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1. 发明公开

US20240117273A1 SURFACTANT COMPOSITIONS AND USE THEREOF 审中-公开
公开(公告)号：US20240117273A1
公开(公告)日：2024-04-11
申请号：US18502227
申请日：2023-11-06
申请人： Ecolab USA Inc.
发明人： Ashish Dhawan , Carter Martin Silvernail , Sukhwan Soontravanich , Ali Marie Bichler
IPC分类号： C11D1/72 , B01D65/02 , C07C43/315 , C07C211/45 , C11D3/37 , C11D11/00 , C11D17/00
CPC分类号： C11D1/721 , B01D65/02 , C07C43/315 , C07C211/45 , C11D3/3773 , C11D11/0011 , C11D17/0021
摘要： Surfactants capable of releasing and/or dissolving polymers to form water-soluble or water-dispersible polymer solutions are disclosed. In addition, polymer compositions containing a water-in-oil emulsion comprising the surfactant are provided and can be used, for example, in methods of dissolving a polymer. Also disclosed are detergent compositions and methods of cleaning articles and/or membranes using the surfactants herein. These surfactants and polymer compositions can be used in various industries including for water clarification, papermaking, sewage and industrial water treatment, drilling mud stabilizers, and enhanced oil recovery.

2. 发明授权

US10870616B2 Derivatives of sobetirome 有权
公开(公告)号：US10870616B2
公开(公告)日：2020-12-22
申请号：US16707604
申请日：2019-12-09
申请人： OREGON HEALTH & SCIENCE UNIVERSITY
发明人： Thomas Scanlan , Jordan Devereaux , Andrew Placzek , Tapasree Banerji , Skylar Ferrara , James Matthew Meinig , Tania Banerji
IPC分类号： C07C43/315 , C07C235/20 , C07C59/115 , C07C39/07 , C07C65/34 , C07F7/08 , A61P25/28
CPC分类号： C07C43/315 , A61P25/28 , C07C39/07 , C07C59/115 , C07C65/34 , C07C235/20 , C07F7/0803 , C07B2200/07
摘要： Disclosed are halo substituted derivative compounds of sobetirome with improved pharmacological characteristics relative to sobetirome, pharmaceutical compositions that include those compounds and methods of treating diseases such as neurodegenerative disorders using those pharmaceutical compositions.

3. 发明申请

US20180029967A1 GEM DIFLUOROCOMPOUNDS AS DEPIGMENTING OR LIGHTENING AGENTS 审中-公开
公开(公告)号：US20180029967A1
公开(公告)日：2018-02-01
申请号：US15551686
申请日：2016-03-04
申请人： TFCHEM
发明人： Géraldine DELIENCOURT-GODEFROY , Lénaïg LOPES
IPC分类号： C07C43/247 , C07D317/72 , C07C49/753 , A61K8/35 , A61K8/33 , A61K8/37 , A61K8/34 , A61K8/49 , C07C53/08 , A61Q19/02
CPC分类号： C07C43/247 , A61K8/33 , A61K8/347 , A61K8/35 , A61K8/37 , A61K8/4973 , A61K8/69 , A61Q19/02 , C07C43/253 , C07C43/315 , C07C49/753 , C07C53/08 , C07C69/63 , C07C2601/14 , C07D317/72
摘要： The present invention relates to a compound having the formula (I), as well as a method for preparing such a compound, a cosmetic or pharmaceutic composition containing such a compound, and the use thereof as a depigmenting, lightening, bleaching or whitening agent and for treating pigmentation disorders, notably by topical application on the skin.

4. 发明申请

US20170152456A1 FLUOROPOLYETHER COMPOUND, LUBRICANT, AND MAGNETIC DISK 审中-公开
公开(公告)号：US20170152456A1
公开(公告)日：2017-06-01
申请号：US15318511
申请日：2015-06-22
申请人： MORESCO CORPORATION
发明人： Ryosuke SAGATA , Haruo KASAI
IPC分类号： C10M105/54 , C08G65/331 , G11B5/725 , C10M107/38
CPC分类号： C10M105/54 , C07C43/137 , C07C43/315 , C08G65/007 , C08G65/3318 , C08G65/337 , C10M107/38 , C10M147/04 , C10M2213/04 , C10M2213/043 , C10M2213/06 , C10M2213/0606 , C10N2230/10 , C10N2230/56 , C10N2240/204 , G11B5/725 , G11B5/82
摘要： The disclosure provides a fluoropolyether compound represented by formula (1): R1—CH2—R2—CH2—R3 wherein R1 is C1-C10 alkoxy; R2 is —(CF2)pO(CF2O)x(CF2CF2O)y(CF2CF2CF2O)z(CF2CF2CF2CF2O)w(CF2)p—; x and y are each a real number of 0 to 30; z is a real number of 0 to 30; w is a real number of 0 to 20; p is an integer of 1 to 3; R3 is —OCH2CH(OH)CH2OH, —OCH2CH(OH)CH2OCH2CH(OH)CH2OH, —O(CH2)mOH, or —OCH2(OH)CHCH2—OC6H4—R4; m is an integer of 2 to 8; and R4 is hydrogen, C1-C4 alkoxy, amino, or an amide residue; and also provides a lubricant having the compound and a magnetic disk.

5. 发明授权

US09365476B2 Aryl compounds modified with perfluorovinyl ethers 有权
标题翻译：用全氟乙烯基醚改性的芳基化合物
公开(公告)号：US09365476B2
公开(公告)日：2016-06-14
申请号：US14068784
申请日：2013-10-31
申请人： E I DU PONT DE NEMOURS AND COMPANY
发明人： Neville Everton Drysdale
IPC分类号： C07C43/315
CPC分类号： C07C43/315
摘要： A compound of formula (I) wherein Rf is CF3, —C2F5, —CF2CFXCF3; X is —F, or —OC3F7; Y is —H, —Cl, or —Br; R1 is —(CH2)q—, —(OCH2CH2)t—, or —(CH2)q(OCH2CH2)t—; Rf1 is —OCF2CFY1—O—Rf2; Rf2 is —CF3, —C2F5, —CF2CFX1CF3; X1 is —F, or —OC3F7; Y1 is —H, —Cl, or —Br; q is 0 to 10; t is 1 to 10; a is 1 to 5; and b is 1 to 5.
摘要翻译：式（I）的化合物，其中R f是CF 3，-C 2 F 5，-CF 2 CFXCF 3; X为-F或-OC 3 F 7; Y是-H，-Cl或-Br; R1是 - （CH2）q-， - （OCH2CH2）t-或 - （CH2）q（OCH2CH2）t-; Rf1为-OCF2CFY1-O-Rf2; Rf2是-CF3，-C2F5，-CF2CFX1CF3; X1为-F或-OC3F7; Y1是-H，-Cl或-Br; q为0〜10; t为1〜10; a是1到5; b为1〜5。

6. 发明申请

US20150274667A1 PROCESS FOR PREPARATION OF ROFLUMILAST 有权
标题翻译：制备流感病毒的方法
公开(公告)号：US20150274667A1
公开(公告)日：2015-10-01
申请号：US14736062
申请日：2015-06-10
申请人： SCINOPHARM (CHANSHU) PHARMACEUTICALS, LTD.
发明人： Yi-Jing Chen , Stanislaw Pikul , Shen-Chun Kuo , Guo-dong Chu
IPC分类号： C07D213/74 , C07D319/06 , C07D317/22 , C07C43/307
CPC分类号： C07D213/74 , C07C43/2055 , C07C43/307 , C07C43/315 , C07D213/75 , C07D317/22 , C07D319/06
摘要： The present invention provides novel processes for the preparation of N-substituted benzamides having the formula VIc: In some embodiments, the invention provides a process for preparation of roflumilast and other pharmaceutically active species. Novel compounds, including intermediates for the synthesis of roflumilast, are also provided.
摘要翻译：本发明提供用于制备具有式VIc的N-取代的苯甲酰胺的新方法：在一些实施方案中，本发明提供了制备罗氟司特和其它药学活性物质的方法。还提供了新型化合物，包括合成罗氟司特的中间体。

7. 发明申请

US20140135518A1 PERFLUOROPOLYVINYL MODIFIED ARYL INTERMEDIATES AND MONOMERS 有权
标题翻译：全氟代乙烯改性芳香族中间体和单体
公开(公告)号：US20140135518A1
公开(公告)日：2014-05-15
申请号：US14068535
申请日：2013-10-31
申请人： E I DU PONT DE NEMOURS AND COMPANY
发明人： Neville Everton Drysdale
IPC分类号： C07C235/48 , C07C47/575 , C07C49/84 , C07C51/347 , C07C65/21 , C07C41/01 , C07C45/61 , C07C67/00 , C07C43/23 , C07C69/78
CPC分类号： C07C235/48 , C07C41/06 , C07C41/48 , C07C43/205 , C07C43/225 , C07C43/23 , C07C43/313 , C07C43/315 , C07C45/64 , C07C45/70 , C07C47/575 , C07C49/84 , C07C51/367 , C07C51/62 , C07C65/21 , C07C67/31 , C07C67/347 , C07C69/92 , C07C231/12
摘要： A compound of formula (I) wherein Rf is —CF3, —C2F5, or —CF2CFXCF3; X is —F, or —OC3F7; Y is —H, —Cl, or —Br; R is —OH, —(CH2)nOH, —(OCH2CH2)mOH, —(CH2)n(OCH2CH2)mOH, —O—C(O)—R1, —(CH2)nO—C(O)R1, —(OCH2CH2)mOC(O)—R1, —C(O)NHw(CH2CH2OH)2-w, —C≡N, —C≡CH, or —C(O)R2; n is 1 to 10; m is 1 to 10; R1 is C1 to C10 alkyl; R2 is —H, C1 to C10 alkyl, —Cl, or —OCH2CH2OH; a is 1 to 5; b is 1 to 5; and w is 0, 1 or 2.
摘要翻译：式（I）的化合物，其中R f为-CF 3，-C 2 F 5或-CF 2 CFXCF 3; X为-F或-OC 3 F 7; Y是-H，-Cl或-Br; R是-OH， - （CH 2）n OH， - （OCH 2 CH 2）m OH， - （CH 2）n（OCH 2 CH 2）mOH，-O-C（O）-R 1， - （CH 2）n O -C（O）（OCH 2 CH 2）mOC（O）-R 1，-C（O）NH w（CH 2 CH 2 OH）2-w，-C≡N，-C≡CH或-C（O） n为1〜10; m为1〜10; R1是C1-C10烷基; R2是-H，C1-C10烷基，-Cl或-OCH2CH2OH; a是1到5; b为1〜5; w为0,1或2。

8. 发明授权

US08350096B2 Compound for resist and radiation-sensitive composition 有权
标题翻译：抗蚀剂和辐射敏感组合物的化合物
公开(公告)号：US08350096B2
公开(公告)日：2013-01-08
申请号：US13051155
申请日：2011-03-18
申请人： Masatoshi Echigo , Dai Oguro
发明人： Masatoshi Echigo , Dai Oguro
IPC分类号： C07C39/12 , C07C39/16 , G03F7/004
CPC分类号： G03F7/0045 , C07C39/15 , C07C43/164 , C07C43/18 , C07C43/196 , C07C43/2055 , C07C43/225 , C07C43/315 , C07C49/747 , C07C69/96 , C07C2601/14 , C07C2603/74 , G03F7/0392 , Y10S430/106
摘要： A radiation-sensitive composition containing 1 to 80% by weight of a solid component and 20 to 99% by weight of a solvent. The solid component contains a compound B which has (a) a structure derived from a polyphenol compound A by introducing an acid-dissociating group to at least one phenolic hydroxyl group of the polyphenol compound A which is synthesized by a condensation between a di- to tetrafunctional aromatic ketone or aromatic aldehyde each having 5 to 36 carbon atoms with a compound having 1 to 3 phenolic hydroxyl groups and 6 to 15 carbon atoms, and (b) a molecular weight of 400 to 2000. The composition containing the compound B is useful as an acid-amplified, non-polymeric resist material, because it is highly sensitive to radiation such as KrF excimer lasers, extreme ultraviolet rays, electron beams, and X-rays, and provides resist patterns with a high resolution, high heat resistance, and high etching resistance.
摘要翻译：含有1至80重量％固体组分和20至99重量％溶剂的辐射敏感组合物。固体成分含有化合物B，该化合物B具有（a）由多酚化合物A导入的结构，该酸结合基通过将多元酚化合物A中的至少一个酚羟基引入到通过二 - 具有5至36个碳原子的四官能芳族酮或芳族醛与具有1至3个酚羟基和6至15个碳原子的化合物，和（b）分子量为400至2000.含有化合物B的组合物是有用的作为酸性扩增的非聚合抗蚀剂材料，因为它对诸如KrF准分子激光器，极紫外线，电子束和X射线的辐射高度敏感，并且提供具有高分辨率，高耐热性的抗蚀剂图案，耐腐蚀性高。

9. 发明授权

US08258349B2 Process for production of benzaldehyde compound 有权
标题翻译：苯甲醛化合物生产工艺
公开(公告)号：US08258349B2
公开(公告)日：2012-09-04
申请号：US12863759
申请日：2009-01-30
申请人： Koichi Nakazawa
发明人： Koichi Nakazawa
IPC分类号： C07C45/00 , C07C43/30
CPC分类号： C07C45/515 , C07C41/16 , C07C41/52 , C07C43/225 , C07C43/315 , C07C47/575
摘要： A benzaldehyde acetal compound of formula (3): (wherein Q represents a hydrogen atom or a halogen atom, Ar represents a phenyl group optionally substituted with at least one selected from the group consisting of alkyl groups having 1 to 4 carbon atoms and halogen atoms, and R represents an alkyl group having 1 to 4 carbon atoms).
摘要翻译：式（3）的苯甲醛缩醛化合物：（其中Q表示氢原子或卤素原子，Ar表示任选被至少一个选自具有1至4个碳原子的烷基和卤素原子取代的苯基），R表示碳原子数为1〜4的烷基）。

10. 发明授权

US08258217B2 Perfluoroalkyl substituted phenol derivatives as surface modifiers 失效
标题翻译：全氟烷基取代酚衍生物作为表面改性剂
公开(公告)号：US08258217B2
公开(公告)日：2012-09-04
申请号：US12310259
申请日：2007-08-29
申请人： Michèle Gerster , Manuel Mihalic
发明人： Michèle Gerster , Manuel Mihalic
IPC分类号： C08K5/136 , C08K5/375
CPC分类号： C07C69/82 , C07C43/225 , C07C43/23 , C07C43/315 , C07C69/63 , C07C69/65 , C07C69/712 , C07C235/20 , C07C271/44 , C07C271/58 , C07C323/16 , C08K5/06 , C08K5/10 , C08K5/136 , C08K5/205 , C08K5/375
摘要： The instant invention relates to a composition comprising a) an organic material which is susceptible to oxidative, thermal or light-induced degradation, and b) at least one compound of the formula (I) wherein the general symbols are as defined in claim 1; especially wherein at least one of the radicals R2, R3 or R4 is —CH2—CH(CH3)—S(O)p—R12, —CH2—CH2—CH2—S(O)p—R12, —CH2—CH(R11)—CH2—R12 or —CH2—CH═CH—R12, R11 is hydrogen or halogen, R12 is a monovalent perfluorinated alkyl or alkenyl, linear or branched organic radical having four to twenty fully fluorinated carbon atoms; or —CH2CH2(CF2)mCF3, m is 3 to 12, and p is 0, 1 or 2. The compounds of the formula I are useful as reducers of surface energy for organic materials, for example synthetic polymer. Polymers with such a reduced surface energy possess an “easy-to-clean”, “self-cleaning” “antisoiling”, “soil-release” “antigraffiti”, “oil resistance”, “solvent resistance”, “chemical resistance”, “self lubricating”, “scratch resistance”, “low moisture absorption”, “dirt pickup resistance”, “slip properties” and “hydrophobic surface”; and anti-adhesion properties against proteins and against microorganism such as for example bacteria, fungi and algae.
摘要翻译：本发明涉及一种组合物，其包含a）对氧化，热或光诱导降解敏感的有机材料，和b）至少一种式（I）化合物，其中一般符号如权利要求1所定义; 特别是其中基团R 2，R 3或R 4中的至少一个为-CH 2 -CH（CH 3）-S（O）p -R 12，-CH 2 -CH 2 -CH 2 -S（O）p -R 12，-CH 2 -CH（ R 11）-CH 2 -R 12或-CH 2 -CH = CH-R 12，R 11是氢或卤素，R 12是具有四至二十个完全氟化的碳原子的一价全氟化烷基或链烯基的直链或支链有机基团; 或-CH 2 CH 2（CF 2）m CF 3，m为3至12，p为0,1或2.式I化合物可用作有机材料例如合成聚合物的表面能的还原剂。具有这种表面能降低的聚合物具有“易清洁”，“自清洁”“防污”，“释放”“防刮涂”，“耐油性”，“耐溶剂性”，“耐化学性” “自润滑”，“耐划伤性”，“低吸湿性”，“抗污性”，“滑爽性”和“疏水性表面”; 和抗蛋白质和抗微生物（例如细菌，真菌和藻类）的抗粘附性。

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