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    • 2. 发明授权
    • Magnetic memory and method of manufacturing the same
    • 磁存储器及其制造方法
    • US08710605B2
    • 2014-04-29
    • US13231894
    • 2011-09-13
    • Shigeki TakahashiYuichi OhsawaJunichi ItoChikayoshi KamataSaori KashiwadaMinoru AmanoHiroaki Yoda
    • Shigeki TakahashiYuichi OhsawaJunichi ItoChikayoshi KamataSaori KashiwadaMinoru AmanoHiroaki Yoda
    • H01L29/72
    • H01L43/12H01L27/228H01L43/08H01L43/10
    • A magnetic memory according to an embodiment includes: at least one memory cell comprising a magnetoresistive element as a memory element, and first and second electrodes that energize the magnetoresistive element. The magnetoresistive element includes: a first magnetic layer having a variable magnetization direction perpendicular to a film plane; a tunnel barrier layer on the first magnetic layer; and a second magnetic layer on the tunnel barrier layer, and having a fixed magnetization direction perpendicular to the film plane. The first magnetic layer including: a first region; and a second region outside the first region so as to surround the first region, and having a smaller perpendicular magnetic anisotropy energy than that of the first region. The second magnetic layer including: a third region; and a fourth region outside the third region, and having a smaller perpendicular magnetic anisotropy energy than that of the third region.
    • 根据实施例的磁存储器包括:包括作为存储元件的磁阻元件的至少一个存储单元,以及激励磁阻元件的第一和第二电极。 磁阻元件包括:具有与膜平面垂直的可变磁化方向的第一磁性层; 在第一磁性层上的隧道阻挡层; 以及隧道势垒层上的第二磁性层,并且具有与膜平面垂直的固定的磁化方向。 所述第一磁性层包括:第一区域; 以及围绕第一区域的第一区域外的第二区域,并且具有比第一区域小的垂直磁各向异性能量。 第二磁性层包括:第三区域; 以及第三区域外的第四区域,并且具有比第三区域小的垂直磁各向异性能量。
    • 7. 发明授权
    • Method for manufacturing nonvolatile memory device
    • 非易失性存储器件的制造方法
    • US08981507B2
    • 2015-03-17
    • US13534673
    • 2012-06-27
    • Shigeki TakahashiKyoichi SuguroJunichi ItoYuichi OhsawaHiroaki Yoda
    • Shigeki TakahashiKyoichi SuguroJunichi ItoYuichi OhsawaHiroaki Yoda
    • H01L43/12
    • H01L43/12
    • According to one embodiment, a method for manufacturing a nonvolatile memory device including a plurality of memory cells is disclosed. Each of the plurality of memory cells includes a base layer including a first electrode, a magnetic tunnel junction device provided on the base layer, and a second electrode provided on the magnetic tunnel junction device. The magnetic tunnel junction device includes a first magnetic layer, a tunneling barrier layer provided on the first magnetic layer, and a second magnetic layer provided on the tunneling barrier layer. The method can include etching a portion of the second magnetic layer and a portion of the first magnetic layer by irradiating gas clusters onto a portion of a surface of the second magnetic layer or a portion of a surface of the first magnetic layer.
    • 根据一个实施例,公开了一种用于制造包括多个存储单元的非易失性存储器件的方法。 多个存储单元中的每一个包括基底层,其包括第一电极,设置在基底层上的磁性隧道结器件和设置在磁性隧道结装置上的第二电极。 磁隧道结装置包括第一磁性层,设置在第一磁性层上的隧道势垒层,以及设置在隧道势垒层上的第二磁性层。 该方法可以包括通过将气体簇照射到第二磁性层的表面的一部分或第一磁性层的表面的一部分上来蚀刻第二磁性层的一部分和第一磁性层的一部分。