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    • 7. 发明申请
    • PAIR OF ELECTRODES FOR DBD PLASMA PROCESS
    • DBD等离子体处理电极对
    • US20150348759A1
    • 2015-12-03
    • US14654341
    • 2013-12-18
    • ASAHI GLASS COMPANY LIMITED
    • M. Eric TIXHONM. Eric MICHELM. Joseph LECLERCQ
    • H01J37/32C03C17/245
    • H01J37/32348C03C17/002C03C17/245C03C2217/213C03C2218/15C03C2218/153C23C16/402C23C16/509C23C16/545H01J37/32568H01J37/32715H01J2237/332
    • The present invention concerns a device (10) for the surface treatment of a substrate (1) by dielectric barrier discharge that enables the generation of a cold filamentary plasma at atmospheric pressure, comprising a reaction chamber, in which are positioned means for supporting and/or moving the substrate (2) and at least two electrodes (3, 4) arranged in parallel on either side of the means for supporting and/or moving the substrate (2), of which one electrode (3) is intended to be brought to high voltage and a counter-electrode (4) to be earthed. It is characterised in that the counter-electrode (4) has a width (lce) and a length (Lce) that are respectively smaller than the width (le) and the length (Le) of the electrode (3), and in that the counter-electrode (4) is positioned so that it is enclosed in an orthogonal projection (5) of the electrode (3) on a plane containing the counter-electrode (4). The invention also concerns a surface treatment process, in particular for layer deposition, that calls for such a device.
    • 本发明涉及一种用于通过能够在大气压下产生冷丝状等离子体的电介质阻挡放电来对衬底(1)进行表面处理的器件(10),其包括反应室,其中定位有用于支撑和/ 或移动基板(2)和至少两个平行布置的电极(3,4),用于支撑和/或移动基板(2)的装置的两侧,其中一个电极(3)将被带入 到高电压和对电极(4)接地。 其特征在于,对电极(4)的宽度(lce)和长度(Lce)分别小于电极(3)的宽度(le)和长度(Le),因此, 相对电极(4)被定位成使其被包围在包含对电极(4)的平面上的电极(3)的正交突起(5)中。 本发明还涉及要求这种装置的表面处理方法,特别是用于层沉积的表面处理方法。
    • 9. 发明授权
    • Organosiloxane inclusive precursors having ring and/or cage-like structures for use in combustion deposition
    • 具有用于燃烧沉积的环和/或笼状结构的含有机硅氧烷的前体
    • US08414970B2
    • 2013-04-09
    • US12071162
    • 2008-02-15
    • Michael P. Remington
    • Michael P. Remington
    • B05D5/06
    • C03C17/245C03C2217/213C03C2218/15C09D183/02C23C4/12C23C4/123C23C16/401C23C16/453C23C26/00
    • Certain example embodiments relate to a method of forming a coating on a glass substrate using combustion deposition. A glass substrate having at least one surface to be coated is provided. An organosiloxane inclusive precursor having a ring- or cage-like structure to be combusted is introduced. Using at least one flame, at least a portion of the precursor is combusted to form a combusted material, the combusted material including non-vaporized material. The glass substrate is provided in an area so that the glass substrate is heated sufficiently to allow the combusted material to form the coating, directly or indirectly, on the glass substrate. In certain example embodiments, the precursor is a cyclic siloxane based and/or polyhedral silsesquioxane (POSS) based precursor, which advantageously may affect the coating's transmission and/or reflection properties compared to conventionally used silicon precursors. For example, a single-layer anti-reflective coating including silicon oxide may increase visible transmission of the uncoated substrate by at least about 2.0 %.
    • 某些示例性实施例涉及使用燃烧沉积在玻璃基板上形成涂层的方法。 提供具有至少一个待涂覆表面的玻璃基板。 引入具有要燃烧的环状或笼状结构的含有机硅氧烷的前体。 使用至少一个火焰,所述前体的至少一部分被燃烧以形成燃烧的材料,所述燃烧的材料包括非汽化材料。 玻璃基板设置在一个区域中,使得玻璃基板被充分加热,以允许燃烧的材料直接或间接地在玻璃基板上形成涂层。 在某些示例性实施方案中,前体是基于环状硅氧烷和/或多面体倍半硅氧烷(POSS)的前体,与常规使用的硅前体相比,其有利地影响涂层的透射和/或反射特性。 例如,包括氧化硅的单层抗反射涂层可以使未涂覆的基材的可见透射率增加至少约2.0%。