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    • 4. 发明授权
    • Process for making circuit board or lead frame
    • 制造电路板或引线框架的工艺
    • US07005241B2
    • 2006-02-28
    • US10822825
    • 2004-04-13
    • Katsuya FukaseToyoaki Sakai
    • Katsuya FukaseToyoaki Sakai
    • G03F7/00
    • G03F7/0035H01L21/4828H01L21/4846H05K3/062H05K3/064H05K3/202H05K2203/0369H05K2203/0508H05K2203/058H05K2203/0597H05K2203/1476
    • A process for making a circuit board comprises the following steps of: half-etching a metal layer formed on an insulating substrate by means of a first masking which is positioned on an upper surface of the metal layer; applying a positive liquid resist on the half-etched metal layer from an upper side of the first masking; exposing the positive liquid resist with parallel light from the upper side of the first masking and developing the positive liquid resist in such a manner that a part of the positive liquid resist located under the first masking is protected to be unexposed and undeveloped; etching again the metal layer by means of a second masking composed of the first masking and the protected positive liquid resist to form a conductive pattern on the insulating substrate; and removing the first masking and the second masking from the metal layer.
    • 制造电路板的方法包括以下步骤:通过位于金属层的上表面上的第一掩模半蚀刻在绝缘基板上形成的金属层; 从第一掩模的上侧在半蚀刻金属层上施加正的液体抗蚀剂; 以平行的光从第一掩模的上侧露出正的液体抗蚀剂,并以这样的方式显影出正的液体抗蚀剂,使得位于第一掩蔽下的正极抗蚀剂的一部分被保护为未曝光和未显影; 通过由第一掩模和受保护的正性液体抗蚀剂构成的第二掩模再次蚀刻金属层,以在绝缘基板上形成导电图案; 以及从金属层去除第一掩蔽和第二掩蔽。