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1. 发明授权

US08609304B2 Method of manufacturing a transfer mask and method of manufacturing a semiconductor device 有权
标题翻译：制造转印掩模的方法和制造半导体器件的方法
公开(公告)号：US08609304B2
公开(公告)日：2013-12-17
申请号：US13436132
申请日：2012-03-30
申请人： Masaru Tanabe , Hideaki Mitsui , Naoki Nishida , Satoshi Iwashita
发明人： Masaru Tanabe , Hideaki Mitsui , Naoki Nishida , Satoshi Iwashita
IPC分类号： G03F1/50
CPC分类号： G03F1/84 , G03F1/70 , G03F1/72
摘要： An internal defect or the like of a transfer mask is detected using transmitted light quantity distribution data of an inspection apparatus. Using a die-to-die comparison inspection method, inspection light is irradiated to a first region of a thin film to obtain a first transmitted light quantity distribution, the inspection light is also irradiated to a second region of the thin film to obtain a second transmitted light quantity distribution, a predetermined-range difference distribution is produced by plotting coordinates at which difference light quantity values calculated from a comparison between the first transmitted light quantity distribution and the second transmitted light quantity distribution are each not less than a first threshold value and less than a second threshold value, and a selection is made of a transfer mask in which a region with high density of plotting is not detected in the predetermined-range difference distribution.
摘要翻译：使用检查装置的透射光量分布数据检测转印掩模的内部缺陷等。使用管芯间的比较检查方法，将检查光照射到薄膜的第一区域以获得第一透射光量分布，也将检查光照射到薄膜的第二区域，以获得第二透射光通过绘制从第一透射光量分布和第二透射光量分布之间的比较计算出的差光量值分别不小于第一阈值的坐标，并产生预定范围的差分布，小于第二阈值，并且选择在预定范围差分布中未检测到具有高密度绘图密度的区域的转印掩模。

2. 发明申请

US20110230623A1 METHOD FOR CONTINUOUSLY PRODUCING ACRYLIC RESIN SHEET TECHNICAL FIELD 审中-公开
标题翻译：连续生产丙烯酸树脂片的方法技术领域
公开(公告)号：US20110230623A1
公开(公告)日：2011-09-22
申请号：US13058430
申请日：2009-08-07
申请人： Takayuki Hirano , Hajime Okutsu , Naoki Nishida , Eita Funami , Hiroshi Okafuji , Hideto Yamazawa , Dalsuke Takayama , Yutaka Ishihara
发明人： Takayuki Hirano , Hajime Okutsu , Naoki Nishida , Eita Funami , Hiroshi Okafuji , Hideto Yamazawa , Dalsuke Takayama , Yutaka Ishihara
IPC分类号： B29C35/10 , C08F265/06
CPC分类号： C08F2/46 , B29C35/10 , B29C39/16 , B29C2035/0827 , B29C2035/0833 , B29C2035/0844 , B29C2035/0877 , B29K2033/08 , B29K2033/12 , C08F265/00 , C08F265/02 , C08F265/04
摘要： Disclosed is a method for continuously producing an acrylic resin sheet containing 50% by mass or more of methyl methacrylate units, which comprises irradiating an active energy ray-polymerizable viscous liquid 2 which contains a polymer, satisfies the following equations (1) and (2), and has a viscosity of 5,000 Pa·s or more with the active energy ray to cure the liquid while transferring the liquid in the state of being held between an endless belt 3 and a film 5 transmissive to the active energy ray or between first and second films transmissive to the active energy ray, 30,000≦Mw≦500,000 (1) 35−(9/200,000)×Mw≦P≦60 (2) wherein, in these equations, Mw represents a weight average molecular weight [−] of the polymer contained in the liquid, and P represents a content [% by mass] of the polymer contained in the liquid.
摘要翻译：公开了一种连续制造含有50质量％以上的甲基丙烯酸甲酯单元的丙烯酸树脂片的方法，其包括照射含有聚合物的活性能量射线聚合性粘性液体2，满足下述式（1）和（2）），并且通过活性能量射线具有5000Pa·s以上的粘度以固化液体，同时在保持在环状带3和透射于活性能量射线的膜5之间的状态下或在第一对于活性能量射线透射的第二膜，30,000和1000; Mw＆lt; 100; 500,000（1）35-（9 / 200,000）×Mw＆nlE; P＆nlE; 60（2）其中，在这些方程式中，Mw表示重均分子量[ ]，P表示包含在液体中的聚合物的含量[质量％]。

3. 发明授权

US07611808B2 Halftone type phase shift mask blank and halftone type phase shift mask 有权
标题翻译：半色调型相移掩模和半色调型相移掩模
公开(公告)号：US07611808B2
公开(公告)日：2009-11-03
申请号：US11642595
申请日：2006-12-21
申请人： Masao Ushida , Minoru Sakamoto , Naoki Nishida
发明人： Masao Ushida , Minoru Sakamoto , Naoki Nishida
IPC分类号： G03F1/00
CPC分类号： G03F1/32 , G03F1/84
摘要： A halftone type phase shift mask having a semitranslucent film pattern and a shielding film pattern provided on a transparent substrate in this order is constituted in such a manner that each of the reflectances of the transparent substrate, the semitranslucent film pattern and the shielding film pattern for an inspecting light represents a difference which can detect the semitranslucent film pattern and the shielding film pattern based on a reflected light generated when the inspecting light is irradiated on the mask.
摘要翻译：以透明基板，半透明膜图案和半透明膜图案和屏蔽膜图案中的每一个反射的方式构成具有半透明膜图案和设置在透明基板上的屏蔽膜图案的半色调型相移掩模检查光表示可以基于在检查光照射在掩模上时产生的反射光来检测半透明膜图案和屏蔽膜图案的差异。

4. 发明申请

US20070230323A1 Recording head and recorder 审中-公开
标题翻译：录音头和录音机
公开(公告)号：US20070230323A1
公开(公告)日：2007-10-04
申请号：US11717573
申请日：2007-03-13
申请人： Naoki Nishida , Hiroaki Ueda , Manami Kuiseko , Koujirou Sekine , Kenji Konno , Masahiro Okitsu , Hiroshi Hatano
发明人： Naoki Nishida , Hiroaki Ueda , Manami Kuiseko , Koujirou Sekine , Kenji Konno , Masahiro Okitsu , Hiroshi Hatano
IPC分类号： G11B7/24
CPC分类号： G11B5/314 , B82Y10/00 , G11B7/00454 , G11B7/124 , G11B7/1359 , G11B7/1378 , G11B7/1387 , G11B11/10532 , G11B11/10554 , G11B2005/0021 , G11B2007/13727
摘要： A recorder has a recording medium for information recording, a light source, an optical system, a slider, and an optical waveguide. To the optical system, light from the light source enters, and the slider moves relative to the recording medium while not in contact therewith. The optical waveguide is arranged at position facing the recording medium in the slider so that light entering from the optical system is irradiated on the recording medium. Where the mode field diameter of the optical waveguide on the light output side is d and the mode field diameter thereof on the light input side is D, the mode field diameter is converted by smoothly changing the diameter of the optical waveguide to satisfy D>d.
摘要翻译：记录器具有用于信息记录的记录介质，光源，光学系统，滑块和光波导。对于光学系统，来自光源的光进入，并且滑块相对于记录介质移动而不与其接触。光波导布置在滑块中面向记录介质的位置，使得从光学系统进入的光被照射在记录介质上。在光输出侧的光波导的模场直径为d，光输入侧的模场直径为D的情况下，通过平滑地改变光波导的直径来转换模场直径，满足D> d 。

5. 发明申请

US20070134568A1 Halftone type phase shift mask blank and halftone type phase shift mask 有权
公开(公告)号：US20070134568A1
公开(公告)日：2007-06-14
申请号：US11642595
申请日：2006-12-21
申请人： Masao Ushida , Minoru Sakamoto , Naoki Nishida
发明人： Masao Ushida , Minoru Sakamoto , Naoki Nishida
IPC分类号： G03F1/00
CPC分类号： G03F1/32 , G03F1/84
摘要： A halftone type phase shift mask having a semitranslucent film pattern and a shielding film pattern provided on a transparent substrate in this order is constituted in such a manner that each of the reflectances of the transparent substrate, the semitranslucent film pattern and the shielding film pattern for an inspecting light represents a difference which can detect the semitranslucent film pattern and the shielding film pattern based on a reflected light generated when the inspecting light is irradiated on the mask.

6. 发明授权

US06992327B2 Monitor pattern of semiconductor device and method of manufacturing semiconductor device 有权
公开(公告)号：US06992327B2
公开(公告)日：2006-01-31
申请号：US10447956
申请日：2003-05-30
申请人： Sachie Tone , Hiroyuki Uno , Naoki Tanahashi , Naoki Nishida
发明人： Sachie Tone , Hiroyuki Uno , Naoki Tanahashi , Naoki Nishida
IPC分类号： H01L23/58
CPC分类号： H01L22/34 , H01L2924/0002 , H01L2924/00
摘要： A plurality of diffused resistors and a plurality of wirings (resistive elements) are alternately disposed along a virtual line, and those diffused resistors and wirings are connected in series by contact vias. In the same wiring layer as that of the wirings, a dummy pattern is formed so as to surround a formation region of the wirings and the diffused resistors. A space between the dummy pattern and the wirings is set in accordance with, for example, a minimum space between wirings in a chip formation portion.

7. 发明授权

US06654535B2 Polyimide optical waveguide 失效
公开(公告)号：US06654535B2
公开(公告)日：2003-11-25
申请号：US09948043
申请日：2001-09-07
申请人： Miyuki Teramoto , Naoki Nishida , Takuji Hatano
发明人： Miyuki Teramoto , Naoki Nishida , Takuji Hatano
IPC分类号： G02B610
CPC分类号： G02B6/138 , G02B1/046 , C08L79/08
摘要： An optical waveguide is produced by forming on a substrate a waveguide layer and/or a clad layer containing, as their main ingredient, polyimide with a fluorine substitution rate of 30% or higher (thus as a fluorinated polyimide layer), with a primer layer laid in between that contains, as its main ingredient, polyimide with a fluorine substitution rate of 10% or lower (including 0%). This improves adherence of the fluorinated polyimide layer to the substrate and prevents the fluorinated polyimide layer from peeling off the substrate. For more effective prevention of such peeling-off and of warping of the substrate, the primer layer is preferably formed to have a thickness of 0.1 to 20 &mgr;m. The primer layer may contain a coupling agent.

8. 发明授权

US08298903B2 Monitor pattern of semiconductor device and method of manufacturing semiconductor device 有权
标题翻译：半导体器件的监视器模式及制造半导体器件的方法
公开(公告)号：US08298903B2
公开(公告)日：2012-10-30
申请号：US12974462
申请日：2010-12-21
申请人： Sachie Tone , Hiroyuki Uno , Naoki Takahashi , Naoki Nishida
发明人： Sachie Tone , Hiroyuki Uno , Naoki Takahashi , Naoki Nishida
IPC分类号： H01L21/20
CPC分类号： H01L22/34 , H01L2924/0002 , H01L2924/00
摘要： A plurality of diffused resistors and a plurality of wirings (resistive elements) are alternately disposed along a virtual line, and those diffused resistors and wirings are connected in series by contact vias. In the same wiring layer as that of the wirings, a dummy pattern is formed so as to surround a formation region of the wirings and the diffused resistors. A space between the dummy pattern and the wirings is set in accordance with, for example, a minimum space between wirings in a chip formation portion.
摘要翻译：多个扩散电阻器和多个布线（电阻元件）沿虚拟线交替布置，并且这些扩散电阻器和布线通过接触通孔串联连接。在与布线的布线层相同的布线层中，形成虚线图案以围绕布线的形成区域和扩散电阻器。虚设图案和布线之间的空间根据例如芯片形成部分中的布线之间的最小间隔来设定。

9. 发明申请

US20120069721A1 RECORDING HEAD AND RECORDER 审中-公开
标题翻译：记录头和记录
公开(公告)号：US20120069721A1
公开(公告)日：2012-03-22
申请号：US13303835
申请日：2011-11-23
申请人： Naoki Nishida , Hiroaki Ueda , Manami Kuiseko , Koujirou Sekine , Kenji Konno , Masahiro Okitsu , Hiroshi Hatano
发明人： Naoki Nishida , Hiroaki Ueda , Manami Kuiseko , Koujirou Sekine , Kenji Konno , Masahiro Okitsu , Hiroshi Hatano
IPC分类号： G11B11/14 , G11B15/64
CPC分类号： G11B5/314 , B82Y10/00 , G11B7/00454 , G11B7/124 , G11B7/1359 , G11B7/1378 , G11B7/1387 , G11B11/10532 , G11B11/10554 , G11B2005/0021 , G11B2007/13727
摘要： A recorder has a recording medium for information recording, a light source, an optical system, a slider, and an optical waveguide. To the optical system, light from the light source enters, and the slider moves relative to the recording medium while not in contact therewith. The optical waveguide is arranged at position facing the recording medium in the slider so that light entering from the optical system is irradiated on the recording medium. Where the mode field diameter of the optical waveguide on the light output side is d and the mode field diameter thereof on the light input side is D, the mode field diameter is converted by smoothly changing the diameter of the optical waveguide to satisfy D>d.
摘要翻译：记录器具有用于信息记录的记录介质，光源，光学系统，滑块和光波导。对于光学系统，来自光源的光进入，并且滑块相对于记录介质移动而不与其接触。光波导布置在滑块中面向记录介质的位置，使得从光学系统进入的光被照射在记录介质上。在光输出侧的光波导的模场直径为d，光输入侧的模场直径为D的情况下，通过平滑地改变光波导的直径来转换模场直径，满足D> d 。

10. 发明申请

US20110092042A1 MONITOR PATTERN OF SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE 有权
标题翻译：半导体器件的显示器图案及制造半导体器件的方法
公开(公告)号：US20110092042A1
公开(公告)日：2011-04-21
申请号：US12974462
申请日：2010-12-21
申请人： Sachie TONE , Hiroyuki UNO , Naoki TANAHASHI , Naoki NISHIDA
发明人： Sachie TONE , Hiroyuki UNO , Naoki TANAHASHI , Naoki NISHIDA
IPC分类号： H01L21/02
CPC分类号： H01L22/34 , H01L2924/0002 , H01L2924/00
摘要： A plurality of diffused resistors and a plurality of wirings (resistive elements) are alternately disposed along a virtual line, and those diffused resistors and wirings are connected in series by contact vias. In the same wiring layer as that of the wirings, a dummy pattern is formed so as to surround a formation region of the wirings and the diffused resistors. A space between the dummy pattern and the wirings is set in accordance with, for example, a minimum space between wirings in a chip formation portion.
摘要翻译：多个扩散电阻器和多个布线（电阻元件）沿虚拟线交替布置，并且这些扩散电阻器和布线通过接触通孔串联连接。在与布线的布线层相同的布线层中，形成虚线图案以围绕布线的形成区域和扩散电阻器。虚设图案和布线之间的空间根据例如芯片形成部分中的布线之间的最小间隔来设定。

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