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1. 发明申请

US20050140946A1 Exposure system and method for manufacturing device 失效
标题翻译：曝光系统及其制造方法
公开(公告)号：US20050140946A1
公开(公告)日：2005-06-30
申请号：US10969971
申请日：2004-10-22
申请人： Toshihiko Tsuji , Yoshitomo Nagahashi , Manabu Fujii , Hironori Murakami
发明人： Toshihiko Tsuji , Yoshitomo Nagahashi , Manabu Fujii , Hironori Murakami
IPC分类号： G03F7/20 , G03B27/52
CPC分类号： G03F7/70991 , G03F7/70858 , G03F7/70875 , G03F7/70891 , G03F7/709
摘要： An exposure system is provided which can maintain a predetermined performance of the exposure apparatus stably by maintaining a cooling capacity by preventing a negative pressure from being generated in a circulation path of the liquid and preventing the back pressure from increasing even if at least a part of a temperature adjusting device is disposed under a disposition surface of the exposure apparatus due to the disposition area. A sealed tank which stores the cooling agent which is circulated in the circuiting systems and a pump, etc., which circulates the cooling agent are disposed under the disposition surface FL of the exposure system. The reticle stage and the wafer stage which are objects of which the temperature is supposed to be controlled are disposed above the disposition surface FL. A tank which open to air is provided so as to prevent the negative pressure from being generated in the reticle stage, etc. such that the tank and the tank are connected by a connecting piping arrangement. Also, the piping arrangement which eliminates the bubbles which are contained in the cooling agent which is circulated in the circulating systems are connected to the circulating systems.
摘要翻译：提供一种曝光系统，其可以通过防止在液体的循环路径中产生负压并通过保持冷却能力来稳定地保持曝光装置的预定性能，并且即使在至少一部分温度调节装置由于配置区域而设置在曝光装置的配置表面下。储存在循环系统中循环的冷却剂的密封罐和循环冷却剂的泵等设置在曝光系统的配置面FL的下方。作为温度被控制的对象的标线片台和晶片台设置在配置面FL上方。设置有开放空气的罐，以防止在标线片等中产生负压，使得罐和罐通过连接配管装置连接。此外，消除在循环系统中循环的冷却剂中包含的气泡的管道装置连接到循环系统。

2. 发明授权

US07106414B2 Exposure system and method for manufacturing device 失效
标题翻译：曝光系统及其制造方法
公开(公告)号：US07106414B2
公开(公告)日：2006-09-12
申请号：US10969971
申请日：2004-10-22
申请人： Toshihiko Tsuji , Yoshitomo Nagahashi , Manabu Fujii , Hironori Murakami
发明人： Toshihiko Tsuji , Yoshitomo Nagahashi , Manabu Fujii , Hironori Murakami
IPC分类号： G03B27/42 , G03B27/52 , G03B27/32
CPC分类号： G03F7/70991 , G03F7/70858 , G03F7/70875 , G03F7/70891 , G03F7/709
摘要： An exposure system is provided which can maintain a predetermined performance of the exposure apparatus stably by maintaining a cooling capacity by preventing a negative pressure from being generated in a circulation path of the liquid and preventing the back pressure from increasing even if at least a part of a temperature adjusting device is disposed under a disposition surface of the exposure apparatus due to the disposition area. A sealed tank which stores the cooling agent which is circulated in the circuiting systems and a pump, etc., which circulates the cooling agent are disposed under the disposition surface FL of the exposure system. The reticle stage and the wafer stage which are objects of which the temperature is supposed to be controlled are disposed above the disposition surface FL. A tank which open to air is provided so as to prevent the negative pressure from being generated in the reticle stage, etc. such that the tank and the tank are connected by a connecting piping arrangement. Also, the piping arrangement which eliminates the bubbles which are contained in the cooling agent which is circulated in the circulating systems are connected to the circulating systems.
摘要翻译：提供一种曝光系统，其可以通过防止在液体的循环路径中产生负压并通过保持冷却能力来稳定地保持曝光装置的预定性能，并且即使在至少一部分温度调节装置由于配置区域而设置在曝光装置的配置表面下。储存在循环系统中循环的冷却剂的密封罐和循环冷却剂的泵等设置在曝光系统的配置面FL的下方。作为温度被控制的对象的标线片台和晶片台设置在配置面FL上方。设置有开放空气的罐，以防止在标线片等中产生负压，使得罐和罐通过连接配管装置连接。此外，消除在循环系统中循环的冷却剂中包含的气泡的管道装置连接到循环系统。

3. 发明授权

US07116396B2 Exposure device, exposure method and device manufacturing method 失效
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US07116396B2
公开(公告)日：2006-10-03
申请号：US10944783
申请日：2004-09-21
申请人： Toshihiko Tsuji , Takaaki Kimura , Yoshitomo Nagahashi
发明人： Toshihiko Tsuji , Takaaki Kimura , Yoshitomo Nagahashi
IPC分类号： G03B27/53
CPC分类号： G03F7/70858 , G03F7/70875 , G03F7/70891
摘要： An exposure device, where circulating systems and for controlling a temperature varied by the driving of a linear motor are connected to a reticle stage and wafer stage, a controller sets the temperature of refrigerant circulating through the circulating system by driving heater, circulating system is connected to a projection optical system and a controller sets the temperature of refrigerant circulating through a circulating system by driving heater by a feedforward control to control the temperature of the refrigerant circulating through the circulating system.
摘要翻译：一种曝光装置，其中循环系统和用于通过线性电动机的驱动控制温度变化的曝光装置连接到标线片台和晶片台，控制器通过驱动加热器设定通过循环系统循环的制冷剂的温度，循环系统被连接投影光学系统和控制器通过前馈控制器通过驱动加热器来设定通过循环系统循环的制冷剂的温度，以控制通过循环系统循环的制冷剂的温度。

4. 发明授权

US06922910B2 Exposure apparatus 有权
标题翻译：曝光装置
公开(公告)号：US06922910B2
公开(公告)日：2005-08-02
申请号：US10606033
申请日：2003-06-26
申请人： Toshihiko Tsuji , Yoshitomo Nagahashi , Takaaki Kimura , Shinichi Takagi
发明人： Toshihiko Tsuji , Yoshitomo Nagahashi , Takaaki Kimura , Shinichi Takagi
IPC分类号： G03F7/20 , F26B19/00
CPC分类号： G03F7/70858 , G03F7/70883
摘要： An exposure apparatus is provided for performing exposure processes with high accuracy by accurately performing pressure control inside a chamber having a plurality of air-conditioning chambers. The inside of the main chamber which accommodates the exposure apparatus is divided into a plurality of air-conditioning chambers, and a pressure detection device which detects the pressure is provided with each of the plurality of air-conditioning chambers. Also, among the plurality of the air-conditioning chambers, the pressure inside a main column which accommodates an exposure stage on which a wafer in mounted and subjected to an exposure process, is set to be higher than the pressure of the other air-conditioning chambers based on detection results obtained from the pressure detection devices.
摘要翻译：提供一种曝光装置，用于通过在具有多个空调室的室内精确地进行压力控制，以高精度进行曝光处理。容纳曝光装置的主室的内部被分成多个空调室，并且设置有多个空调室中的每一个的检测压力的压力检测装置。此外，在多个空调室中，容纳在其上安装并进行曝光处理的晶片的曝光台的主列内的压力被设定为高于其他空调的压力基于从压力检测装置获得的检测结果。

5. 发明申请

US20050140959A1 Exposure device, exposure method and device manufacturing method 失效
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US20050140959A1
公开(公告)日：2005-06-30
申请号：US10944783
申请日：2004-09-21
申请人： Toshihiko Tsuji , Takaaki Kimura , Yoshitomo Nagahashi
发明人： Toshihiko Tsuji , Takaaki Kimura , Yoshitomo Nagahashi
IPC分类号： G03F7/20 , G03B27/58
CPC分类号： G03F7/70858 , G03F7/70875 , G03F7/70891
摘要： An exposure device, where circulating systems and for controlling a temperature varied by the driving of a linear motor are connected to a reticle stage and wafer stage, a controller sets the temperature of refrigerant circulating through the circulating system by driving heater, circulating system is connected to a projection optical system and a controller sets the temperature of refrigerant circulating through a circulating system by driving heater by a feedforward control to control the temperature of the refrigerant circulating through the circulating system.
摘要翻译：一种曝光装置，其中循环系统和用于通过线性电动机的驱动控制温度变化的曝光装置连接到标线片台和晶片台，控制器通过驱动加热器设定通过循环系统循环的制冷剂的温度，循环系统被连接投影光学系统和控制器通过前馈控制器通过驱动加热器来设定通过循环系统循环的制冷剂的温度，以控制通过循环系统循环的制冷剂的温度。

6. 发明授权

US07948608B2 Exposure apparatus, exposure method, method for manufacturing device 有权
标题翻译：曝光装置，曝光方法，制造装置的方法
公开(公告)号：US07948608B2
公开(公告)日：2011-05-24
申请号：US12379183
申请日：2009-02-13
申请人： Yoshitomo Nagahashi
发明人： Yoshitomo Nagahashi
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70866 , G03F7/70341
摘要： An exposure apparatus that: projects pattern images onto a substrate via liquid and a projection optical system, the liquid forming a liquid immersion region between the projection optical system and the substrate; and exposes the substrate. The apparatus has: a liquid-supplying-section that supplies the liquid onto the substrate; a first pipe section that introduces the liquid to the liquid-supplying-section; and a second pipe section, connected to the first pipe section, that collects the liquid not being supplied to the liquid-supplying-section from the first pipe section. By doing this, it is possible to provide a liquid-immersion exposure apparatus having a liquid-supplying-mechanism, exposure method, and a method for manufacturing devices so as to: restrict the temperature of the liquid, supplied between the projection optical system and the substrate, from varying; and prevent contaminants from invading into the liquid.
摘要翻译：曝光装置，其通过液体和投影光学系统将图案图像投影到基板上，所述液体在所述投影光学系统和所述基板之间形成液浸区域; 并曝光底物。该装置具有：将液体供给到基板上的液体供给部; 将液体引导到供液部的第一管部; 以及与第一管部连接的第二管部，其从第一管部收集未供给到供液部的液体。通过这样做，可以提供具有供液机构，曝光方法和制造装置的方法的液浸曝光装置，以便：限制供应到投影光学系统和底物，来自变化; 并防止污染物侵入液体。

7. 发明授权

US06784972B2 Exposure apparatus, device manufacturing method and environmental control method of exposure apparatus 失效
标题翻译：曝光装置，装置制造方法和曝光装置的环境控制方法
公开(公告)号：US06784972B2
公开(公告)日：2004-08-31
申请号：US09994053
申请日：2001-11-27
申请人： Yoshitomo Nagahashi , Saburo Kamiya , Koichi Katsura
发明人： Yoshitomo Nagahashi , Saburo Kamiya , Koichi Katsura
IPC分类号： G03B2752
CPC分类号： G03F7/70858 , G03F7/70875 , G03F7/70883 , G03F7/70891
摘要： An air conditioner arranged in a machine chamber supplies gas for air conditioning into an exposure chamber via a supply path, and performs air conditioning of the exposure chamber. Then, the gas for air conditioning that has performed air conditioning returns to the machine chamber via an exhaust path. A chemical filter is provided in part of the exhaust path returning to the machine chamber from the exposure chamber. This filter securely removes contaminants that are introduced by outgassing and the like in an exposure apparatus main body and that are contained in the gas for air conditioning returning to the machine chamber from the exposure chamber. Accordingly, the inside of the exposure chamber can be kept chemically clean. Therefore, highly accurate exposure quantity control and thus highly accurate exposure can be performed for a long period of time, and high throughput can be maintained for a long period of time.
摘要翻译：布置在机器室中的空调机通过供给路径将用于空调的气体供给到曝光室，并进行曝光室的空调。然后，进行空调的空调用气体经由排气路返回到机械室。在从曝光室返回到机器室的排气路径的一部分中设置有化学过滤器。该过滤器可靠地清除在曝光装置主体中通过除气等引入的污染物，并且被包含在从曝光室返回机器室的用于空调的气体中。因此，可以使曝光室的内部保持化学清洁。因此，可以长时间地进行高精度的曝光量控制，从而高度准确的曝光，并且可以长时间保持高通量。

8. 发明授权

US06753942B2 Environmental control chamber 失效
标题翻译：环境控制室
公开(公告)号：US06753942B2
公开(公告)日：2004-06-22
申请号：US10289296
申请日：2002-11-07
申请人： Yoshitomo Nagahashi
发明人： Yoshitomo Nagahashi
IPC分类号： G03B2752
CPC分类号： G03F7/70858 , G03F7/70866 , G03F7/70875 , G03F7/70883
摘要： This invention is an exposure apparatus with an environmental control chamber for forming a closed space. An air conditioning device for circulating air in the closed space along a predetermined course of flow path. A main body of an exposure device which is disposed in a closed space formed by the environmental control chamber at a predetermined position along the predetermined course of flow path from the air conditioning device and exposes a substrate with a predetermined pattern. A heat-discharging box disposed in the environmental control chamber at least on the downstream side of the flow path from the main body of the exposure device and accommodating a first heat source which is detachable from the main body of the device.
摘要翻译：本发明是具有用于形成封闭空间的环境控制室的曝光装置。一种空气调节装置，用于沿着预定的流动路径使封闭空间中的空气循环。一种曝光装置的主体，其设置在由环境控制室形成的封闭空间中，该预定位置沿着来自空调装置的预定流路的预定位置，并以预定图案露出基板。一种排放箱，其至少在距离曝光装置的主体的流路的下游侧设置在环境控制室中，并容纳可从该装置主体拆卸的第一热源。

9. 发明授权

US08797502B2 Exposure apparatus, exposure method, and method for producing device with electricity removal device by adding additive to liquid 有权
标题翻译：曝光装置，曝光方法以及通过向液体添加添加剂来制造具有除电装置的装置的方法
公开(公告)号：US08797502B2
公开(公告)日：2014-08-05
申请号：US12929503
申请日：2011-01-28
申请人： Yoshitomo Nagahashi
发明人： Yoshitomo Nagahashi
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A projection exposure apparatus transfers a pattern formed on a mask onto a substrate through a liquid. The projection exposure apparatus includes an optical member which projects an image of the pattern onto the substrate and an electricity removal device which removes electricity from the liquid to be supplied to a space between the optical member and a surface of the substrate by adding an additive to the liquid to suppress the liquid from being charged.
摘要翻译：投影曝光装置通过液体将形成在掩模上的图案转印到基板上。投影曝光装置包括将图案的图像投影到基板上的光学部件和通过向基板的表面之间的空间中提供给液体的电力除去电力的除电装置，液体以抑制液体的充电。

10. 发明申请

US20110235006A1 Exposure apparatus, exposure method, method for manufacturing device 有权
标题翻译：曝光装置，曝光方法，制造装置的方法
公开(公告)号：US20110235006A1
公开(公告)日：2011-09-29
申请号：US13067463
申请日：2011-06-02
申请人： Yoshitomo Nagahashi
发明人： Yoshitomo Nagahashi
IPC分类号： G03B27/52
CPC分类号： G03F7/70866 , G03F7/70341
摘要： An exposure method and apparatus exposes a substrate via a projection optical system and a liquid. The liquid is circulated in a circulation path. At least a part of the liquid in the circulation path is supplied through a discharge path to a space below the projection optical system, the discharge path being connected to the circulation path. The substrate is exposed via the projection optical system and the liquid.
摘要翻译：曝光方法和装置通过投影光学系统和液体曝光基板。液体在循环路径中循环。循环路径中的液体的至少一部分通过排出路径供给到投影光学系统下方的空间，排出路径与循环路径连接。基板通过投影光学系统和液体曝光。

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