专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20110255773A1 CIRCUIT PATTERN INSPECTING APPARATUS, MANAGEMENT SYSTEM INCLUDING CIRCUIT PATTERN INSPECTING APPARATUS, AND METHOD FOR INSPECTING CIRCUIT PATTERN 有权
标题翻译：电路图形检查装置，包括电路图形检查装置的管理系统，以及检查电路图案的方法
公开(公告)号：US20110255773A1
公开(公告)日：2011-10-20
申请号：US13125718
申请日：2009-10-19
申请人： Hiroyuki Takahashi , Yasuhiro Gunji , Hirokazu Ito
发明人： Hiroyuki Takahashi , Yasuhiro Gunji , Hirokazu Ito
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G06T7/13 , G06T2207/30148 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： The operation rate of a circuit pattern inspecting apparatus is prevented from deteriorating by measuring image noise of the circuit pattern inspecting apparatus and detecting the sign that the apparatus is to be in an abnormal state. Provided is the circuit pattern inspecting apparatus wherein circuit pattern abnormalities are detected by irradiating a substrate having a circuit pattern formed thereon with an electron beam and detecting generated secondary electrons or reflected electrons. The circuit pattern inspecting apparatus is provided with: an image processing section wherein an image is generated based on the signal intensities of the detected secondary electrons or those of the reflected electrons and the image is displayed for a display apparatus of the interface; and a control section which analyzes the frequency of noise included in the image.
摘要翻译：通过测量电路图形检查装置的图像噪声并检测装置处于异常状态的符号，防止电路图形检查装置的操作速度恶化。提供电路图案检查装置，其中通过用形成有电子束的电路图案照射基板并检测产生的二次电子或反射电子来检测电路图案异常。电路图案检查装置具有：图像处理部，其基于检测出的二次电子的信号强度或反射电子的信号强度生成图像，并且显示用于界面的显示装置的图像; 以及分析图像中包含的噪声频率的控制部分。

2. 发明申请

US20100314542A1 SEMICONDUCTOR DEVICE INSPECTION APPARATUS 失效
标题翻译：半导体器件检测装置
公开(公告)号：US20100314542A1
公开(公告)日：2010-12-16
申请号：US12860363
申请日：2010-08-20
申请人： Yusuke OMINAMI , Yasuhiro Gunji , Yoshiyuki Shichida
发明人： Yusuke OMINAMI , Yasuhiro Gunji , Yoshiyuki Shichida
IPC分类号： H01J37/244 , H01J37/26
CPC分类号： G01R31/307
摘要： A semiconductor device inspection apparatus having a noise subtraction function includes an electron gun, a stage for holding a sample, a main detector for detecting a signal discharged from the sample, and at least one or more sub detector for detecting noise generated from the sample or apparatus so that there can be obtained an image in which the noise caused by discharge generated on the sample or in the apparatus is removed from the signal. The noise subtraction function subtracts the noise detected by the sub detector from the signal detected by the main detector to remove or reduce the noise from the signal.
摘要翻译：具有噪声减除功能的半导体器件检查装置包括电子枪，用于保持样品的级，用于检测从样品放出的信号的主检测器，以及用于检测从样品产生的噪声的至少一个或多个副检测器，装置，从而可以获得其中从样品或装置中产生的放电引起的噪声从信号中去除的图像。噪声减除函数从主检测器检测到的信号中减去由副检测器检测到的噪声，以消除或降低信号中的噪声。

3. 发明申请

US20100051806A1 CHARGED PARTICLE BEAM APPARATUS 有权
标题翻译：充电颗粒光束装置
公开(公告)号：US20100051806A1
公开(公告)日：2010-03-04
申请号：US12615955
申请日：2009-11-10
申请人： Yuko Sasaki , Yasuhiro Gunji , Zhaohui Cheng
发明人： Yuko Sasaki , Yasuhiro Gunji , Zhaohui Cheng
IPC分类号： G01N23/225
CPC分类号： H01J37/28 , H01J37/153 , H01J37/21 , H01J37/222 , H01J37/265 , H01J2237/141 , H01J2237/1532 , H01J2237/21 , H01J2237/221 , H01J2237/2817
摘要： A charged particle beam apparatus is provided which has high resolving power and a wide scanning region (observation field of view). The apparatus has a unit for adjusting the focus, a unit for adjusting astigmatism, a unit for controlling and detecting scanning positions and a controller operative to control the focus adjustment and astigmatism adjustment at a time in interlocked relation to the scanning positions, thereby assuring compatibility between the high resolving power and the observation view field of a wide area.
摘要翻译：提供具有高分辨率和宽扫描区域（观察视场）的带电粒子束装置。该装置具有用于调节焦点的单元，用于调节散光的单元，用于控制和检测扫描位置的单元，以及控制器，用于与扫描位置互锁地控制焦点调节和像散调整，由此确保相容性在高分辨率和广域的观察视野之间。

4. 发明申请

US20090134340A1 CHARGED PARTICLE BEAM APPARATUS, AND IMAGE GENERATION METHOD WITH CHARGED PARTICLE BEAM APPARATUS 失效
标题翻译：充电颗粒光束装置和带有粒子束装置的图像生成方法
公开(公告)号：US20090134340A1
公开(公告)日：2009-05-28
申请号：US12273805
申请日：2008-11-19
申请人： Kanji FURUHASHI , Shuji Kikuchi , Akira Karakama , Yasuhiro Gunji
发明人： Kanji FURUHASHI , Shuji Kikuchi , Akira Karakama , Yasuhiro Gunji
IPC分类号： H01J3/14
CPC分类号： H01J37/28 , H01J37/20 , H01J37/265 , H01J2237/20221 , H01J2237/20278 , H01J2237/2817
摘要： The present invention has a subject to provide an apparatus that optimizes scanning in accordance with circumstances or purposes, reduces distortion of images, and improves throughput, image quality, and defect detection rate by controlling deflection of a charged particle beam in a stage tracking system. To solve this subject, an apparatus according to the present invention is an inspection apparatus for detecting abnormal conditions of an inspection target by irradiating the inspection target with the charged particle beam and detecting generated secondary electrons, including both a stage that moves continuously with the inspection target placed thereon and a deflection control circuit for providing a deflector with a scanning signal that causes the charged particle beam to scan repeatedly in a direction substantially perpendicular to a stage movement axis direction while the charged particle beam being deflected in the stage movement axis direction in accordance with a change in movement speed of the stage during movement of the stage.
摘要翻译：本发明提供一种根据情况或目的优化扫描的装置，减少图像的失真，并且通过控制在舞台跟踪系统中的带电粒子束的偏转来提高吞吐量，图像质量和缺陷检测率。为了解决这个问题，根据本发明的装置是一种检查装置，用于通过用带电粒子束照射检查对象并检测产生的二次电子来检测检查对象的异常状况，包括两个检查阶段连续移动的阶段目标物放置在其上，以及偏转控制电路，用于向偏转器提供扫描信号，该扫描信号使得带电粒子束在基本上垂直于载物台移动轴线方向的方向上反复扫描，同时带电粒子束在载物台移动轴线方向上偏转根据舞台运动中舞台的移动速度的变化。

5. 发明申请

US20090123059A1 INSPECTION APPARATUS AND INSPECTION METHOD USING ELECTRON BEAM 有权
标题翻译：使用电子束的检查装置和检查方法
公开(公告)号：US20090123059A1
公开(公告)日：2009-05-14
申请号：US12348586
申请日：2009-01-05
申请人： Yasuhiro GUNJI , Hiroshi Miyai , Shigeya Tanaka
发明人： Yasuhiro GUNJI , Hiroshi Miyai , Shigeya Tanaka
IPC分类号： G06K9/00 , G01N23/00
CPC分类号： G01N23/203 , G01N23/2251 , G01N2223/3302 , H01J37/265 , H01J37/28 , H01J2237/2817
摘要： A visual inspection apparatus and method using the scanning electron microscope are disclosed. An electron beam is scanned repeatedly on a sample, and an inspection and a reference image are generated by the secondary electrons generated from the sample or reflected electrons. From the differential image between the inspection image and the reference image, a defect is determined. The number of pixels in the generated image along the direction of repetitive scanning by the electron beam can be changed.
摘要翻译：公开了使用扫描电子显微镜的目视检查装置和方法。在样品上重复扫描电子束，并且由从样品或反射电子产生的二次电子产生检查和参考图像。根据检查图像与参考图像之间的差分图像，确定缺陷。可以改变沿电子束的重复扫描方向产生的图像中的像素数。

6. 发明申请

US20080066830A1 Heat-Resistant Water-Soluble Flux Composition for Soldering 有权
标题翻译：用于焊接的耐热水溶性助焊剂组合物
公开(公告)号：US20080066830A1
公开(公告)日：2008-03-20
申请号：US11632455
申请日：2005-07-15
申请人： Yasuhiro Gunji , Toshiaki Takeyama
发明人： Yasuhiro Gunji , Toshiaki Takeyama
IPC分类号： B23K35/363
CPC分类号： B23K35/3612
摘要： There is provided a water-soluble flux composition for soldering which is excellent particularly in heat resistance and flux residues after soldering of which can be easily removed by washing with water or warm water. The flux composition for soldering contains a compound of formula (1): wherein R1, R2, R3, Rd4, R5 and R6 independently of one another are a hydrocarbon group or hydrogen atom, and A1, A2 and A3 independently of one another are hydroxy group or an organic group of formula (2): and at least one of A1, A2 and A3 is an organic group of formula (2).
摘要翻译：提供了一种用于焊接的水溶性助焊剂组合物，其特别是耐热性优异，焊接后的焊剂残留物可以通过用水或温水洗涤而容易地除去。用于焊接的焊剂组合物包含式（1）的化合物：其中R 1，R 2，R 3，R 4， R 5，R 5和R 6彼此独立地为烃基或氢原子，A 1，O 2， > 2和A 3彼此独立地是羟基或式（2）的有机基团：并且A 1，A 2， SUP> 2和A 3是式（2）的有机基团。

7. 发明授权

US06940069B2 Pattern inspection method and apparatus using electron beam 有权
标题翻译：使用电子束的图案检查方法和装置
公开(公告)号：US06940069B2
公开(公告)日：2005-09-06
申请号：US10637496
申请日：2003-08-11
申请人： Takashi Hiroi , Asahiro Kuni , Masahiro Watanabe , Chie Shishido , Hiroyuki Shinada , Yasuhiro Gunji , Atsuko Takafuji
发明人： Takashi Hiroi , Asahiro Kuni , Masahiro Watanabe , Chie Shishido , Hiroyuki Shinada , Yasuhiro Gunji , Atsuko Takafuji
IPC分类号： G01N23/04 , G01N23/20 , G01N23/225 , G01Q30/04 , G02F1/13 , G06T1/00 , G21K7/00 , H01J37/22 , H01J37/244 , H01J37/28 , G01N23/00
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/24465 , H01J2237/2817
摘要： A pattern inspection method which irradiates a charged particle beam onto a surface of a specimen on which a pattern is formed, simultaneously detecting with plural sensors secondary particles emanated from the surface of the specimen by the irradiation, adding signals outputted from each sensor of the plural sensors which simultaneously detected the secondary particles, obtaining an image of the surface of the specimen on which the pattern is formed from the added signals and processing the image to detect a defect of the pattern.
摘要翻译：将带电粒子束照射在其上形成有图案的样本的表面上的图案检查方法，同时利用多个传感器检测从照射后从样品表面发出的二次粒子，从多个传感器的每个传感器输出的相加信号同时检测次级粒子的传感器，从附加的信号获得形成有图案的样本的表面的图像，并处理图像以检测图案的缺陷。

8. 发明授权

US08086021B2 Appearance inspection apparatus with scanning electron microscope and image data processing method using scanning electron microscope 有权
标题翻译：具有扫描电子显微镜的外观检查装置和使用扫描电子显微镜的图像数据处理方法
公开(公告)号：US08086021B2
公开(公告)日：2011-12-27
申请号：US12367695
申请日：2009-02-09
申请人： Yusuke Ominami , Hiroshi Miyai , Yasuhiro Gunji
发明人： Yusuke Ominami , Hiroshi Miyai , Yasuhiro Gunji
IPC分类号： G06K9/00
CPC分类号： H01J37/28 , H01J37/222 , H01J37/244 , H01J2237/221 , H01J2237/24495 , H01J2237/2485 , H01J2237/2817
摘要： The present invention provides an appearance inspection apparatus that allows a user to give precedence to either defect detection performance or throughput. The appearance inspection apparatus allows a user to select the frequency of a digital image signal or the ratio of the frequency of the digital image signal to a sampling rate. Further, a user is allowed to select either throughput improvement or S/N improvement to prioritize.
摘要翻译：本发明提供了一种外观检查装置，其允许用户优先考虑缺陷检测性能或吞吐量。外观检查装置允许用户选择数字图像信号的频率或数字图像信号的频率与采样率的比率。此外，允许用户选择吞吐量提高或S / N改善以优先化。

9. 发明申请

US20080308725A1 SEMICONDUCTOR DEVICE INSPECTION APPARATUS 失效
标题翻译：半导体器件检测装置
公开(公告)号：US20080308725A1
公开(公告)日：2008-12-18
申请号：US12132361
申请日：2008-06-03
申请人： Yusuke Ominami , Yasuhiro Gunji , Yoshiyuki Shichida
发明人： Yusuke Ominami , Yasuhiro Gunji , Yoshiyuki Shichida
IPC分类号： G01N23/00
CPC分类号： G01R31/307
摘要： A semiconductor device inspection apparatus having a noise subtraction function includes an electron gun, a stage for holding a sample, a main detector for detecting a signal discharged from the sample, and at least one or more sub detector for detecting noise generated from the sample or apparatus so that there can be obtained an image in which the noise caused by discharge generated on the sample or in the apparatus is removed from the signal. The noise subtraction function subtracts the noise detected by the sub detector from the signal detected by the main detector to remove or reduce the noise from the signal.
摘要翻译：具有噪声减除功能的半导体器件检查装置包括电子枪，用于保持样品的级，用于检测从样品放出的信号的主检测器，以及用于检测从样品产生的噪声的至少一个或多个副检测器，装置，从而可以获得其中从样品或装置中产生的放电引起的噪声从信号中去除的图像。噪声减除函数从主检测器检测到的信号中减去由副检测器检测到的噪声，以消除或降低信号中的噪声。

10. 发明申请

US20060151698A1 Charged particle beam apparatus 审中-公开
标题翻译：带电粒子束装置
公开(公告)号：US20060151698A1
公开(公告)日：2006-07-13
申请号：US11311278
申请日：2005-12-20
申请人： Yuko Sasaki , Yasuhiro Gunji , Zhaohui Cheng
发明人： Yuko Sasaki , Yasuhiro Gunji , Zhaohui Cheng
IPC分类号： G21K7/00
CPC分类号： H01J37/28 , H01J37/153 , H01J37/21 , H01J37/222 , H01J37/265 , H01J2237/141 , H01J2237/1532 , H01J2237/21 , H01J2237/221 , H01J2237/2817
摘要： A charged particle beam apparatus is provided which has high resolving power and a wide scanning region (observation field of view). The apparatus has a unit for adjusting the focus, a unit for adjusting astigmatism, a unit for controlling and detecting scanning positions and a controller operative to control the focus adjustment and astigmatism adjustment at a time in interlocked relation to the scanning positions, thereby assuring compatibility between the high resolving power and the observation view field of a wide area.
摘要翻译：提供具有高分辨率和宽扫描区域（观察视场）的带电粒子束装置。该装置具有用于调节焦点的单元，用于调节散光的单元，用于控制和检测扫描位置的单元，以及控制器，用于与扫描位置互锁地控制焦点调节和像散调整，由此确保相容性在高分辨率和广域的观察视野之间。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式