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81. 发明授权

US09235133B2 Lighting optical device, regulation method for lighting optical device, exposure system, and exposure method 有权
标题翻译：照明光学装置，照明光学装置的调节方法，曝光系统和曝光方法
公开(公告)号：US09235133B2
公开(公告)日：2016-01-12
申请号：US11660387
申请日：2005-08-03
申请人： Hirohisa Tanaka , Koji Shigematsu
发明人： Hirohisa Tanaka , Koji Shigematsu
IPC分类号： G03B27/72 , G03B27/54 , G03B27/68 , G03F7/20 , G02B19/00 , G03B27/42 , G03B27/32
CPC分类号： G03F7/70108 , G02B19/0014 , G02B19/0047 , G03F7/70133 , G03F7/70191
摘要： An illumination optical apparatus is able to adjust each of pupil luminance distributions at respective points on a surface to be illuminated to being almost uniform, while maintaining or adjusting an illuminance distribution on the surface to be illuminated to being almost uniform. The illumination optical apparatus illuminates the surface to be illuminated (M, W), with a light beam from a light source (1). The apparatus is provided with a pupil distribution forming device (1-4) for forming a pupil luminance distribution with a predetermined luminance distribution on an illumination pupil plane; and an adjuster (8, 9) for independently adjusting each of pupil luminance distributions about respective points on the surface to be illuminated. The adjuster has a plurality of adjustment surfaces each of which is disposed in an optical path between the pupil distribution forming device and the surface to be illuminated and has a predetermined transmittance distribution or reflectance distribution.
摘要翻译：照明光学装置能够将要被照射的表面上的各个点的每个瞳孔亮度分布调整为几乎均匀，同时保持或调整被照射表面上的照度分布几乎均匀。照明光学装置用来自光源（1）的光束照射被照射的表面（M，W）。该装置设置有用于在照明光瞳平面上形成具有预定亮度分布的光瞳亮度分布的光瞳分布形成装置（1-4）以及用于独立地调整关于待照射表面上的各个点的每个瞳孔亮度分布的调节器（8,9）。调整器具有多个调整面，每个调整面设置在光瞳分布形成装置和被照射面之间的光路中，并且具有预定的透射率分布或反射率分布。

82. 发明授权

US09223226B2 Microlithographic projection exposure apparatus illumination optics 有权
公开(公告)号：US09223226B2
公开(公告)日：2015-12-29
申请号：US13325734
申请日：2011-12-14
申请人： Alexander Kohl
发明人： Alexander Kohl
IPC分类号： G03B27/54 , G03F7/20
CPC分类号： G03F7/70091 , G03F7/70108 , G03F7/70208 , G03F7/70466 , G03F7/70566
摘要： Optics, such as, for example, microlithographic projection exposure apparatus illumination optics, as well as related systems, methods, components and devices are disclosed.

83. 发明授权

US09207542B2 Illumination optical apparatus and projection exposure apparatus 有权
公开(公告)号：US09207542B2
公开(公告)日：2015-12-08
申请号：US13889798
申请日：2013-05-08
申请人： NIKON CORPORATION
发明人： Naomasa Shiraishi
IPC分类号： G03B27/72 , G03B27/54 , G03B27/68 , G03F7/20 , G02B27/28 , G03B27/42 , G03B27/52 , G03B27/32
摘要： An illumination optical apparatus and projection exposure apparatus capable of reducing a light quantity loss when a mask is illuminated with a polarized illumination light. An illumination optical system for illuminating a reticle with an illumination light and a projection optical system for projecting the pattern image of the reticle onto a wafer are provided. An illumination light emitted from an exposure light source in a linearly polarized state in the illumination optical system passes through first and second birefringent members having different fast axis directions and is converted into a polarized state that is substantially linearly polarized in a circumferential direction with the optical axis as the center in an almost specific annular area, and them illuminates the reticle under an annular illuminating condition after passing through a fly-eye lens.

84. 发明授权

US09201313B2 Compact encoder head for interferometric encoder system 有权
标题翻译：用于干涉式编码器系统的紧凑编码器头
公开(公告)号：US09201313B2
公开(公告)日：2015-12-01
申请号：US13672234
申请日：2012-11-08
申请人： Zygo Corporation
发明人： Jan Liesener
IPC分类号： G01B11/02 , G01B11/14 , G03B27/54 , G03B27/58 , G03B27/62 , H02K41/02 , G03F7/20 , G01D5/26 , G01D5/38 , H01L21/68
CPC分类号： G03F7/70775 , G01D5/266 , G01D5/38 , H01L21/681
摘要： An encoder system includes an encoder scale and an encoder head, in which the encoder head is configured to combine each twice-diffracted measurement beam of multiple twice-diffracted measurement beams with a corresponding reference beam to form multiple output beams, where the encoder head includes a monolithic optical component having multiple facets, the multiple facets being arranged to: receive multiple once-diffracted measurement beams from a surface of the encoder scale; and redirect the multiple once-diffracted measurement beams back towards the surface of the encoder scale, the encoder scale being positioned in a path of the once-diffracted measurement beams to produce the twice-diffracted measurement beams.
摘要翻译：编码器系统包括编码器标尺和编码器头，其中编码器头被配置为将多个两次衍射的测量光束的每个两次衍射的测量光束与相应的参考光束组合以形成多个输出光束，其中编码器头包括具有多个小面的单片光学部件，所述多个面被布置成：从编码器刻度的表面接收多个一次衍射的测量光束; 并将多个一次衍射的测量光束重定向到编码器刻度的表面，编码器刻度位于一次衍射的测量光束的路径中，以产生两次衍射的测量光束。

85. 发明授权

US09201226B2 Imaging optics 有权
标题翻译：成像光学
公开(公告)号：US09201226B2
公开(公告)日：2015-12-01
申请号：US13438591
申请日：2012-04-03
申请人： Ulrich Loering , Ralf Mueller , Hans-Juergen Mann , Norman Baer
发明人： Ulrich Loering , Ralf Mueller , Hans-Juergen Mann , Norman Baer
IPC分类号： G03B27/54 , G02B17/06 , G02B5/00 , G02B27/00 , G03F7/20
CPC分类号： G02B17/0657 , G02B5/005 , G02B27/0018 , G03F7/70233 , G03F7/70275
摘要： An imaging optics includes a plurality of mirrors which reflect imaging light to image an object field in an object plane into an image field in an image plane. A mirror body of at least one of the mirrors has a through-opening for the imaging light to pass through. The through-opening has an internal region of a smallest opening width in the mirror body. The through-opening expands from the internal region towards both edge regions of the mirror body. A disturbing influence of unused light portions is reduced or eliminated completely.
摘要翻译：成像光学器件包括多个反射镜，其反射成像光以将物平面中的物场成像到图像平面中的图像场。至少一个反射镜的镜体具有用于成像光通过的通孔。通孔具有镜体中最小开口宽度的内部区域。通孔从内部区域向镜体的两个边缘区域扩展。未使用的光部分的干扰影响被完全消除或消除。

86. 发明授权

US09158194B2 Metrology method and apparatus, and device manufacturing method 有权
标题翻译：计量方法和装置以及装置制造方法
公开(公告)号：US09158194B2
公开(公告)日：2015-10-13
申请号：US13628697
申请日：2012-09-27
申请人： ASML Netherlands B.V.
发明人： Armand Eugene Albert Koolen , Henricus Petrus Maria Pellemans , Maurits Van Der Schaar , Peter Clement Paul Vanoppen , Michael Kubis
IPC分类号： G01B11/00 , G01B11/14 , G03B27/32 , G03B27/54 , G03B27/72 , G03B27/74 , G03C5/00 , G03F1/42 , G03F7/20 , G03F9/00 , G01N21/47 , G01B9/04
CPC分类号： G03F1/42 , G01B9/04 , G01N21/47 , G03F7/70616 , G03F7/70633 , G03F9/70 , G03F9/7069 , G03F9/7088
摘要： An approach is used to estimate and correct the overlay variation as function of offset for each measurement. A target formed on a substrate includes periodic gratings. The substrate is illuminated with a circular spot on the substrate with a size larger than each grating. Radiation scattered by each grating is detected in a dark-field scatterometer to obtain measurement signals. The measurement signals are used to calculate overlay. The dependence (slope) of the overlay as a function of position in the illumination spot is determined. An estimated value of the overlay at a nominal position such as the illumination spot's center can be calculated, correcting for variation in the overlay as a function of the target's position in the illumination spot. This compensates for the effect of the position error in the wafer stage movement, and the resulting non-centered position of the target in the illumination spot.
摘要翻译：一种方法用于估计和校正覆盖变化作为每个测量的偏移函数。形成在衬底上的靶包括周期性光栅。在衬底上用圆形点照射衬底，其尺寸大于每个光栅。在暗场散射仪中检测由每个光栅散射的辐射，以获得测量信号。测量信号用于计算叠加。确定覆盖层与照明点中位置的函数关系（斜率）。可以计算在诸如照明点中心的标称位置处的覆盖物的估计值，以根据目标在照明点中的位置的函数来校正覆盖物的变化。这补偿了晶片台移动中的位置误差的影响，以及目标在照明点中产生的非居中位置。

87. 发明授权

US09155148B2 Light source drive device, optical scanning device and image forming apparatus 有权
标题翻译：光源驱动装置，光扫描装置和成像装置
公开(公告)号：US09155148B2
公开(公告)日：2015-10-06
申请号：US13473278
申请日：2012-05-16
申请人： Masaaki Ishida , Atsufumi Omori , Hayato Fujita
发明人： Masaaki Ishida , Atsufumi Omori , Hayato Fujita
IPC分类号： H05B33/08 , G03B27/54 , H04N1/053 , H04N1/113 , G02B26/12
CPC分类号： H05B33/0824 , G02B26/127 , G03B27/54 , H04N1/053 , H04N1/1135 , H04N2201/0471 , H04N2201/04729 , H04N2201/04732 , H04N2201/04744 , H04N2201/04774 , H04N2201/04789 , H05B33/0851
摘要： A light source drive device includes a first current source which provides a predetermined current to a light source corresponding to a predetermined light output, and a second current source which provides an overshoot current to the light source synchronized with the predetermined current. A processor is configured to set an overshoot time during which the overshoot current is provided to the light source. Further, an overshoot current is set which is applied to the light source. The overshoot time is set so that the overshoot time based on the rising of the predetermined current to when a light emission of the light source is detected.
摘要翻译：光源驱动装置包括：向与预定光输出相对应的光源提供预定电流的第一电流源和与预定电流同步地向光源提供过冲电流的第二电流源。处理器被配置为设置将过冲电流提供给光源的过冲时间。此外，设置施加到光源的过冲电流。设定过冲时间，使得基于预定电流的上升到检测到光源的发光时的过冲时间。

88. 发明授权

US09146476B2 Illumination optical apparatus and projection exposure apparatus 有权
公开(公告)号：US09146476B2
公开(公告)日：2015-09-29
申请号：US13890603
申请日：2013-05-09
申请人： NIKON CORPORATION
发明人： Naomasa Shiraishi
IPC分类号： G03B27/72 , G03F7/20 , G02B27/28 , G03B27/68 , G03B27/42 , G03B27/52 , G03B27/54
CPC分类号： G03F7/70191 , G02B3/0006 , G02B5/3083 , G02B27/28 , G02B27/283 , G02B27/286 , G03F7/70108 , G03F7/70341 , G03F7/70566 , G03F7/70966
摘要： An illumination optical apparatus and projection exposure apparatus capable of reducing a light quantity loss when a mask is illuminated with a polarized illumination light. An illumination optical system for illuminating a reticle with an illumination light and a projection optical system for projecting the pattern image of the reticle onto a wafer are provided. An illumination light emitted from an exposure light source in a linearly polarized state in the illumination optical system passes through first and second birefringent members having different fast axis directions and is converted into a polarized state that is substantially linearly polarized in a circumferential direction with the optical axis as the center in an almost specific annular area, and them illuminates the reticle under an annular illuminating condition after passing through a fly-eye lens.

89. 发明授权

US09134504B2 Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus 有权
标题翻译：光学系统中的光学布置，特别是在微光刻投影曝光设备中
公开(公告)号：US09134504B2
公开(公告)日：2015-09-15
申请号：US13370989
申请日：2012-02-10
申请人： Timo Laufer , Alexander Sauerhoefer
发明人： Timo Laufer , Alexander Sauerhoefer
IPC分类号： G03B27/52 , G03B27/54 , G02B7/18 , G03F7/20 , G03B27/72
CPC分类号： G03F7/70891 , F21V29/505 , F21V29/60 , F21V29/71 , G02B7/1815
摘要： An optical arrangement in an optical system, such as a microlithographic projection exposure apparatus, includes: at least one heat-emitting subsystem which emits heat during the operation of the optical system; a first heat shield which is arranged such that it at least partly absorbs the heat emitted by the heat-emitting subsystem; a first cooling device which is in mechanical contact with the first heat shield and is designed to dissipate heat from the first heat shield; and a second heat shield which at least partly absorbs heat emitted by the first heat shield. The second heat shield is in mechanical contact with a cooling device that dissipates heat from the second heat shield.
摘要翻译：诸如微光刻投影曝光装置的光学系统中的光学装置包括：在光学系统的操作期间发射热量的至少一个发热子系统; 第一热屏蔽，其布置成使得其至少部分地吸收由发热子系统发射的热量; 第一冷却装置，其与第一隔热罩机械接触并被设计成从第一隔热罩散热; 以及至少部分地吸收由第一隔热罩发出的热量的第二隔热罩。第二隔热罩与从第二隔热罩散热的冷却装置机械接触。

90. 发明授权

US09134501B2 Optical element unit and method of supporting an optical element 有权
公开(公告)号：US09134501B2
公开(公告)日：2015-09-15
申请号：US11901131
申请日：2007-09-14
申请人： Dirk Schaffer , Willi Heintel , Hagen Federau , Joachim Hartjes , Harald Kirchner
发明人： Dirk Schaffer , Willi Heintel , Hagen Federau , Joachim Hartjes , Harald Kirchner
IPC分类号： G03B27/68 , G03B27/52 , G03B27/54 , G02B7/02 , G03F7/20 , G03B27/42 , G02B7/00
CPC分类号： G02B7/026 , G02B7/008 , G03F7/70825
摘要： There is provided an optical element unit comprising an optical element, a connector element, and an optical element holder. The optical element has a plane of main extension as well as an outer circumference and defines a radial direction. The connector element connects the optical element and the optical element holder, the connector element having a first connector part connected to the optical element at the outer circumference and a second connector part connected to the optical element holder. The first connector part and the second connector part are connected via at least one coupling part, the coupling part being compliant in the radial direction and substantially preventing rotation between the first connector part and the second connector part in a plane substantially parallel to the plane of main extension.

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