会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 6. 发明申请
    • FIELD-EFFECT TRANSISTOR
    • 场效应晶体管
    • US20090095954A1
    • 2009-04-16
    • US12199446
    • 2008-08-27
    • Tomoaki OnoueTakeshi YasudaTetsuo Tsutsui
    • Tomoaki OnoueTakeshi YasudaTetsuo Tsutsui
    • H01L51/10H01L51/40
    • H01L51/0533H01L21/31691H01L51/0537
    • A field-effect transistor is provided, which includes an organic thin film and which can realize a low threshold voltage while a stable, high field-effect mobility is ensured at the same time. In a field-effect transistor provided with a gate electrode, a source electrode, a drain electrode, a semiconductor film, a gate insulating film, and a substrate, the gate insulating film is formed from a plurality of insulating layers. Here, a first insulating layer in contact with the semiconductor film is formed from poly-p-xylylene formed into a film by a CVD method. A second insulating layer is formed from, for example, cyanoethylpullulan, and the dielectric constant is specified to be higher than that of the first insulating layer.
    • 提供场效应晶体管,其包括有机薄膜,并且可以在同时确保稳定的高场效应迁移率的同时实现低阈值电压。 在设置有栅电极,源极,漏极,半导体膜,栅极绝缘膜和基板的场效应晶体管中,栅极绝缘膜由多个绝缘层形成。 这里,与半导体膜接触的第一绝缘层由通过CVD法形成为膜的聚对二甲苯形成。 第二绝缘层由例如氰乙基普兰兰形成,并且介电常数规定为高于第一绝缘层的介电常数。
    • 7. 发明授权
    • Field-effect transistor
    • 场效应晶体管
    • US07932177B2
    • 2011-04-26
    • US12199446
    • 2008-08-27
    • Tomoaki OnoueTakeshi YasudaTetsuo Tsutsui
    • Tomoaki OnoueTakeshi YasudaTetsuo Tsutsui
    • H01L21/4763
    • H01L51/0533H01L21/31691H01L51/0537
    • A field-effect transistor is provided, which includes an organic thin film and which can realize a low threshold voltage while a stable, high field-effect mobility is ensured at the same time. In a field-effect transistor provided with a gate electrode, a source electrode, a drain electrode, a semiconductor film, a gate insulating film, and a substrate, the gate insulating film is formed from a plurality of insulating layers. Here, a first insulating layer in contact with the semiconductor film is formed from poly-p-xylylene formed into a film by a CVD method. A second insulating layer is formed from, for example, cyanoethylpullulan, and the dielectric constant is specified to be higher than that of the first insulating layer.
    • 提供场效应晶体管,其包括有机薄膜,并且可以在同时确保稳定的高场效应迁移率的同时实现低阈值电压。 在设置有栅电极,源极,漏极,半导体膜,栅极绝缘膜和基板的场效应晶体管中,栅极绝缘膜由多个绝缘层形成。 这里,与半导体膜接触的第一绝缘层由通过CVD法形成为膜的聚对二甲苯形成。 第二绝缘层由例如氰乙基普兰兰形成,并且介电常数规定为高于第一绝缘层的介电常数。
    • 9. 发明申请
    • CONDUCTIVE TERMINAL WELDING METHOD AND CONDUCTIVE TERMINAL STRUCTURE
    • 导电终端焊接方法和导电终端结构
    • US20080102716A1
    • 2008-05-01
    • US11927027
    • 2007-10-29
    • Akihiko NishiokaTakeshi Yasuda
    • Akihiko NishiokaTakeshi Yasuda
    • H01R4/02B23K11/18
    • H01R43/0214H05K3/202H05K3/328
    • The invention provides a welding method by resistance welding capable of adequately increasing a welding strength between two conductive terminals each made of copper, and a conductive terminal structure obtained by the method. A first conductive terminal made of a tinned flat copper plate is molded such that a step portion is formed at a position spaced away from a tip end position of the first conductive terminal and a projection is formed at a tip end portion ranging from the tip end position to the step portion. A second conductive terminal made of the aforementioned copper plate and the first conductive terminal are molded such that a weld surface of the second conductive terminal has a size to cover an entire weld surface of the projection of the first conductive terminal. Simultaneously, the respective conductive terminals are molded such that the tip end portion of the first conductive terminal becomes substantially equal in sectional area to a weld portion of the second conductive terminal. These conductive terminals are brought into contact under pressure with electrodes equal in electrical characteristic to each other, and then electric current is fed to the electrodes. Thus, the projection of the first conductive terminal is melted into and is welded to the weld surface of the second conductive terminal.
    • 本发明提供一种能够充分提高由铜构成的两个导电端子之间的焊接强度的电阻焊接方法和通过该方法获得的导电端子结构的焊接方法。 由镀锡扁平铜板制成的第一导电端子被模制成在与第一导电端子的末端位置隔开的位置上形成台阶部分,并且在尖端部分形成突出部, 位置到台阶部分。 由上述铜板和第一导电端子制成的第二导电端子被模制成使得第二导电端子的焊接表面具有覆盖第一导电端子的突起的整个焊接表面的尺寸。 同时,各导电端子被模制成使得第一导电端子的末端部分与第二导电端子的焊接部分的截面面积基本相等。 这些导电端子在压力下与彼此具有电特性相等的电极接触,然后将电流馈送到电极。 因此,第一导电端子的突起熔化并焊接到第二导电端子的焊接表面。