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    • 12. 发明申请
    • CURABLE RESIN COMPOSITION FOR ANTI-GLARE LAYER, AND ANTI-GLARE FILM
    • 防腐层的可固化树脂组合物和防透膜
    • US20100112296A1
    • 2010-05-06
    • US12532680
    • 2008-03-25
    • Toshio YoshiharaAkinobu UshiyamaAi Shinkai
    • Toshio YoshiharaAkinobu UshiyamaAi Shinkai
    • C08K3/36B32B3/26
    • G02B1/10G02B5/0221G02B5/0242G02B5/0278Y10T428/24479Y10T428/24612Y10T428/25
    • An anti-glare film having the following: an anti-glare layer which is provided on a transparent substrate film, has a concavo-convex shape on the outermost surface thereof, and has at least a concavo-convex layer formed by curing a curable resin composition, which composition has optically-transparent fine particles A that have an average particle diameter of 1 μm or more and 10 μm or less, reactive inorganic fine particles B that have an average particle diameter of 30 nm or more and 100 nm or less and reactive functional groups b on the surface thereof, and a binder component C that has reactive functional groups c; a skin layer which has a small number of the reactive inorganic fine particles B in an interface on the side opposite to the transparent substrate film side and in the vicinity of the interface; and a region which is situated nearer the transparent substrate film than the skin layer, in which the fine particles B are uniformly dispersed.
    • 具有以下的防眩光膜:设置在透明基材膜上的防眩光层在其最外表面具有凹凸形状,并且至少具有通过固化可固化树脂形成的凹凸层 该组合物具有平均粒径为1μm以上且10μm以下的光学透明性微粒A,平均粒径为30nm以上且100nm以下的活性无机微粒B,以及 其表面上具有反应性官能团b和具有反应性官能团c的粘合剂组分C; 在与透明基板膜侧相反一侧并且在界面附近的界面中具有少量反应性无机微粒B的表皮层; 以及位于比透明基材膜更靠近微细颗粒B均匀分散的表皮层的区域。
    • 13. 发明授权
    • Photocurable resin composition, finely embossed pattern-forming sheet, finely embossed transfer sheet, optical article, stamper and method of forming finely embossed pattern
    • 光固化树脂组合物,精细压花图案形成片,精细压花转印片,光学制品,压模和形成精细压花图案的方法
    • US07420005B2
    • 2008-09-02
    • US10178189
    • 2002-06-24
    • Mikiko HojoToshio Yoshihara
    • Mikiko HojoToshio Yoshihara
    • C08F2/46C08K3/00C08K3/18C08F2/50
    • B29C59/046B29C67/246B29C2035/0827B29C2035/0877B29C2059/023B29D17/005B29K2105/16B29L2031/7224Y10T428/25
    • The photocurable resin composition in the first aspect of the invention comprises, as essential components, (A) a binder resin having photopolymerizable functional groups and (B) inorganic superfine particles in the order of sub-micron which can be dispersed in a colloidal form; the photocurable resin composition in the second aspect comprises, as essential components, (C) a binder resin containing photopolymerizable functional groups and (D) hydrophobic fine silica particles; and the photocurable resin composition in the third aspect comprises, as essential components, (E) a binder resin containing acrylic resin and urethane acrylate resin and/or polyester acrylate having photopolymerizable functional groups and (F) an organometallic coupling agent. These photocurable resin compositions are excellent not only in fitting to the shape of a cavity in a stamper complementary to a finely embossed pattern on an optical article, thus enabling rapidly and accurately shaping a finely embossed pattern, but also in form retention after shaping and resistance to blocking, thus enabling exposure to light after removal of the stamper and storage in a rolled form to achieve excellent successive producibility.
    • 本发明第一方面的光固化性树脂组合物含有作为必要成分的(A)具有光聚合性官能团的粘合剂树脂和(B)亚微米级的无机超微粒子,其可以以胶体形式分散; 第二方面的光固化性树脂组合物含有作为必要成分的(C)含有光聚合性官能团的粘合剂树脂和(D)疏水性二氧化硅微粒; 第三方面的光固化性树脂组合物含有作为必要成分的(E)含有丙烯酸树脂和氨基甲酸酯丙烯酸酯树脂的粘合剂树脂和/或具有光聚合性官能团的聚酯丙烯酸酯和(F)有机金属偶合剂。 这些光固化性树脂组合物不仅适用于与光学制品上的精细压花图案互补的印模中的空腔的形状,从而能够快速且精确地成形精细压花图案,而且在成型和电阻之后还具有形状保持性 从而能够在去除压模之后暴露于光,并以轧制形式存储以实现优异的连续可制造性。
    • 20. 发明授权
    • Thin-film dielectric and process for its production
    • 薄膜电介质及其生产工艺
    • US4636908A
    • 1987-01-13
    • US662295
    • 1984-10-01
    • Toshio YoshiharaIchiro Kikuchi
    • Toshio YoshiharaIchiro Kikuchi
    • H01G4/12H01L41/187H01G4/10C04B35/46
    • H01L41/187H01G4/1236H01G4/1263
    • A thin-film dielectric comprising a conductive substrate having formed thereon a thin layer of lead titanate (PT), lead titanate zirconate (PZT), third components type lead titanate zirconate prepared by adding an ingredient represented by the formula Pb(M'.sub.1/3 M".sub.2/3)O.sub.3 (wherein M' represents a divalent transition metal, and M" represents Ta or Nb), as a third component to lead titanate zirconate (PZT) to form a solid solution, or lanthanum-containing lead titanate zirconate (PLZT). The total film thickness of the dielectric composition is 0.1 to 100 .mu.m.The thin-film dielectric is produced by coating the substrate with an organic solvent solution of .beta.-diketone or the like as a precursor for said dielectric in a uniform thickness, prebaking at a temperature higher than the decomposition temperature of the organic component contained in the coating thin-film of precursor and lower than the crystallization temperature of the dielectric in an oxygen-containing stream, repeating the coating-prebaking procedure, and then fully baking at a temperature higher than the crystallization temperature of the dielectric composition; or repeating the coating with the precursor solution and the full baking procedure.
    • PCT No.PCT / JP84 / 00027 Sec。 371日期1984年10月1日 102(e)日期1984年10月1日PCT提交1984年1月31日PCT公布。 出版物WO84 / 03003 日本1984年8月2日。一种薄膜电介质,包括其上形成有钛酸铅(PT)的薄层,锆钛酸铅(PZT),第三组分型钛酸铅锆酸盐的导电基材,其通过将由 作为用于形成固体的钛酸锆酸盐(PZT)的第三成分,通式Pb(M'1 / 3M'2 / 3)O3(其中M'表示二价过渡金属,M“表示Ta或Nb) 溶液或含镧钛酸铅锆酸盐(PLZT)。 电介质组合物的总膜厚为0.1〜100μm。 该薄膜电介质是通过用β-二酮等的有机溶剂溶液作为均匀厚度的所述电介质的前体涂布基板来制备的,在高于所述电介质中所含有机组分的分解温度的温度下预烘烤 在含氧流中涂覆前体的薄膜并低于电介质的结晶温度,重复涂布预烘烤程序,然后在高于电介质组合物的结晶温度的温度下完全烘烤; 或者用前体溶液重复涂覆和完全烘烤过程。