会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 8. 发明申请
    • Methods of fabricating image sensors and image sensors fabricated thereby
    • 制造图像传感器和图像传感器的方法
    • US20110163362A1
    • 2011-07-07
    • US13064176
    • 2011-03-09
    • Won-je ParkChan ParkYoung-hoon ParkJae-ho SongJong-wook HongKeo-sung Park
    • Won-je ParkChan ParkYoung-hoon ParkJae-ho SongJong-wook HongKeo-sung Park
    • H01L31/14
    • H01L27/14643H01L27/14603H01L27/14609H01L27/14641H01L27/14689
    • A method of fabricating an image sensor may include providing a substrate including light-receiving and non-light-receiving regions; forming a plurality of gates on the non-light-receiving region; ion-implanting a first-conductivity-type dopant into the light-receiving region to form a first dopant region of a pinned photodiode; primarily ion-implanting a second-conductivity-type dopant, different from the first-conductivity-type dopant, into an entire surface of the substrate, using the gates as a first mask; forming spacers on both side walls of the gates; and secondarily ion-implanting the second-conductivity-type dopant into the entire surface of the substrate, using the plurality of gates including the spacers as a second mask, to complete a second dopant region of the pinned photodiode. An image sensor may include the substrate; a transfer gate formed on the non-light-receiving region; a first dopant region in the light-receiving region; and a second dopant region formed on a surface of the light-receiving region.
    • 制造图像传感器的方法可以包括提供包括光接收和非光接收区域的基板; 在非光接收区域上形成多个栅极; 将第一导电型掺杂剂离子注入到光接收区域中以形成钉扎光电二极管的第一掺杂区域; 主要使用栅极作为第一掩模,将与第一导电类型掺杂剂不同的第二导电型掺杂剂离子注入基板的整个表面; 在门的两个侧壁上形成间隔物; 并且其次使用包括间隔物的多个栅极作为第二掩模将第二导电型掺杂剂离子注入到基板的整个表面中,以完成被钉扎的光电二极管的第二掺杂区域。 图像传感器可以包括基板; 形成在非光接收区域上的传输门; 在所述光接收区域中的第一掺杂剂区域; 以及形成在光接收区域的表面上的第二掺杂剂区域。
    • 9. 发明申请
    • METHODS OF FABRICATING AN IMAGE SENSOR
    • 制作图像传感器的方法
    • US20070054434A1
    • 2007-03-08
    • US11464244
    • 2006-08-14
    • Won-Je ParkJae-Ho SongYoung-Hoon Park
    • Won-Je ParkJae-Ho SongYoung-Hoon Park
    • H01L21/00
    • H01L27/14683H01L27/14603H01L27/14643
    • Provided are methods of fabricating an image sensor. Embodiments of such methods can include forming a first gate insulation layer in a first region of a semiconductor substrate and a first gate electrode layer, to cover the first gate insulation layer and forming a second gate insulation layer within a nitrogen enhanced atmosphere and a second gate electrode layer in a second region of the semiconductor substrate. The methods also include patterning the first gate electrode layer and the first gate insulation layer of the first region to form a first gate pattern and patterning the second gate electrode layer and the second gate insulation layer of the second region to form a second gate pattern.
    • 提供制造图像传感器的方法。 这种方法的实施例可以包括在半导体衬底的第一区域和第一栅极电极层中形成第一栅极绝缘层,以覆盖第一栅极绝缘层并在氮气增强气氛中形成第二栅极绝缘层和第二栅极 在半导体衬底的第二区域中的电极层。 所述方法还包括图案化第一区域的第一栅极电极层和第一栅极绝缘层以形成第一栅极图案,并且使第二栅极电极层和第二栅极绝缘层图案化以形成第二栅极图案。