会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 8. 发明申请
    • IC CHIP UNIFORM DELAYERING METHODS
    • IC芯片均匀延迟方法
    • US20080233751A1
    • 2008-09-25
    • US11690432
    • 2007-03-23
    • Keith E. BartonThomas A. BauerStanley J. KlepeisJohn A. MillerYun-Yu Wang
    • Keith E. BartonThomas A. BauerStanley J. KlepeisJohn A. MillerYun-Yu Wang
    • H01L21/461
    • G01N1/32H01L22/24
    • Methods of uniformly delayering an IC chip are disclosed. One embodiment includes: performing an ash on the wafer including an Al layer thereof and etching the Al layer; polishing an edge of the wafer using a slurry including an approximately 30 μm polishing particles; removing the aluminum layer and at least one metal layer by polishing using a slurry including approximately 9 μm diamond polishing particles and a non-abrasive backside of a polishing sheet; removing any remaining metal layers to a first metal layer by polishing using a slurry including approximately 3 μm diamond polishing particles and the non-abrasive backside of a polishing sheet; removing any scratches by polishing using a slurry including approximately 1 μm diamond polishing particles and the non-abrasive backside of a polishing sheet; and removing the first metal layer to a polyconductor layer by polishing using a colloidal slurry including approximately 0.25 μm diamond polishing particles.
    • 公开了均匀地延迟IC芯片的方法。 一个实施例包括:在包括其Al层的晶片上执行灰分并蚀刻Al层; 使用包含约30μm的抛光颗粒的浆料抛光晶片的边缘; 通过使用包含大约9μm的金刚石抛光颗粒和抛光片的非研磨背面的浆料进行抛光来去除铝层和至少一个金属层; 通过使用包含大约3μm的金刚石抛光颗粒和抛光片的非研磨背面的浆料进行抛光,将任何剩余的金属层除去到第一金属层; 通过使用包括大约1毫米金刚石抛光颗粒和抛光片的非研磨背面的浆料进行抛光来除去任何划痕; 并且通过使用包含大约0.25μm金刚石抛光颗粒的胶体浆料进行抛光将第一金属层去除到多导体层。