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1. 发明申请

US20110061587A1 METHOD OF PRODUCING PRETREATED METAL FLUORIDES AND FLUORIDE CRYSTALS 审中-公开
标题翻译：生产预浸金属氟化物和氟化物晶体的方法
公开(公告)号：US20110061587A1
公开(公告)日：2011-03-17
申请号：US12992783
申请日：2009-05-15
申请人： Sumito Ishizu , Akira Sekiya , Kentaro Fukuda , Toshihisa Suyama
发明人： Sumito Ishizu , Akira Sekiya , Kentaro Fukuda , Toshihisa Suyama
IPC分类号： C30B15/08 , C30B15/00 , C01F17/00
CPC分类号： C01B9/08 , C01F17/0031 , C01G1/06 , C01P2002/84 , C01P2002/85 , C01P2004/04 , C01P2006/80 , C30B15/00 , C30B15/08 , C30B29/12 , C30B35/007
摘要： [Problem] To provide a method of producing a pretreated metal fluoride containing impurities such as oxygen in decreased amounts and a fluoride crystal containing impurities such as oxygen in decreased amounts and having excellent optical properties such as transparency.[Means for Solution] A metal fluoride is heated in a temperature range of not lower than 300° K. but not higher than 1780° K in the co-presence of a carbonyl fluoride of an amount of not less than 1/100 mol per mol of the metal fluoride to thereby obtain a pretreated metal fluoride while removing oxygen and water from the starting metal fluoride and from the interior of the production furnace. Further, the pretreated metal fluoride as a starting material is heated and melted, and a fluoride crystal of a high quality is obtained from the obtained melt by a crystal growing method such as a melt pull-up method or a melt pull-down method.
摘要翻译：提供一种以减少量生产含有诸如氧等杂质的预处理金属氟化物的方法和含有少量杂质的氟化物晶体，并且具有优异的光学性能如透明度的方法。 [解决方案]金属氟化物在不低于300°K的温度范围内加热，但不高于1780°K，在不少于1/100mol / 摩尔的金属氟化物，从而得到预处理的金属氟化物，同时从起始金属氟化物和生产炉内部除去氧和水。此外，将作为起始原料的预处理的金属氟化物加热熔融，并通过熔融拉拔法或熔融拉拔法等晶体生长法从所得熔体中获得高质量的氟化物晶体。

2. 发明申请

US20130158304A1 METHOD FOR PRODUCING A FLUOROCOMPOUND 审中-公开
标题翻译：生产氟化物的方法
公开(公告)号：US20130158304A1
公开(公告)日：2013-06-20
申请号：US13704074
申请日：2011-06-13
申请人： Heng-dao Quan , Masanori Tamura , Junji Mizukado , Akira Sekiya
发明人： Heng-dao Quan , Masanori Tamura , Junji Mizukado , Akira Sekiya
IPC分类号： C07C17/354 , C07C17/358
CPC分类号： C07C17/354 , B01J21/04 , B01J21/18 , B01J23/44 , B01J23/644 , B01J23/66 , B01J27/12 , B01J27/13 , B01J35/0006 , B01J35/1014 , B01J37/0201 , B01J37/0205 , B01J37/0207 , B01J37/16 , B01J37/18 , C07C17/358 , C07C21/22 , C07C21/18
摘要： An object is to provide a method for producing 1,1,1,4,4,4-hexafluoro-2-butene with high efficiency, which is suitable for a flow reaction, and cis-1,1,1,4,4,4-hexafluoro-2-butene can be efficiently obtained when isomerization of hexafluoro-1,3-butadiene is conducted using a catalyst and the resultant mixture is successively subjected to catalytic hydrogenation to produce cis-1,1,1,4,4,4-hexafluoro-2-butene, wherein the whole process is performed by a flow catalytic reaction.
摘要翻译：目的在于提供一种高效制备1,1,1,4,4,4-六氟-2-丁烯的方法，适用于流动反应，顺式-1,1,1,4,4 当使用催化剂进行六氟-1,3-丁二烯的异构化时，可以有效地获得4-六氟-2-丁烯，所得混合物依次进行催化氢化，得到顺式-1,1,1,4,4 ，4-六氟-2-丁烯，其中整个过程通过流动催化反应进行。

3. 发明授权

US08277560B2 CVD apparatus and method of cleaning the CVD apparatus 有权
标题翻译： CVD装置和清洁CVD装置的方法
公开(公告)号：US08277560B2
公开(公告)日：2012-10-02
申请号：US10492539
申请日：2003-03-19
申请人： Katsuo Sakai , Seiji Okura , Masaji Sakamura , Kaoru Abe , Hitoshi Murata , Etsuo Wani , Kenji Kameda , Yuki Mitsui , Yutaka Ohira , Taisuke Yonemura , Akira Sekiya
发明人： Katsuo Sakai , Seiji Okura , Masaji Sakamura , Kaoru Abe , Hitoshi Murata , Etsuo Wani , Kenji Kameda , Yuki Mitsui , Yutaka Ohira , Taisuke Yonemura , Akira Sekiya
IPC分类号： H01L21/00 , C23C16/00
CPC分类号： C23C16/45593 , C23C16/4405 , C23C16/4412 , H01L21/02046 , Y02C20/30 , Y02P70/605
摘要： A CVD apparatus cleaning method that efficiently removes by-product such as SiO2 or Si3N4 adhered to and deposited on surfaces of an inner wall, an electrode, and the like in a reaction chamber at a film forming step. In the cleaning method the discharged cleaning gas amount is very small, environmental influences such as global warming can be lessened, and cost can be reduced. A CVD apparatus supplying reactive gas into a reaction chamber and forming a deposited film on a surface of a base material provided in the reaction chamber includes an exhaust gas recycling path recycling an exhaust gas reaching the reaction chamber from downstream of a pump on an exhaust path for exhausting a gas from an inner part of the reaction chamber through the pump.
摘要翻译：一种CVD装置清洗方法，其在成膜步骤中有效地除去在反应室内附着和沉积在内壁，电极等的表面上的副产物如SiO 2或Si 3 N 4。在清洁方法中，排出的清洁气体量非常小，可以减少诸如全球变暖的环境影响，并且可以降低成本。将反应气体供应到反应室中并在设置在反应室中的基材的表面上形成沉积膜的CVD装置包括排气回收路径，从排气路径上的泵下游到达反应室的废气再循环用于从反应室的内部通过泵排出气体。

4. 发明申请

US20080274334A1 Dry Etching Gas and Method of Dry Etching 审中-公开
标题翻译：干蚀刻气体和干蚀刻方法
公开(公告)号：US20080274334A1
公开(公告)日：2008-11-06
申请号：US11628014
申请日：2005-05-30
申请人： Akira Sekiya , Tatsuya Sugimoto , Toshiro Yamada , Takanobu Mase
发明人： Akira Sekiya , Tatsuya Sugimoto , Toshiro Yamada , Takanobu Mase
IPC分类号： C09K13/00 , H01L21/306 , B32B3/00
CPC分类号： H01L21/31116 , C07C41/18 , C07C43/17 , C07C45/513 , C07C45/673 , C07C45/82 , C07C49/227 , C07C2601/04 , C07F9/5352 , Y10T428/24479 , C07C49/687
摘要： A dry etching gas comprising a C4-6 fluorine compound which has an ether bond or carbonyl group and one or more fluorine atoms in the molecule and is constituted only of carbon, fluorine, and oxygen atoms and in which the ratio of the number of fluorine atoms to the number of carbon atoms (F/C) is 1.9 or lower (provided that the compound is neither a fluorine compound having one cyclic ether bond and one carbon-carbon double bond nor a saturated fluorine compound having one carbonyl group); a mixed dry etching gas comprising the dry etching gas and at least one gas selected from the group consisting of rare gases, O2, O3, CO, CO2, CHF3, CH2F2, CF4, C2F6, and C3F8; and a method of dry etching which comprises converting either of these dry etching gases into a plasma and processing a semiconductor material with the plasma. The dry etching gases can be safely used, are reduced in influence on the global environment, and can highly selectively dry-etch a semiconductor material at a high dry etching rate to form a satisfactory pattern shape. The dry etching method employs either of these dry etching gases.
摘要翻译：一种干蚀刻气体，其包含在分子中具有醚键或羰基和一个或多个氟原子的C 4-6二氟化合物，其仅由碳，氟和氧原子构成，并且在氟原子数与碳原子数的比例（F / C）为1.9以下（前提是该化合物既不是具有一个环醚键的氟化合物，也不是一个碳 - 碳双键，也不是饱和氟具有一个羰基的化合物）; 包括干蚀刻气体和至少一种选自稀有气体O 2，O 3，CO，CO 2的气体的混合干蚀刻气体， CH 2，CH 2，CH 2，CH 2，CF 4，C 2， F 6，和C 3 F 8; 以及干蚀刻方法，其包括将这些干蚀刻气体中的任一种转化为等离子体并用等离子体处理半导体材料。可以安全地使用干蚀刻气体，减小对全局环境的影响，并且可以以高干蚀刻速率高度选择性地干蚀刻半导体材料以形成令人满意的图案形状。干蚀刻方法采用这些干蚀刻气体中的任一种。

5. 发明授权

US06211420B1 Process for the preparation of fluorinated olefin 有权
标题翻译：氟化烯烃的制备方法
公开(公告)号：US06211420B1
公开(公告)日：2001-04-03
申请号：US09180627
申请日：1998-11-13
申请人： Akira Sekiya , Toshiro Yamada , Mitsuru Sugawara
发明人： Akira Sekiya , Toshiro Yamada , Mitsuru Sugawara
IPC分类号： C07C1720
CPC分类号： C07C23/08 , C07C17/206 , C07C17/208 , C07C17/383
摘要： In a process for preparing a fluorinated olefin having a carbon—carbon double bond, the carbon atoms of which have a fluorine atom, by reacting a halogenated olefin having at least one carbon—carbon double bond, a carbon atom or the carbon atoms of which bond have a chlorine atom or atoms bound thereto, and, in which the carbon atom or atoms with a single bond in the molecule have no halogen atom other than a fluorine atom, with an alkali metal fluoride, said reaction of the halogenated olefin with the alkali metal fluoride is conducted in the presence of an organic halogen-containing compound having a carbon—carbon single bond, a carbon or the carbons of which have at least one halogen atom other than fluorine atom.
摘要翻译：在通过使具有至少一个碳 - 碳双键的卤代烯烃，碳原子或碳原子的碳原子与碳原子一起形成碳原子的碳 - 碳双键的氟代烯烃的方法中，其碳原子具有氟原子键具有与其结合的氯原子或原子，并且其中分子中具有单键的碳原子或原子不具有氟原子的卤素原子与碱金属氟化物反应，卤代烯烃与碱金属氟化物在具有碳 - 碳单键的有机含卤素化合物，碳或碳具有至少一个除氟原子以外的卤素原子的存在下进行。

6. 发明申请

US20100191013A1 PROCESS FOR PRODUCTION OF CARBONYL FLUORIDE 有权
标题翻译：碳氟化物生产工艺
公开(公告)号：US20100191013A1
公开(公告)日：2010-07-29
申请号：US12067243
申请日：2006-09-26
申请人： Heng-dao Quan , Masanori Tamura , Akira Sekiya
发明人： Heng-dao Quan , Masanori Tamura , Akira Sekiya
IPC分类号： C07C51/58 , C07C21/185
CPC分类号： C01B32/80
摘要： The present invention provides a method for inexpensively, efficiently, safely, and continuously producing COF2, without using highly toxic raw materials such as phosgene or difficult-to-get raw materials, with no risk of explosion or the like. Tetrafluoroethylene gas and oxygen gas are introduced into a reactor, and they are then heated in a gas phase in the absence of nitrogen gas for reaction, so as to produce carbonyl fluoride. The reactor is preferably a tubular reaction tube. As such tetrafluoroethylene gas, unpurified or purified tetrafluoroethylene gas obtained by heating HCFC-22 gas for thermal decomposition can be used. According to the present invention, COF2 that is useful as cleaning gas for CVD devices (chemical vapor deposition method) can be inexpensively, efficiently, and safely produced.
摘要翻译：本发明提供了一种廉价，有效，安全，连续地生产COF2的方法，而不使用高毒性的原料如光气或难以获得的原料，不会有爆炸等危险。将四氟乙烯气体和氧气引入反应器中，然后在不存在氮气的气相中加热反应，以产生碳酰氟。反应器优选为管式反应管。作为这样的四氟乙烯气体，可以使用通过加热用于热分解的HCFC-22气体获得的未纯化或纯化的四氟乙烯气体。根据本发明，可以廉价，高效，安全地制造用作CVD装置的清洁气体（化学气相沉积法）的COF 2。

7. 发明授权

US07326279B2 Method for removing harmful substance in vent gas 有权
标题翻译：排放气体中有害物质去除方法
公开(公告)号：US07326279B2
公开(公告)日：2008-02-05
申请号：US10528355
申请日：2003-11-28
申请人： Yasuo Nakazawa , Moriyuki Fukushima , Kensuke Suda , Akira Sekiya
发明人： Yasuo Nakazawa , Moriyuki Fukushima , Kensuke Suda , Akira Sekiya
IPC分类号： B01D53/68
CPC分类号： B01D53/70 , B01D53/685 , B01D2251/30 , B01D2251/40 , B01D2253/102 , B01D2253/108 , B01D2257/2027 , B01D2257/2066 , B01D2258/0216
摘要： A method for removing harmful substances in a vent gas containing a halogen or halogen compound gas remaining in the pipeline of a cylinder cabinet, which comprises contacting the vent gas with a treating agent comprising an alkaline earth metal compound, an alkali metal compound, zeolite, and a carbonaceous material.
摘要翻译：一种用于除去残留在气缸柜的管道中的含有卤素或卤素化合物气体的排放气体中的有害物质的方法，该方法包括使排放气体与包含碱土金属化合物，碱金属化合物，沸石，和碳质材料。

8. 发明授权

US07247289B2 Porous aluminum fluoride 有权
标题翻译：多孔氟化铝
公开(公告)号：US07247289B2
公开(公告)日：2007-07-24
申请号：US10535491
申请日：2003-11-12
申请人： Hengdao Quan , Masanori Tamura , Akira Sekiya
发明人： Hengdao Quan , Masanori Tamura , Akira Sekiya
IPC分类号： C01B21/72 , C07C69/63 , C07C5/00
CPC分类号： C07C17/208 , B01J27/12 , B01J27/125 , C07B39/00 , C07C67/00 , Y10S585/935
摘要： A porous aluminum fluoride on which SbClxF5-x (wherein x represents a numeral of 0 to 5) is supported, SbClxF5-x being obtainable by supporting SbCl5, or the like on a porous aluminum fluoride and treating it with hydrogen fluoride. The resulting porous aluminum fluoride has a high activity as a fluorinating agent, a fluorination catalyst, or the like, is easy to handle, can be used for a flow-type reaction, and also can be used even at a high temperature.
摘要翻译：其上负载有SbCl x X F x-x x（其中x表示0至5的数字）的多孔氟化铝，SbCl F 通过在多孔氟化铝上负载SbCl 5等可以得到5-xS，并用氟化氢处理。所得到的多孔氟化铝作为氟化剂，氟化催化剂等具有高活性，易于处理，可用于流动型反应，也可以在高温下使用。

9. 发明申请

US20050080303A1 Porous calcium fluoride, its producing method, catalyst for hydrogenation reaction, and method for producing trihydrofluorocarbon 审中-公开
标题翻译：多孔氟化钙，其制备方法，氢化反应催化剂和三氢氟碳化合物的制备方法
公开(公告)号：US20050080303A1
公开(公告)日：2005-04-14
申请号：US10680257
申请日：2003-10-08
申请人： Akira Sekiya , Masanori Tamura , Toshiro Yamada
发明人： Akira Sekiya , Masanori Tamura , Toshiro Yamada
IPC分类号： B01J23/58 , B01J27/138 , B01J32/00 , B01J35/10 , C07C17/23 , C07C17/10
CPC分类号： B01J23/58 , B01J27/138 , B01J32/00 , B01J35/10 , B01J35/1014 , B01J35/1019 , C07C17/23 , C07C23/08
摘要： Porous calcium fluoride having a large surface area, a method for producing the same, a catalyst (for hydrogenation reaction in particular) using the porous calcium fluoride as a carrier with superior activity, selectivity, and durability, and a method for producing trihydrofluorocarbon using the catalyst. The porous calcium fluoride having a BET surface area of 20 m2/g to 200 m2/g is prepared by reacting soda lime with hydrogen fluoride. The carried cataryst (for hydrogenation reaction in particurar) is obtained by causing a metal or metal compound to be carried on carrier formed of the porous calcium fluoride. Trihydrofluorocarbon (2) is produced by causing a fluooroalkene (1) to contact hydrogen in the presence of the catalyst for hydrogenation reaction. wherein X denotes a halogen atom, Rf1 and Rf2 individually denote a fluorine or a parafluoroalkyl group, and Rf1 may be bonded to Rf2 to form a ring.
摘要翻译：具有大表面积的多孔氟化钙，其制备方法，使用多孔氟化钙作为载体的催化剂（特别是用于氢化反应）具有优异的活性，选择性和耐久性，以及使用催化剂。通过钠钙与氟化氢反应制备BET表面积为20m 2 / g至200m 2 / g的多孔氟化钙。携带的催化剂（特别是用于氢化反应）通过使金属或金属化合物承载在由多孔氟化钙形成的载体上而获得。通过在氢化反应催化剂存在下使氟烯烃（1）与氢接触来制备三氢氟化碳（2）。其中X表示卤素原子，Rf1和Rf2分别表示氟或对氟烷基，Rf1可以键合到Rf2上形成环。

10. 发明授权

US06403846B1 Fluorinated, saturated hydrocarbons 失效
标题翻译：氟化饱和烃
公开(公告)号：US06403846B1
公开(公告)日：2002-06-11
申请号：US09423747
申请日：2000-02-03
申请人： Akira Sekiya , Toshirou Yamada , Takashi Uruma , Tatsuya Sugimoto
发明人： Akira Sekiya , Toshirou Yamada , Takashi Uruma , Tatsuya Sugimoto
IPC分类号： C07C1908
CPC分类号： C11D7/261 , C07C17/00 , C07C17/354 , C07C17/389 , C07C19/08 , C07C23/08 , C10M105/52 , C10M2211/022 , C10M2211/06 , C11D7/28 , C11D7/30 , C11D7/5018 , C07C23/06
摘要： A composition containing less than 95 mol % of a trihydrofluorinated saturated hydrocarbon represented by the following formula (I) Rf1—R1—Rf2 (I) (wherein R1 represents a carbon chain in which CHF and CH2 are bound, and Rf1 and Rf2 are bound to each other to form a ring by a perfluoroalkylene chain of 2 to 4 carbon atoms) and the balance of a tetrahydrofluorinated saturated hydrocarbon having the same carbon number and the same carbon structure as the trihydrofluorinated saturated hydrocarbon, as represented by the following formula (II) Rf1—R2—Rf2 (II) (wherein R2 represents a carbon chain in which CH2 and CH3 are bound, and Rf1 and Rf2 are as defined above) is provided as a composition containing, in a high proportion, trihydrofluorocarbon, a hydrofluorocarbon (HFC) known to have a small global heating coefficient, which has less influence on the global environment, shows less toxicity to animals, and is chemically stable.
摘要翻译：由下式（I）表示的含有少于95摩尔％的三氢氟化饱和烃的组合物（其中，R1表示其中CHF和CH2键合的碳链，Rf1和Rf2彼此结合形成环，由具有2至4个碳原子的全氟亚烷基链）和与下式（II）表示的具有与三氢氟化饱和烃相同碳数和相同碳结构的四氢氟化饱和烃的余量（其中R2表示碳链其中CH 2和CH 3结合，Rf1和Rf2如上所定义）作为组成，其以高比例含有三氢氟碳化合物，已知具有小的全球加热系数的氢氟烃（HFC）的影响较小全球环境对动物的毒性较小，化学稳定。

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