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21. 发明申请

WO2012091162A1 LIQUID IMMERSION MEMBER AND CLEANING METHOD 审中-公开
标题翻译：液体浸泡会员和清洁方法
公开(公告)号：WO2012091162A1
公开(公告)日：2012-07-05
申请号：PCT/JP2011/080580
申请日：2011-12-27
申请人： NIKON CORPORATION , SATO, Shinji
发明人： SATO, Shinji
IPC分类号： G03F7/20
CPC分类号： G03F7/708 , G03F7/70216 , G03F7/70341 , G03F7/70925
摘要： A liquid immersion member (3) comprises: a first liquid immersion member (31), which is disposed at least partly around an optical path (K), that forms a first immersion space (LSI) of a first liquid (LQ) at an emergent surface side (7) of an optical member (8) such that the optical path of exposure light (EL) between the optical member and a substrate (P) is filled with the first liquid; and a second liquid immersion member (32), which is disposed at the outer side of the first liquid immersion member, that forms a second immersion space (LS2) of a second liquid (LQ) partly around the first immersion space and adjacent to a first guide space (A2). A cleaning method comprises: supplying a cleaning liquid (LC) such that it contacts at least part of the first liquid immersion member; and recovering at least some of the cleaning liquid from the first liquid immersion member via an opening (S2) belonging to the second liquid immersion member.
摘要翻译：液浸部件（3）包括：至少部分地围绕光路（K）设置的第一液浸部件（31），其形成第一液体（LQ）的第一浸没空间（LSI）光学构件（8）的出射表面侧（7），使得光学构件和基底（P）之间的曝光光（EL）的光路被第一液体填充; 以及第二液浸部件（32），其设置在所述第一液浸部件的外侧，部分地围绕所述第一浸没空间形成第二液体（LQ）的第二浸没空间（LS2），并且邻近所述第二浸液部件第一引导空间（A2）。一种清洁方法，包括：提供清洗液体，使其与第一液浸部件的至少一部分接触; 以及经由属于所述第二液浸部件的开口（S2）从所述第一液浸部件回收至少一部分所述清洗液。

22. 发明申请

WO2012061163A3 APPARATUS, OPTICAL ASSEMBLY, METHOD FOR INSPECTION OR MEASUREMENT OF AN OBJECT AND METHOD FOR MANUFACTURING A STRUCTURE 审中-公开
公开(公告)号：WO2012061163A3
公开(公告)日：2012-05-10
申请号：PCT/US2011/057758
申请日：2011-10-25
申请人： NIKON CORPORATION , GOODWIN, Eric, Peter , WILLIAMSON, David, Michael , SMITH, Daniel, Gene , PHARAND, Michel , COOPER, Alexander , ROBERTSON, Alec , STAMPER, Brian, L.
发明人： GOODWIN, Eric, Peter , WILLIAMSON, David, Michael , SMITH, Daniel, Gene , PHARAND, Michel , COOPER, Alexander , ROBERTSON, Alec , STAMPER, Brian, L.
IPC分类号： G02F1/33
摘要： An optical assembly for a system for inspecting or measuring of an object is provided that is configured to move as a unit with a system, as the system is pointed at a target, and eliminates the need for a large scanning (pointing) mirror that is moveable relative to other parts of the system. The optical assembly comprises catadioptric optics configured to fold the optical path of the pointing beam and measurement beam that are being directed through the outlet of the system, to compress the size of the optical assembly.

23. 发明申请

WO2012033212A1 MOVABLE BODY APPARATUS, OBJECT PROCESSING DEVICE, EXPOSURE APPARATUS, FLAT-PANEL DISPLAY MANUFACTURING METHOD, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：可移动身体装置，对象处理装置，曝光装置，平板显示制造方法和装置制造方法
公开(公告)号：WO2012033212A1
公开(公告)日：2012-03-15
申请号：PCT/JP2011/070667
申请日：2011-09-05
申请人： NIKON CORPORATION , AOKI, Yasuo
发明人： AOKI, Yasuo
IPC分类号： G03F7/20
CPC分类号： G03F7/709 , G03F7/70716
摘要： By a substrate support member (60) moving in predetermined strokes in a scanning direction on a Y step surface plate (20), a substrate (P) held by the substrate support member (60) moves in the scanning direction in predetermined strokes in a state supported from below by an air floating device (59). Further, because a Y step guide (50) having the air floating device (59) moves in a cross-scan direction along with the substrate holding member (60), the substrate (P) can be moved optionally in the scanning direction, and/or in the cross-scan direction. In doing so, because the Y step surface plate (20) moves in the cross-scan direction with the substrate support member (60) and the Y step guide (50), the substrate support member (60) is constantly supported by the Y step surface plate (20).
摘要翻译：通过在Y台阶（20）上沿扫描方向以预定行程移动的基板支撑构件（60），由基板支撑构件（60）保持的基板（P）在预定的行程中沿扫描方向移动状态由空气浮动装置（59）从下方支撑。此外，由于具有空气浮动装置（59）的Y台阶引导件（50）与基板保持部件（60）一起沿横向扫描方向移动，所以可以在扫描方向上任意地移动基板（P），并且 /或在横扫方向。在这样做的同时，由于Y台阶面板（20）在基板支撑部件（60）和Y台阶引导件（50）的横向扫描方向上移动，基板支撑部件（60）由Y 台阶板（20）。

24. 发明申请

WO2012033211A1 MOVABLE BODY APPARATUS, OBJECT PROCESSING DEVICE, EXPOSURE APPARATUS, FLAT-PANEL DISPLAY MANUFACTURING METHOD, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：可移动身体装置，对象处理装置，曝光装置，平板显示制造方法和装置制造方法
公开(公告)号：WO2012033211A1
公开(公告)日：2012-03-15
申请号：PCT/JP2011/070666
申请日：2011-09-05
申请人： NIKON CORPORATION , AOKI, Yasuo
发明人： AOKI, Yasuo
IPC分类号： G03F7/20 , F16C29/02 , H01L21/67 , H01L21/683
CPC分类号： G03F7/709 , F16C29/008 , F16C29/025 , G03F7/70716
摘要： In a substrate stage device (PST), a substrate (P) is held by a substrate support member (60) mounted on a Y step surface plate (50). The substrate support member (60) moves in the scanning direction in long strokes on the Y step surface plate (50). The part corresponding to an exposure area (IA) of the substrate (P) is held by suction in a non-contact manner from below by a fixed point stage (80), and other parts are supported by levitation by the plurality of air floating devices (70) placed on the Y step surface plate (50). The part corresponding to the exposure area (IA) of the substrate (P) is controlled so that surface position of the substrate (P) is located in the depth of focus of the projection optical system by the fixed point stage (80).
摘要翻译：在衬底载台装置（PST）中，衬底（P）由安装在Y台阶表面板（50）上的衬底支撑构件（60）保持。基板支撑构件（60）在Y台阶面板（50）上以长行程沿扫描方向移动。对应于基板（P）的曝光区域（IA）的部分通过固定点台（80）从下方以非接触的方式由吸力保持，并且其它部分由悬浮的多个空气支撑装置（70）放置在Y台阶面板（50）上。控制与基板（P）的曝光区域（IA）对应的部分，使得基板（P）的表面位置由定点台（80）位于投影光学系统的焦深位置。

25. 发明申请

WO2012011613A2 CLEANING METHOD, CLEANING APPARATUS, DEVICE FABRICATING METHOD, PROGRAM, AND STORAGE MEDIUM 审中-公开
标题翻译：清洁方法，清洁装置，装置制造方法，程序和存储介质
公开(公告)号：WO2012011613A2
公开(公告)日：2012-01-26
申请号：PCT/JP2011/067186
申请日：2011-07-21
申请人： NIKON CORPORATION , TANAKA Ryo , IKEDA Yutaka
发明人： TANAKA Ryo , IKEDA Yutaka
CPC分类号： G03F7/70925 , G03F7/70341 , G03F7/70916 , G03F7/70975
摘要： A liquid immersion member cleaning method used in an immersion exposure apparatus exposes a substrate with exposure light that transits an exposure liquid, wherein the liquid immersion member is disposed at least partly around an optical member and an optical path of the exposure light, which passes through the exposure liquid between the optical member and the substrate. The cleaning method comprises: loading a cleaning tool into the immersion exposure apparatus and disposing the cleaning tool at a position at which it opposes a first recovery port of the liquid immersion member, which is capable of recovering the exposure liquid; and supplying a cleaning liquid to a recovery passageway of the liquid immersion member, wherethrough the exposure liquid from the first recovery port flows. The liquid immersion member has a first discharge port, which is for discharging the exposure liquid from the recovery passageway, and a second discharge port, which is for discharging a gas from the recovery passageway and hinders the discharge of the exposure liquid more than the first discharge port does; and the cleaning liquid is recovered from a recovery part of the cleaning tool via the first recovery port.
摘要翻译：在浸没曝光装置中使用的液浸部件清洗方法，使曝光用曝光液曝光基板，其中，所述浸液部件至少部分地设置在光学部件周围，所述光学部件和曝光光线的光路通过光学构件和基板之间的曝光液体。清洗方法包括：将清洁工具装入浸没曝光装置中，并将清洁工具设置在能够回收曝光液体的与液浸部件的第一回收口相对的位置处; 并且将清洗液供给到液浸部件的回收通道，通过来自第一回收口的曝光液体流过。液浸部件具有用于从回收通道排出曝光液体的第一排出口和用于从回收通道排出气体并阻止曝光液体排出的第二排出口比第一排出口多排放口; 并且清洁液体经由第一回收口从清洁工具的回收部分回收。

26. 发明申请

WO2011122354A2 EXPOSURE APPARATUS, EXCHANGE METHOD OF OBJECT, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光装置，物体交换方法，曝光方法及装置制造方法
公开(公告)号：WO2011122354A2
公开(公告)日：2011-10-06
申请号：PCT/JP2011/056318
申请日：2011-03-10
申请人： NIKON CORPORATION , AOKI, Yasuo
发明人： AOKI, Yasuo
IPC分类号： G03F7/20
CPC分类号： G03F7/7075 , B65G49/064 , G03F7/70791 , H01L21/67748
摘要： A first carrier unit (50a) carries out a substrate tray (90a) that supports a substrate (Pa) from below from a substrate holder (22) by sliding the substrate tray in one axis direction (Y-axis direction) parallel to the substrate surface. Meanwhile, a second carrier unit (50b) carries in a substrate tray (90b) that supports a substrate (Pb) from below onto the substrate holder (22) by sliding the substrate tray in the Y-axis direction, in parallel with the carry-out operation of the substrate (Pa) (in a state where a part of the substrate tray (90a) that supports the substrate (Pa) is located on the substrate holder (22)). Consequently, exchange of the substrate on the substrate holder can speedily be performed.
摘要翻译：第一运送单元（50a）通过在一个轴向（Y）上滑动基板托盘而从基板保持件（22）从下方执行支撑基板（Pa）的基板托盘（90a）轴方向）平行于基板表面。另一方面，第二运送部（50b）通过使基板托盘在Y轴方向上滑动，与基板托架（22）并行地载置从下方支撑基板（Pb）的基板托盘（90b）（Pa）（在支撑基板（Pa）的基板托盘（90a）的一部分位于基板支架（22）上的状态下）的操作。因此，可以快速地进行衬底支架上衬底的交换。

27. 发明申请

WO2011119178A1 TONE MAPPING WITH ADAPTIVE SLOPE FOR IMAGE SHARPENING 审中-公开
标题翻译：使用自适应斜率进行图像缩放的色调映射
公开(公告)号：WO2011119178A1
公开(公告)日：2011-09-29
申请号：PCT/US2010/043501
申请日：2010-07-28
申请人： NIKON CORPORATION , TEZAUR, Radka
发明人： TEZAUR, Radka
IPC分类号： G06K9/40
CPC分类号： G06T5/008 , G06T5/003 , G06T2207/20012 , G06T2207/20021
摘要： A method for sharpening a captured image (14) includes (i) selecting a pixel (240) in the captured image (14); (ii) selecting a selected high intensity value (302); (iii) selecting a selected low intensity value (302); (iv) normalizing the intensity value to establish a normalized intensity value using the selected high intensity value and the selected low intensity value (304); (v) determining an adjusted normalized intensity value for the normalized intensity value using a contrast correction function (306); and (vi) scaling the adjusted normalized intensity value to get a transformed intensity value (308). Subsequently, the adjusted image (16) can be generated using the transformed intensity value for each pixel (240). The contrast correction function can be selected that provides the desired amount of sharpening. Thus, the amount of sharpening that is applied to the image (14) can be specifically selected.
摘要翻译：用于锐化拍摄图像（14）的方法包括（i）选择所捕获图像（14）中的像素（240）; （ii）选择所选择的高强度值（302）; （iii）选择所选择的低强度值（302）; （iv）使用所选择的高强度值和所选择的低强度值对强度值进行归一化以建立归一化强度值（304）; （v）使用对比度校正函数确定所述归一化强度值的经调整的归一化强度值（306）; 和（vi）缩放所调整的归一化强度值以获得变换强度值（308）。随后，可以使用每个像素（240）的变换强度值来生成调整后的图像（16）。可以选择提供所需量的锐化的对比度校正功能。因此，可以具体地选择施加到图像（14）的锐化量。

28. 发明申请

WO2011083751A1 HYBRID ELECTROSTATIC CHUCK 审中-公开
标题翻译：混合静电卡盘
公开(公告)号：WO2011083751A1
公开(公告)日：2011-07-14
申请号：PCT/JP2010/073898
申请日：2010-12-28
申请人： NIKON CORPORATION , SOGARD Micheal
发明人： SOGARD Micheal
IPC分类号： H01L21/683
CPC分类号： H01L21/6831 , G03F7/70708 , H01L21/6833
摘要： An electrostatic chuck (230) for holding a device (200) includes a chuck body (244), a Coulomb electrode assembly (246), a Johnsen-Rahbek (J-R) electrode assembly (248), and a control system (224). The chuck body (244) includes a chucking surface (250) that engages the device (200), and the chuck body (244) is made of a dielectric having a relatively high resistance. The J-R electrode assembly (248) is positioned spaced apart from the chucking surface (250). The Coulomb electrode assembly (246) is also positioned spaced apart from the chucking surface (250). The control system (224) selectively directs a first voltage to the J-R electrode assembly (248) to generate a J-R type force that attracts the device (200) towards the chucking surface (250), and selectively directs a second voltage to the Coulomb electrode assembly (246) to generate a Coulomb type force that also attracts the device (200) towards the chucking surface (250). With this design, both the J-R type force and the Coulomb type force are used to concurrently attract the device (200) against the chucking surface (2500. As a result thereof, the electrostatic chuck (230) is better able to reduce non-flatness of the device (200), and/or crush any particles positioned between the device (200) and the chucking surface (250).
摘要翻译：用于保持装置（200）的静电卡盘（230）包括卡盘主体（244），库仑电极组件（246），约翰 - 拉贝克（J-R）电极组件（248）和控制系统（224））。卡盘主体（244）包括与装置（200）接合的卡盘表面（250），卡盘主体（244）由具有较高阻力的电介质制成。 J-R电极组件（248）定位成与夹紧表面（250）间隔开。库仑电极组件（246）也位于与夹紧表面（250）间隔开的位置。所述控制系统（224）选择性地将第一电压引导到所述JR电极组件（248）以产生将所述装置（200）吸引到所述夹紧表面（250）的JR型力，并且选择性地将第二电压引导到所述库仑电极组件（246）以产生也吸引装置（200）朝向夹紧表面（250）的库仑型力。通过这种设计，JR型力和库仑型力均被用于同时将装置（200）吸引在卡盘表面（2500）上。因此，静电卡盘（230）能够更好地降低非平坦度的装置（200），和/或压碎位于装置（200）和夹紧表面（250）之间的任何颗粒。

29. 发明申请

WO2011068249A2 EXPOSURE APPARATUS, LIQUID IMMERSION MEMBER, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光装置，液体浸渍部件和装置制造方法
公开(公告)号：WO2011068249A2
公开(公告)日：2011-06-09
申请号：PCT/JP2010/072063
申请日：2010-12-02
申请人： NIKON CORPORATION , SHIBAZAKI, Yuichi
发明人： SHIBAZAKI, Yuichi
IPC分类号： G03F7/20
CPC分类号： G03F7/70925 , G03F7/70341 , G03F7/70858
摘要： Liquid (Lq) is held between a tip lens (42) of a projection optical system and a wafer (W) on a wafer stage, using a nozzle member (32) which has a shape enclosing an optical path of an illumination light (IL), and a bottom surface to which the wafer is placed facing via a predetermined clearance that has an annular recess section (32n, 32h) formed having multiple projecting sections (32b 1 , 32b 2 , 32d). This prevents adhesion of contamination and liquid from remaining that become factors of defects of a pattern formed on the wafer. The nozzle member preferably has an annular shaped inclined surface(32c) whose gap with the wafer surface becomes smaller from the inner side to the outer side, formed on an inner bottom surface facing the wafer of an outer recess section (32h) formed on the bottom surface of the nozzle member.
摘要翻译：液体（Lq）使用喷嘴构件（32）保持在投影光学系统的顶端透镜（42）和晶片台上的晶片（W）之间，所述喷嘴构件具有包围照明光（IL）的光路以及晶片所经过的预定间隙所面对的底面，所述预定间隙具有形成为具有多个突出部（32b，1 / sub）的环形凹部（32n，32h） 32b 2，32d）。这防止了污染和液体残留的附着，这成为晶片上形成的图案的缺陷的因素。喷嘴构件优选具有环形形状的倾斜表面（32c），其与晶片表面的间隙从内侧向外侧变小，形成在形成在外侧凹槽部分（32h）的与晶片相对的内底表面上喷嘴部件的底面。

30. 发明申请

WO2011065589A2 SUBSTRATE CARRIER DEVICE, SUBSTRATE CARRYING METHOD, SUBSTRATE SUPPORTING MEMBER, SUBSTRATE HOLDING DEVICE, EXPOSURE APPARATUS, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：基板载体装置，基板承载方法，基板支撑构件，基板保持装置，曝光装置，曝光方法和装置制造方法
公开(公告)号：WO2011065589A2
公开(公告)日：2011-06-03
申请号：PCT/JP2010/071762
申请日：2010-11-29
申请人： NIKON CORPORATION , AOKI, Yasuo , SEKI, Tadashi , YANAGAWA, Takuya
发明人： AOKI, Yasuo , SEKI, Tadashi , YANAGAWA, Takuya
IPC分类号： H01L21/677 , G03F7/20 , B65G49/06
CPC分类号： G03F7/70733 , B65G49/064 , B65G2249/045 , H01L21/67706 , H01L21/67715 , H01L21/67748
摘要： A substrate carry-out device (70) carries out an exposed substrate (P) mounted on a substrate stage (20) from a substrate holder (50) by moving the substrate (P) in one axis direction (X-axis direction) parallel to a horizontal plane in a state where the substrate (P) is mounted on a substrate tray (90) housed in the substrate holder (50). Meanwhile, a substrate carry-in device (80) makes an unexposed substrate (P) to be carried into the substrate stage (20) wait at a substrate exchange position in a state where the unexposed substrate (P) is mounted on another substrate tray (90), and after the exposed substrate (P) is carried out from the substrate stage (20), lowers the another substrate tray (90), thereby mounting the unexposed substrate (P) onto the substrate holder (50).
摘要翻译：基板搬送装置（70）通过使基板（P）沿一个轴方向（X轴方向）平行地移动而从基板保持架（50）安装在基板台（20）上的露出基板（P）在基板（P）被安装在容纳在基板保持件（50）中的基板托盘（90）的状态下的水平面。同时，衬底搬运装置（80）使得未曝光的衬底（P）被运送到衬底台（20）中，在未曝光衬底（P）安装在另一个衬底托盘上的状态下等待衬底更换位置（90），并且在从基板台（20）进行曝光的基板（P）之后，降低另一个基板托盘（90），从而将未曝光的基板（P）安装到基板保持件（50）上。

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