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    • 4. 发明授权
    • Apparatus for forming thin film
    • 用于形成薄膜的装置
    • US08999064B2
    • 2015-04-07
    • US13179463
    • 2011-07-08
    • Sang-Woo Lee
    • Sang-Woo Lee
    • C23C16/00C23C14/24C23C14/12
    • C23C14/243C23C14/12
    • A thin film forming apparatus according to the embodiment includes a plurality of vapor deposition sources respectively separated from each other, a plurality of nozzle bodies connected to upper portions of the respective vapor deposition sources, and a plurality of nozzles connected to upper portions of the respective nozzle bodies. A nozzle hole of each of the nozzles is formed on a same vapor deposition line. Thus, according to the embodiment, the first organic material and the second organic material respectively sprayed through a first nozzle hole and a second nozzle hole can be uniformly mixed by disposing the first nozzle hole and the second nozzle on the same vapor deposition line.
    • 根据实施例的薄膜形成装置包括分别彼此分离的多个气相沉积源,连接到各个蒸镀源的上部的多个喷嘴体,以及连接到各个蒸镀源的上部的多个喷嘴 喷嘴体。 每个喷嘴的喷嘴孔形成在相同的蒸镀线上。 因此,根据本实施例,通过将第一喷嘴孔和第二喷嘴设置在相同的蒸镀线上,能够均匀地混合通过第一喷嘴孔和第二喷嘴孔喷射的第一有机材料和第二有机材料。