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1. 发明授权

US11448664B2 Large radius probe 有权
公开(公告)号：US11448664B2
公开(公告)日：2022-09-20
申请号：US17069302
申请日：2020-10-13
申请人： Bruker Nano, Inc.
发明人： Jeffrey Wong
IPC分类号： G01Q60/30 , G01Q70/10 , G01Q70/16 , G01Q60/38 , C23C16/34 , C23C16/56 , C23C16/44 , C23C16/02 , G01Q60/36
摘要： A large radius probe for a surface analysis instrument such as an atomic force microscope (AFM). The probe is microfabricated to have a tip with a hemispherical distal end or apex. The radius of the apex is the range of about a micron making the probes particularly useful for nanoindentation analyses. The processes of the preferred embodiments allow such large radius probes to be batch fabricated to facilitate cost and robustness.

2. 发明申请

US20210318353A1 SYSTEM AND METHOD OF PERFORMING SCANNING PROBE MICROSCOPY ON A SUBSTRATE SURFACE 有权
公开(公告)号：US20210318353A1
公开(公告)日：2021-10-14
申请号：US17261494
申请日：2019-07-24
申请人： Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
发明人： Roelof Willem HERFST , Anton Adriaan BIJNAGTE , Jan Jacobus Benjamin BIEMOND , Klara MATUROVA
IPC分类号： G01Q60/30 , G01Q40/02 , G01Q10/06
摘要： The invention is directed at a method of performing scanning probe microscopy on a substrate surface using a scanning probe microscopy system. A probe tip and substrate surface are moved relative to each other in one or more directions parallel to the scanning plane to position the probe tip to a scanning position on the substrate surface with the probe tip; a displacement is measured by an encoder of said probe tip in said one or more directions; and a fiducial pattern is provided fixed relative to the substrate surface, said fiducial pattern having a scannable structure that is scannable by said probe tip and said structure forming a grid of fiducial marks in said one or more dimensions; said grid dimensioned to allow for measuring placement deviations of the probe tip relative to the probe head by identifying one or more fiducial marks in the fiducial pattern.

3. 发明申请

US20210125809A1 A METHOD FOR SEM-GUIDED AFM SCAN WITH DYNAMICALLY VARIED SCAN SPEED 有权
公开(公告)号：US20210125809A1
公开(公告)日：2021-04-29
申请号：US17252837
申请日：2018-06-29
申请人： JIANGSU JITRI MICRO-NANO AUTOMATION INSTITUTE CO., LTD.
发明人： Yu SUN , Jun CHEN , Ko Lun CHEN , Tiancong WANG
IPC分类号： H01J37/28 , G01Q30/02 , G01Q60/30 , G01Q10/06 , G01Q30/04
摘要： A method discloses topography information extracted from scanning electron microscope (SEM) images to determine the atomic force microscope (AFM) image scanning speed at each sampling point or in each region on a sample. The method includes the processing of SEM images to extract possible topography features and create a feature metric map (step 1), the conversion of the feature metric map into AFM scan speed map (step 2), and performing AFM scan according to the scan speed map (step 3). The method enables AFM scan with higher scan speeds in areas with less topography feature, and lower scan speeds in areas that are rich in topography features.

4. 发明授权

US10254268B2 Method for detecting toxic metal ions in sample 有权
公开(公告)号：US10254268B2
公开(公告)日：2019-04-09
申请号：US15465344
申请日：2017-03-21
申请人： Korea University Research and Business Foundation, Sejong Campus
发明人： Jinsung Park , Woong Kim , Joohyung Park , Seongjae Jo , Minwoo Kim , Gyudo Lee
IPC分类号： G01N33/20 , G01N1/28 , B82Y30/00 , B82Y35/00 , C01G7/00 , G01Q60/24 , G01Q60/28 , G01N21/78 , G01Q60/30 , G01N15/00 , B82Y15/00
摘要： Disclosed is a method for detecting toxic metal ions in a sample. The method includes: a) preparing a solution of organic acid-bound gold nanoparticles; b) adding a sample containing toxic metal ions to the solution prepared in a) to allow the gold nanoparticles to aggregate; c) dropping the reaction solution obtained in b) onto a silicon substrate and drying the reaction solution such that the gold nanoparticle aggregates are immobilized on the silicon substrate; and d) analyzing the characteristics of the gold nanoparticles immobilized on the silicon substrate. The method enables the detection of even a trace amount of toxic metal ions in a sample with high sensitivity. Therefore, the method can be applied to the management of water quality in food service providers and hospitals, the measurement of contaminants in water supply and drainage systems, and the management of industrial wastewater. Furthermore, the method is expected to be widely applicable to water purifiers and the food and beverage industry in the future.

5. 发明申请

US20190094268A1 HIGH RANGE AND RESOLUTION SCANNING PROBE AND METHODS 审中-公开
公开(公告)号：US20190094268A1
公开(公告)日：2019-03-28
申请号：US16079817
申请日：2017-02-24
申请人： ADVANCED MEASUREMENT TECHNOLOGY INC
发明人： Charles R. Sides
IPC分类号： G01Q60/30
摘要： A scanning probe used to measure and determine the features of an electrically conductive surface and which can be used to determine present corrosion state of a bare or coated metal and monitor corrosion progression under coatings that previously had to be removed to assess the present corrosion state and corrosion progression of the underlying metal surface.

6. 发明授权

US10215686B2 Metal corrosion resistance evaluation method and evaluation device using in-liquid potential measurement 有权
公开(公告)号：US10215686B2
公开(公告)日：2019-02-26
申请号：US14905048
申请日：2013-07-22
申请人： Hitachi, Ltd.
发明人： Kyoko Hombo , Kenya Ohashi , Masahiro Itoh , Mitsuharu Ikeda , Takeshi Fukuma , Naritaka Kobayashi , Shoichiro Ogata
IPC分类号： G01N17/00 , G01Q30/14 , G01Q60/30 , G01N17/02
摘要： The objective of the present invention is to provide a corrosion resistance evaluation method and evaluation device that make it possible to estimate crevice corrosion depth and pitting depth in a short period of time. A corrosion resistance evaluation method according to the present invention is characterized in that the surface potential of a metal under evaluation is measured in a state in which the metal is immersed in a usage-environment liquid, the surface potential distribution of the metal is determined, the surface potential differences in the microstructure of the metal are calculated on the basis of the surface potential distribution, and the corrosion rate of crevice corrosion and corrosion rate of pitting are predicted using the maximum surface potential difference from among the calculated surface potential differences as an evaluation index for corrosion evaluation.

7. 发明授权

US10060862B2 Microwave impedance microscopy using a tuning fork 有权
公开(公告)号：US10060862B2
公开(公告)日：2018-08-28
申请号：US15479657
申请日：2017-04-05
申请人： Yongtao Cui , Yue Ma , Zhixun Shen
发明人： Yongtao Cui , Yue Ma , Zhixun Shen
IPC分类号： G01N22/00 , G01N27/02 , G01Q10/04 , G01Q20/04 , G01Q60/30
CPC分类号： G01N22/00 , G01N27/02 , G01Q10/045 , G01Q20/04 , G01Q60/30
摘要： A microwave impedance microscope including a tuning fork having a high-aspect ratio etched metal tip electrode extending transversely to one tine of the fork and having a high aspect ratio to thereby reduce parasitic capacitance. The metal tip may be electrochemically etched from a wire, then bonded to the tine. The fork is slightly inclined from the surface of the sample and the tip electrode projects transversely to the fork. A microwave signal is impressed on the tip. Microwave circuitry receives microwave signals reflected from the sample back into the tip and demodulates the reflected signal according to the impressed signal. Further circuitry further demodulates the reflected signal according to the lower-frequency signal causing the fork to oscillate at its mechanically resonant frequency. A multi-wavelength matching circuit interposed between the microwave circuitry and the probe includes a coaxial cable of length half a fundamental microwave wavelength.

8. 发明授权

US09810713B2 Method and apparatus of operating a scanning probe microscope 有权
公开(公告)号：US09810713B2
公开(公告)日：2017-11-07
申请号：US15057963
申请日：2016-03-01
申请人： Bruker Nano, Inc.
发明人： Jian Shi , Yan Hu , Shuiqing Hu , Ji Ma , Chanmin Su
IPC分类号： G01Q20/00 , B82Y35/00 , G01Q10/06 , G01Q60/32 , G01Q20/02 , G01Q60/30 , G01Q60/34
CPC分类号： G01Q20/00 , B82Y35/00 , G01Q10/065 , G01Q20/02 , G01Q60/24 , G01Q60/30 , G01Q60/32 , G01Q60/34
摘要： Methods and apparatuses are provided for automatically controlling and stabilizing aspects of a scanning probe microscope (SPM), such as an atomic force microscope (AFM), using Peak Force Tapping (PFT) Mode. In an embodiment, a controller automatically controls periodic motion of a probe relative to a sample in response to a substantially instantaneous force determined, and automatically controls a gain in a feedback loop. A gain control circuit automatically tunes a gain based on separation distances between a probe and a sample to facilitate stability. Accordingly, instability onset is quickly and accurately determined during scanning, thereby eliminating the need of expert user tuning of gains during operation.

9. 发明授权

US09784762B2 Determination of local contact potential difference by noncontact atomic force microscopy 有权
公开(公告)号：US09784762B2
公开(公告)日：2017-10-10
申请号：US15059371
申请日：2016-03-03
申请人： International Business Machines Corporation
发明人： Leo Gross , Gerhard Meyer , Bruno Schuler , Wolfram Steurer
IPC分类号： G01Q60/30 , G01Q60/32 , G01Q30/06 , G01R19/00
CPC分类号： G01Q60/30 , G01Q30/06 , G01Q60/32 , G01R19/0084
摘要： A method for determining a value of a local contact potential difference by noncontact atomic force microscopy. For one or more cantilever positions above a surface of a sample: i) determining two distinct voltage values of DC voltage applied between an oscillating cantilever and the sample, and ii) determining, by one or more processors, a value of a local contact potential difference based, at least in part, on the two distinct voltage values that were determined.

10. 发明授权

US09594101B2 Apparatus for measuring the local electrical resistance of a surface 有权
标题翻译：用于测量表面局部电阻的装置
公开(公告)号：US09594101B2
公开(公告)日：2017-03-14
申请号：US13696125
申请日：2011-05-03
申请人： Olivier Schneegans , Pascal Chretien , Frédéric Houzé
发明人： Olivier Schneegans , Pascal Chretien , Frédéric Houzé
IPC分类号： G01R27/02 , B82Y35/00 , G01Q60/30
CPC分类号： G01R27/02 , B82Y35/00 , G01Q60/30
摘要： Apparatus for measuring the local electrical resistance of a surface, the apparatus comprising: a DC voltage source for applying a bias voltage (Vpol) to the sample (E) for characterizing; a measurement circuit (CM) capable of being connected to a conductive probe suitable for coming into contact with a surface (SE) of said sample in order to generate a signal (S) representative of a contact resistance between said conductive probe and said surface of the sample; and a control device (CMD) for controlling said measurement circuit; the apparatus being characterized in that said measurement circuit comprises: a measurement resistive two-terminal network (DM) presenting variable resistance and connected between said conductive probe and a ground of the circuit; and a calculation unit (UC) for generating said signal representative of a contact resistance between said conductive probe and said surface of the sample as a function of a voltage (Vs) across the terminals of said measurement resistive two-terminal network.
摘要翻译：用于测量表面的局部电阻的装置，该装置包括：用于向样品（E）施加偏置电压（Vpol）的直流电压源，用于表征; 测量电路（CM），其能够连接到适于与所述样品的表面（SE）接触的导电探针，以便产生代表所述导电探针与所述表面之间的接触电阻的信号（S）例子; 和用于控制所述测量电路的控制装置（CMD）; 该装置的特征在于所述测量电路包括：呈现可变电阻并连接在所述导电探针与电路的地之间的测量电阻双端网络（DM）; 以及用于产生表示所述导电探针和所述样品表面之间的接触电阻的所述信号的计算单元（UC），作为所述测量电阻式两端网络的所述端子两端的电压（Vs）的函数。

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