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    • 3. 发明申请
    • VCSEL STRUCTURE
    • VCSEL结构
    • US20170033534A1
    • 2017-02-02
    • US15302346
    • 2015-04-07
    • Danmarks Tekniske Universitet
    • Il-Sug CHUNGALIREZA Taghizadeh
    • H01S5/183H01S5/026
    • H01S5/18319G02B6/12004H01S5/026H01S5/1032H01S5/183H01S5/18302H01S5/18311H01S5/18341H01S5/18361H01S5/18363H01S5/1838H01S5/18386H01S5/18397
    • The invention relates to a VCSEL structure based on a novel grating reflector. The grating reflector (1) comprises a grating layer (20) with a contiguous core grating region having a grating structure, wherein an index of refraction of high-index sections (21) of the grating structure is at least 2.5, and wherein an index of refraction of low-index sections (22) of the grating structure is less than 2. The core grating region defines a projection in a direction normal to the grating layer. The grating reflector further comprises a cap layer (30) abutting the grating layer (20), and an index of refraction of the cap layer within the projection of the core grating region onto the cap layer is at least 2.5, and within the projection of the core grating region, the cap layer is abutted by a first solid dielectric low-index layer, an index of refraction of the first low-index layer or air being less than 2; and within the projection of the core grating region, the grating layer is also abutted by a second low-index layer and/or by air, an index of refraction of the second low-index layer or air being less than 2. The VCSEL structure furthermore comprises a first reflector and an active region for providing a cavity and amplification. The cap layer (30) may comprise an active layer (32) between cladding layers (31,33) and electrical contacts (35,36) to provide a current through the active layer. Current confinement may be realized by low-index oxide regions (60).
    • 本发明涉及一种基于新型光栅反射器的VCSEL结构。 光栅反射器(1)包括具有光栅结构的连续核心光栅区域的光栅层(20),其中光栅结构的高折射率部分(21)的折射率至少为2.5,并且其中指数 光栅结构的低折射率部分(22)的折射率小于2.核心光栅区域在垂直于光栅层的方向上限定投影。 栅格反射器还包括邻接光栅层(20)的覆盖层(30),并且覆盖层在核心光栅区域的突起内的覆盖层的折射率至少为2.5,并且在 核心光栅区域,盖层与第一固体电介质低折射率层邻接,第一低折射率层或空气的折射率小于2; 并且在芯光栅区域的投影内,光栅层也被第二低折射率层和/或空气邻接,第二低折射率层或空气的折射率小于2. VCSEL结构 还包括第一反射器和用于提供空腔和放大的有源区域。 盖层(30)可以包括在包层(31,33)和电触头(35,36)之间的有源层(32),以提供通过有源层的电流。 电流限制可以由低折射率氧化物区域实现(60)。
    • 9. 发明授权
    • Surface emitting laser and manufacturing method thereof
    • 表面发射激光器及其制造方法
    • US07923275B2
    • 2011-04-12
    • US12544243
    • 2009-08-20
    • Shigeru Nakagawa
    • Shigeru Nakagawa
    • H01L21/00
    • H01S5/1833B82Y20/00H01S5/18311H01S5/18316H01S5/18347H01S5/18363H01S5/2081H01S5/3432H01S2301/163
    • A surface emitting laser includes a lower Bragg reflector, a resonator and an upper Bragg reflector. The resonator is provided on top of the lower Bragg reflector and includes an active layer, a lower semiconductor layer and an upper semiconductor layer. The upper Bragg reflector is provided on top of the resonator, and includes a plurality of semiconductor layers. In this surface emitting laser, the uppermost layer among the plurality of semiconductor layers in the lower Bragg reflector forms an air gap, which is larger than the aperture of the first insulating layer, while the lowermost layer among the plurality of semiconductor layers in the upper Bragg reflector forms an air gap, which is larger than the aperture of the second insulating layer.
    • 表面发射激光器包括下布拉格反射器,谐振器和上布拉格反射器。 谐振器设置在下布拉格反射器的顶部,并且包括有源层,下半导体层和上半导体层。 上布拉格反射器设置在谐振器的顶部,并且包括多个半导体层。 在该表面发射激光器中,下布拉格反射器中的多个半导体层中的最上层形成比第一绝缘层的孔径大的气隙,而上部的多个半导体层中的最下层 布拉格反射器形成比第二绝缘层的孔径大的气隙。