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    • 1. 发明授权
    • Photosensitive resin precursor composition
    • 感光树脂前体组合物
    • US07507518B2
    • 2009-03-24
    • US10885100
    • 2004-07-07
    • Yoji FujitaTomoyuki YubaMitsuhito Suwa
    • Yoji FujitaTomoyuki YubaMitsuhito Suwa
    • G03F7/021G03F7/023G03F7/30
    • G03F7/0233G03F7/0045G03F7/0751
    • The present invention relates to a positive photosensitive resin precursor composition which exhibits good storage stability after exposure.A photosensitive resin precursor composition comprises (a) a polymer essentially composed of a structural unit expressed by formula (1); (b) at least two photo acid generators; and (c) a compound having an alkoxymethyl group: wherein R1 represents an organic group with a valence of 2 to 8, having at least two carbon atoms; R2 represents an organic group with a valence of 2 to 6, having at least two carbon atoms; R3 represents hydrogen or an organic group having a carbon number in the range of 1 to 20; n represents a number ranging from 10 to 100,000; m represents an integer in the range of 0 to 2; and p and q represent integers in the range of 0 to 4 and satisfy p+q>0.
    • 本发明涉及曝光后显示良好的储存稳定性的正型感光性树脂前体组合物。 光敏树脂前体组合物包含(a)基本上由式(1)表示的结构单元组成的聚合物; (b)至少两个光酸产生剂; 和(c)具有烷氧基甲基的化合物:其中R1表示具有至少两个碳原子的价数为2至8的有机基团; R2表示具有至少2个碳原子的2价至6价的有机基团; R3表示氢或碳数为1〜20的有机基团; n表示10〜100,000的数; m表示0〜2的整数, p和q表示0〜4的整数,满足p + q> 0。
    • 2. 发明申请
    • Photosensitive resin precursor composition
    • 感光树脂前体组合物
    • US20050014876A1
    • 2005-01-20
    • US10885100
    • 2004-07-07
    • Yoji FujitaTomoyuki YubaMitsuhito Suwa
    • Yoji FujitaTomoyuki YubaMitsuhito Suwa
    • G03F7/022G03F7/004G03F7/023G03F7/075C08L1/00
    • G03F7/0233G03F7/0045G03F7/0751
    • The present invention relates to a positive photosensitive resin precursor composition which exhibits good storage stability after exposure. A photosensitive resin precursor composition comprises (a) a polymer essentially composed of a structural unit expressed by formula (1); (b) at least two photo acid generators; and (c) a compound having an alkoxymethyl group: wherein R1 represents an organic group with a valence of 2 to 8, having at least two carbon atoms; R2 represents an organic group with a valence of 2 to 6, having at least two carbon atoms; R3 represents hydrogen or an organic group having a carbon number in the range of 1 to 20; n represents a number ranging from 10 to 100,000; m represents an integer in the range of 0 to 2; and p and q represent integers in the range of 0 to 4 and satisfy p+q>0.
    • 本发明涉及曝光后显示良好的储存稳定性的正型感光性树脂前体组合物。 光敏树脂前体组合物包含(a)基本上由式(1)表示的结构单元组成的聚合物; (b)至少两个光酸产生剂; 和(c)具有烷氧基甲基的化合物:其中R 1表示具有至少两个碳原子的价数为2至8的有机基团; R 2表示具有至少两个碳原子的价数为2至6的有机基团; R 3表示氢或碳数为1〜20的有机基团; n表示10〜100,000的数; m表示0〜2的整数, p和q表示0〜4的整数,满足p + q> 0。
    • 3. 发明授权
    • Positive-type photosensitive polyimide precursor composition
    • 正型光敏聚酰亚胺前体组合物
    • US06524764B1
    • 2003-02-25
    • US09744734
    • 2001-01-29
    • Masao TomikawaMitsuhito SuwaYoji Fujita
    • Masao TomikawaMitsuhito SuwaYoji Fujita
    • G03F7023
    • G03F7/0233C08G73/10G03F7/022
    • The present invention relates to a positive type photosensitive resin precursor composition which is characterized in that it contains polymer having, as its chief component, structural units represented by the following general formula (1) and, furthermore, in that it satisfies the following conditions (a) and/or (b). The invention provides an alkali-developable photosensitive composition. (a) There is included an ester of a naphthoquinone diazide sulphonic acid and a phenol compound of dipole moment 0.1 to 1.6 debye (b) There is included a phenol compound represented by general formula (8) and a naphthoquinone diazide sulphonic acid and/or an ester of a phenol compound represented by general formula (8) and a naphthoquinone diazide sulphonic acid (In general formula (1), R1 represents a bivalent to octavalent organic group with at least two carbon atoms, R2 represents a bivalent to hexavalent organic group with at least two carbon atoms, and R3 represents hydrogen or an organic group with from one to ten carbons. n is an integer in the range 10 to 100,000, m is an integer in the range 0 to 2, and p and q are integers in the range 0 to 4, but p and q are not simultaneously 0.) (In the formula, R23, R24, R26 and R27 each represents a hydrogen atom or a C1-8 alkyl group, alkoxy group, carboxyl group or ester group. At least one R25 is hydroxyl group, while the rest represent hydrogen atoms and C1-8 alkyl groups. aa, bb, cc and dd represent integers in the range 0 to 3. However, aa+bb≦5, bb+dd≦5 and aa+bb>0. ee represents an integer in the range 1 to 3.)
    • 本发明涉及一种正型感光性树脂前体组合物,其特征在于,其含有以下述通式(1)表示的结构单元作为主要成分的聚合物,此外,其具有满足以下条件( a)和/或(b)。 本发明提供一种碱显影性感光性组合物,(a)含有萘醌二叠氮磺酸的酯和偶极矩0.1〜1.6德烯的酚化合物(b)含有通式(8)表示的酚化合物 )和萘醌二叠氮磺酸和/或由通式(8)表示的酚化合物和萘醌二叠氮磺酸的酯(通式(1)中,R 1表示具有至少两个碳的二价至八价有机基团 原子,R2表示具有至少两个碳原子的二价至六价有机基团,并且R 3表示氢或具有1至10个碳的有机基团,n为10至100,000的整数,m为范围内的整数 0〜2,p和q为0〜4的整数,p和q不同时为0)(式中,R 23,R 24,R 26和R 27分别表示氢原子或C 1-8烷基 基团,烷氧基,羧基或醚基 ter组。 至少一个R 25是羟基,而其余的表示氢原子和C 1-8烷基。 aa,bb,cc和dd表示0至3范围内的整数。然而,aa + bb <= 5,bb + dd <= 5和aa + bb> 0。 ee表示1〜3的整数)
    • 7. 发明申请
    • POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION
    • 阳性型光敏树脂组合物
    • US20100099041A1
    • 2010-04-22
    • US12449527
    • 2008-02-05
    • Yoji FujitaShinji ArimotoRinsei Ike
    • Yoji FujitaShinji ArimotoRinsei Ike
    • G03F7/004
    • C08F290/06C08F290/14C08F299/02C08F299/06C08G73/101C08G73/1014C08G73/1017C08G73/121C08G73/122C08G73/123C08G73/124C08G73/125C08G73/126C08G73/127C08G73/14C08L61/00C08L61/06C08L79/085G03F7/0236C08L2666/20C08L2666/16
    • [Problem] To provide a positive-type photosensitive resin composition that is produced with novolac resin and has good mechanical properties and high storage stability. [Means for Solving the Problem] A positive-type photosensitive resin composition, comprising: (a) a novolac resin; (b) a polymer comprising, as a main component, a structure represented by formula (1) below and/or a structure represented by formula (2) below: (wherein formulae (1) and (2), R1 and R2 may be the same or different and each represent an organic group having at least two carbon atoms and a valence of 2 to 8, R3 and R4 may be the same or different and each represent hydrogen or a monovalent organic group of 1 to 20 carbon atoms, —NH—R5 in formula (1) and —CO—R6 in formula (2) each represent a polymer end group, R5 and R6 each represent a monovalent organic group having 2 to 30 carbon atoms which includes an unsaturated hydrocarbon group, n is in the range of 10 to 100,000, l and m each represent an integer of 0 to 2, and p and q each represent an integer of 0 to 4, provided that p+q>0; (c) a quinone diazide compound; (d) an alkoxymethyl group-containing compound; and (e) a solvent.
    • [问题]提供一种用酚醛清漆树脂制备并具有良好的机械性能和高储存稳定性的正型感光性树脂组合物。 一种正型感光性树脂组合物,其包含:(a)酚醛清漆树脂; (b)以下述式(1)表示的结构和/或下述式(2)所示的结构作为主要成分的聚合物:(式(1)和(2)中,R 1和R 2可以是 相同或不同,各自表示具有至少两个碳原子并且价数为2至8的有机基团,R 3和R 4可以相同或不同,各自表示氢或1至20个碳原子的一价有机基团, 式(1)中的NH-R5和式(2)中的-CO-R6各自表示聚合物端基,R5和R6各自表示包含不饱和烃基的碳原子数为2〜30的一价有机基团,n为 10〜100,000的范围,l和m各自表示0〜2的整数,p和q各自表示0〜4的整数,条件是p + q> 0;(c)醌二叠氮化合物;(d )含烷氧基甲基的化合物;和(e)溶剂。
    • 8. 发明授权
    • Positive type photosensitive resin composition
    • 正型感光性树脂组合物
    • US08883391B2
    • 2014-11-11
    • US13514932
    • 2010-12-07
    • Tomotsugu MiyabeYoji Fujita
    • Tomotsugu MiyabeYoji Fujita
    • G03F7/023C08L79/08C08G73/10G03F7/075C08K5/29C08K5/5425C08K5/5435
    • C08L79/08C08G73/10C08K5/29C08K5/5425C08K5/5435C08L63/00G03F7/0233G03F7/0751
    • Disclosed is a positive-type photosensitive resin composition which has excellent storage stability, particularly excellent sensitivity stability, and can be formed into a cured film having excellent adhesion onto a substrate when heated at 350° C. or higher or heated in the air. The positive-type photosensitive resin composition comprises (a) a polymer having, as the main component, at least one structure selected from the group consisting of a polyimide precursor structure, a polybenzoxazole precursor structure, and a polyimide structure, (b) a quinonediazide compound, (c) a silane coupling agent having a styryl group, (d) a silane coupling agent having an epoxy group, an oxetanyl group, a methacryloxy group, an acryloxy group, an amino group, an amide group or mercapto group and an alkoxysilyl group, and (e) a solvent.
    • 公开了一种具有优异的储存稳定性,特别优异的灵敏度稳定性的正型感光性树脂组合物,并且可以在350℃以上加热或在空气中加热时,形成具有优异的粘合力的固化膜。 正型感光性树脂组合物包含(a)以聚酰亚胺前体结构,聚苯并恶唑前体结构和聚酰亚胺结构为主成分的组中选择的至少一种结构为主成分的聚合物,(b)醌二叠氮化物 化合物,(c)具有苯乙烯基的硅烷偶联剂,(d)具有环氧基,氧杂环丁烷基,甲基丙烯酰氧基,丙烯酰氧基,氨基,酰胺基或巯基的硅烷偶联剂,和 烷氧基甲硅烷基,(e)溶剂。
    • 9. 发明授权
    • Molten carbonate type fuel cell
    • 熔融碳酸盐型燃料电池
    • US4980248A
    • 1990-12-25
    • US375688
    • 1989-07-05
    • Yoji Fujita
    • Yoji Fujita
    • H01M8/02H01M4/86H01M4/90H01M8/14
    • H01M4/9016H01M4/8621H01M8/142H01M2004/8689H01M2008/147H01M2300/0051Y02E60/526
    • A molten carbonate type fuel cell with a stabilized battery characteristic over a long period of time by replenishing the electrolyte which has been consumed, and maintaining the electrolyte at a consistent composition, the fuel cell carrying, on at least one of the electrolytic layer at its side of the air electrode, the air electrode per se, and the structural members of the air electrode side gas chamber, a lithium-containing composite oxide which brings about chemical reaction, when a ratio of lithium (Li) to potassium (K) in the electrolyte reduces, to produce Li.sub.2 CO.sub.3 due to change in the ratios between lithium and other elements, during a period when the Li/K ratio between lithium and potassium in the electrolyte comprising mainly Li.sub.2 CO.sub.3 and K.sub.2 CO.sub.3 varies from 40/60 to 70/30 at a temperature range of from 600.degree. C. to 700.degree. C. in a gas atmosphere of the air electrode side.
    • 一种具有稳定电池特性的熔融碳酸盐型燃料电池,其特征在于,通过补充被消耗的电解质,并将电解质保持在一致的组成,所述燃料电池在其电解质层的至少一个上承载 空气电极本身,空气电极侧气室的结构部件,当锂(Li)与钾(K)的比率导致化学反应时的含锂复合氧化物 在主要由Li 2 CO 3和K 2 CO 3组成的电解质中的锂/钾之间的Li / K比在40/60至70/30之间的时间内,由于锂和其它元素之间的比率的变化,电解质会降低,以产生Li 2 CO 3, 在空气电极侧的气体气氛中的温度范围为600℃至700℃。