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    • 6. 发明授权
    • Techniques for providing a direct injection semiconductor memory device
    • 提供直接注入半导体存储器件的技术
    • US08982633B2
    • 2015-03-17
    • US13954660
    • 2013-07-30
    • Micron Technology, Inc.
    • Srinivasa R. BannaMichael A. Van Buskirk
    • G11C16/04G11C7/00G11C11/402G11C11/403H01L27/102H01L27/108H01L29/78H01L27/082
    • G11C7/00G11C11/4026G11C11/403G11C2211/4016H01L27/082H01L27/1023H01L27/108H01L27/10802H01L29/7841
    • Techniques for providing a direct injection semiconductor memory device are disclosed. In one particular exemplary embodiment, the techniques may be realized as a direct injection semiconductor memory device including a first region connected to a bit line extending in a first orientation and a second region connected to a source line extending in a second orientation. The direct injection semiconductor memory device may also include a body region spaced apart from and capacitively coupled to a word line extending in the second orientation, wherein the body region is electrically floating and disposed between the first region and the second region. The direct injection semiconductor memory device may further include a third region connected to a carrier injection line extending in the second orientation, wherein the first region, the second region, the body region, and the third region are disposed in sequential contiguous relationship.
    • 公开了提供直接注入半导体存储器件的技术。 在一个特定示例性实施例中,技术可以被实现为直接注入半导体存储器件,其包括连接到沿第一取向延伸的位线的第一区域和连接到沿第二取向延伸的源极线的第二区域。 直接注入半导体存储器件还可以包括与在第二取向上延伸的字线间隔开并且电容耦合到字线的主体区域,其中主体区域电浮置并且设置在第一区域和第二区域之间。 直接注入半导体存储器件还可以包括连接到沿着第二取向延伸的载流子注入管线的第三区域,其中第一区域,第二区域,体区域和第三区域以顺序连续的关系设置。
    • 7. 发明授权
    • Memory cells, memory cell arrays, methods of using and methods of making
    • 存储单元,存储单元阵列,使用方法和制作方法
    • US08654583B2
    • 2014-02-18
    • US13937612
    • 2013-07-09
    • Yuniarto Widjaja
    • Yuniarto Widjaja
    • G11C14/00
    • G11C11/4026G11C11/404G11C11/4074G11C11/56G11C13/0002G11C13/0004G11C13/0007G11C13/003G11C13/0038G11C13/0097G11C14/0018G11C14/0045G11C16/0416G11C2211/4016G11C2213/76G11C2213/79H01L27/1023H01L27/1052H01L27/10802H01L27/24H01L29/66825H01L29/66833H01L29/7841H01L29/7881H01L45/06H01L45/144H01L45/145
    • A semiconductor memory cell and arrays of memory cells are provided In at least one embodiment, a memory cell includes a substrate having a top surface, the substrate having a first conductivity type selected from a p-type conductivity type and an n-type conductivity type; a first region having a second conductivity type selected from the p-type and n-type conductivity types, the second conductivity type being different from the first conductivity type, the first region being formed in the substrate and exposed at the top surface; a second region having the second conductivity type, the second region being formed in the substrate, spaced apart from the first region and exposed at the top surface; a buried layer in the substrate below the first and second regions, spaced apart from the first and second regions and having the second conductivity type; a body region formed between the first and second regions and the buried layer, the body region having the first conductivity type; a gate positioned between the first and second regions and above the top surface; and a nonvolatile memory configured to store data upon transfer from the body region.
    • 提供半导体存储单元和存储单元阵列在至少一个实施例中,存储单元包括具有顶表面的衬底,该衬底具有选自p型导电类型和n型导电类型的第一导电类型 ; 具有选自p型和n型导电类型的第二导电类型的第一区域,所述第二导电类型不同于所述第一导电类型,所述第一区域形成在所述基板中并暴露在所述顶表面处; 具有第二导电类型的第二区域,第二区域形成在基板中,与第一区域间隔开并暴露在顶表面处; 位于第一和第二区域下方的衬底中的与第一和第二区域间隔开并且具有第二导电类型的掩埋层; 形成在所述第一和第二区域与所述掩埋层之间的体区,所述体区具有第一导电类型; 位于第一和第二区域之间并位于顶部表面之上的门; 以及非易失性存储器,被配置为在从身体区域传送时存储数据。