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1. 发明申请

US20090123867A1 PHOTOSENSITIVE RESIN COMPOSITION AND ADHESION PROMOTER 有权
标题翻译：光敏树脂组合物和粘合促进剂
公开(公告)号：US20090123867A1
公开(公告)日：2009-05-14
申请号：US11994300
申请日：2006-04-18
申请人： Tomoyuki Yuba , Yoji Fujita , Masao Tomikawa
发明人： Tomoyuki Yuba , Yoji Fujita , Masao Tomikawa
IPC分类号： G03F7/075 , G03F7/20 , C07F7/10
CPC分类号： G03F7/0751 , C08K5/0025 , C08K5/544 , G03F7/0045 , G03F7/0226 , G03F7/0755 , Y10S430/106 , Y10S430/111 , Y10S430/115 , Y10S430/117
摘要： The present invention provides a photosensitive resin composition comprising (a) an alkali-soluble resin, (b) a silicon compound having a secondary aromatic amino group and an alkoxy group, and (c) at least one selected from a photopolymerization initiator, a photo acid generator and a photo base generator. According to the present invention, it is possible to obtain a photosensitive resin composition which remarkably enhances the adhesion property with a substrate after curing without deteriorating storage stability of a solution, and does not cause peeling of a fine pattern even upon development.
摘要翻译：本发明提供一种感光性树脂组合物，其含有（a）碱溶性树脂，（b）具有仲芳香族氨基和烷氧基的硅化合物，和（c）选自光聚合引发剂，照片酸发生器和光源发生器。根据本发明，可以获得在固化后显着提高与基材的粘合性的感光性树脂组合物，而不会降低溶液的储存稳定性，并且即使在显影时也不会造成精细图案的剥离。

2. 发明授权

US08883391B2 Positive type photosensitive resin composition 有权
标题翻译：正型感光性树脂组合物
公开(公告)号：US08883391B2
公开(公告)日：2014-11-11
申请号：US13514932
申请日：2010-12-07
申请人： Tomotsugu Miyabe , Yoji Fujita
发明人： Tomotsugu Miyabe , Yoji Fujita
IPC分类号： G03F7/023 , C08L79/08 , C08G73/10 , G03F7/075 , C08K5/29 , C08K5/5425 , C08K5/5435
CPC分类号： C08L79/08 , C08G73/10 , C08K5/29 , C08K5/5425 , C08K5/5435 , C08L63/00 , G03F7/0233 , G03F7/0751
摘要： Disclosed is a positive-type photosensitive resin composition which has excellent storage stability, particularly excellent sensitivity stability, and can be formed into a cured film having excellent adhesion onto a substrate when heated at 350° C. or higher or heated in the air. The positive-type photosensitive resin composition comprises (a) a polymer having, as the main component, at least one structure selected from the group consisting of a polyimide precursor structure, a polybenzoxazole precursor structure, and a polyimide structure, (b) a quinonediazide compound, (c) a silane coupling agent having a styryl group, (d) a silane coupling agent having an epoxy group, an oxetanyl group, a methacryloxy group, an acryloxy group, an amino group, an amide group or mercapto group and an alkoxysilyl group, and (e) a solvent.
摘要翻译：公开了一种具有优异的储存稳定性，特别优异的灵敏度稳定性的正型感光性树脂组合物，并且可以在350℃以上加热或在空气中加热时，形成具有优异的粘合力的固化膜。正型感光性树脂组合物包含（a）以聚酰亚胺前体结构，聚苯并恶唑前体结构和聚酰亚胺结构为主成分的组中选择的至少一种结构为主成分的聚合物，（b）醌二叠氮化物化合物，（c）具有苯乙烯基的硅烷偶联剂，（d）具有环氧基，氧杂环丁烷基，甲基丙烯酰氧基，丙烯酰氧基，氨基，酰胺基或巯基的硅烷偶联剂，和烷氧基甲硅烷基，（e）溶剂。

3. 发明授权

US4980248A Molten carbonate type fuel cell 失效
标题翻译：熔融碳酸盐型燃料电池
公开(公告)号：US4980248A
公开(公告)日：1990-12-25
申请号：US375688
申请日：1989-07-05
申请人： Yoji Fujita
发明人： Yoji Fujita
IPC分类号： H01M8/02 , H01M4/86 , H01M4/90 , H01M8/14
CPC分类号： H01M4/9016 , H01M4/8621 , H01M8/142 , H01M2004/8689 , H01M2008/147 , H01M2300/0051 , Y02E60/526
摘要： A molten carbonate type fuel cell with a stabilized battery characteristic over a long period of time by replenishing the electrolyte which has been consumed, and maintaining the electrolyte at a consistent composition, the fuel cell carrying, on at least one of the electrolytic layer at its side of the air electrode, the air electrode per se, and the structural members of the air electrode side gas chamber, a lithium-containing composite oxide which brings about chemical reaction, when a ratio of lithium (Li) to potassium (K) in the electrolyte reduces, to produce Li.sub.2 CO.sub.3 due to change in the ratios between lithium and other elements, during a period when the Li/K ratio between lithium and potassium in the electrolyte comprising mainly Li.sub.2 CO.sub.3 and K.sub.2 CO.sub.3 varies from 40/60 to 70/30 at a temperature range of from 600.degree. C. to 700.degree. C. in a gas atmosphere of the air electrode side.
摘要翻译：一种具有稳定电池特性的熔融碳酸盐型燃料电池，其特征在于，通过补充被消耗的电解质，并将电解质保持在一致的组成，所述燃料电池在其电解质层的至少一个上承载空气电极本身，空气电极侧气室的结构部件，当锂（Li）与钾（K）的比率导致化学反应时的含锂复合氧化物在主要由Li 2 CO 3和K 2 CO 3组成的电解质中的锂/钾之间的Li / K比在40/60至70/30之间的时间内，由于锂和其它元素之间的比率的变化，电解质会降低，以产生Li 2 CO 3，在空气电极侧的气体气氛中的温度范围为600℃至700℃。

4. 发明授权

US09073301B2 Screen printing machine having a screen position adjusting device 有权
标题翻译：丝网印刷机具有屏幕位置调整装置
公开(公告)号：US09073301B2
公开(公告)日：2015-07-07
申请号：US13643554
申请日：2011-04-25
申请人： Takeshi Kondo , Ritsuo Hirukawa , Yoji Fujita
发明人： Takeshi Kondo , Ritsuo Hirukawa , Yoji Fujita
IPC分类号： B41F15/00 , B41F15/08 , B41F15/26 , B41F15/44 , H05K3/12 , B41F35/00 , B41F15/28 , B41F15/36 , H05K3/34
CPC分类号： B41F15/44 , B41F15/0881 , B41F15/28 , B41F15/36 , B41F35/005 , B41P2235/246 , B41P2235/26 , H05K3/1233 , H05K3/3484
摘要： A screen printing machine configured to move a squeegee by a squeegee moving device along a mask to print solder on a substrate through a through hole of the mask is improved in size and usability. A squeegee-device main body is fixed to a mask frame receiver for holding a mask frame, and a squeegee slide, a squeegee head, and a squeegee-slide driving device are provided on the main body. A position adjusting device including two front/rear-direction adjusting units, one right/left-direction adjusting unit, and one floating support unit is provided between a main body frame of the screen printing machine, and the mask frame receiver and the squeegee-device main body to adjust relative positions of the mask and the substrate by moving the mask frame receiver and the squeegee-device main body together with each other.
摘要翻译：丝网印刷机被配置为通过刮板移动装置沿着掩模移动刮板，通过掩模的通孔在基板上印刷焊料，尺寸和可用性得到改善。刮板装置主体被固定到用于保持面罩框架的面罩框架接收器，并且在主体上设置有刮板滑块，刮板头和刮板滑动驱动装置。在丝网印刷机的主体框架和面罩框架接收器和刮板接收器之间设置有包括两个前/后方向调整单元，一个左/右方向调整单元和一个浮动支撑单元的位置调整装置，装置主体，用于通过使掩模框架接收器和刮板装置主体彼此移动来调节掩模和基板的相对位置。

5. 发明授权

US08158324B2 Positive-type photosensitive resin composition 有权
标题翻译：正型感光性树脂组合物
公开(公告)号：US08158324B2
公开(公告)日：2012-04-17
申请号：US12449527
申请日：2008-02-05
申请人： Yoji Fujita , Shinji Arimoto , Rinsei Ike
发明人： Yoji Fujita , Shinji Arimoto , Rinsei Ike
IPC分类号： G03F7/023
CPC分类号： C08F290/06 , C08F290/14 , C08F299/02 , C08F299/06 , C08G73/101 , C08G73/1014 , C08G73/1017 , C08G73/121 , C08G73/122 , C08G73/123 , C08G73/124 , C08G73/125 , C08G73/126 , C08G73/127 , C08G73/14 , C08L61/00 , C08L61/06 , C08L79/085 , G03F7/0236 , C08L2666/20 , C08L2666/16
摘要： A positive-type photosensitive resin composition, including: (a) a novolac resin; (b) a polymer including, as a main component, a structure represented by formula (1) and/or formula (2): (wherein R1 and R2 may be the same or different and each represent an organic group having at least two carbon atoms and a valence of 2 to 8, R3 and R4 may be the same or different and each represent hydrogen or a monovalent organic group of 1 to 20 carbon atoms, —NH—R5 in formula (1) and —CO—R6 in formula (2) each represent a polymer end group, R5 and R6 each represent a monovalent organic group having 2 to 30 carbon atoms which includes an unsaturated hydrocarbon group, n is in the range of 10 to 100,000, l and m each represent an integer of 0 to 2, and p and q each represent an integer of 0 to 4, provided that p+q>0; (c) a quinone diazide compound; (d) an alkoxymethyl group-containing compound; and (e) a solvent.
摘要翻译：正型感光性树脂组合物，其包含：（a）酚醛清漆树脂; （b）包含以式（1）和/或式（2）表示的结构作为主要成分的聚合物：（其中R 1和R 2可以相同或不同，各自表示具有至少两个碳的有机基团原子和2〜8价，R3和R4可以相同或不同，分别表示氢或1〜20个碳原子的一价有机基团，式（1）中的-NH-R5和式（2）各自表示聚合物端基，R 5和R 6各自表示碳原子数为2〜30的1价有机基团，其包含不饱和烃基，n在10〜100,000的范围内，l和m各自表示 0〜2，p和q各自表示0〜4的整数，条件是p + q> 0;（c）醌二叠氮化合物;（d）含烷氧基甲基的化合物;和（e）溶剂。

6. 发明授权

US07977028B2 Photosensitive resin composition and adhesion promoter 有权
标题翻译：感光树脂组合物和粘合促进剂
公开(公告)号：US07977028B2
公开(公告)日：2011-07-12
申请号：US11994300
申请日：2006-04-18
申请人： Tomoyuki Yuba , Yoji Fujita , Masao Tomikawa
发明人： Tomoyuki Yuba , Yoji Fujita , Masao Tomikawa
IPC分类号： G03F7/075 , G03F7/028 , G03F7/032 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0751 , C08K5/0025 , C08K5/544 , G03F7/0045 , G03F7/0226 , G03F7/0755 , Y10S430/106 , Y10S430/111 , Y10S430/115 , Y10S430/117
摘要： The present invention provides a photosensitive resin composition comprising (a) an alkali-soluble resin, (b) a silicon compound having a secondary aromatic amino group and an alkoxy group, and (c) at least one selected from a photopolymerization initiator, a photo acid generator and a photo base generator. According to the present invention, it is possible to obtain a photosensitive resin composition which remarkably enhances the adhesion property with a substrate after curing without deteriorating storage stability of a solution, and does not cause peeling of a fine pattern even upon development.
摘要翻译：本发明提供一种感光性树脂组合物，其含有（a）碱溶性树脂，（b）具有仲芳香族氨基和烷氧基的硅化合物，和（c）选自光聚合引发剂，照片酸发生器和光源发生器。根据本发明，可以获得在固化后显着提高与基材的粘合性的感光性树脂组合物，而不会降低溶液的储存稳定性，并且即使在显影时也不会造成精细图案的剥离。

7. 发明授权

US06524764B1 Positive-type photosensitive polyimide precursor composition 有权
标题翻译：正型光敏聚酰亚胺前体组合物
公开(公告)号：US06524764B1
公开(公告)日：2003-02-25
申请号：US09744734
申请日：2001-01-29
申请人： Masao Tomikawa , Mitsuhito Suwa , Yoji Fujita
发明人： Masao Tomikawa , Mitsuhito Suwa , Yoji Fujita
IPC分类号： G03F7023
CPC分类号： G03F7/0233 , C08G73/10 , G03F7/022
摘要： The present invention relates to a positive type photosensitive resin precursor composition which is characterized in that it contains polymer having, as its chief component, structural units represented by the following general formula (1) and, furthermore, in that it satisfies the following conditions (a) and/or (b). The invention provides an alkali-developable photosensitive composition. (a) There is included an ester of a naphthoquinone diazide sulphonic acid and a phenol compound of dipole moment 0.1 to 1.6 debye (b) There is included a phenol compound represented by general formula (8) and a naphthoquinone diazide sulphonic acid and/or an ester of a phenol compound represented by general formula (8) and a naphthoquinone diazide sulphonic acid (In general formula (1), R1 represents a bivalent to octavalent organic group with at least two carbon atoms, R2 represents a bivalent to hexavalent organic group with at least two carbon atoms, and R3 represents hydrogen or an organic group with from one to ten carbons. n is an integer in the range 10 to 100,000, m is an integer in the range 0 to 2, and p and q are integers in the range 0 to 4, but p and q are not simultaneously 0.) (In the formula, R23, R24, R26 and R27 each represents a hydrogen atom or a C1-8 alkyl group, alkoxy group, carboxyl group or ester group. At least one R25 is hydroxyl group, while the rest represent hydrogen atoms and C1-8 alkyl groups. aa, bb, cc and dd represent integers in the range 0 to 3. However, aa+bb≦5, bb+dd≦5 and aa+bb>0. ee represents an integer in the range 1 to 3.)
摘要翻译：本发明涉及一种正型感光性树脂前体组合物，其特征在于，其含有以下述通式（1）表示的结构单元作为主要成分的聚合物，此外，其具有满足以下条件（ a）和/或（b）。本发明提供一种碱显影性感光性组合物，（a）含有萘醌二叠氮磺酸的酯和偶极矩0.1〜1.6德烯的酚化合物（b）含有通式（8）表示的酚化合物）和萘醌二叠氮磺酸和/或由通式（8）表示的酚化合物和萘醌二叠氮磺酸的酯（通式（1）中，R 1表示具有至少两个碳的二价至八价有机基团原子，R2表示具有至少两个碳原子的二价至六价有机基团，并且R 3表示氢或具有1至10个碳的有机基团，n为10至100,000的整数，m为范围内的整数 0〜2，p和q为0〜4的整数，p和q不同时为0）（式中，R 23，R 24，R 26和R 27分别表示氢原子或C 1-8烷基基团，烷氧基，羧基或醚基 ter组。至少一个R 25是羟基，而其余的表示氢原子和C 1-8烷基。 aa，bb，cc和dd表示0至3范围内的整数。然而，aa + bb <= 5，bb + dd <= 5和aa + bb> 0。 ee表示1〜3的整数）

8. 发明申请

US20130087057A1 SCREEN PRINTING MACHINE 有权
标题翻译：丝印机
公开(公告)号：US20130087057A1
公开(公告)日：2013-04-11
申请号：US13643554
申请日：2011-04-25
申请人： Takeshi Kondo , Ritsuo Hirukawa , Yoji Fujita
发明人： Takeshi Kondo , Ritsuo Hirukawa , Yoji Fujita
IPC分类号： B41F15/44
CPC分类号： B41F15/44 , B41F15/0881 , B41F15/28 , B41F15/36 , B41F35/005 , B41P2235/246 , B41P2235/26 , H05K3/1233 , H05K3/3484
摘要： A screen printing machine configured to move a squeegee by a squeegee moving device along a mask to print solder on a substrate through a through hole of the mask is improved in size and usability. A squeegee-device main body is fixed to a mask frame receiver for holding a mask frame, and a squeegee slide, a squeegee head, and a squeegee-slide driving device are provided on the main body. A position adjusting device including two front/rear-direction adjusting units, one right/left-direction adjusting unit, and one floating support unit is provided between a main body frame of the screen printing machine, and the mask frame receiver and the squeegee-device main body to adjust relative positions of the mask and the substrate by moving the mask frame receiver and the squeegee-device main body together with each other.
摘要翻译：丝网印刷机被配置为通过刮板移动装置沿着掩模移动刮板，通过掩模的通孔在基板上印刷焊料，尺寸和可用性得到改善。刮板装置主体被固定到用于保持面罩框架的面罩框架接收器，并且在主体上设置有刮板滑块，刮板头和刮板滑动驱动装置。在丝网印刷机的主体框架和面罩框架接收器和刮板接收器之间设置有包括两个前/后方向调整单元，一个左/右方向调整单元和一个浮动支撑单元的位置调整装置，装置主体，用于通过使掩模框架接收器和刮板装置主体彼此移动来调节掩模和基板的相对位置。

9. 发明申请

US20120251949A1 POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION 有权
标题翻译：正型型感光树脂组合物
公开(公告)号：US20120251949A1
公开(公告)日：2012-10-04
申请号：US13514932
申请日：2010-12-07
申请人： Tomotsugu Miyabe , Yoji Fujita
发明人： Tomotsugu Miyabe , Yoji Fujita
IPC分类号： G03F7/075
CPC分类号： C08L79/08 , C08G73/10 , C08K5/29 , C08K5/5425 , C08K5/5435 , C08L63/00 , G03F7/0233 , G03F7/0751
摘要： Disclosed is a positive-type photosensitive resin composition which has excellent storage stability, particularly excellent sensitivity stability, and can be formed into a cured film having excellent adhesion onto a substrate when heated at 350° C. or higher or heated in the air. The positive-type photosensitive resin composition comprises (a) a polymer having, as the main component, at least one structure selected from the group consisting of a polyimide precursor structure, a polybenzoxazole precursor structure, and a polyimide structure, (b) a quinonediazide compound, (c) a silane coupling agent having a styryl group, (d) a silane coupling agent having an epoxy group, an oxetanyl group, a methacryloxy group, an acryloxy group, an amino group, an amide group or mercapto group and an alkoxysilyl group, and (e) a solvent.
摘要翻译：公开了一种具有优异的储存稳定性，特别优异的灵敏度稳定性的正型感光性树脂组合物，并且可以在350℃以上加热或在空气中加热时，形成具有优异的粘合力的固化膜。正型感光性树脂组合物包含（a）以聚酰亚胺前体结构，聚苯并恶唑前体结构和聚酰亚胺结构为主成分的组中选择的至少一种结构为主成分的聚合物，（b）醌二叠氮化物化合物，（c）具有苯乙烯基的硅烷偶联剂，（d）具有环氧基，氧杂环丁烷基，甲基丙烯酰氧基，丙烯酰氧基，氨基，酰胺基或巯基的硅烷偶联剂，和烷氧基甲硅烷基，（e）溶剂。

10. 发明授权

US07507518B2 Photosensitive resin precursor composition 有权
标题翻译：感光树脂前体组合物
公开(公告)号：US07507518B2
公开(公告)日：2009-03-24
申请号：US10885100
申请日：2004-07-07
申请人： Yoji Fujita , Tomoyuki Yuba , Mitsuhito Suwa
发明人： Yoji Fujita , Tomoyuki Yuba , Mitsuhito Suwa
IPC分类号： G03F7/021 , G03F7/023 , G03F7/30
CPC分类号： G03F7/0233 , G03F7/0045 , G03F7/0751
摘要： The present invention relates to a positive photosensitive resin precursor composition which exhibits good storage stability after exposure.A photosensitive resin precursor composition comprises (a) a polymer essentially composed of a structural unit expressed by formula (1); (b) at least two photo acid generators; and (c) a compound having an alkoxymethyl group: wherein R1 represents an organic group with a valence of 2 to 8, having at least two carbon atoms; R2 represents an organic group with a valence of 2 to 6, having at least two carbon atoms; R3 represents hydrogen or an organic group having a carbon number in the range of 1 to 20; n represents a number ranging from 10 to 100,000; m represents an integer in the range of 0 to 2; and p and q represent integers in the range of 0 to 4 and satisfy p+q>0.
摘要翻译：本发明涉及曝光后显示良好的储存稳定性的正型感光性树脂前体组合物。光敏树脂前体组合物包含（a）基本上由式（1）表示的结构单元组成的聚合物; （b）至少两个光酸产生剂; 和（c）具有烷氧基甲基的化合物：其中R1表示具有至少两个碳原子的价数为2至8的有机基团; R2表示具有至少2个碳原子的2价至6价的有机基团; R3表示氢或碳数为1〜20的有机基团; n表示10〜100,000的数; m表示0〜2的整数， p和q表示0〜4的整数，满足p + q> 0。

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