专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20190248660A1 ANTI-CORROSION SOL-GEL MATERIAL 审中-公开
公开(公告)号：US20190248660A1
公开(公告)日：2019-08-15
申请号：US15558007
申请日：2016-03-15
申请人： TRENT UNIVERSITY
发明人： Andrew James Vreugdenhil , Theresa Elizabeth Stotesbury
IPC分类号： C01B33/145 , C08G77/14 , C08G77/28 , C08L83/06 , C09D5/08 , C09D183/06
CPC分类号： C01B33/145 , C01B33/14 , C01B33/149 , C08G77/14 , C08G77/28 , C08G2220/00 , C08L83/06 , C08L2312/00 , C09D5/08 , C09D183/06 , C08L83/00
摘要： The present disclosure relates to anti-corrosion sol-gel material. In particular, the disclosure relates to a cross-linked sol-gel material comprising a first colloidal sol gel made from silanols having an epoxy functionality and a second colloidal sol gel made from silanols having a thiol functionality.

2. 发明申请

US20180273803A1 POLISHING COMPOSITION FOR MAGNETIC DISK SUBSTRATE 审中-公开
公开(公告)号：US20180273803A1
公开(公告)日：2018-09-27
申请号：US15934786
申请日：2018-03-23
申请人： YAMAGUCHI SEIKEN KOGYO CO., LTD.
发明人： Toru IWATA
IPC分类号： C09G1/02 , C09K3/14 , B24B29/00 , B24B37/04 , C01B33/14
CPC分类号： C09G1/02 , B24B29/00 , B24B37/044 , B24B37/048 , C01B33/14 , C09K3/1463 , G11B5/8404
摘要： Embodiments provide a polishing composition for a magnetic disk substrate, which contains colloidal silica having an average primary particle size of 5 to 200 nm, fumed silica having an average particle size of 30 to 800 nm, pulverized wet-process silica particles having an average particle size of 100 to 1000 nm, and water. According to an embodiment, a ratio of the colloidal silica is 5 to 90% by mass, a ratio of the fumed silica is 5 to 90% by mass, and a ratio of the pulverized wet-process silica particles is 5 to 90% by mass with respect to all the silica particles, and a concentration of all the silica particles is 1 to 50% by mass.

3. 发明申请

US20180194947A1 Metal Oxide-Containing Dispersion With High Salt Stability 审中-公开
公开(公告)号：US20180194947A1
公开(公告)日：2018-07-12
申请号：US15743242
申请日：2016-06-28
申请人： Wolfgang LORTZ , Ulrich FISCHER , Daniel NESS , Gabriele BERGMANN , Katharina DAUTH
发明人： Wolfgang LORTZ , Ulrich FISCHER , Daniel NESS , Gabriele BERGMANN , Katharina DAUTH
IPC分类号： C09C1/40 , C09C1/30 , C09D17/00 , D21H19/42 , C11D7/20 , C11D17/00 , A61K8/04 , A61K8/26 , A61K9/10
CPC分类号： C09C1/405 , A61K8/044 , A61K8/26 , A61K9/10 , C01B33/14 , C01B33/1417 , C01B33/149 , C01B33/159 , C01P2004/61 , C01P2004/62 , C09C1/24 , C09C1/3045 , C09C1/3054 , C09C1/3063 , C09C1/3081 , C09C1/309 , C09C1/3661 , C09C1/3684 , C09C1/3692 , C09C1/407 , C09C3/063 , C09D17/001 , C09D17/007 , C11D7/20 , C11D17/0013 , D21H19/42
摘要： Aqueous dispersion containing a hydrophilic metal oxide powder comprising a metal oxide and a surface modification of the metal oxide, wherein a) the metal oxide is selected from the group consisting of TiO2, ZrO2, SiO2, Al2O3, Fe2O3, Fe3O4, Sb2O3, WO3, CeO2 and mixed oxides thereof and b) the surface modification b1) comprises silicon atoms and aluminum atoms and b2) the silicon atoms are at least partly bonded to a hydrocarbon radical via a C atom and b3) the Al/Si molar ratio of the surface modification is 1:2-1:20.

4. 发明授权

US10017393B2 Method of fabricating array of nanoparticle clusters using thermal transformation of sublimable liquid crystal film 有权
公开(公告)号：US10017393B2
公开(公告)日：2018-07-10
申请号：US14927926
申请日：2015-10-30
申请人： KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
发明人： Dong Ki Yoon , Dae Seok Kim
IPC分类号： C01B33/14 , C09K19/12 , C09K19/04
CPC分类号： C01B33/14 , C09K19/12 , C09K2019/044 , C09K2019/122 , C09K2219/00 , C09K2219/03
摘要： The present invention relates to a method for fabricating an array of nanoparticle clusters, in which a thermally transformable organic liquid crystal film having a periodic array of micro-sized dimple-like defect structures spontaneously transformed by thermal sublimation of liquid crystal molecules is used as a template, and nanoparticles form self-assembled clusters having a uniform size with respect to the defect structures, thereby achieving a periodic array of nanoparticle clusters.

5. 发明授权

US09856401B2 Polishing composition and method for polishing magnetic disk substrate 有权
公开(公告)号：US09856401B2
公开(公告)日：2018-01-02
申请号：US15278911
申请日：2016-09-28
申请人： YAMAGUCHI SEIKEN KOGYO CO., LTD.
发明人： Toru Iwata , Akira Sugawa
IPC分类号： C09G1/02 , B24B37/04 , G11B5/84 , C09K3/14 , C01B33/14
CPC分类号： C09G1/02 , B24B37/042 , B24B37/044 , C01B33/14 , C01P2004/62 , C01P2004/64 , C09K3/1409 , C09K3/1463 , C09K3/1472 , G11B5/8404
摘要： Embodiments of the invention provide a polishing composition including colloidal silica, pulverized wet-process silica particles, and a water-soluble polymer compound, wherein the water-soluble polymer compound is a polymer or copolymer having a constituent unit derived from an unsaturated aliphatic carboxylic acid. Various embodiments achieve a high polishing rate and obtain a good surface smoothness and end-face shape without the use of alumina particles.

6. 发明授权

US09527749B2 Colloidal silica particles, process for producing the same, and organic solvent-dispersed silica sol, polymerizable compound-dispersed silica sol, and dicarboxylic anhydride-dispersed silica sol each obtained from the same 有权
标题翻译：胶体二氧化硅粒子，其制造方法，有机溶剂分散二氧化硅溶胶，可聚合化合物分散二氧化硅溶胶和二羧酸酐分散二氧化硅溶胶各自得自其
公开(公告)号：US09527749B2
公开(公告)日：2016-12-27
申请号：US15011001
申请日：2016-01-29
申请人： NISSAN CHEMICAL INDUSTRIES, LTD.
发明人： Naohiko Suemura , Keiko Yoshitake , Toshiaki Takeyama
IPC分类号： C01B33/14 , B82Y30/00 , C01B33/145 , C01B33/146 , C08K3/36
CPC分类号： C01B33/14 , B82Y30/00 , C01B33/145 , C01B33/146 , C01P2004/64 , C08K3/36
摘要： There is provided colloidal silica particles comprising at least one polyvalent metal element M selected from a group consisting of iron, aluminum, zinc, zirconium, titanium, tin, and lead in an average content of 0.001 to 0.02 in terms of an M/Si molar ratio, and having an average primary particle diameter of 5 to 40 nm, wherein the content of the polyvalent metal element M present in an outermost layer of the colloidal particles is 0 to 0.003 atom per square nanometer (nm2) of a surface area of the colloidal particles; and a silica sol that the colloidal silica particles are dispersed in an organic solvent, a silica sol that the colloidal silica particles are dispersed in a polymerizable compound, and a silica sol that the colloidal silica particles are dispersed in a dicarboxylic anhydride.
摘要翻译：提供的胶体二氧化硅颗粒包含选自铁，铝，锌，锆，钛，锡和铅中的至少一种多价金属元素M，平均含量换算成M / Si摩尔数为0.001至0.02 比率，平均一次粒径为5〜40nm，其中存在于胶体粒子的最外层的多价金属元素M的含量为0〜0.003原子/平方纳米（nm 2）的表面积胶体颗粒; 和胶体二氧化硅粒子分散在有机溶剂中的二氧化硅溶胶，胶态二氧化硅粒子分散在聚合性化合物中的二氧化硅溶胶和胶体二氧化硅粒子分散在二羧酸酐中的二氧化硅溶胶。

7. 发明申请

US20160355405A1 METHOD OF FABRICATING ARRAY OF NANOPARTICLE CLUSTERS USING THERMAL TRANSFORMATION OF SUBLIMABLE LIQUID CRYSTAL FILM 有权
标题翻译：使用可转换液晶层的热转换制备纳米晶簇的方法
公开(公告)号：US20160355405A1
公开(公告)日：2016-12-08
申请号：US14927926
申请日：2015-10-30
申请人： KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
发明人： Dong Ki Yoon , Dae Seok Kim
IPC分类号： C01B33/14 , B05D3/00 , C09K19/12 , B05D7/00
CPC分类号： C01B33/14 , C09K19/12 , C09K2019/044 , C09K2019/122 , C09K2219/00 , C09K2219/03
摘要： The present invention relates to a method for fabricating an array of nanoparticle clusters, in which a thermally transformable organic liquid crystal film having a periodic array of micro-sized dimple-like defect structures spontaneously transformed by thermal sublimation of liquid crystal molecules is used as a template, and nanoparticles form self-assembled clusters having a uniform size with respect to the defect structures, thereby achieving a periodic array of nanoparticle clusters.
摘要翻译：本发明涉及一种制造纳米颗粒簇阵列的方法，其中使用通过液晶分子的热升华自发转化的具有微小凹坑状缺陷结构的周期性阵列的可热转变的有机液晶膜作为模板和纳米颗粒形成相对于缺陷结构具有均匀尺寸的自组装簇，从而实现纳米颗粒簇的周期性阵列。

8. 发明申请

US20160279597A1 CHEMICAL FILTER 审中-公开
标题翻译：化学过滤器
公开(公告)号：US20160279597A1
公开(公告)日：2016-09-29
申请号：US15029933
申请日：2014-09-30
申请人： NITTA CORPORATION
发明人： Makoto SHIGETA , Minoru OHSHIO
IPC分类号： B01J20/18 , C01B39/24 , C01B39/38 , C01B39/46 , C01B39/44 , C01B39/32 , C01B39/22 , C01B33/12 , C01B33/14 , B01J20/12 , B01J20/10 , B01J20/291 , B01J20/14 , B01J20/28 , C01B39/26
CPC分类号： B01J20/18 , B01D53/02 , B01D53/04 , B01D53/70 , B01D2253/106 , B01D2253/1085 , B01D2253/11 , B01D2257/553 , B01D2258/0216 , B01D2259/4062 , B01J20/103 , B01J20/12 , B01J20/14 , B01J20/2803 , B01J20/2804 , B01J20/28042 , B01J20/28045 , B01J20/291 , B01J2220/603 , B01J2220/606 , C01B33/126 , C01B33/14 , C01B39/02 , C01B39/22 , C01B39/24 , C01B39/26 , C01B39/32 , C01B39/38 , C01B39/44 , C01B39/46
摘要： Provided is a chemical filter for silanol compound removal which is capable of efficiently removing a silanol compound in air.The chemical filter for silanol compound removal of the present invention uses an inorganic silica-based porous material such that a pH of a mixed solution obtained by mixing with pure water (content: 5 wt %) is 7 or less as an adsorbent.
摘要翻译：本发明的硅烷醇化合物除去用化学过滤器使用无机二氧化硅基多孔质材料，使得通过与纯水（含量：5重量％）混合得到的混合溶液的pH为7以下作为吸附剂。

9. 发明申请

US20160176719A1 Silica Sol 有权
标题翻译：二氧化硅溶胶
公开(公告)号：US20160176719A1
公开(公告)日：2016-06-23
申请号：US14910330
申请日：2014-08-20
申请人： AKZO NOBEL CHENICALS INTERNATIONAL B.V.
发明人： Erik Sanne , Freddie Hansson
IPC分类号： C01B33/143 , D21H21/10 , D21H17/37 , C01B33/14 , D21H17/68
CPC分类号： C01B33/143 , C01B33/14 , C01B33/141 , C01B33/142 , C01B33/145 , D21H17/375 , D21H17/68 , D21H19/40 , D21H21/10
摘要： The present invention relates to a silica sol having a pH above about 10, molar ratio of Si02:M20, in which M is alkali metal, of from about 6:1 to about 16:1, concentration of soluble silica above about 3000 mg Si02/l, and S-value of from about 18 to about 40%. The invention further relates to a process for producing a silica sol which comprises acidifying an aqueous alkali metal silicate solution to a pH of from 1 to 4 to form an acid sol, alkalizing the acid sol by addition of aqueous alkali metal silicate solution to obtain an intermediate sol and interrupt the addition of aqueous alkali metal silicate solution when the intermediate sol has reached a pH of from about 5 to about 8, stirring the intermediate sol for a time period of from about 10 to about 6000 seconds without addition of aqueous alkali metal silicate solution, alkalizing the intermediate sol by addition of aqueous alkali metal silicate solution to obtain a silica sol having a pH above about 10 and molar ratio of Si02:M20, in which M is alkali metal, of from about 6:1 to about 16:1, and optionally adding an aluminum compound to the acid sol, intermediate sol or silica sol. The invention further relates to a silica sol obtainable by the process of the invention. The invention further relates to the use of the silica sol as a flocculating agent, in water purification and in producing paper and board. The invention further relates to a process for producing paper and board which comprises: (i) providing an aqueous suspension comprising cellulosic fibers; (ii) adding to the suspension one or more drainage and retention aids comprising the silica sol; and (iii) dewatering the obtained suspension to provide a sheet or web of paper or board.
摘要翻译：本发明涉及pH高于约10，SiO 2 :M 2 O摩尔比（其中M为碱金属）为约6:1至约16:1的二氧化硅溶胶，高于约3000mg SiO 2的可溶性二氧化硅浓度 / l，S值为约18至约40％。本发明还涉及二氧化硅溶胶的制造方法，其包括将碱金属硅酸盐水溶液酸化至1〜4的pH以形成酸性溶胶，通过加入碱金属硅酸盐水溶液碱化酸性溶胶，得到中间溶胶，并且当中间溶胶达到约5至约8的pH时中断加入碱金属硅酸盐水溶液，在不加入碱金属水溶液的情况下搅拌中间溶胶约10至约6000秒的时间硅酸盐溶液，通过加入碱金属硅酸盐水溶液碱化中间体溶胶，得到pH高于约10的硅溶胶，其中M为碱金属的SiO 2 :M 2 O的摩尔比为约6:1至约16 ：1，并且任选地向酸性溶胶，中间溶胶或二氧化硅溶胶中加入铝化合物。本发明还涉及通过本发明的方法获得的二氧化硅溶胶。本发明还涉及二氧化硅溶胶作为絮凝剂，在水净化和生产纸和纸板中的用途。本发明还涉及生产纸和纸板的方法，其包括：（i）提供包含纤维素纤维的水性悬浮液; （ii）向悬浮液中加入一种或多种包含二氧化硅溶胶的排水和助留剂; 和（iii）对获得的悬浮液进行脱水以提供纸张或纸板或纸板。

10. 发明授权

US09272918B2 Synthetic amorphous silica powder and method for producing same 有权
标题翻译：合成无定形二氧化硅粉末及其制造方法
公开(公告)号：US09272918B2
公开(公告)日：2016-03-01
申请号：US13520798
申请日：2010-12-24
申请人： Toshiaki Ueda
发明人： Toshiaki Ueda
IPC分类号： C01B33/12 , C01B33/18 , C01B33/14 , C03C3/06 , C03B19/10
CPC分类号： C01B33/181 , C01B33/14 , C01P2002/02 , C01P2002/82 , C01P2004/03 , C01P2004/54 , C01P2004/61 , C01P2006/12 , C03B19/1025 , C03B19/1065 , C03C3/06 , C03C2201/02 , C03C2203/10 , C03C2203/27 , Y10T428/2982
摘要： The synthetic amorphous silica powder of the present invention is characterized in that it comprises a synthetic amorphous silica powder obtained by applying a spheroidizing treatment to a silica powder, and by subsequently cleaning and drying it so that the synthetic amorphous silica powder has an average particle diameter D50 of 10 to 2,000 μm; wherein the synthetic amorphous silica powder has: a quotient of 1.00 to 1.35 obtained by dividing a BET specific surface area of the powder by a theoretical specific surface area calculated from the average particle diameter D50; a real density of 2.10 to 2.20 g/cm3; an intra-particulate porosity of 0 to 0.05; a circularity of 0.75 to 1.00; and a spheroidization ratio of 0.55 to 1.00.
摘要翻译：本发明的合成无定形二氧化硅粉末的特征在于，其包含通过对二氧化硅粉末进行球化处理得到的合成无定形二氧化硅粉末，然后进行清洗和干燥，使得合成的无定形二氧化硅粉末的平均粒径 D50为10〜2000μm; 其中所述合成无定形二氧化硅粉末具有：通过将粉末的BET比表面积除以由平均粒径D50计算的理论比表面积获得的商为1.00至1.35的商; 实际密度为2.10〜2.20g / cm3; 颗粒内孔隙率为0至0.05; 0.75〜1.00的圆形度; 球化率为0.55〜1.00。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式