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31. 发明申请

US20140225317A1 METHOD FOR MANUFACTURING FERROELECTRIC FILM 审中-公开
标题翻译：制造薄膜的方法
公开(公告)号：US20140225317A1
公开(公告)日：2014-08-14
申请号：US14235207
申请日：2011-07-29
申请人： Takeshi Kijima , Yuuji Honda
发明人： Takeshi Kijima , Yuuji Honda
IPC分类号： B29C39/00
CPC分类号： B29C39/003 , C01G33/006 , C01P2002/34 , C01P2002/72 , C01P2004/03 , H01L21/02197 , H01L21/02282 , H01L41/1873 , H01L41/318 , H01L41/331
摘要： To provide a method for manufacturing a ferroelectric film formed of a lead-free material. The method for manufacturing a ferroelectric film according to an aspect of the present invention is a method for manufacturing a ferroelectric film including the steps of pouring a sol-gel solution for forming (K1-XNaX)NbO3 into a mold 3, calcining the sol-gel solution to form a (K1-XNaX)NbO3 material film inside the mold 3, heat-treating and crystallizing the (K1-XNaX)NbO3 material film in an oxygen atmosphere to form a (K1-XNaX)NbO3 crystallized film inside the mold 3 and removing the mold 3 through etching, and is characterized in that the mold 3 is more easily etched than the (K1-XNaX)NbO3 crystallized film and the X satisfies a formula below 0.3≦X≦0.7.
摘要翻译：提供一种制造由无铅材料形成的铁电体膜的方法。根据本发明的一个方面的铁电体膜的制造方法是一种强电介质膜的制造方法，其特征在于，包括以下步骤：将用于形成（K1-XNaX）NbO3的溶胶 - 凝胶溶液倒入模具3中，凝胶溶液在模具3内形成（K1-XNaX）NbO3材料膜，在氧气氛中热处理和结晶（K1-XNaX）NbO3材料膜，以在模具内形成（K1-XNaX）NbO3结晶膜并且通过蚀刻去除模具3，其特征在于，模具3比（K1-XNaX）NbO 3结晶膜更容易蚀刻，并且X满足低于0.3＆lt; NlE; X＆lt; lE; 0.7的公式。

32. 发明授权

US08186807B2 Actuator, method for manufacturing actuator, droplet ejection device, droplet ejection head and printer 有权
标题翻译：致动器，制造执行器的方法，液滴喷射装置，液滴喷射头和打印机
公开(公告)号：US08186807B2
公开(公告)日：2012-05-29
申请号：US12393126
申请日：2009-02-26
申请人： Takeshi Kijima , Minoru Usui
发明人： Takeshi Kijima , Minoru Usui
IPC分类号： B41J2/14
CPC分类号： B41J2/14 , B41J2/04 , B41J2002/041 , B41J2202/11
摘要： A droplet ejection device includes a pressure chamber that includes a cavity surrounded by a side wall and a bottom wall, a deformable substrate that is provided above the pressure chamber to cover the cavity and that is parallel to the bottom wall, a magnetic body having an opening that is provided above the deformable substrate and that is fixed to the deformable substrate, and a coil that is disposed above the deformable substrate, that surrounds the magnetic body, and that is fixed to a fixing portion provided above the side wall.
摘要翻译：液滴喷射装置包括压力室，该压力室包括被侧壁和底壁包围的空腔，设置在压力室上方以覆盖空腔并且平行于底壁的可变形基板，具有开口，其设置在可变形基板的上方并且固定到可变形基板上;线圈，其设置在可变形基板的上方，围绕磁体，并且固定到设置在侧壁上方的固定部。

33. 发明申请

US20120103675A1 LAMINATED ELECTRONIC DEVICES AND METHOD OF MANUFACTURING SAME 有权
标题翻译：层压电子器件及其制造方法
公开(公告)号：US20120103675A1
公开(公告)日：2012-05-03
申请号：US13280734
申请日：2011-10-25
申请人： Kazunari KIMURA , Junichi NAKAMURA , Takeshi KIJIMA , Isao ABE , Takahiro SUZUKI , Toshiaki ARAKI
发明人： Kazunari KIMURA , Junichi NAKAMURA , Takeshi KIJIMA , Isao ABE , Takahiro SUZUKI , Toshiaki ARAKI
IPC分类号： H05K1/11 , H05K3/42 , H05K1/16
CPC分类号： H05K3/4061 , H01P1/20345 , H05K3/4629 , Y10T29/49165
摘要： A laminated electronic device comprises two or more wiring layers including a first wiring layer and a second wiring layer, an insulating layer interposed between the first wiring layer and second wiring layer, and a through conductor extending through the insulating layer for electrically connecting a first conductor disposed on the first wiring layer to a second conductor disposed on the second wiring layer. The through conductor includes divergent sections at both ends, which have a diameter gradually increased toward the first conductor or second conductor.
摘要翻译：层叠电子器件包括两个或更多个布线层，包括第一布线层和第二布线层，插入在第一布线层和第二布线层之间的绝缘层，以及穿过绝缘层的贯通导体，用于将第一布线布置在第一布线层上的布置在第二布线层上的第二导体。贯通导体包括两端的发散部分，其具有朝向第一导体或第二导体逐渐增加的直径。

34. 发明授权

US07914130B2 Droplet ejection device and printer 有权
标题翻译：液滴喷射装置和打印机
公开(公告)号：US07914130B2
公开(公告)日：2011-03-29
申请号：US12398351
申请日：2009-03-05
申请人： Takeshi Kijima , Shoichi Iino
发明人： Takeshi Kijima , Shoichi Iino
IPC分类号： B41J2/045
CPC分类号： B41J2/14274 , B41J2202/11
摘要： A droplet ejection device includes: a substrate having first, second, third & fourth pressure chambers extending in a first direction; a nozzle plate below the substrate & having first, second, third & fourth nozzle apertures continuous with first, second, third & forth pressure chambers, respectively; a vibration plate above the substrate; first, second, third & fourth piezoelectric elements above the vibration plate & above first, second, third & fourth pressure chambers. wherein, viewed in a second direction orthogonal to the first direction, the first nozzle aperture positioned to overlap the third nozzle aperture & doesn't overlap the second & fourth nozzle apertures; the second nozzle aperture overlaps the fourth nozzle aperture & doesn't overlap the first & third nozzle apertures, viewed in the second direction; the first piezoelectric element positioned to overlap the third piezoelectric element & doesn't overlap the second & fourth piezoelectric elements, viewed in the second direction; & the second piezoelectric element overlaps the fourth piezoelectric element & doesn't overlap the first & third piezoelectric elements.
摘要翻译：液滴喷射装置包括：具有沿第一方向延伸的第一，第二，第三和第四压力室的基板; 位于基底下方的喷嘴板，分别具有与第一，第二，第三和第四压力室连续的第一，第二，第三和第四喷嘴孔口; 基板上方的振动板; 振动板上方的第一，第二，第三和第四压电元件以及第一，第二，第三和第四压力室之上。其中，从与所述第一方向正交的第二方向观察，所述第一喷嘴孔定位成与所述第三喷嘴孔重叠，并且不与所述第二和第四喷嘴孔重叠; 第二喷嘴孔与第四喷嘴孔重叠，并且在第二方向上不与第一和第三喷嘴孔重叠; 第一压电元件定位成与第三压电元件重叠，并且在第二方向上不与第二和第四压电元件重叠; 并且第二压电元件与第四压电元件重叠，并且不与第一和第三压电元件重叠。

35. 发明授权

US07847372B2 Ferroelectric capacitor, method of manufacturing ferroelectric capacitor, and ferroelectric memory 有权
标题翻译：铁电电容器，铁电电容器的制造方法和铁电存储器
公开(公告)号：US07847372B2
公开(公告)日：2010-12-07
申请号：US11805890
申请日：2007-05-24
申请人： Takeshi Kijima
发明人： Takeshi Kijima
IPC分类号： H01L29/00
CPC分类号： H01L28/65 , H01L27/11502 , H01L28/56
摘要： A ferroelectric capacitor including: a substrate; a first electrode formed above the substrate; a first ferroelectric layer formed above the first electrode and including a complex oxide shown by Pb(Zr,Ti)O3; a second ferroelectric layer formed above the first ferroelectric layer and including a complex oxide shown by Pb(Zr,Ti)1-xNbxO3; and a second electrode formed above the second ferroelectric layer.
摘要翻译： 1.一种铁电电容器，包括：基板; 形成在所述衬底上的第一电极; 形成在第一电极上方并包含由Pb（Zr，Ti）O 3表示的复合氧化物的第一铁电层; 形成在第一铁电体层上方的第二铁电体层，并且包含由Pb（Zr，Ti）1-xNbxO 3表示的复合氧化物; 以及形成在第二铁电层上方的第二电极。

36. 发明授权

US07710004B2 Insulating target material, method of manufacturing insulating target material, conductive complex oxide film, and device 有权
标题翻译：绝缘靶材料，绝缘靶材料的制造方法，导电性复合氧化膜及其装置
公开(公告)号：US07710004B2
公开(公告)日：2010-05-04
申请号：US12400859
申请日：2009-03-10
申请人： Koji Ohashi , Setsuya Iwashita , Takeshi Kijima , Yasuaki Hamada
发明人： Koji Ohashi , Setsuya Iwashita , Takeshi Kijima , Yasuaki Hamada
IPC分类号： H01L41/04 , H01L41/047
CPC分类号： C23C14/3414 , B41J2/161 , B41J2/1646 , C23C14/088 , H01L21/31691 , H01L27/105 , H01L27/11502 , H01L27/11507 , H01L28/55 , H01L41/0478 , H01L41/0973 , H01L41/29 , H01L2224/45144 , H01L2224/48091 , H01L2924/13091 , H01L2924/16195 , H01L2924/19107 , H01L2924/00014 , H01L2924/00
摘要： An insulating target material for obtaining a conductive complex oxide film represented by a general formula ABO3, the insulating target material including an oxide of an element A, an oxide of an element B, and at least one of an Si compound and a Ge compound.
摘要翻译：一种用于获得由通式ABO3表示的导电复合氧化物膜的绝缘靶材料，包括元素A的氧化物，元素B的氧化物，以及Si化合物和Ge化合物中的至少一种的绝缘靶材料。

37. 发明授权

US07678241B2 Film forming apparatus, substrate for forming oxide thin film and production method thereof 有权
标题翻译：成膜装置，用于形成氧化物薄膜的基板及其制造方法
公开(公告)号：US07678241B2
公开(公告)日：2010-03-16
申请号：US11071116
申请日：2005-03-04
申请人： Takeshi Kijima , Eiji Natori , Mitsuhiro Suzuki
发明人： Takeshi Kijima , Eiji Natori , Mitsuhiro Suzuki
IPC分类号： C23C14/34
CPC分类号： C23C14/568 , C23C14/505
摘要： The invention provides a film forming apparatus that is capable of forming films sequentially with two types of film forming mechanisms in the same chamber. The film forming apparatus according to the present invention includes a Pt target disposed at one side within a film forming chamber, a sputtering output mechanism to supply to the Pt target, a Pt vapor deposition source disposed at an other side within the film forming chamber, a vapor deposition output mechanism to supply to the Pt vapor deposition source, a substrate holder disposed between the Pt target and the Pt vapor deposition source within the film forming chamber to mount a substrate, a rotating mechanism to move the substrate holder so that the substrate directs to the Pt target or to the Pt vapor deposition source, a heating mechanism to heat the substrate when the substrate is subjected to a sputtering film forming, and a cooling mechanism to cool the substrate when the substrate is subjected to vapor deposition film forming.
摘要翻译：本发明提供一种成膜装置，其能够在相同的室中依次用两种成膜机构形成膜。根据本发明的成膜装置包括设置在成膜室内的一侧的Pt靶，向Pt靶供给的溅射输出机构，设置在成膜室内的另一侧的Pt蒸镀源，蒸镀输出机构，供给Pt蒸镀源，设置在成膜室内的Pt靶和Pt蒸镀源之间的基板保持架，安装基板;旋转机构，使基板保持架移动，使基板指向Pt靶或Pt气相沉积源，当衬底经受溅射膜形成时加热衬底的加热机构，以及当衬底经历气相沉积膜形成时冷却衬底的冷却机构。

38. 发明申请

US20100013894A1 PIEZOELECTRIC LAMINATE, SURFACE ACOUSTIC WAVE DEVICE, THIN-FILM PIEZOELECTRIC RESONATOR, AND PIEZOELECTRIC ACTUATOR 审中-公开
标题翻译：压电层压板，表面声波装置，薄膜压电谐振器和压电致动器
公开(公告)号：US20100013894A1
公开(公告)日：2010-01-21
申请号：US12556232
申请日：2009-09-09
申请人： Mayumi Ueno , Takamitsu Higuchi , Takeshi Kijima
发明人： Mayumi Ueno , Takamitsu Higuchi , Takeshi Kijima
IPC分类号： B41J2/045
CPC分类号： H01L41/18 , B41J2/14201 , H01L41/0815 , H01L41/1873 , H01L41/318 , H03H9/02031 , H03H9/02574
摘要： A piezoelectric laminate including a base and a first piezoelectric layer formed above the base and including potassium sodium niobate. The first piezoelectric layer is shown by a compositional formula (KaNa1-a)xNbO3, “a” and “x” in the compositional formula being respectively 0.1
摘要翻译：一种压电层压板，包括在基底上形成的底部和第一压电层，并包括铌酸钾钠。第一压电层由组成式（KaNa1-a）xNbO3表示，组成式中的“a”和“x”分别为0.1

39. 发明授权

US07622850B2 Piezoelectric device, piezoelectric actuator, piezoelectric pump, inkjet recording head, inkjet printer, surface acoustic wave device, thin-film piezoelectric resonator, frequency filter, oscillator, electronic circuit, and electronic instrument 有权
标题翻译：压电元件，压电致动器，压电泵，喷墨记录头，喷墨打印机，声表面波器件，薄膜压电谐振器，频率滤波器，振荡器，电子电路和电子仪器
公开(公告)号：US07622850B2
公开(公告)日：2009-11-24
申请号：US11304937
申请日：2005-12-15
申请人： Setsuya Iwashita , Takeshi Kijima , Koji Ohashi
发明人： Setsuya Iwashita , Takeshi Kijima , Koji Ohashi
IPC分类号： H01L41/187 , H01L41/047
CPC分类号： H03H9/0542 , B41J2/14233 , H01L27/20 , H01L41/0478 , H01L41/0815 , H01L41/0973 , H03H9/02574 , H03H9/173 , H03H9/174 , H03H9/176
摘要： A piezoelectric device includes: a substrate; a first conductive layer formed over the substrate, the first conductive layer including at least one buffer layer formed of a (001) preferentially oriented lanthanum-based layered perovskite compound; a piezoelectric layer formed over the first conductive layer and including a piezoelectric having a perovskite structure; and a second conductive layer electrically connected with the piezoelectric layer.
摘要翻译：压电装置包括：基板; 形成在所述基板上的第一导电层，所述第一导电层包括由（001）优先取向的镧基层状钙钛矿化合物形成的至少一个缓冲层; 形成在所述第一导电层上并包括具有钙钛矿结构的压电体的压电层; 以及与压电层电连接的第二导电层。

40. 发明授权

US07597813B2 Element substrate and method of manufacturing the same 有权
标题翻译：元件基板及其制造方法
公开(公告)号：US07597813B2
公开(公告)日：2009-10-06
申请号：US11906549
申请日：2007-10-02
申请人： Toshihiko Kaneda , Satoshi Kimura , Hidemichi Furihata , Takeshi Kijima
发明人： Toshihiko Kaneda , Satoshi Kimura , Hidemichi Furihata , Takeshi Kijima
IPC分类号： H01B13/00 , H01L21/302
CPC分类号： H05K3/20 , C23C18/1608 , C23C18/1657 , C23C18/1689 , C23C18/2086 , C23C18/36 , H05K3/107 , H05K2201/09036 , H05K2201/09981 , H05K2203/0108 , H05K2203/0113 , H05K2203/072 , Y10S977/887 , Y10T428/24479 , Y10T428/26
摘要： A method of manufacturing an element substrate including: forming a release layer on a first support substrate; forming a metal layer having a predetermined pattern on the release layer; disposing a second support substrate on the first support substrate so that the metal layer is interposed between the first and second support substrates; pouring a resin material in a fluid state between the first and second support substrates; curing the resin material to form a resin substrate; and removing the metal layer from the first support substrate by decomposing the release layer to transfer the metal layer to the resin substrate.
摘要翻译：一种元件基板的制造方法，包括：在第一支撑基板上形成剥离层; 在剥离层上形成具有预定图案的金属层; 在所述第一支撑基板上设置第二支撑基板，使得所述金属层介于所述第一和第二支撑基板之间; 在第一和第二支撑基板之间浇注处于流体状态的树脂材料; 固化树脂材料以形成树脂基材; 以及通过分解所述剥离层以将所述金属层转移到所述树脂基板，从所述第一支撑基板移除所述金属层。

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