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61. 发明申请

US20160155603A1 Particle-Optical Systems and Arrangements and Particle-Optical Components for such Systems and Arrangements 有权
标题翻译：这种系统和布置的粒子 - 光学系统和布置和粒子 - 光学部件
公开(公告)号：US20160155603A1
公开(公告)日：2016-06-02
申请号：US15016743
申请日：2016-02-05
申请人： Applied Materials Israel Ltd. , Carl Zeiss Microscopy GMBH
发明人： Dirk Zeidler , Thomas KEMEN , Anger Pascal , Antonio Casares , Christof Riedesel
IPC分类号： H01J37/09 , H01J37/21
CPC分类号： H01J37/09 , B82Y10/00 , B82Y40/00 , H01J37/21 , H01J37/28 , H01J37/3177 , H01J2237/0453 , H01J2237/0458 , H01J2237/0492 , H01J2237/1205
摘要： The present invention concerns a charged-particle multi-beamlet system that comprises a source of charged particles (301); a first multi-aperture plate (320) having plural apertures disposed in a charged particle beam path of the system downstream of the source; a first multi-aperture selector plate (313) having plural apertures; a easier (340), wherein the first multi-aperture selector plate is mounted on the carrier; and an actuator (350) configured to move the carrier such that the first multi-aperture selector plate is disposed in the charged particle beam path of the system downstream of the source in a first mode of operation of the system, and such that the first multi-aperture selector plate is disposed outside of the charged particle beam path in a second mode of operation of the system. The source, the first multi-aperture plate and the carrier of the system are arranged such that a first number of charged particle beamlets is generated at a position downstream of both the first multi-aperture plate and the first multi-aperture selector plate in the first mode of operation, and that a second number of charged particle beamlets is generated at the position in the second mode of operation, wherein the first number of beamlets differs from the second number of beamlets.
摘要翻译：本发明涉及一种带电粒子多子束系统，其包括带电粒子源（301）; 第一多孔板（320），其具有设置在所述源的下游的所述系统的带电粒子束路径中的多个孔; 具有多个孔的第一多孔选择板（313）更容易（340），其中所述第一多孔径选择器板安装在所述载体上; 以及构造成移动所述载体的致动器（350），使得所述第一多孔径选择器板在所述系统的第一操作模式中被布置在所述源的下游的系统的带电粒子束路径中，并且使得所述第一多孔径选择器板在系统的第二操作模式中设置在带电粒子束路径的外部。源极，第一多孔板和系统的载体被布置成使得在第一多孔径板和第一多孔径选择器板的下游位置处产生第一数量的带电粒子子束第一操作模式，并且在第二操作模式的位置处产生第二数量的带电粒子子束，其中第一数量的子束与第二数量的子束不同。

62. 发明授权

US09327324B2 Method and system for cleaning a vacuum chamber 有权
标题翻译：用于清洁真空室的方法和系统
公开(公告)号：US09327324B2
公开(公告)日：2016-05-03
申请号：US13777044
申请日：2013-02-26
申请人： Applied Materials Israel Ltd.
发明人： Lior Segev , Irit Ruach Nir , Guy Eitan
IPC分类号： B08B6/00 , B08B7/00 , H01J37/02 , H01J37/20 , H01J37/32
CPC分类号： B08B7/00 , H01J37/02 , H01J37/20 , H01J37/32862 , H01J2237/006 , H01J2237/022
摘要： A system and method are described, for use in cleaning of a vacuum chamber. The method comprising connecting a vacuum chamber to a plasma generating unit via a plasma connection port and connecting the vacuum chamber to a high vacuum pumping unit via a pumping port. A flow conductance through the plasma connection port to the vacuum chamber is controlled to limit passage of charged particles and cleaning substances produced in the plasma generating unit, to thereby maintain a working pressure inside the vacuum chamber while cleaning the vacuum chamber by said cleaning substances.
摘要翻译：描述了用于清洁真空室的系统和方法。该方法包括通过等离子体连接端口将真空室连接到等离子体产生单元，并通过泵送端口将真空室连接到高真空泵送单元。控制通过等离子体连接端口到真空室的流动传导，以限制带电粒子和等离子体发生单元中产生的清洁物质的通过，从而在通过所述清洁物质清洁真空室的同时保持真空室内的工作压力。

63. 发明授权

US09324537B2 Charged particle inspection method and charged particle system 有权
标题翻译：带电粒子检测方法和带电粒子系统
公开(公告)号：US09324537B2
公开(公告)日：2016-04-26
申请号：US14309452
申请日：2014-06-19
申请人： Carl Zeiss Microscopy GmbH , Applied Materials Israel, Ltd.
发明人： Thomas Kemen , Rainer Knippelmeyer , Stefan Schubert
IPC分类号： H01J37/00 , H01J37/04 , H01J37/09 , H01J37/317
CPC分类号： H01J37/04 , H01J37/045 , H01J37/09 , H01J37/145 , H01J37/147 , H01J37/244 , H01J37/3177 , H01J2237/0435 , H01J2237/0453 , H01J2237/04922 , H01J2237/04924 , H01J2237/04926 , H01J2237/15 , H01J2237/2446 , H01J2237/2448 , H01J2237/2561 , H01J2237/2817 , H01J2237/31774
摘要： The present invention relates to a charged particle system comprising: a charged particle source; a first multi aperture plate; a second multi aperture plate disposed downstream of the first multi aperture plate, the second multi aperture plate; a controller configured to selectively apply at least first and second voltage differences between the first and second multi aperture plates; wherein the charged particle source and the first and second multi aperture plates are arranged such that each of a plurality of charged particle beamlets traverses an aperture pair, said aperture pair comprising one aperture of the first multi aperture plate and one aperture of the second multi aperture plate, wherein plural aperture pairs are arranged such that a center of the aperture of the first multi aperture plate is, when seen in a direction of incidence of the charged particle beamlet traversing the aperture of the first multi aperture plate, displaced relative to a center of the aperture of the second multi aperture plate. The invention further pertains to a particle-optical component configured to change a divergence of a set of charged particle beamlets and a charged particle inspection method comprising inspection of an object using different numbers of charged particle beamlets.
摘要翻译：带电粒子系统本发明涉及一种带电粒子系统，包括：带电粒子源; 第一个多孔板; 设置在所述第一多孔板的下游的第二多孔板，所述第二多孔板; 控制器，被配置为选择性地施加所述第一和第二多孔板之间的至少第一和第二电压差; 其中所述带电粒子源和所述第一和第二多孔径孔布置成使得多个带电粒子子束中的每一个穿过孔径对，所述孔径对包括所述第一多孔板的一个孔和所述第二多孔的一个孔板，其中多个孔径对布置成使得当穿过穿过第一多孔板的孔的带电粒子束的入射方向从第一多孔板的孔的中心相对于中心位移时，第一多孔板的孔的中心的第二多孔板的孔径。本发明还涉及一种构造成改变一组带电粒子子束的发散度的粒子光学部件，以及包括使用不同数量的带电粒子子束检查物体的带电粒子检查方法。

64. 发明申请

US20160111251A1 PARTICLE-OPTICAL SYSTEMS AND ARRANGEMENTS AND PARTICLE-OPTICAL COMPONENTS FOR SUCH SYSTEMS AND ARRANGEMENTS 有权
标题翻译：颗粒光学系统和安排以及这种系统和安排的颗粒光学部件
公开(公告)号：US20160111251A1
公开(公告)日：2016-04-21
申请号：US14975314
申请日：2015-12-18
申请人： CARL ZEISS MICROSCOPY GMBH , APPLIED MATERIALS ISRAEL LTD.
发明人： Rainer KNIPPELMEYER , Oliver KIENZLE , Thomas KEMEN , Heiko MUELLER , Stephan UHLEMANN , Maximilian HAIDER , Antonio CASARES , Steven ROGERS
IPC分类号： H01J37/30 , H01J37/317 , H01J37/10
CPC分类号： H01J37/04 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/10 , H01J37/14 , H01J37/153 , H01J37/28 , H01J37/3007 , H01J37/3177 , H01J2237/0435 , H01J2237/0453 , H01J2237/047 , H01J2237/04735 , H01J2237/04756 , H01J2237/06 , H01J2237/14 , H01J2237/2817 , H01J2237/31774
摘要： A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.
摘要翻译：粒子光学装置包括用于产生带电粒子束的带电粒子源; 布置在带电粒子束的光束路径中的多孔板，其中多孔板具有以预定的第一阵列图案形成在其中的多个孔，其中多个带电粒子子束由束形成在多孔板下游的带电粒子，并且其中通过所述多个子束在所述装置的图像平面中形成多个束斑，所述多个束斑以第二阵列图案布置; 以及用于操纵带电粒子束和/或多个子束的粒子光学元件; 其中所述第一阵列图案在第一方向上具有第一图案规则性，并且所述第二阵列图案在与所述第一方向对应的电子 - 光学上的第二方向上具有第二图案规则性，并且其中所述第二规则性高于所述第一规则性。

65. 发明申请

US20160018660A1 OPTICAL ELEMENT FOR SPATIAL BEAM SHAPING 有权
标题翻译：空间光束形状的光学元件
公开(公告)号：US20160018660A1
公开(公告)日：2016-01-21
申请号：US14336862
申请日：2014-07-21
申请人： APPLIED MATERIALS ISRAEL, LTD.
发明人： Yoav Berlatzky , Seffi Sadeh , Ido Kofler , Haim Eder , Michael Rudman , Hagay Famini
IPC分类号： G02B27/09 , H01L27/146
CPC分类号： G02B27/0905 , G02B5/201 , G02B21/06 , G02B27/143
摘要： A spatial beam shaper structure and a corresponding optical system are provided. The spatial beam shaper structure comprises a light collecting surface configured for affecting light impinging thereon to provide a substantially smooth light profile of at least one optical property, the light collecting surface having a pattern in the form of multiple surface regions comprising regions of at least two different optical properties arranged in an alternating fashion, wherein an interface region between each two locally adjacent regions of the different optical properties has the at least two different optical properties, to provide substantially smooth transition of said different optical properties within the interface region.
摘要翻译：提供空间光束整形器结构和相应的光学系统。空间光束整形器结构包括光收集表面，其被配置用于影响入射到其上的光以提供至少一个光学特性的基本平滑的光分布，所述光收集表面具有多个表面区域形式的图案，所述多个表面区域包括至少两个以交替方式布置的不同光学性质，其中不同光学性质的每个两个局部相邻区域之间的界面区域具有至少两个不同的光学性质，以提供所述不同光学性质在界面区域内的基本上平滑的转变。

66. 发明授权

US09224576B2 Particle-optical systems and arrangements and particle-optical components for such systems and arrangements 有权
标题翻译：用于这种系统和布置的粒子 - 光学系统和布置以及粒子 - 光学部件
公开(公告)号：US09224576B2
公开(公告)日：2015-12-29
申请号：US14165573
申请日：2014-01-27
申请人： Carl Zeiss Microscopy GmbH , Applied Materials Israel, Ltd.
发明人： Rainer Knippelmeyer , Oliver Kienzle , Thomas Kemen , Heiko Mueller , Stephan Uhlemann , Maximilian Haider , Antonio Casares , Steven Rogers
IPC分类号： G21K5/10 , H01J37/08 , H01J37/30 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/28 , H01J37/317 , H01J37/14 , H01J37/10
CPC分类号： H01J37/04 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/10 , H01J37/14 , H01J37/153 , H01J37/28 , H01J37/3007 , H01J37/3177 , H01J2237/0435 , H01J2237/0453 , H01J2237/047 , H01J2237/04735 , H01J2237/04756 , H01J2237/06 , H01J2237/14 , H01J2237/2817 , H01J2237/31774
摘要： A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.
摘要翻译：粒子光学装置包括用于产生带电粒子束的带电粒子源; 布置在带电粒子束的光束路径中的多孔板，其中多孔板具有以预定的第一阵列图案形成在其中的多个孔，其中多个带电粒子子束由束形成在多孔板下游的带电粒子，并且其中通过所述多个子束在所述装置的图像平面中形成多个束斑，所述多个束斑以第二阵列图案布置; 以及用于操纵带电粒子束和/或多个子束的粒子光学元件; 其中所述第一阵列图案在第一方向上具有第一图案规则性，并且所述第二阵列图案在与所述第一方向对应的电子 - 光学上的第二方向上具有第二图案规则性，并且其中所述第二规则性高于所述第一规则性。

67. 发明申请

US20150362524A1 DETERMINING A STATE OF A HIGH ASPECT RATIO HOLE USING MEASUREMENT RESULTS FROM AN ELECTROSTATIC MEASUREMENT DEVICE 有权
标题翻译：使用静电测量装置的测量结果确定高比例孔的状态
公开(公告)号：US20150362524A1
公开(公告)日：2015-12-17
申请号：US14719193
申请日：2015-05-21
申请人： Applied Materials Israel, Ltd.
发明人： Konstantin Chirko , Alon Litman
IPC分类号： G01Q60/30
CPC分类号： G01Q60/30 , G01Q30/02 , H01J37/28 , H01J2237/281 , H01J2237/2815
摘要： A system, method and a non-transitory compute readable medium for evaluating a high aspect ratio (HAR) hole having a nanometric scale width and formed in a substrate, including obtaining, during an illumination period, multiple measurement results by an electrostatic measurement device that comprises a probe tip that is placed in proximity to the HAR hole; wherein multiple locations within the HAR hole are illuminated with a beam of charged particles during the illumination period; and processing the multiple measurement results to determine a state of the HAR hole.
摘要翻译：一种用于评估具有纳米尺度宽度并形成在衬底中的高纵横比（HAR）孔的系统，方法和非暂时计算可读介质，包括在照明周期期间通过静电测量装置获得多个测量结果，包括放置在靠近HAR孔的探针尖端; 其中所述HAR孔内的多个位置在照明周期期间用带电粒子束照射; 并处理多个测量结果以确定HAR孔的状态。

68. 发明申请

US20150356719A9 METHOD OF DESIGN-BASED DEFECT CLASSIFICATION AND SYSTEM THEREOF 有权
标题翻译：基于设计的缺陷分类方法及其系统
公开(公告)号：US20150356719A9
公开(公告)日：2015-12-10
申请号：US13756462
申请日：2013-01-31
申请人： Applied Materials Israel Ltd.
发明人： MARK GESHEL , ZVI GOREN , EFRAT ROZENMAN
IPC分类号： G06T7/00
CPC分类号： G06T7/0004 , G01R31/26 , G01R31/2894 , G06T7/0006 , G06T7/001 , G06T2207/30148 , H01L22/12
摘要： There is provided an inspection method capable of classifying defects detected on a production layer of a specimen. The method comprises: obtaining input data related to the detected defects; processing the input data using a decision algorithm associated with the production layer and specifying two or more classification operations and a sequence thereof; and sorting the processed defects in accordance with predefined bins, wherein each bin is associated with at least one classification operation, wherein at least one classification operation sorts at least part of the processed defects to one or more classification bins to yield finally classified defects, and wherein each classification operation, excluding the last one, sorts at least part of the processed defects to be processed by one or more of the following classification operations.
摘要翻译：提供了能够对在样品的生产层上检测到的缺陷进行分类的检查方法。该方法包括：获取与检测到的缺陷相关的输入数据; 使用与生产层相关联的决策算法处理输入数据并指定两个或更多个分类操作及其序列; 以及根据预定义的箱分类处理的缺陷，其中每个仓与至少一个分类操作相关联，其中至少一个分类操作将至少部分经处理的缺陷排序到一个或多个分类箱以产生最终分类的缺陷，以及其中除了最后一个之外的每个分类操作通过以下分类操作中的一个或多个对待处理的缺陷的至少一部分进行排序。

69. 发明申请

US20150193926A1 INSPECTION HAVING A SEGMENTED PUPIL 有权
标题翻译：检查已签署的PUPIL
公开(公告)号：US20150193926A1
公开(公告)日：2015-07-09
申请号：US14149645
申请日：2014-01-07
申请人： APPLIED MATERIALS ISRAEL, LTD.
发明人： Yoav Berlatzky , Amir Shoham , Ido Dolev
IPC分类号： G06T7/00 , G01N33/00 , G06T7/60 , G01N21/55
CPC分类号： G01N33/00 , G01N21/8806 , G01N2021/8822 , G01N2033/0095
摘要： A method and an apparatus that may include optics that is arranged to illuminate a surface of a sample with radiation and to collect reflected radiation from the surface of the sample; wherein the optics includes a pupil that has multiple pupil segments that correspond to different angular regions of collection or illumination; and a detection module arranged to receive the reflected radiation and generate, for each pupil segment, pupil segment detection signals.
摘要翻译：一种方法和装置，其可以包括被布置成用辐射照射样品表面并收集来自样品表面的反射辐射的光学器件; 其中所述光学器件包括具有对应于收集或照明的不同角度区域的多个光瞳段的光瞳; 以及检测模块，布置成接收反射的辐射并且为每个瞳孔段产生瞳孔段检测信号。

70. 发明申请

US20150008331A1 CHARGED PARTICLE INSPECTION METHOD AND CHARGED PARTICLE SYSTEM 有权
标题翻译：充电颗粒检测方法和充电颗粒系统
公开(公告)号：US20150008331A1
公开(公告)日：2015-01-08
申请号：US14309452
申请日：2014-06-19
申请人： Carl Zeiss SMT GmbH , Applied Materials Israel, Ltd.
发明人： Thomas KEMEN , Rainer KNIPPELMEYER , Stefan SCHUBERT
IPC分类号： H01J37/04 , H01J37/317
CPC分类号： H01J37/04 , H01J37/045 , H01J37/09 , H01J37/145 , H01J37/147 , H01J37/244 , H01J37/3177 , H01J2237/0435 , H01J2237/0453 , H01J2237/04922 , H01J2237/04924 , H01J2237/04926 , H01J2237/15 , H01J2237/2446 , H01J2237/2448 , H01J2237/2561 , H01J2237/2817 , H01J2237/31774
摘要： The present invention relates to a charged particle system comprising: a charged particle source; a first multi aperture plate; a second multi aperture plate disposed downstream of the first multi aperture plate, the second multi aperture plate; a controller configured to selectively apply at least first and second voltage differences between the first and second multi aperture plates; wherein the charged particle source and the first and second multi aperture plates are arranged such that each of a plurality of charged particle beamlets traverses an aperture pair, said aperture pair comprising one aperture of the first multi aperture plate and one aperture of the second multi aperture plate, wherein plural aperture pairs are arranged such that a center of the aperture of the first multi aperture plate is, when seen in a direction of incidence of the charged particle beamlet traversing the aperture of the first multi aperture plate, displaced relative to a center of the aperture of the second multi aperture plate. The invention further pertains to a particle-optical component configured to change a divergence of a set of charged particle beamlets and a charged particle inspection method comprising inspection of an object using different numbers of charged particle beamlets.
摘要翻译：带电粒子系统本发明涉及一种带电粒子系统，包括：带电粒子源; 第一个多孔板; 设置在所述第一多孔板的下游的第二多孔板，所述第二多孔板; 控制器，被配置为选择性地施加所述第一和第二多孔板之间的至少第一和第二电压差; 其中所述带电粒子源和所述第一和第二多孔径孔布置成使得多个带电粒子子束中的每一个穿过孔径对，所述孔径对包括所述第一多孔板的一个孔和所述第二多孔的一个孔板，其中多个孔径对布置成使得当穿过穿过第一多孔板的孔的带电粒子束的入射方向从第一多孔板的孔的中心相对于中心位移时，第一多孔板的孔的中心的第二多孔板的孔径。本发明还涉及一种构造成改变一组带电粒子子束的发散度的粒子光学部件，以及包括使用不同数量的带电粒子子束检查物体的带电粒子检查方法。

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