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1. 发明申请

US20080063257A1 Pattern Inspection Method And Apparatus 有权
标题翻译：图案检验方法及装置
公开(公告)号：US20080063257A1
公开(公告)日：2008-03-13
申请号：US11931693
申请日：2007-10-31
申请人： Takashi HIROI , Masahiro Watanabe , Chie Shishido , Aritoshi Sugimoto , Maki Tanaka , Hiroshi Miyai , Asahiro Kuni , Yasuhiko Nara
发明人： Takashi HIROI , Masahiro Watanabe , Chie Shishido , Aritoshi Sugimoto , Maki Tanaka , Hiroshi Miyai , Asahiro Kuni , Yasuhiko Nara
IPC分类号： G06K9/00
CPC分类号： G01N21/9501 , G01N21/956 , G01N2021/8854 , G01N2021/8861 , G01N2021/8864 , G01R31/311 , G03F1/86 , G06T1/0007 , G06T7/0002 , G06T7/001 , G06T2200/24 , G06T2207/10061 , G06T2207/30148 , H01J37/222 , H01J37/265 , H01J37/28 , H01J2237/221 , H01J2237/24592 , H01J2237/28
摘要： An apparatus for processing a defect candidate image, including: an imager for taking an enlarged image of a specimen; an image processor for processing the image taken by the imager to detect defect candidates existing on the specimen and classify the detected defect candidates into one of plural defect classes; a memory for storing information of the defect candidates including the images of the defect candidates and the classified defect class data outputted from the image processor; and a display unit having a display screen for displaying information stored in the memory, wherein the display unit displays an image of the defect candidates together with the defect class data stored in the memory and the displayed defect class data is changeable on the display screen, and the memory changes the stored defect class data of the displayed defect candidate to the changed defect class data.
摘要翻译：一种用于处理缺陷候选图像的装置，包括：用于拍摄样本的放大图像的成像器; 图像处理器，用于处理由成像器拍摄的图像以检测存在于样本上的缺陷候选，并将检测到的缺陷候选分类为多个缺陷类别中的一个; 存储器，用于存储包括缺陷候选图像和从图像处理器输出的分类缺陷类别数据的缺陷候选的信息; 以及显示单元，具有用于显示存储在存储器中的信息的显示屏幕，其中所述显示单元与存储在存储器中的缺陷类别数据一起显示缺陷候选的图像，并且显示的缺陷类别数据可在显示屏幕上变化，并且存储器将存储的缺陷候选的缺陷类别数据改变为改变的缺陷类别数据。

2. 发明申请

US20070269101A1 PATTERN INSPECTION METHOD AND APPARATUS 有权
标题翻译：模式检验方法和装置
公开(公告)号：US20070269101A1
公开(公告)日：2007-11-22
申请号：US11782274
申请日：2007-07-24
申请人： Takashi HIROI , Masahiro WATANABE , Chie SHISHIDO , Aritoshi SUGIMOTO , Maki TANAKA , Hiroshi MIYAI , Asahiro KUNI , Yasuhiko NARA
发明人： Takashi HIROI , Masahiro WATANABE , Chie SHISHIDO , Aritoshi SUGIMOTO , Maki TANAKA , Hiroshi MIYAI , Asahiro KUNI , Yasuhiko NARA
IPC分类号： G06K9/00
CPC分类号： G01N21/9501 , G01N21/956 , G01N2021/8854 , G01N2021/8861 , G01N2021/8864 , G01R31/311 , G03F1/86 , G06T1/0007 , G06T7/0002 , G06T7/001 , G06T2200/24 , G06T2207/10061 , G06T2207/30148 , H01J37/222 , H01J37/265 , H01J37/28 , H01J2237/221 , H01J2237/24592 , H01J2237/28
摘要： A pattern inspection apparatus including: an image detecting part for detecting a digital image of an object substrate; a display having a screen on which the digital image of the object substrate and/or a distribution of defect candidates in a map form are displayable; an input device for inputting information of a non-inspection region to be masked on the object substrate by defining a region on the screen on which said distribution of defect candidates is displayed in a map form; a memory part for storing coordinate data, pattern data or feature quantity data of the non-inspection region to be masked on the object substrate inputted on the screen by the input device; and a defect judging part in which the digital image detected by the image detecting part is examined in a state that a region matching with a condition stored in the memory part is masked and a defect is detected in a region other than said masked region.
摘要翻译：一种图案检查装置，包括：图像检测部，用于检测对象基板的数字图像; 具有可以显示对象基板的数字图像的屏幕和/或以地图形式的缺陷候选的分布的显示器; 输入装置，用于通过在屏幕上定义要以掩模形式显示所述缺陷候选的分布的区域来输入要被掩蔽在对象基板上的不检查区域的信息; 用于存储由输入装置输入到屏幕上的待掩蔽的待检查区域的坐标数据，图案数据或特征量数据的存储部分; 以及缺陷判断部分，其中在与存储在存储器部分中的条件匹配的区域被屏蔽并且在除了所述屏蔽区域之外的区域中检测到缺陷的状态下，检查由图像检测部分检测到的数字图像。

3. 发明申请

US20070131877A9 Pattern inspection method and system therefor 审中-公开
标题翻译：图案检验方法及系统
公开(公告)号：US20070131877A9
公开(公告)日：2007-06-14
申请号：US10062666
申请日：2002-02-05
申请人： Takashi Hiroi , Masahiro Watanabe , Asahiro Kuni , Maki Tanaka , Munenori Fukunishi , Hiroshi Miyai , Yasuhiko Nara , Mitsunobu Isobe
发明人： Takashi Hiroi , Masahiro Watanabe , Asahiro Kuni , Maki Tanaka , Munenori Fukunishi , Hiroshi Miyai , Yasuhiko Nara , Mitsunobu Isobe
IPC分类号： G01N23/00
CPC分类号： G06K9/6211 , G01N23/22 , G06K9/033 , G06K2209/19 , G06T7/001 , G06T2207/30148
摘要： Conventionally, defect data outputted by an inspection system comprised only characteristic quantitative data, such as coordinate data, area, and projected length, and only the coordinate data for moving to a defect location could be utilized effectively. By contrast, the present invention, by using image data in addition to characteristic quantitative data as the defect data for an inspection system, enables the retrieval of image data via an outside results confirmation system. Further, in the case of defect data of a plurality of substrates, it is enabled to display a defect image during inspection by the fact that similar defects are retrieved via images and retrieval results are displayed as trends makes it possible to display a defect image during inspection by searching similar defects on images and displaying them as a trend, designating a substrate on the trend, thereby displaying the defect map thereof and designating a defect on the defect map.
摘要翻译：通常，由检查系统输出的缺陷数据仅包括诸如坐标数据，面积和投影长度的特征定量数据，并且仅有用于移动到缺陷位置的坐标数据可以被有效地利用。相比之下，本发明通过使用除了特征定量数据之外的图像数据作为检查系统的缺陷数据，能够经由外部结果确认系统检索图像数据。此外，在多个基板的缺陷数据的情况下，能够通过图像检索相似缺陷的事实在检查期间显示缺陷图像，并且检索结果被显示为趋势，使得可以在显示缺陷图像期间显示缺陷图像通过搜索图像上的类似缺陷并将其显示为趋势，指定趋势上的基板，从而显示其缺陷图并指定缺陷图上的缺陷来进行检查。

4. 发明授权

US06898305B2 Circuit pattern inspection method and apparatus 有权
公开(公告)号：US06898305B2
公开(公告)日：2005-05-24
申请号：US09791911
申请日：2001-02-22
申请人： Takashi Hiroi , Masahiro Watanabe , Chie Shishido , Asahiro Kuni , Maki Tanaka , Hiroshi Miyai , Yasuhiko Nara , Mari Nozoe
发明人： Takashi Hiroi , Masahiro Watanabe , Chie Shishido , Asahiro Kuni , Maki Tanaka , Hiroshi Miyai , Yasuhiko Nara , Mari Nozoe
IPC分类号： G01N23/225 , G01N21/956 , G06T1/00 , G06T7/00 , H01L21/66 , G06K9/00
CPC分类号： G06T7/001 , G01N21/95684 , G06T2207/10056 , G06T2207/30148
摘要： The present invention provides techniques, including a method and system, for inspecting for defects in a circuit pattern on a semi-conductor material. One specific embodiment provides a trial inspection threshold setup method, where the initial threshold is modified after a defect analysis of trial inspection stored data. The modified threshold is then used as the threshold in actual inspection.

5. 发明申请

US20050080647A1 Business process diagnostic method and business process diagnostic system 审中-公开
标题翻译：业务流程诊断方法和业务流程诊断系统
公开(公告)号：US20050080647A1
公开(公告)日：2005-04-14
申请号：US10929418
申请日：2004-08-31
申请人： Koji Okada , Tatsuya Suzuki , Asahiro Kuni
发明人： Koji Okada , Tatsuya Suzuki , Asahiro Kuni
IPC分类号： G06Q10/00 , G06Q10/06 , G06Q50/00 , G06F17/60
CPC分类号： G06Q10/06 , G06Q30/0203
摘要： In business process diagnosis, answers to questions is improved in their accuracy, and an accurate result of diagnosis is obtained. A computer diagnoses a business process of an organization based on answers to questions. The diagnosis includes a first answer reception step in which a first question sheet containing common questions is displayed to receive answers to said common questions and to receive questions proper to the organization, and then a second question sheet containing said common questions, said answers to the common questions, and said questions proper to the organization is generated; a second answer reception step in which said second question sheet is displayed to receive answers to said questions proper to the organization, and then a third question sheet containing said common questions, said answers to the common questions, said questions proper to the organization, and said answers to the questions proper to the organization is generated; and a diagnosis step in which the business process of said organization is diagnosed based on the answers to said common questions and the answers to said questions proper to the organization, with said answers to said common questions and said answers to said questions proper to the organization being filled in said third question sheet.
摘要翻译：在业务流程诊断中，问题的答案在准确性方面得到改进，得到了准确的诊断结果。计算机根据问题的答案诊断组织的业务流程。诊断包括第一答案接收步骤，其中显示包含常见问题的第一问题单以接收对所述常见问题的答案并且接收适合于该组织的问题，然后包含包含所述常见问题的第二个问题单，对共同的问题，并提出了适合组织的问题; 第二回答接收步骤，其中显示所述第二问题单以接收对组织适当的所述问题的答案，然后包含第三个问题单，其中包含所述常见问题，常见问题的答案，对组织适用的所述问题，以及表示对组织适用的问题的答案是产生的; 以及诊断步骤，其中基于所述常见问题的答案和对组织适当的所述问题的答案来诊断所述组织的业务流程，所述答案涉及对所述组织适合的所述常见问题和所述问题的答案填写在第三个问题单中。

6. 发明授权

US06614022B2 Pattern inspection method and apparatus using electron beam 失效
标题翻译：使用电子束的图案检查方法和装置
公开(公告)号：US06614022B2
公开(公告)日：2003-09-02
申请号：US09908713
申请日：2001-07-20
申请人： Takashi Hiroi , Asahiro Kuni , Masahiro Watanabe , Chie Shishido , Hiroyuki Shinada , Yasuhiro Gunji , Atsuko Takafuji
发明人： Takashi Hiroi , Asahiro Kuni , Masahiro Watanabe , Chie Shishido , Hiroyuki Shinada , Yasuhiro Gunji , Atsuko Takafuji
IPC分类号： H01J37244
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/24465 , H01J2237/2817
摘要： In the detecting system for irradiating the electron beam and detecting the secondary electron thereof, an area of the detector is an important factor for high-speed detection. For the technique of the current electron optical system and detector, a detector of the area larger than a constant area is necessary and detection of 200 Msps or more by receiving limitation on the frequency inversely proportional to the area is substantially difficult. For example, for detection at 400 Msps under the condition that the required area is 4 mm square and the rate for 4 mm square is defined as 150 Msps, four discrete high-speed detectors of 2 mm square are arranged to amplify and then add the signals for A/D conversion. Otherwise, the secondary electron is sequentially inputted to the detector of 8 mm square with the secondary electron deflector, the secondary electron is detected at 100 Msps and arranged after the A/D conversion. In any case, the area of 4 mm square and rate of 400 Msps can be attained.
摘要翻译：在用于照射电子束并检测其二次电子的检测系统中，检测器的面积是高速检测的重要因素。对于当前电子光学系统和检测器的技术，需要一个大于恒定面积的区域的检测器，并且通过接收与该区域成反比的频率的限制来检测200 Msps以上是非常困难的。例如，对于在所需面积为4平方毫米，4平方毫米的速率定义为150 Msps的条件下，以400 Msps进行检测，放置4个离散高速2 mm的高速检测器，放大，然后将A / D转换。否则，二次电子依次输入到具有二次电子偏转器的8mm正方形的检测器，二次电子以100Msps检测并且在A / D转换之后排列。在任何情况下，可以获得4平方毫米的面积和400 Msps的面积。

7. 发明授权

US06376854B2 Method of inspecting a pattern on a substrate 有权
标题翻译：检查基板上的图案的方法
公开(公告)号：US06376854B2
公开(公告)日：2002-04-23
申请号：US09848422
申请日：2001-05-04
申请人： Chie Shishido , Takashi Hiroi , Haruo Yoda , Masahiro Watanabe , Asahiro Kuni , Maki Tanaka , Takanori Ninomiya , Hideaki Doi , Shunji Maeda , Mari Nozoe , Hiroyuki Shinoda , Atsuko Takafuji , Aritoshi Sugimoto , Yasutsugu Usami
发明人： Chie Shishido , Takashi Hiroi , Haruo Yoda , Masahiro Watanabe , Asahiro Kuni , Maki Tanaka , Takanori Ninomiya , Hideaki Doi , Shunji Maeda , Mari Nozoe , Hiroyuki Shinoda , Atsuko Takafuji , Aritoshi Sugimoto , Yasutsugu Usami
IPC分类号： G01N2188
CPC分类号： G01N21/95607
摘要： A method for inspecting a pattern formed on a substrate, includes the steps of moving a table along a first direction on which a substrate to be inspected is mounted, irradiating a converged electron beam on the substrate by scanning the converged electron beam along a second direction which is perpendicular to the first direction; detecting an electron radiated from the substrate by the irradiation of the converged electron beam in which the movement of the table and the scanning of the converged electron beam are synchronized; forming a digital image of the substrate from the detected electron; improving a quality of the digital image by filtering the digital image; and detecting a defect of a pattern formed on the substrate by using the improved quality digital image.
摘要翻译：一种用于检查形成在基板上的图案的方法，包括以下步骤：沿着安装有待检查的基板的第一方向移动工作台，通过沿第二方向扫描会聚的电子束将会聚的电子束照射在基板上其垂直于第一方向; 通过会聚电子束的照射来检测从基板辐射的电子，其中台的移动和会聚电子束的扫描同步; 从检测到的电子形成衬底的数字图像; 通过过滤数字图像来提高数字图像的质量; 以及通过使用改进的质量数字图像来检测在基板上形成的图案的缺陷。

8. 发明授权

US07894658B2 Pattern inspection method and apparatus 有权
标题翻译：图案检验方法及装置
公开(公告)号：US07894658B2
公开(公告)日：2011-02-22
申请号：US11931693
申请日：2007-10-31
申请人： Takashi Hiroi , Masahiro Watanabe , Chie Shishido , Aritoshi Sugimoto , Maki Tanaka , Hiroshi Miyai , Asahiro Kuni , Yasuhiko Nara
发明人： Takashi Hiroi , Masahiro Watanabe , Chie Shishido , Aritoshi Sugimoto , Maki Tanaka , Hiroshi Miyai , Asahiro Kuni , Yasuhiko Nara
IPC分类号： G06K9/00
CPC分类号： G01N21/9501 , G01N21/956 , G01N2021/8854 , G01N2021/8861 , G01N2021/8864 , G01R31/311 , G03F1/86 , G06T1/0007 , G06T7/0002 , G06T7/001 , G06T2200/24 , G06T2207/10061 , G06T2207/30148 , H01J37/222 , H01J37/265 , H01J37/28 , H01J2237/221 , H01J2237/24592 , H01J2237/28
摘要： An apparatus for processing a defect candidate image, including: an imager for taking an enlarged image of a specimen; an image processor for processing the image taken by the imager to detect defect candidates existing on the specimen and classify the detected defect candidates into one of plural defect classes; a memory for storing information of the defect candidates including the images of the defect candidates and the classified defect class data outputted from the image processor; and a display unit having a display screen for displaying information stored in the memory, wherein the display unit displays an image of the defect candidates together with the defect class data stored in the memory and the displayed defect class data is changeable on the display screen, and the memory changes the stored defect class data of the displayed defect candidate to the changed defect class data.
摘要翻译：一种用于处理缺陷候选图像的装置，包括：用于拍摄样本的放大图像的成像器; 图像处理器，用于处理由成像器拍摄的图像以检测存在于样本上的缺陷候选，并将检测到的缺陷候选分类为多个缺陷类别中的一个; 存储器，用于存储包括缺陷候选图像和从图像处理器输出的分类缺陷类别数据的缺陷候选的信息; 以及显示单元，具有用于显示存储在存储器中的信息的显示屏幕，其中所述显示单元与存储在所述存储器中的缺陷类别数据一起显示所述缺陷候选的图像，并且所显示的缺陷类别数据可在所述显示屏幕上变化，并且存储器将存储的缺陷候选的缺陷类别数据改变为改变的缺陷类别数据。

9. 发明授权

US07457453B2 Pattern inspection method and apparatus 有权
标题翻译：图案检验方法及装置
公开(公告)号：US07457453B2
公开(公告)日：2008-11-25
申请号：US11782274
申请日：2007-07-24
申请人： Takashi Hiroi , Masahiro Watanabe , Chie Shishido , Aritoshi Sugimoto , Maki Tanaka , Hiroshi Miyai , Asahiro Kuni , Yasuhiko Nara
发明人： Takashi Hiroi , Masahiro Watanabe , Chie Shishido , Aritoshi Sugimoto , Maki Tanaka , Hiroshi Miyai , Asahiro Kuni , Yasuhiko Nara
IPC分类号： G06K9/00
CPC分类号： G01N21/9501 , G01N21/956 , G01N2021/8854 , G01N2021/8861 , G01N2021/8864 , G01R31/311 , G03F1/86 , G06T1/0007 , G06T7/0002 , G06T7/001 , G06T2200/24 , G06T2207/10061 , G06T2207/30148 , H01J37/222 , H01J37/265 , H01J37/28 , H01J2237/221 , H01J2237/24592 , H01J2237/28
摘要： A pattern inspection apparatus including: an image detecting part for detecting a digital image of an object substrate; a display having a screen on which the digital image of the object substrate and/or a distribution of defect candidates in a map form are displayable; an input device for inputting information of a non-inspection region to be masked on the object substrate by defining a region on the screen on which said distribution of defect candidates is displayed in a map form; a memory part for storing coordinate data, pattern data or feature quantity data of the non-inspection region to be masked on the object substrate inputted on the screen by the input device; and a defect judging part in which the digital image detected by the image detecting part is examined in a state that a region matching with a condition stored in the memory part is masked and a defect is detected in a region other than said masked region.
摘要翻译：一种图案检查装置，包括：图像检测部，用于检测对象基板的数字图像; 具有可以显示对象基板的数字图像的屏幕和/或以地图形式的缺陷候选的分布的显示器; 输入装置，用于通过在屏幕上定义要以掩模形式显示所述缺陷候选的分布的区域来输入要被掩蔽在对象基板上的不检查区域的信息; 用于存储由输入装置输入到屏幕上的待掩蔽的待检查区域的坐标数据，图案数据或特征量数据的存储部分; 以及缺陷判断部分，其中在与存储在存储器部分中的条件匹配的区域被屏蔽并且在除了所述屏蔽区域之外的区域中检测到缺陷的状态下，检查由图像检测部分检测到的数字图像。

10. 发明授权

US07439504B2 Pattern inspection method and apparatus using electron beam 失效
标题翻译：使用电子束的图案检查方法和装置
公开(公告)号：US07439504B2
公开(公告)日：2008-10-21
申请号：US11176344
申请日：2005-07-08
申请人： Takashi Hiroi , Asahiro Kuni , Masahiro Watanabe , Chie Shishido , Hiroyuki Shinada , Yasuhiro Gunji , Atsuko Takafuji
发明人： Takashi Hiroi , Asahiro Kuni , Masahiro Watanabe , Chie Shishido , Hiroyuki Shinada , Yasuhiro Gunji , Atsuko Takafuji
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/24465 , H01J2237/2817
摘要： A pattern inspection method and apparatus in which a charged particle beam is irradiated onto a surface of a specimen on which a pattern is formed, plural sensors simultaneously detect secondary particles emanated from the surface of the specimen by the irradiation, signals outputted from each sensor of the plural sensors which simultaneously detect the secondary particles are added, an image of the surface of the specimen on which the pattern is obtained from the added signals, and the image is processed to detect a defect of the pattern.
摘要翻译：一种图案检查方法和装置，其中带电粒子束照射到形成有图案的样本的表面上，多个传感器同时检测通过照射从样品表面发出的二次颗粒，从每个传感器输出的信号添加同时检测二次粒子的多个传感器，从附加的信号中添加从其获得图案的样本的表面的图像，并且处理图像以检测图案的缺陷。

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