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    • 1. 发明授权
    • Solid-state image pickup device
    • 固态图像拾取装置
    • US08497562B2
    • 2013-07-30
    • US13180211
    • 2011-07-11
    • Yukimasa IshidaTakashi SatoYasushi Yamazaki
    • Yukimasa IshidaTakashi SatoYasushi Yamazaki
    • H01L31/102H01L27/148G01T1/24
    • H01L27/14658
    • A solid-state image pickup device is provided which includes a substrate; a transistor formed on the substrate; a photoelectric conversion element including a first electrode connected to a drain or a source of the transistor, a semiconductor layer stacked on the first electrode, and a second electrode stacked on the semiconductor layer; an insulating layer disposed on the second electrode; and a bias line formed on the insulating layer to be connected to the second electrode, in which the insulating layer contains at least an inorganic insulating film, and the bias line is connected to the second electrode via a contact hole formed in the insulating layer, and a side surface of the semiconductor layer is in contact with the inorganic insulating film.
    • 提供一种固态图像拾取装置,其包括基板; 形成在基板上的晶体管; 光电转换元件,包括连接到晶体管的漏极或源极的第一电极,堆叠在第一电极上的半导体层和堆叠在半导体层上的第二电极; 设置在所述第二电极上的绝缘层; 以及形成在绝缘层上的与绝缘层至少包含无机绝缘膜连接的绝缘层上的偏置线,偏置线经由形成在绝缘层中的接触孔连接到第二电极, 并且半导体层的侧表面与无机绝缘膜接触。
    • 2. 发明授权
    • Solid-state image pickup device
    • 固态图像拾取装置
    • US07956313B2
    • 2011-06-07
    • US12422616
    • 2009-04-13
    • Takashi SatoYukimasa IshidaYasushi Yamazaki
    • Takashi SatoYukimasa IshidaYasushi Yamazaki
    • H01L27/00
    • H01L27/14609H01L27/14603H04N5/374
    • There is provided a solid-state image pickup device that has a plurality of scanning lines that extends in a predetermined direction, a plurality of data lines that extends in a direction for intersecting the scanning lines, and a plurality of bias lines within an image pickup area on a substrate. For each of a plurality of pixels disposed in positions corresponding to intersections of the plurality of scanning lines and the plurality of data lines, a field effect transistor that is controlled by the scanning line and a photoelectric conversion element that has a electrode electrically connected to the data line through the field effect transistor and a electrode electrically connected to the bias line are formed, and a constant electric potential line for electrostatic protection is formed on the substrate. For each of bias lines, a bias line electrostatic protection circuit having a protection diode.
    • 提供了一种固态图像拾取装置,其具有沿预定方向延伸的多条扫描线,沿与扫描线相交的方向延伸的多条数据线,以及在图像拾取器内的多条偏置线 基底上的区域。 对于设置在与多条扫描线和多条数据线的交点对应的位置的多个像素中的每一个,由扫描线控制的场效应晶体管和具有电连接到该扫描线的电极的光电转换元件 形成通过场效应晶体管的数据线和电连接到偏置线的电极,并且在基板上形成用于静电保护的恒定电位线。 对于每个偏置线,具有保护二极管的偏置线静电保护电路。
    • 4. 发明申请
    • SOLID-STATE IMAGE PICKUP DEVICE
    • 固态图像拾取器件
    • US20090302202A1
    • 2009-12-10
    • US12422616
    • 2009-04-13
    • Takashi SatoYukimasa IshidaYasushi Yamazaki
    • Takashi SatoYukimasa IshidaYasushi Yamazaki
    • H01L27/00G01T1/24
    • H01L27/14609H01L27/14603H04N5/374
    • There is provided a solid-state image pickup device that has a plurality of scanning lines that extends in a predetermined direction, a plurality of data lines that extends in a direction for intersecting the scanning lines, and a plurality of bias lines within an image pickup area on a substrate. For each of a plurality of pixels disposed in positions corresponding to intersections of the plurality of scanning lines and the plurality of data lines, a field effect transistor that is controlled by the scanning line and a photoelectric conversion element that has a electrode electrically connected to the data line through the field effect transistor and a electrode electrically connected to the bias line are formed, and a constant electric potential line for electrostatic protection is formed on the substrate. For each of bias lines, a bias line electrostatic protection circuit having a protection diode.
    • 提供了一种固态图像拾取装置,其具有沿预定方向延伸的多条扫描线,沿与扫描线相交的方向延伸的多条数据线,以及在图像拾取器内的多条偏置线 基底上的区域。 对于设置在与多条扫描线和多条数据线的交点对应的位置的多个像素中的每一个,由扫描线控制的场效应晶体管和具有电连接到该扫描线的电极的光电转换元件 形成通过场效应晶体管的数据线和电连接到偏置线的电极,并且在基板上形成用于静电保护的恒定电位线。 对于每个偏置线,具有保护二极管的偏置线静电保护电路。
    • 5. 发明授权
    • Electro-optical device substrate, electro-optical device, and electronic apparatus
    • 电光器件基板,电光器件和电子设备
    • US08441014B2
    • 2013-05-14
    • US13078197
    • 2011-04-01
    • Yasushi YamazakiTakashi Sato
    • Yasushi YamazakiTakashi Sato
    • H01L29/04
    • H01L27/1225G02F1/167H01L27/1255
    • In an electro-optical device substrate, first and second pixel switching elements each include a gate electrode formed of a first conductive film, a gate insulation film formed of a first insulation film, a semiconductor layer, a source electrode formed of a second conductive film, and a drain electrode formed of the second conductive film. A first storage capacitor includes a first storage capacitor electrode formed of the second conductive film, a protective film formed of a second insulation film so as to over at least the first storage capacitor electrode, and a pixel electrode formed so as to overlap with the first storage capacitor electrode at least partially with the protective film interposed therebetween.
    • 在电光器件基板中,第一和第二像素开关元件各自包括由第一导电膜形成的栅极电极,由第一绝缘膜形成的栅极绝缘膜,半导体层,由第二导电膜形成的源极 以及由第二导电膜形成的漏电极。 第一存储电容器包括由第二导电膜形成的第一存储电容电极,至少形成在第一保持电容电极上的由第二绝缘膜形成的保护膜,以及形成为与第一导电膜重叠的像素电极 保持电容电极至少部分地保留有保护膜。
    • 6. 发明授权
    • Display unit
    • 显示单元
    • US08217927B2
    • 2012-07-10
    • US12192157
    • 2008-08-15
    • Takashi KunimoriYasushi YamazakiTakashi SatoMasanori Yasumori
    • Takashi KunimoriYasushi YamazakiTakashi SatoMasanori Yasumori
    • G06F3/038G09G5/00G09G3/36
    • G09G3/3406G09G2320/043G09G2360/144
    • The invention provides a display unit that has a display area and first and second photodetectors 10a and 10b on a substrate and outputs as a light intensity signal S a light intensity detected by the first and second photodetectors 10a and 10b. The first photodetector 10a includes a first photodetection circuit LS1 outputting a first output signal Sa to an ambient light photosensor reader 20, and the second photodetector 10b includes a light-reducing unit and a second photodetection circuit LS2 outputting a second output signal Sb to an ambient light photosensor reader 20. The ambient light photosensor reader 20 includes a photodegradation factor calculator 21 calculating a photodegradation reparation factor K, a photodegradation rate calculator 22 deriving a photodegradation rate D based on the photodegradation reparation factor K, and a light signal output unit 24 outputting a light intensity signal S based on the photodegradation rate D.
    • 本发明提供了一种在基板上具有显示区域和第一和第二光电检测器10a和10b的显示单元,并且作为光强度信号S输出由第一和第二光电检测器10a和10b检测的光强度。 第一光检测器10a包括将第一输出信号Sa输出到环境光光传感器读取器20的第一光电检测电路LS1,第二光检测器10b包括将第二输出信号Sb输出到环境的光减少单元和第二光电检测电路LS2 环境光光传感器读取器20包括计算光降解修复因子K的光降解因子计算器21,基于光降解修复因子K导出光降解率D的光降解率计算器22,以及光信号输出单元24,其输出 基于光降解速率D的光强度信号S.
    • 7. 发明申请
    • SOLID-STATE IMAGE PICKUP DEVICE
    • 固态图像拾取器件
    • US20110266599A1
    • 2011-11-03
    • US13180211
    • 2011-07-11
    • Yukimasa IshidaTakashi SatoYasushi Yamazaki
    • Yukimasa IshidaTakashi SatoYasushi Yamazaki
    • H01L27/146
    • H01L27/14658
    • A solid-state image pickup device is provided which includes a substrate; a transistor formed on the substrate; a photoelectric conversion element including a first electrode connected to a drain or a source of the transistor, a semiconductor layer stacked on the first electrode, and a second electrode stacked on the semiconductor layer; an insulating layer disposed on the second electrode; and a bias line formed on the insulating layer to be connected to the second electrode, in which the insulating layer contains at least an inorganic insulating film, and the bias line is connected to the second electrode via a contact hole formed in the insulating layer, and a side surface of the semiconductor layer is in contact with the inorganic insulating film.
    • 提供一种固态图像拾取装置,其包括基板; 形成在基板上的晶体管; 光电转换元件,包括连接到晶体管的漏极或源极的第一电极,堆叠在第一电极上的半导体层和堆叠在半导体层上的第二电极; 设置在所述第二电极上的绝缘层; 以及形成在绝缘层上的与绝缘层至少包含无机绝缘膜连接的绝缘层上的偏置线,偏置线经由形成在绝缘层中的接触孔连接到第二电极, 并且半导体层的侧表面与无机绝缘膜接触。
    • 8. 发明授权
    • Electro-optical device, driving circuit and electronic apparatus
    • 电光装置,驱动电路和电子设备
    • US07928941B2
    • 2011-04-19
    • US12000754
    • 2007-12-17
    • Katsunori YamazakiYasushi Yamazaki
    • Katsunori YamazakiYasushi Yamazaki
    • G09G3/34
    • G09G3/3677G09G3/2011G09G3/3614G09G3/3655G09G2300/0876G09G2310/0283G09G2330/021
    • It is possible to suppress the voltage amplitudes of data lines and to prevent deterioration in display quality by a simple configuration.Each of pixels 110 includes a pixel capacitor and a storage capacitor of which one end is connected to a pixel electrode and the other end is connected to each capacitive line 132. If first, second, third, . . . , 320th, and 321st scanning lines 112 are sequentially selected, the capacitive line 132 of each row is provided with TFTs 152, 154, 156 and 158. A source electrode of the TFT 156 of a first row is connected to a first feed line 165 and a gate electrode thereof is connected to a first scanning line 112. A source electrode of the TFT 158 is connected to a second feed line 167 and a gate electrode thereof is connected to a common drain electrode of the TFTs 152 and 154. The drain electrodes of the TFT 156 and 158 are connected to the first capacitive line 132. A gate electrode of the TFT 152 is connected to a second scanning line 112.
    • 可以通过简单的配置来抑制数据线的电压振幅和防止显示质量的劣化。 每个像素110包括像素电容器和存储电容器,其一端连接到像素电极,另一端连接到每个电容线132.如果是第一,第二,第三, 。 。 ,第320和第321扫描线112,每行的电容线132设置有TFT 152,154,156和158.第一行的TFT 156的源电极连接到第一馈电线165 其栅电极连接到第一扫描线112. TFT 158的源电极连接到第二馈电线167,其栅电极连接到TFT 152和154的公共漏电极。漏极 TFT 156和158的电极连接到第一电容线132.TFT 152的栅电极连接到第二扫描线112。
    • 10. 发明授权
    • Method for manufacturing semiconductor device
    • 制造半导体器件的方法
    • US07465637B2
    • 2008-12-16
    • US11520696
    • 2006-09-14
    • Yasushi Yamazaki
    • Yasushi Yamazaki
    • H01L21/336
    • H01L29/66621H01L27/10876H01L29/1083H01L29/66659H01L29/78
    • A method for manufacturing a semiconductor device comprises the steps of forming a gate trench in a semiconductor substrate, forming a gate insulation film in an inner wall of the gate trench, filling a gate electrode material into at least an inside of the gate trench, forming a gate electrode by patterning the gate electrode material, and selectively forming a punch-through stopper region prior to patterning the gate electrode material, using a mask in a prescribed position of the semiconductor substrate that is adjacent to the gate trench. The step for forming the punch-through stopper region may be performed subsequent to the step for filling the gate electrode material into the gate trench, or may be performed prior to the step for forming the gate trench.
    • 一种制造半导体器件的方法包括以下步骤:在半导体衬底中形成栅极沟槽,在栅极沟槽的内壁中形成栅极绝缘膜,将栅电极材料填充到栅极沟槽的至少内部,形成 通过对栅电极材料进行构图而形成栅电极,并且在栅极电极材料图案化之前,使用与栅极沟槽相邻的半导体衬底的规定位置的掩模来选择性地形成穿通阻挡区域。 用于形成穿通阻止区域的步骤可以在用于将栅电极材料填充到栅极沟槽中的步骤之后进行,或者可以在用于形成栅极沟槽的步骤之前进行。