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1. 发明授权

US11985756B2 Linear accelerator coil including multiple fluid channels 有权
公开(公告)号：US11985756B2
公开(公告)日：2024-05-14
申请号：US17505977
申请日：2021-10-20
申请人： Applied Materials, Inc.
发明人： Robert B. Vopat , Charles T. Carlson
IPC分类号： H05H7/22 , H01J37/317 , H05H9/00
CPC分类号： H05H7/22 , H01J37/3171 , H05H9/00 , H01J2237/0473 , H01J2237/141 , H01J2237/31701
摘要： Embodiments herein are directed to a linear accelerator assembly for an ion implanter, wherein the linear accelerator includes a jacketed resonator coil. In some embodiments, a linear accelerator assembly may include a first fluid conduit and a coil resonator coupled to the first fluid conduit, wherein the coil resonator is operable to receive a first fluid via the first fluid conduit, wherein the coil resonator comprises a first coil conduit adjacent a second coil conduit, and wherein a first fluid channel defined by the first coil conduit is operable to receive the first fluid.

2. 发明授权

US10083813B2 Multicolumn charged particle beam exposure apparatus 有权
公开(公告)号：US10083813B2
公开(公告)日：2018-09-25
申请号：US15461829
申请日：2017-03-17
申请人： INTEL CORPORATION
发明人： Masaki Kurokawa , Takamasa Sato , Shinichi Kojima , Akio Yamada
IPC分类号： H01J3/14 , H01J37/147 , H01J37/317 , H01J37/24
CPC分类号： H01J37/147 , H01J37/241 , H01J37/3177 , H01J2237/141 , H01J2237/1504 , H01J2237/152 , H01J2237/1526 , H01J2237/20285
摘要： A multicolumn charged particle beam exposure apparatus includes a plurality of column cells which generate charged particle beams, and the column cell includes a yoke which is made of a magnetic material and generates a magnetic field of a predetermined intensity distribution around an optical axis of the column, and a coil which is wound around the yoke. The coil includes a plurality of divided windings, which are driven by different power sources.

3. 发明申请

US20170125203A1 Charged Particle Source 审中-公开
公开(公告)号：US20170125203A1
公开(公告)日：2017-05-04
申请号：US15404618
申请日：2017-01-12
申请人： Hermes Microvision Inc.
发明人： Shuai Li
IPC分类号： H01J37/143
CPC分类号： H01J37/143 , H01J3/20 , H01J37/063 , H01J37/065 , H01J37/09 , H01J37/14 , H01J37/28 , H01J2237/0453 , H01J2237/063 , H01J2237/06308 , H01J2237/06375 , H01J2237/0653 , H01J2237/083 , H01J2237/141 , H01J2237/1415 , H01J2237/2806 , H01J2237/2817
摘要： This invention provides a charged particle source, which comprises an emitter and means fo generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

4. 发明申请

US20160042911A1 DESKTOP ELECTRON MICROSCOPE AND COMBINED ROUND-MULTIPOLE MAGNETIC LENS THEREOF 有权
标题翻译：桌面电子显微镜及其组合圆形多功能磁性镜片
公开(公告)号：US20160042911A1
公开(公告)日：2016-02-11
申请号：US14534815
申请日：2014-11-06
申请人： NATIONAL TSING HUA UNIVERSITY
发明人： WEI-YU CHANG , FU-RONG CHEN , TE-HUI LEE , TSU-WEI HUANG
IPC分类号： H01J37/141 , H01J37/26
CPC分类号： H01J37/153 , H01J37/14 , H01J37/141 , H01J37/1413 , H01J37/145 , H01J37/26 , H01J2237/141 , H01J2237/1415
摘要： A combined round-multipole magnetic lens comprises a coil bracket, a first pole piece and a second pole piece. At least a first pole shoe of the first pole piece on the coil support and at least a second pole shoe of the second pole piece under the coil support respectively extend towards the central axis. The first pole shoe and the second pole shoe are symmetric according to the central axis, or the first pole shoes and the second pole shoes are respectively symmetrically arranged, and the angle difference between the first pole shoe and the adjacent second pole shoes is 360/2N degrees. A magnetic circuit gap is formed between the first pole shoe and the adjacent second pole shoe, for generating a magnetic field distribution of multi-poles and reducing the volume and the number of power supplies.
摘要翻译：组合的圆形多极磁性透镜包括线圈支架，第一极靴和第二极靴。线圈支撑件上的第一极靴的至少第一极靴和线圈支撑件下方的第二极靴的至少第二极靴分别朝向中心轴线延伸。第一极靴和第二极靴根据中心轴对称，或第一极靴和第二极靴分别对称布置，第一极靴和相邻的第二极靴之间的角度差为360 / 2N度。在第一极靴和相邻的第二极靴之间形成磁路间隙，用于产生多极的磁场分布并减小电源的体积和数量。

5. 发明申请

US20150294833A1 CHARGED PARTICLE BEAM APPARATUS 有权
标题翻译：充电颗粒光束装置
公开(公告)号：US20150294833A1
公开(公告)日：2015-10-15
申请号：US14439628
申请日：2013-10-21
申请人： Hitachi High-Technologies Corporation
发明人： Muneyuki Fukuda , Naomasa Suzuki , Akira Ikegami , Hideto Dohi , Momoyo Enyama , Tomoyasu Shojo
IPC分类号： H01J37/147 , H01J37/28 , H01J37/141
CPC分类号： H01J37/1478 , H01J37/141 , H01J37/147 , H01J37/28 , H01J2237/141 , H01J2237/1415 , H01J2237/1506 , H01J2237/2801
摘要： In order to provide a charged particle beam apparatus capable of high resolution measurement of a sample at any inclination angle, a charged particle beam apparatus for detecting secondary charged particles (115) generated by irradiating a sample (114) with a primary charged particle beam (110) is provided with a beam tilt lens (113) having: a yoke magnetic path member (132) and a lens coil (134) to focus the primary charged particle beam (110) on the sample (114); and a solenoid coil (133) configured to arrange the upper end on the side surface of the yoke magnetic path member (132) and arrange the bottom end between the tip end of the pole piece of the yoke magnetic path member (132) and the sample (114) in order to arbitrarily tilt the primary charged particle beam (110) on the sample (114).
摘要翻译：为了提供能够以任何倾斜角对样品进行高分辨率测量的带电粒子束装置，用于检测通过用一次带电粒子束（114）照射样品（114）而产生的二次带电粒子（115）的带电粒子束装置 110）设置有光束倾斜透镜（113），其具有：一个磁轭磁路部件（132）和一个用于将一次带电粒子束（110）聚焦在样本（114）上的透镜线圈; 以及螺线管线圈（133），其配置为将所述上端配置在所述磁轭磁路部件（132）的侧面，并将所述磁轭磁路部件（132）的极片的前端部与所述磁轭部件样品（114），以便任意倾斜样品（114）上的初级带电粒子束（110）。

6. 发明授权

US07888660B2 Controlling the characteristics of implanter ion-beams 有权
标题翻译：控制注入离子束的特性
公开(公告)号：US07888660B2
公开(公告)日：2011-02-15
申请号：US11341838
申请日：2006-01-27
申请人： Kenneth H. Purser , Harald A. Enge , Norman L. Turner
发明人： Kenneth H. Purser , Harald A. Enge , Norman L. Turner
IPC分类号： G21K5/04
CPC分类号： H01J37/141 , H01J37/14 , H01J37/147 , H01J37/1472 , H01J37/153 , H01J37/315 , H01J37/3171 , H01J2237/141 , H01J2237/1534 , H01J2237/31703
摘要： A method and apparatus satisfying growing demands for improving the precision of angle of incidence of implanting ions that impact a semiconductor wafer and the precision of ribbon ion beams for uniform doping of wafers as they pass under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes. The design of the optical elements makes possible: (1) Broad-range adjustment of the width of a ribbon beam at the work piece; (2) Correction of inaccuracies in the intensity distribution across the width of a ribbon beam; (3) Independent steering about both X and Y axes; (4) Angle of incidence correction at the work piece; and (5) Approximate compensation for the beam expansion effects arising from space charge. In a practical situation, combinations of the elements allow ribbon beam expansion between source and work piece to 350 millimeter, with good uniformity and angular accuracy. Also, the method and apparatus may be used for introducing quadrupole fields along a beam line.
摘要翻译：一种满足日益增长的要求的方法和装置，用于提高冲击半导体晶片的注入离子入射角的精度以及当离子束通过时晶片的均匀掺杂的带状离子束的精度。该方法和装置涉及用于植入目的的新型磁离子 - 光学传输元件的设计和组合。光学元件的设计成为可能：（1）宽幅调节工件上的带状光束的宽度; （2）纠正带状横梁宽度的强度分布不准确; （3）关于X轴和Y轴的独立转向; （4）工件入射角校正; 和（5）空间费用引起的光束膨胀效应的近似补偿。在实际情况下，这些元件的组合允许源和工件之间的带状光束膨胀到350毫米，具有良好的均匀性和角度精度。此外，该方法和装置可用于沿着光束线引入四极场。

7. 发明申请

US20070187619A1 ELECTROMAGNET WITH ACTIVE FIELD CONTAINMENT 有权
标题翻译：具有活动场地容纳的电磁铁
公开(公告)号：US20070187619A1
公开(公告)日：2007-08-16
申请号：US11276128
申请日：2006-02-15
申请人： Peter Kellerman , Keneth Purser
发明人： Peter Kellerman , Keneth Purser
IPC分类号： H01J37/317 , H01J37/141
CPC分类号： H01J37/05 , H01J37/141 , H01J37/1472 , H01J37/3171 , H01J2237/0042 , H01J2237/057 , H01J2237/141 , H01J2237/142 , H01J2237/1508 , H01J2237/152 , H01J2237/31701 , H01J2237/31705
摘要： An electromagnet and related ion implanter system including active field containment are disclosed. The electromagnet provides a dipole magnetic field within a tall, large gap with minimum distortion and degradation of strength. In one embodiment, an electromagnet for modifying an ion beam includes: a ferromagnetic box structure including six sides; an opening in each of a first side and a second opposing side of the ferromagnetic box structure for passage of the ion beam therethrough; and a plurality of current-carrying wires having a path along an inner surface of the ferromagnetic box structure, the inner surface including the first side and the second opposing side and a third side and a fourth opposing side, wherein the plurality of current-carrying wires are positioned to pass around each of the openings of the first and second opposing sides.
摘要翻译：公开了一种包括活性场容纳的电磁体和相关离子注入机系统。电磁铁在高大的间隙内提供偶极磁场，具有最小的变形和强度的降低。在一个实施例中，用于修改离子束的电磁体包括：包括六个边的铁磁盒结构; 所述铁磁盒结构的第一侧和第二相对侧中的每一个中的开口用于使所述离子束通过其中; 以及多个载流线，其具有沿铁磁箱结构的内表面的路径，内表面包括第一侧和第二相对侧，以及第三侧和第四相对侧，其中多个载流电线定位成绕过第一和第二相对侧的每个开口。

8. 发明申请

US20060169924A1 Controlling the characteristics of implanter ion-beams 有权
标题翻译：控制注入离子束的特性
公开(公告)号：US20060169924A1
公开(公告)日：2006-08-03
申请号：US11341839
申请日：2006-01-27
申请人： Kenneth Purser , Harald Enge , Norman Turner
发明人： Kenneth Purser , Harald Enge , Norman Turner
IPC分类号： H01J37/08
CPC分类号： H01J37/141 , H01J37/14 , H01J37/147 , H01J37/1472 , H01J37/153 , H01J37/315 , H01J37/3171 , H01J2237/141 , H01J2237/1534 , H01J2237/31703
摘要： A method and apparatus satisfying growing demands for improving the precision of angle of incidence of implanting ions that impact a semiconductor wafer and the precision of ribbon ion beams for uniform doping of wafers as they pass under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes. The design of the optical elements makes possible: (1) Broad-range adjustment of the width of a ribbon beam at the work piece; (2) Correction of inaccuracies in the intensity distribution across the width of a ribbon beam; (3) Independent steering about both X and Y axes; (4) Angle of incidence correction at the work piece; and (5) Approximate compensation for the beam expansion effects arising from space charge. In a practical situation, combinations of the elements allow ribbon beam expansion between source and work piece to 350 millimeter, with good uniformity and angular accuracy. Also, the method and apparatus may be used for introducing quadrupole fields along a beam line.
摘要翻译：一种满足日益增长的要求的方法和装置，用于提高冲击半导体晶片的注入离子入射角的精度以及当离子束通过时晶片的均匀掺杂的带状离子束的精度。该方法和装置涉及用于植入目的的新型磁离子 - 光学传输元件的设计和组合。光学元件的设计成为可能：（1）宽幅调节工件上的带状光束的宽度; （2）纠正带状横梁宽度的强度分布不准确; （3）关于X轴和Y轴的独立转向; （4）工件入射角校正; 和（5）空间费用引起的光束膨胀效应的近似补偿。在实际情况下，这些元件的组合允许源和工件之间的带状光束膨胀到350毫米，具有良好的均匀性和角度精度。此外，该方法和装置可用于沿着光束线引入四极场。

9. 发明申请

US20060151698A1 Charged particle beam apparatus 审中-公开
标题翻译：带电粒子束装置
公开(公告)号：US20060151698A1
公开(公告)日：2006-07-13
申请号：US11311278
申请日：2005-12-20
申请人： Yuko Sasaki , Yasuhiro Gunji , Zhaohui Cheng
发明人： Yuko Sasaki , Yasuhiro Gunji , Zhaohui Cheng
IPC分类号： G21K7/00
CPC分类号： H01J37/28 , H01J37/153 , H01J37/21 , H01J37/222 , H01J37/265 , H01J2237/141 , H01J2237/1532 , H01J2237/21 , H01J2237/221 , H01J2237/2817
摘要： A charged particle beam apparatus is provided which has high resolving power and a wide scanning region (observation field of view). The apparatus has a unit for adjusting the focus, a unit for adjusting astigmatism, a unit for controlling and detecting scanning positions and a controller operative to control the focus adjustment and astigmatism adjustment at a time in interlocked relation to the scanning positions, thereby assuring compatibility between the high resolving power and the observation view field of a wide area.
摘要翻译：提供具有高分辨率和宽扫描区域（观察视场）的带电粒子束装置。该装置具有用于调节焦点的单元，用于调节散光的单元，用于控制和检测扫描位置的单元，以及控制器，用于与扫描位置互锁地控制焦点调节和像散调整，由此确保相容性在高分辨率和广域的观察视野之间。

10. 发明授权

US11908657B2 Scanning electron microscope device and electron beam inspection apparatus 有权
公开(公告)号：US11908657B2
公开(公告)日：2024-02-20
申请号：US17646195
申请日：2021-12-28
申请人： ZHONGKE JINGYUAN ELECTRON LIMITED
发明人： Qinglang Meng , Weiqiang Sun
IPC分类号： H01J37/21 , G01N23/2251 , H01J37/141 , H01J37/147 , H01J37/26 , H01J37/28
CPC分类号： H01J37/21 , G01N23/2251 , H01J37/141 , H01J37/1477 , H01J37/263 , H01J37/28 , H01J2237/06375 , H01J2237/141 , H01J2237/1415 , H01J2237/1516 , H01J2237/2448 , H01J2237/24475 , H01J2237/2817
摘要： A scanning electron microscope device for a sample to be detected and an electron beam inspection apparatus are provided, the scanning electron microscope device being configured to project electron beam to a surface of the sample to generate backscattered electrons and secondary electrons, and comprising: an electron beam source, a deflection mechanism, and an objective lens assembly. The deflection mechanism comprises a first deflector located downstream the electron beam source and a second deflector located downstream the first deflector. The objective lens assembly comprises: an excitation coil; and a magnetic yoke, formed by a magnetizer material as a housing which opens towards the sample and comprising a hollow body defining an internal chamber where the excitation coil is accommodated, and at least one inclined portion extending inward from the hollow body at an angle with reference to the hollow body and directing towards the optical axis, with an end of the at least one inclined portion being formed into a pole piece. The deflection mechanism further comprises a compensation electrode, which is located between the pole piece and the surface of the sample and is configured to adjust a focusing position of the electron beam at which the electron beam is focused, in a condition of excitation thereof with a voltage being applied thereon, by adjusting the voltage.

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