子：其中P为10〜21个，各自表示氢原子，B表示硫或氧原子，m表示0或1; （B）盐（II）：其中R 22表示C 1 -C 30烃基，Q 3和Q 4各自表示氟原子，并且A' +表示有机阳离子（IIa）：其中P 6和P 7各自为C 1 -C 12烷基， SUP> 8表示氢原子，P 9表示C1-C12烷基; 和（C）含有具有酸不稳定基团的结构单元的树脂。

4. 发明授权

US07741007B2 Chemicallly amplified resist composition 有权
标题翻译：化学放大抗蚀剂组合物
公开(公告)号：US07741007B2
公开(公告)日：2010-06-22
申请号：US11987672
申请日：2007-12-03
申请人： Satoshi Yamaguchi , Satoshi Yamamoto , Nobuo Ando
发明人： Satoshi Yamaguchi , Satoshi Yamamoto , Nobuo Ando
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要： The present invention provides a chemically amplified resist composition comprising: (A) a salt represented by the formula (1) wherein R21, Q1, Q2, and A+ defined in the specification; (B) a salt represented by the formula (II): wherein R22, Q3, Q4, and A′+ are defined in the specification; and (C) a resin which contains a structural unit having a structural unit having an acid-labile group and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid.
摘要翻译：本发明提供一种化学放大抗蚀剂组合物，其包含：（A）由式（1）表示的盐，其中在说明书中定义的R 21，Q 1，Q 2和A + （B）由式（II）表示的盐：其中R 22，Q 3，Q 4和A'+在本说明书中定义; 和（C）含有具有酸不稳定基团的结构单元的结构单元的树脂，其本身在碱性水溶液中不溶或难溶，但通过酸作用而溶于碱水溶液中。

5. 发明授权

US11167637B2 Fuel filler structure for fuel tank 有权
公开(公告)号：US11167637B2
公开(公告)日：2021-11-09
申请号：US14390693
申请日：2012-04-12
申请人： Satoshi Yamamoto , Chiaki Kataoka , Masaki Akagi
发明人： Satoshi Yamamoto , Chiaki Kataoka , Masaki Akagi
IPC分类号： B60K15/04
摘要： To obtain a fuel filler structure for a fuel tank wherein when causing an opening and closing valve to close, it can be ensured that the opening and closing valve does not rapidly rotate to a closed position in which it closes a fuel fill inlet, and when causing the opening and closing valve to open, the opening and closing valve can be opened with a small force. A fuel filler structure is equipped with a damper on the near side of a flapper valve in the insertion direction of a fuel nozzle. When the flapper valve rotates to an open position, the damper does not act on the flapper valve, and when the flapper valve rotates to a closed position, the damper acts on the flapper valve.

6. 发明授权

US10534236B2 Electrochromic compound, electrochromic composition, and electrochromic display element 有权
公开(公告)号：US10534236B2
公开(公告)日：2020-01-14
申请号：US15737115
申请日：2016-06-17
申请人： Satoshi Yamamoto , Daisuke Goto , Toshiya Sagisaka , Masato Shinoda , Mamiko Inoue , Fuminari Kaneko , Tohru Yashiro
发明人： Satoshi Yamamoto , Daisuke Goto , Toshiya Sagisaka , Masato Shinoda , Mamiko Inoue , Fuminari Kaneko , Tohru Yashiro
IPC分类号： G02F1/15 , C07D265/28 , G09F9/30 , C09K9/02 , C08F20/36 , C07D265/38 , G02F1/1516
摘要： Provided is an electrochromic compound represented by the following general formula (I) or (II) where R1 to R13 are each independently a hydrogen atom, a halogen atom, a monovalent organic group, or a polymerizable functional group, and at least one of the R1 to the R13 is a polymerizable functional group.

7. 发明授权

US09869918B2 Electrochromic apparatus, electrochromic element, and method of manufacturing electrochromic element 有权
公开(公告)号：US09869918B2
公开(公告)日：2018-01-16
申请号：US14988992
申请日：2016-01-06
申请人： Takahiko Matsumoto , Keiichiroh Yutani , Hidekazu Yaginuma , Koh Fujimura , Fuminari Kaneko , Mamiko Inoue , Sukchan Kim , Satoshi Yamamoto , Tohru Yashiro
发明人： Takahiko Matsumoto , Keiichiroh Yutani , Hidekazu Yaginuma , Koh Fujimura , Fuminari Kaneko , Mamiko Inoue , Sukchan Kim , Satoshi Yamamoto , Tohru Yashiro
IPC分类号： G02F1/155 , G02F1/1343
CPC分类号： G02F1/155 , G02F1/13439 , G02F2001/1552
摘要： An electrochromic apparatus including a first support, a first electrode, a first transparent conductive layer, an electrochromic layer, a second support, a second electrode, a second transparent conductive layer, and an electrolyte layer is provided. The first and second supports have first and second surfaces, respectively, on each of which a plurality of grooves is formed. The grooves on the second surface are facing the grooves on the first surface. The first and second electrodes are disposed at each one of the plurality of grooves of the first and second supports, respectively. The first and second transparent conductive layers are in contact with the first and second surfaces, respectively. The electrochromic layer is in contact with the first transparent conductive layer. The electrolyte layer is between the electrochromic layer and the second transparent conductive layer.

8. 发明授权

US09312036B2 Jet pump measurement pipe repair method 有权
标题翻译：喷射泵测量管修复方法
公开(公告)号：US09312036B2
公开(公告)日：2016-04-12
申请号：US13315887
申请日：2011-12-09
申请人： Yuki Minato , Toshihiro Yasuda , Kunihiko Kinugasa , Hajime Mori , Satoshi Yamamoto , Jun Suzuki , Tadahiro Mitsuhashi
发明人： Yuki Minato , Toshihiro Yasuda , Kunihiko Kinugasa , Hajime Mori , Satoshi Yamamoto , Jun Suzuki , Tadahiro Mitsuhashi
IPC分类号： G21C15/25 , F04F5/54 , G21C17/017 , G21C19/14 , G21C17/10
CPC分类号： G21C15/25 , F04F5/54 , G21C17/017 , G21C17/10 , G21C19/14 , Y02E30/40 , Y10T29/49735
摘要： In a jet pump measurement pipe repair method according to the present embodiment, a breakage part of a measurement pipe horizontally fixed to a lower part of a jet pump provided in reactor water in a reactor pressure vessel is repaired. The method has: a step of cutting and removing the measurement pipe including the breakage part; a step of retaining a connection pipe for connecting the remaining measurement pipe on the jet pump by means of a clamp; and a step of connecting ends of the remaining measurement pipe by means of the connection pipe.
摘要翻译：在根据本实施例的喷射泵测量管道修复方法中，修复水平固定到设置在反应堆压力容器中的反应器水中的喷射泵的下部的测量管的断裂部分。该方法具有：切断除去包含断裂部的测量管的步骤; 保持用于通过夹具连接喷射泵上的剩余测量管的连接管的步骤; 以及通过连接管连接剩余测量管的端部的步骤。

9. 发明授权

US09291893B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US09291893B2
公开(公告)日：2016-03-22
申请号：US13281145
申请日：2011-10-25
申请人： Tatsuro Masuyama , Satoshi Yamamoto , Koji Ichikawa
发明人： Tatsuro Masuyama , Satoshi Yamamoto , Koji Ichikawa
IPC分类号： G03F7/004 , G03F7/039 , G03F7/20
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0397 , G03F7/2041
摘要： A resist composition contains; a resin having a structural unit represented by the formula (aa) and a structural unit represented by the formula (ab); and an acid generator, wherein Raa1 represents a hydrogen atom and a methyl group; Aaa1 represents an optionally substituted C1 to C6 alkanediyl group etc.; Raa2 represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; Rab1 represents a hydrogen atom and a methyl group; Aab1 represents a single bond, an optionally substituted C1 to C6 alkanediyl group etc.; W1 represents an optionally substituted C4 to C24 alicyclic hydrocarbon group; n represents 1 or 2; Aab2 in each occurrence independently represents an optionally substituted C1 to C6 aliphatic hydrocarbon group; Rab2 in each occurrence independently represents a C1 to C12 fluorinated alkyl group.
摘要翻译：抗蚀剂组合物含有具有由式（aa）表示的结构单元的树脂和由式（ab）表示的结构单元; 和酸产生剂，其中Raa1表示氢原子和甲基; Aaa1表示可以具有取代基的C1〜C6烷二基等。 Raa2表示任选取代的C1至C18脂族烃基; Rab1表示氢原子和甲基; Aab1表示单键，任选取代的C 1至C 6烷二基等; W1表示任选取代的C4至C24脂环族烃基; n表示1或2; Aab2各自独立地表示任选取代的C 1至C 6脂族烃基; Rab2各自独立地表示C1〜C12氟化烷基。

10. 发明授权

US09229320B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US09229320B2
公开(公告)日：2016-01-05
申请号：US13196446
申请日：2011-08-02
申请人： Koji Ichikawa , Satoshi Yamamoto
发明人： Koji Ichikawa , Satoshi Yamamoto
IPC分类号： G03F7/004 , G03F7/039 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , G03F7/2059
摘要： A resist composition contains; a resin having a structural unit derived from a compound represented by the formula (a); and an acid generator represented by the formula (B1). wherein R1 represents a hydrogen atom or a methyl group; A10 represents a single bond, an optionally substituted C1 to C6 alkanediyl group or a group represented by formula (a-1) defined in the specification; W1 represents an optionally substituted C4 to C36 alicyclic hydrocarbon group; A20 in each occurrence independently represents an optionally substituted C1 to C6 aliphatic hydrocarbon group; R2 in each occurrence independently represents a C1 to C12 perfluoroalkyl group; n represents 1 or 2; Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; Lb1 represents an optionally substituted C1 to C17 divalent aliphatic hydrocarbon group; Y represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; and Z+ represents an organic cation.
摘要翻译：抗蚀剂组合物含有具有衍生自由式（a）表示的化合物的结构单元的树脂; 和由式（B1）表示的酸发生剂。其中R1表示氢原子或甲基; A10表示单键，可以具有取代基的C1〜C6烷二基或由说明书中定义的式（a-1）表示的基团; W1表示任选取代的C4至C36脂环族烃基; A20每次独立地表示任选取代的C 1至C 6脂族烃基; R2各自独立地表示C1〜C12全氟烷基; n表示1或2; Q1和Q2独立地表示氟原子或C1〜C6全氟烷基; Lb1表示任选取代的C 1至C 17二价脂族烃基; Y表示任选取代的C 1至C 18脂族烃基; Z +表示有机阳离子。

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