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    • 5. 发明申请
    • METHOD FOR PURIFYING ALKALINE TREATMENT FLUID FOR SEMICONDUCTOR SUBSTRATE AND A PURIFICATION APPARATUS
    • 纯化半导体基板的碱处理液和纯化装置的方法
    • US20130174868A1
    • 2013-07-11
    • US13824946
    • 2011-09-26
    • Hisashi MuraokaToshitsura Cho
    • Hisashi MuraokaToshitsura Cho
    • B01J20/10
    • B01J20/10B01J20/0251B01J20/28035H01L21/02052H01L29/1608
    • Provided are a purification method and purification apparatus for an alkaline treatment liquid for a semiconductor substrate, which use adsorption purification means that can purify various alkaline treatment liquids to be used for treating semiconductor substrates for various purposes so as to have an ultrahigh purity, in particular, an Fe concentration in a ppq region, and that is excellent in chemical resistance and mechanical strength. The adsorption purification means is purification means for an alkaline treatment liquid for treating a semiconductor substrate for various purposes at the time of producing, for example, a semiconductor substrate or a semiconductor device. In the purification method and purification apparatus for an alkaline treatment liquid for a semiconductor substrate, an alkaline treatment liquid is brought into contact with silicon carbide crystal surfaces in the absorption purification means, for example, an alkaline treatment liquid is allowed to flow through a gap between adsorbing plate laminates (2) whose both surfaces are CVD silicon carbide surfaces, thereby removing metal impurities contained in the alkaline treatment liquid through adsorption of the metal impurities to the silicon carbide crystal surfaces.
    • 提供一种用于半导体基板的碱性处理液的净化方法和净化装置,其使用能够净化用于各种目的的半导体基板处理的各种碱处理液以具有超高纯度的吸附净化装置,特别是 ,ppq区域的Fe浓度,耐化学性和机械强度优异。 吸附净化装置是用于在制造例如半导体衬底或半导体器件时用于处理用于各种目的的半导体衬底的碱性处理液的净化装置。 在用于半导体衬底的碱性处理液的净化方法和净化装置中,碱性处理液与吸收净化装置中的碳化硅晶体表面接触,例如使碱性处理液体流过间隙 在两面为CVD碳化硅表面的吸附板层叠体(2)之间,通过将金属杂质吸附到碳化硅晶体表面,除去碱处理液中所含的金属杂质。