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    • 3. 发明申请
    • PHOTOELECTRIC CONVERSION DEVICE
    • 光电转换器件
    • US20130180577A1
    • 2013-07-18
    • US13732604
    • 2013-01-02
    • SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
    • Yoshinobu ASAMIRiho Kataishi
    • H01L31/0352
    • H01L31/0352H01L31/02167H01L31/02168H01L31/02245H01L31/02363H01L31/068H01L31/0682H01L31/074Y02E10/547
    • To provide a photoelectric conversion device including a passivation film in which an opening for connection to an electrode does not need to be provided. The photoelectric conversion device includes, between a pair of electrodes, a silicon substrate having p-type conductivity; a silicon semiconductor layer having n-type conductivity which is provided over one surface of the silicon substrate and in contact with one of the pair of electrodes; and an oxide semiconductor layer having p-type conductivity which is provided over the other surface of the silicon substrate and in contact with the other of the pair of electrodes. The oxide semiconductor layer is formed using an inorganic compound which contains an oxide of a metal belonging to any of Groups 4 to 8 in the periodic table as its main component and whose band gap is greater than or equal to 2 eV.
    • 为了提供一种包括钝化膜的光电转换装置,其中不需要提供用于连接到电极的开口。 光电转换装置在一对电极之间包括具有p型导电性的硅衬底; 具有n型导电性的硅半导体层,其设置在所述硅衬底的一个表面上并与所述一对电极中的一个电极接触; 以及具有p型导电性的氧化物半导体层,其设置在所述硅基板的另一表面上并与所述一对电极中的另一个接触。 氧化物半导体层使用含有属于元素周期表中第4至8族中的任何一种的金属的氧化物作为其主要成分并且其带隙大于或等于2eV的无机化合物形成。
    • 8. 发明授权
    • Photoelectric conversion device
    • 光电转换装置
    • US09112086B2
    • 2015-08-18
    • US13657015
    • 2012-10-22
    • SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
    • Riho KataishiYoshinobu Asami
    • H01L29/10H01L31/0232H01L31/074H01L31/0747
    • H01L31/074H01L31/0747Y02E10/50
    • To provide a photoelectric conversion device which has little light loss caused by light absorption in a window layer and has favorable electric characteristics. The photoelectric conversion device includes, between a pair of electrodes, a light-transmitting semiconductor layer which has one conductivity type and serves as a window layer, and a silicon semiconductor substrate having a conductivity type for forming a p-n junction or a silicon semiconductor layer having a conductivity type for forming a p-i-n junction. The light-transmitting semiconductor layer can be formed using an inorganic compound containing, as its main component, an oxide of a metal belonging to any of Groups 4 to 8 of the periodic table. The band gap of the metal oxide is greater than or equal to 2 eV.
    • 提供一种由窗口层中的光吸收引起的光损耗小且具有良好的电气特性的光电转换装置。 光电转换装置在一对电极之间包括具有一种导电类型并用作窗口层的透光半导体层和具有用于形成pn结的导电类型的硅半导体衬底或具有用于形成pn结的硅半导体层或具有 用于形成pin结的导电类型。 可以使用含有属于周期表第4〜8族的金属的氧化物作为其主要成分的无机化合物来形成透光性半导体层。 金属氧化物的带隙大于或等于2eV。