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91. 发明申请

WO2013063104A1 AIR GAUGES COMPRISING DUAL-RANGE DIFFERENTIAL PRESSURE SENSOR 审中-公开
标题翻译：包含双范围差压传感器的空气压力表
公开(公告)号：WO2013063104A1
公开(公告)日：2013-05-02
申请号：PCT/US2012/061675
申请日：2012-10-24
申请人： NIKON CORPORATION
发明人： SOGARD, Michael , LEE, Sandy
IPC分类号： G01B13/12 , G03F7/20
CPC分类号： G03F9/7026 , G01B13/12 , G03F7/70641 , G03F9/7057
摘要： Position-sensing devices include first and second gas passageways connectable to a source of pressurized gas. A gas-releasing probe is connected to the first passageway. The probe is positionable relative to a surface and configured to release a first flow of the gas, flowing through the first passageway, toward the surface while a second flow of the gas flows through the second passageway. A differential-pressure (DP) sensing device is connected between the first and second passageways. The DP-sensing device has first and second DP sensors connected in parallel. The first DP sensor produces a gas-pressure measurement within a first dynamic -pressure range, and the second DP sensor produces a gas-pressure measurement in a second dynamic-pressure range. The resulting position measurement has greater dynamic range and higher resolution than would otherwise be produced with either the first DP sensor or the second DP sensor alone.
摘要翻译：位置检测装置包括可连接到加压气体源的第一和第二气体通道。气体释放探针连接到第一通道。探针可相对于表面定位并且构造成释放流过第一通道的气体的第一流向表面，同时气体的第二流动流过第二通道。差压（DP）感测装置连接在第一和第二通道之间。 DP感测装置具有并联连接的第一和第二DP传感器。第一DP传感器在第一动态压力范围内产生气体压力测量，第二DP传感器在第二动态压力范围内产生气体压力测量。所产生的位置测量具有比用第一DP传感器或第二DP传感器单独产生的更大的动态范围和更高的分辨率。

92. 发明申请

WO2013027866A1 EXPOSURE APPARATUS AND METHOD OF CONFINING A LIQUID 审中-公开
标题翻译：曝光装置和装配液体的方法
公开(公告)号：WO2013027866A1
公开(公告)日：2013-02-28
申请号：PCT/JP2012/072086
申请日：2012-08-24
申请人： NIKON CORPORATION , NAGASAKA, Hiroyuki
发明人： NAGASAKA, Hiroyuki
IPC分类号： G03F7/20
CPC分类号： G03F7/70341
摘要： An exposure apparatus includes a first member (30) disposed at least in a part of a periphery of an optical path (K) of the exposure light, having a first face (310) facing an upper face of an object through a first gap (Wl) and holding the liquid (LQ) between the up¬ per face of the object and the first face; a second member (60) dis¬ posed at an outer side of the first face with respect to the optical path and having a second face (61) facing the upper face of the ob¬ ject through a second gap; a first supply port (64) disposed at an out¬ er side of the second face for supplying a fluid (LB); and a first suc¬ tion port (33) disposed between the first face and the second face for sucking at least part of gas (Ga) in an outer space of the second member via a gap (W2) between the second face and the upper face of the object.
摘要翻译：曝光装置包括：至少设置在曝光光的光路（K）的周边的一部分中的第一部件（30），具有通过第一间隙面对物体的上表面的第一面（310） W1）并且将物体和第一面之间的液体（LQ）保持在一起; 第二构件（60），其相对于所述光路分布在所述第一面的外侧，并且具有通过第二间隙面对所述物体的上表面的第二面（61）; 设置在所述第二面的外侧以供给流体的第一供给口（64）; 以及设置在所述第一面和所述第二面之间的第一凹部口（33），用于经由所述第二面和所述鞋面之间的间隙（W2）吸附所述第二构件的外部空间中的至少一部分气体（Ga）面对面。

93. 发明申请

WO2013025204A1 METHOD FOR DETECTING EXISTENCE OF DUST SPOTS IN DIGITAL IMAGES BASED ON LOCALLY ADAPTIVE THRESHOLDING 审中-公开
标题翻译：基于局部自适应阈值检测数字图像中灰尘斑点存在的方法
公开(公告)号：WO2013025204A1
公开(公告)日：2013-02-21
申请号：PCT/US2011/047915
申请日：2011-08-16
申请人： NIKON CORPORATION , TEZAUR, Radka
发明人： TEZAUR, Radka
IPC分类号： G06K9/40
CPC分类号： G06T7/0002 , G06T5/002 , G06T7/70 , G06T7/90 , G06T2207/10024 , G06T2207/20076 , H04N5/2171
摘要： A method for detecting a dust spot (16) in a digital image (10) includes the steps of determining (226) an expected dust spot configuration (344) of the dust spot (16) in the image (10); applying (228) a statistic order filter to a value channel of an HSV color space of the image (10) to generate a filtered value for each pixel being evaluated (349), the filtered value being based upon the expected dust spot configuration (344); and comparing (230) the filtered value to an actual color space value of a plurality of pixels (348) in the digital image (10) to generate (232) a binary image (350). In one embodiment, the method can also include the step of comparing (234) the binary image (350) to the expected dust spot configuration (344) to determine a probability of the presence of the dust spot (16) in the digital image (10).
摘要翻译：一种用于检测数字图像（10）中的灰尘斑点（16）的方法包括以下步骤：确定（226）图像（10）中的灰尘斑点（16）的预期灰尘斑点构型（344）; 将统计阶次滤波器（228）应用于图像（10）的HSV颜色空间的值通道，以生成被评估的每个像素的滤波值（349），滤波值基于预期的灰尘点配置（344 ）; 以及将所述经滤波的值与所述数字图像（10）中的多个像素（348）的实际色空间值进行比较（230）以生成（232）二进制图像（350）。在一个实施例中，该方法还可以包括将二值图像（350）与预期灰尘点配置（344）进行比较（234）以确定数字图像中灰尘斑点（16）的存在概率的步骤 10）。

94. 发明申请

WO2013022892A1 INTERMITTENT TEMPERATURE CONTROL OF MOVABLE OPTICAL ELEMENTS 审中-公开
标题翻译：可移动光学元件的间歇温度控制
公开(公告)号：WO2013022892A1
公开(公告)日：2013-02-14
申请号：PCT/US2012/049863
申请日：2012-08-07
申请人： NIKON CORPORATION , PHILLIPS, Alton H. , WATSON, Lorri L., Legal Representative of WATSON, Douglas C. (deceased) , BOW, Travis D. , KONDO, Hiroyuki , YAMADA, Atsushi , TAKINO, Hideo , KOMATSUDA, Hideki
发明人： PHILLIPS, Alton H. , BOW, Travis D. , KONDO, Hiroyuki , YAMADA, Atsushi , TAKINO, Hideo , KOMATSUDA, Hideki
IPC分类号： G03B27/32
CPC分类号： G02B26/0816 , G03F7/70075 , G03F7/702 , G03F7/70825 , G03F7/70891 , G03F7/7095
摘要： An optical system including an optical element, a positioning mechanism configured to position the optical element into an operational position, and a temperature control mechanism configured to intermittently control the temperature of the optical element between operations. By alternatively positioning the optical element between an operational position and a position in thermal contact with the temperature control mechanism, the two mechanisms for positioning and controlling the temperature of the optical element are de-coupled from one another. As a result, the mechanism for each may be optimized. In non-exclusive embodiments, the temperature control mechanism may be used to control the temperature of an individual optical element or a plurality of optical elements, such as for example, a fly's eye mirror used in an illumination unit of an EUV lithography tool.
摘要翻译：一种光学系统，包括光学元件，配置成将光学元件定位在操作位置的定位机构，以及配置为在操作之间间歇地控制光学元件的温度的温度控制机构。通过可选地将光学元件定位在与温度控制机构热接触的操作位置和位置之间，用于定位和控制光学元件的温度的两个机构彼此脱耦合。因此，可以优化每种机制。在非排他的实施例中，温度控制机构可以用于控制单个光学元件或多个光学元件的温度，例如在EUV光刻工具的照明单元中使用的飞眼镜。

95. 发明申请

WO2011068256A1 ROLLER APPARATUS AND TRANSPORTATION APPARATUS COMPRISING THE SAME 审中-公开
标题翻译：滚动装置和运输装置包括它们
公开(公告)号：WO2011068256A1
公开(公告)日：2011-06-09
申请号：PCT/JP2010/072297
申请日：2010-12-06
申请人： NIKON CORPORATION , MIYAJI Akira , MASUKAWA Takashi
发明人： MIYAJI Akira , MASUKAWA Takashi
IPC分类号： H01L51/56 , H05B33/10 , B65H27/00
CPC分类号： H01L51/56 , B65H23/24 , B65H2406/111 , B65H2406/113 , B65H2406/364 , H01L27/3244 , H01L51/0002 , H01L51/0014 , H01L51/0021 , H01L51/0097 , H01L2251/5338
摘要： A transportation apparatus (30,130) includes a roller apparatus RN,RN2) that is used to transport a transportation target, the roller apparatus including: a roller body (40,140,240) which is adapted to be rotatable; and a gasflow forming apparatus (60,160) which forms a flow of a gas between an outer peripheral surface (42a, 141a, 241a) of the roller body and the transportation target.
摘要翻译：一种运送装置（30,130），包括用于运送运送目标物的辊装置RN，RN2），该辊装置包括：适于旋转的辊体（40,140,240）; 以及在辊体的外周面（42a，141a，241a）和输送对象物之间形成气体流的气流形成装置（60,160）。

96. 发明申请

WO2011062283A1 REFLECTIVE IMAGING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND METHOD FOR PRODUCING DEVICE 审中-公开
标题翻译：反射成像光学系统，曝光装置及其制造方法
公开(公告)号：WO2011062283A1
公开(公告)日：2011-05-26
申请号：PCT/JP2010/070751
申请日：2010-11-16
申请人： NIKON CORPORATION , ONO, Takuro
发明人： ONO, Takuro
IPC分类号： G03F7/20 , G02B17/06
CPC分类号： G03F7/70233 , G02B17/0657
摘要： An imaging optical system (6) of the far pupil type, which is applicable to an exposure apparatus, is provided with six reflecting mirrors (M1 to M6) and forms an image of a first plane (4) on a second plane (7). An incident pupil of the imaging optical system is positioned on a side opposite to the imaging optical system with the first plane intervening therebetween. A condition of -14.3
摘要翻译：可应用于曝光装置的远光瞳型成像光学系统（6）设置有六个反射镜（M1至M6），并在第二平面（7）上形成第一平面（4）的图像，。成像光学系统的入射光瞳位于与成像光学系统相对的一侧，其中第一平面介于其之间。通过沿入射光瞳和第一平面之间的光轴（AX）设置的距离PD来实现-14.3 <（PD / TT）/ R <-8.3的条件，沿光学器件设置的距离TT 第一平面和第二平面之间的角度以及进入第一平面的主光束的入射角R（rad）。

97. 发明申请

WO2010147242A3 MOVABLE BODY APPARATUS, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
公开(公告)号：WO2010147242A3
公开(公告)日：2010-12-23
申请号：PCT/JP2010/060922
申请日：2010-06-21
申请人： NIKON CORPORATION , ICHINOSE, Go
发明人： ICHINOSE, Go
IPC分类号： G03F7/20
摘要： A stage device is equipped with a fine movement stage (WFS1) on which a wafer (W) is mounted, a coarse movement stage (WCS1) formed into a frame shape that encloses the periphery of the fine movement stage (WFS1), which supports the fine movement stage (WFS1) such that the fine movement stage is relatively movable and which is movable along an XY plane, a planar motor that drives the coarse movement stage (WCS1) in a predetermined range within the XY plane, and an actuator that drives the fine movement stage (WFS1) with respect to the coarse movement stage (WCS1). Therefore, the size, in a direction perpendicular to the XY plane (height direction), of a movable body made up of the fine movement stage (WFS1) and the coarse movement stage (WCS1) can be reduced, compared with a wafer stage having a coarse/fine movement configuration in which the fine movement stage is mounted on the coarse movement stage.

98. 发明申请

WO2010147241A3 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
公开(公告)号：WO2010147241A3
公开(公告)日：2010-12-23
申请号：PCT/JP2010/060921
申请日：2010-06-21
申请人： NIKON CORPORATION , ICHINOSE, Go
发明人： ICHINOSE, Go
IPC分类号： G03F7/20
摘要： Positional information of each of wafer stages (WST1 and WST2) during exposure and during alignment is measured directly under a projection optical system (PL) and directly under a primary alignment system (AL1), respectively, by a plurality of encoder heads, Z heads and the like, which a measurement bar (71) placed below surface plates (14A and 14B) has, using gratings placed on the lower surfaces of fine movement stages (WFS1 and WFS2). Since a main frame (BD) that supports the projection optical system (PL) and the measurement bar (71) are separated, deformation of the measurement bar caused by inner stress (including thermal stress) and transmission of vibration or the like from the main frame to the measurement bar, and the like do not occur, which is different from the case where the main frame and the measurement bar are integrated. Consequently, high-precision measurement of the positional information of the wafer stages can be performed.

99. 发明申请

WO2010134623A1 CLEANING METHOD, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：清洁方法，曝光方法和装置制造方法
公开(公告)号：WO2010134623A1
公开(公告)日：2010-11-25
申请号：PCT/JP2010/058845
申请日：2010-05-19
申请人： NIKON CORPORATION , WATANABE Shunji
发明人： WATANABE Shunji
IPC分类号： G03F7/20 , B08B3/12 , G02B27/00
CPC分类号： G03F7/70925 , G03F7/70341 , G03F7/70916 , G03F7/70975
摘要： A cleaning method includes cleaning a member, used at the time of exposing a substrate via liquid (S2), which is in contact with the liquid. The method includes cleaning the member with an alkali solution (S3) followed by cleaning the member with a solution including hydrogen peroxide (S4).
摘要翻译：清洁方法包括清洗在与液体接触的液体（S2）暴露基板时使用的部件。该方法包括用碱溶液（S3）清洗该构件，然后用含有过氧化氢的溶液（S4）清洗该构件。

100. 发明申请

WO2010104162A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTURING DEVICE 审中-公开
标题翻译：曝光装置，曝光方法和制造装置的方法
公开(公告)号：WO2010104162A1
公开(公告)日：2010-09-16
申请号：PCT/JP2010/054163
申请日：2010-03-05
申请人： NIKON CORPORATION , KIUCHI Tohru , MIZUTANI Hideo
发明人： KIUCHI Tohru , MIZUTANI Hideo
IPC分类号： G03F7/20
CPC分类号： G03F7/70791 , G03F7/70275 , G03F7/70358 , G03F7/70425
摘要： An exposure apparatus of one aspect of the present invention is provided with a moving mechanism (SC) that moves a first portion of a belt-shaped substrate (SH) that has photosensitivity in a first heading (-X direction) along a first direction (X direction) and moves a second portion of the substrate in a second heading (+X direction) along the first direction, a stage mechanism (MS) that holds a mask (M) and moves it in a third heading (+Y direction) along a second direction (Y direction) in synchronization with the movement of the substrate, and a projection optical system (PL). The projection optical system forms a first projection image of the pattern on the first portion so that the third heading on the mask and the first heading on the first portion optically correspond, and forms a second projection image of the pattern on the second portion so that the third heading on the mask and the second heading on the second portion optically correspond.
摘要翻译：本发明的一个方面的曝光装置设置有移动机构（SC），该移动机构使沿着第一方向（-X方向）移动具有第一标题（-X方向）的光敏性的带状基板（SH）的第一部分 X方向）移动并沿着第一方向在第二方位（+ X方向）上移动基板的第二部分，保持掩模（M）并在第三方向（+ Y方向）上移动的阶段机构（MS）沿着与基板的移动同步的第二方向（Y方向）和投影光学系统（PL）。投影光学系统在第一部分上形成图案的第一投影图像，使得掩模上的第三标题和第一部分上的第一标题光学对应，并且在第二部分上形成图案的第二投影图像，使得掩模上的第三个标题和第二部分的第二个标题光学对应。

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