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    • 2. 发明申请
    • III-NITRIDE LIGHT-EMITTING DEVICES WITH IMPROVED HIGH-CURRENT EFFICIENCY
    • 具有改善的高效率的III-NITRIDE发光装置
    • US20050167690A1
    • 2005-08-04
    • US10769590
    • 2004-01-30
    • Nathan GardnerChristopher KocotStephen Stockman
    • Nathan GardnerChristopher KocotStephen Stockman
    • H01L33/00H01L33/32H01L29/24
    • H01L33/32
    • A light-emitting semiconductor device comprises a III-Nitride active region and a III-Nitride layer formed proximate to the active region and having a thickness that exceeds a critical thickness for relaxation of strain in the III-Nitride layer. The III-Nitride layer may be a carrier confinement layer, for example. In another aspect of the invention, a light-emitting semiconductor device comprises a III-Nitride light emitting layer, an InxAlyGa1-x-yN (0≦x≦1, 0≦y≦1, x+y≦1), and a spacer layer interposing the light emitting layer and the InxAlyGa1-x-yN layer. The spacer layer may advantageously space the InxAlyGa1-x-yN layer and any contaminants therein apart from the light emitting layer. The composition of the III-Nitride layer may be advantageously selected to determine a strength of an electric field in the III-Nitride layer and thereby increase the efficiency with which the device emits light.
    • 发光半导体器件包括在有源区附近形成的III-氮化物有源区和III-氮化物层,其厚度超过III-氮化物层中的应变松弛的临界厚度。 例如,III-氮化物层可以是载流子限制层。 在本发明的另一方面中,一种发光半导体器件包括III族氮化物发光层,In-Al 2 O 3,Ga 1-xy, SUB> N(0 <= x <= 1,0,0 <= y <= 1,x + y <= 1),以及插入发光层和In < 1&lt; 1&gt; Ga 1-xy N层。 间隔层可以有利地将In和/或Al 2 Y 1 Ga 1-x-y N N层及其中的任何污染物与发光层隔开。 可以有利地选择III-氮化物层的组成以确定III-氮化物层中的电场的强度,从而提高器件发光的效率。
    • 4. 发明授权
    • Short turn-off time photoconductive switch
    • 短关断时间光导开关
    • US06403990B1
    • 2002-06-11
    • US09819101
    • 2001-03-27
    • Yasuhisa KanekoMitsuchika SaitoChristopher Kocot
    • Yasuhisa KanekoMitsuchika SaitoChristopher Kocot
    • H01L31109
    • H01L31/109
    • The photoconductive switch comprises a first confinement layer, a second confinement layer, a photoconductive layer that includes a doped sub-layer and an undoped sub-layer, a first electrode and a second electrode. The first confinement layer is a layer of a first semiconductor material having a first band-gap energy and a first conductivity type. The second confinement layer is a layer of a second semiconductor material having a second band-gap energy. The photoconductive layer is a layer of a third semiconductor material having a third band-gap energy and a second conductivity type, opposite to the first conductivity type. The photoconductive layer is sandwiched between the first confinement layer and the second confinement layer, and the third band-gap energy is less than the first and second band-gap energies. In the photoconductive layer, the doped sub-layer is in contact with the first confinement layer, and the undoped sub-layer is adjacent the second confinement layer. The first electrode and the second electrode are separate from each other and are located on the surface of the first confinement layer remote from the photoconductive layer.
    • 光导开关包括第一限制层,第二限制层,包括掺杂子层和未掺杂子层的光电导层,第一电极和第二电极。 第一限制层是具有第一带隙能和第一导电类型的第一半导体材料的层。 第二限制层是具有第二带隙能量的第二半导体材料层。 光电导层是具有与第一导电类型相反的第三带隙能和第二导电类型的第三半导体材料的层。 光电导层夹在第一限制层和第二限制层之间,第三带隙能量小于第一和第二带隙能量。 在光电导层中,掺杂子层与第一限制层接触,未掺杂的子层与第二限制层相邻。 第一电极和第二电极彼此分离并且位于远离光电导层的第一限制层的表面上。