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    • 42. 发明申请
    • Method for detection of carcinoembryonic antigens having a modified sugar chain structure
    • 检测具有修饰的糖链结构的癌胚抗原的方法
    • US20040185512A1
    • 2004-09-23
    • US10767718
    • 2004-01-30
    • WAKO PURE CHEMICAL INDUSTRIES, LTD.
    • Hideaki HosokawaKenji NakamuraShinji Satomura
    • G01N033/574C07K016/30
    • G01N33/57473G01N2400/02
    • The present invention relates to a method for detection of carcinoembryonic antigens (hereinafter abbreviated as CEAs) having a modified sugar chain structure which comprises using an antibody against a constant region of CEAs and a protein capable of recognizing a modified sugar chain structure of CEAs, a method for detecting a cancer which comprises using an amount of CEAs having a modified sugar chain structure and a kit for detection of CEAs having a modified sugar chain structure which comprises an antibody against a constant region of CEAs and a protein capable of recognizing a modified sugar chain structure of CEAs. Said method and kit are useful in a separately measurement of the various CEAs, a detection of a cancer and a definition of the kind of a cancer, and, for example, by using in proper combination of the measurement value of various CEAs obtained by the method of the present invention, it becomes possible to detect the cancer or define the kind of the cancer.
    • 本发明涉及一种检测具有修饰的糖链结构的癌胚抗原(以下简称为CEA)的方法,其包括使用针对恒定区的CEA的抗体和能够识别CEA的修饰的糖链结构的蛋白质, 用于检测癌症的方法,其包括使用一定量的具有修饰的糖链结构的CEA和用于检测具有修饰的糖链结构的CEA的试剂盒,其包含针对恒定区的CEA的抗体和能够识别修饰的糖的蛋白质 CEAs的链结构。 所述方法和试剂盒可用于各种CEA的单独测量,癌症的检测和癌症种类的定义,并且例如通过以下方式适当地组合各种CEAs的测量值: 本发明的方法,可以检测癌症或确定癌症的种类。
    • 46. 发明授权
    • Resist composition and a method for formation of a pattern using the
composition
    • 抗蚀剂组合物和使用该组合物形成图案的方法
    • US6143472A
    • 2000-11-07
    • US195236
    • 1998-11-18
    • Motoshige SuminoAkiko Katsuyama
    • Motoshige SuminoAkiko Katsuyama
    • G03F7/004G03F7/039
    • G03F7/039G03F7/0045
    • This invention relates to a resist composition comprising a polymer containing, as a constituent unit, a monomer unit shown by the general formula [1a] ##STR1## (wherein X is a polycyclic hydrocarbon residue which may have a substituent, Z is a spacer or a direct bond, and R is a substituted alkyl or alkenyl group having one or two protected hydroxyl groups as substituent), a photosensitive compound which can generate an acid upon exposure to light and a solvent which can dissolve the polymer and the photosensitive compound, and a method for formation of a pattern using the said resist composition.The said resist composition shows high sensitivity and high resolution ability in which a polymer having high transmittance against deep-ultraviolet lights having a wavelength of 220 nm or less, particularly ArF excimer laser beams. The said resist composition can remarkably advantageously be used as a resist material for ArF excimer laser beams which has been considered to be a valuable technology for exposure belonging to the coming generation.
    • 本发明涉及一种抗蚀剂组合物,其包含含有由通式[1a]所示的单体单元作为构成单元的聚合物(其中X为可以具有取代基的多环烃残基,Z为间隔基或直接键 R为具有1个或2个被保护的羟基作为取代基的取代的烷基或链烯基),能够在光照下产生酸的光敏化合物和溶解聚合物和感光性化合物的溶剂,以及 使用所述抗蚀剂组合物形成图案。 所述抗蚀剂组合物显示出高灵敏度和高分辨能力,其中对波长为220nm以下的深紫外光具有高透射率的聚合物,特别是ArF准分子激光束。 所述抗蚀剂组合物可以显着有利地用作用于ArF准分子激光束的抗蚀剂材料,其被认为是属于下一代的有意义的曝光技术。