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1. 发明公开

US20240047194A1 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS 审中-公开
公开(公告)号：US20240047194A1
公开(公告)日：2024-02-08
申请号：US18264539
申请日：2022-01-25
申请人： Tokyo Electron Limited
发明人： Kenichi KOTE , Takafumi NOGAMI , Kazui KOBAYASHI
IPC分类号： H01L21/02 , H01J37/32 , C23C16/46 , C23C16/511 , C23C16/34 , C23C16/40 , C23C16/455
CPC分类号： H01L21/02274 , H01L21/0217 , H01L21/02164 , H01J37/32724 , H01J37/32816 , H01J37/32449 , C23C16/46 , C23C16/511 , C23C16/345 , C23C16/402 , C23C16/45557 , H01J2237/332 , H01J37/32192 , H01J2237/182
摘要： The present disclosure provides a substrate processing method including: a preparation process of placing a target substrate on a stage within a processing container; a first heating process of supplying a first gas into the processing container and heating the target substrate with a heater; a second heating process of stopping the supply of the first gas, supplying a second gas different from the first gas, and heating the target substrate with the heater; and a processing process of processing the target substrate by supplying the second gas and a third gas.

2. 发明公开

US20230307214A1 METHOD FOR ETCHING LITHIUM NIOBATE AND METHOD FOR FORMING LITHIUM NIOBATE PATTERN USING THE SAME 审中-公开
公开(公告)号：US20230307214A1
公开(公告)日：2023-09-28
申请号：US18114295
申请日：2023-02-27
申请人： Korea Institute of Science and Technology , KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
发明人： Ho Joong JUNG , Sang Wook HAN , Hyung Jun HEO , Hansuek LEE , Min Kyo SEO , Hyeon HWANG
IPC分类号： H01J37/32 , G03F7/20 , B08B3/08
CPC分类号： H01J37/32825 , H01J37/32449 , G03F7/2026 , B08B3/08 , H01J2237/182 , H01J2237/3343 , H01J2237/3321 , H01J37/3266 , H01J2237/022
摘要： The present invention relates to a method for etching lithium niobate, the method including a process of etching lithium niobate using a mask pattern as a physical dry etching method using Ar plasma produced in a chamber through Ar gas, wherein in the process of etching lithium niobate, a process pressure of the chamber is maintained at 1 mTorr to 20 mTorr, and a method for forming a lithium niobate pattern using the same.

3. 发明公开

US20230178331A1 Charged Particle Beam Device 审中-公开
公开(公告)号：US20230178331A1
公开(公告)日：2023-06-08
申请号：US17911711
申请日：2020-03-26
申请人： Hitachi High-Tech Corporation
发明人： Mai YOSHIHARA , Wei Chean TAN
IPC分类号： H01J37/22 , H01J37/28 , H01J37/18
CPC分类号： H01J37/222 , H01J37/28 , H01J37/18 , H01J2237/182
摘要： Improved is the reliability of sample analysis performed using a charged particle beam apparatus.
The charged particle beam apparatus includes region setting means for setting an irradiation region for irradiating a sample with an electron beam and an irradiation prohibited region for prohibiting the irradiation of the sample with the electron beam using a low-magnification image of the sample captured under low vacuum. In addition, the charged particle beam apparatus includes captured image acquisition means for selectively irradiating the irradiation region with the electron beam with the inside of a sample chamber under high-vacuum and acquiring a high-vacuum SEM image of the irradiation region based on the secondary or backscattered electrons emitted from the irradiation region.

4. 发明申请

US20170271125A1 X-RAY ANALYSIS IN AIR 审中-公开
公开(公告)号：US20170271125A1
公开(公告)日：2017-09-21
申请号：US15617157
申请日：2017-06-08
申请人： Oxford Instruments Nanotechnology Tools Limited
发明人： Peter J. STATHAM
IPC分类号： H01J37/244 , H01J37/28
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/164 , H01J2237/182 , H01J2237/188 , H01J2237/24415 , H01J2237/2445 , H01J2237/2608
摘要： An x-ray analysis apparatus comprises an electron beam assembly for generating a focused electron beam within a first gas pressure environment. A sample assembly is used for retaining a sample within a second gas pressure environment such that the sample receives the electron beam from the electron beam assembly and such that the gas pressure in the second gas pressure environment is greater than the gas pressure within the first gas pressure environment. An x-ray detector is positioned so as to have at least one x-ray sensor element within the first gas pressure environment. The sensor element is mounted to a part of the electron beam assembly which is proximal to the sample assembly and further arranged in use to receive x-rays generated by the interaction between the electron beam and the sample.

5. 发明申请

US20170207075A1 ION TRANSFER TUBE FLOW AND PUMPING SYSTEM LOAD 有权
公开(公告)号：US20170207075A1
公开(公告)日：2017-07-20
申请号：US15001667
申请日：2016-01-20
申请人： Thermo Finnigan LLC
发明人： Scott T. QUARMBY , Edward B. McCAULEY , Joshua T. MAZE
IPC分类号： H01J49/24 , H01J49/16
CPC分类号： H01J49/24 , H01J49/0013 , H01J49/0404 , H01J49/165 , H01J2237/182
摘要： A mass spectrometer system can include an ion source, a vacuum chamber; a mass analyzer within the vacuum chamber, a transfer tube between the ion source and the vacuum chamber, a transfer tube heater, and a vacuum pump. The mass spectrometer system can be configured to reduce the pump speed of the vacuum pump in response to receiving a transfer tube swap instruction; lower the temperature of the transfer tube to below a first threshold; operating the vacuum pump at the reduced pump speed while the transfer tube is replaced with a second transfer tube; heating the second transfer tube to a temperature above a pump down temperature; and increasing the pump speed of the vacuum pump after the temperature of the second transfer tube exceeds a second threshold.

6. 发明申请

US20160240345A1 CHARGED PARTICLE SOURCE ARRANGEMENT FOR A CHARGED PARTICLE BEAM DEVICE, CHARGED PARTICLE BEAM DEVICE FOR SAMPLE INSPECTION, AND METHOD FOR PROVIDING A PRIMARY CHARGED PARTICLE BEAM FOR SAMPLE INSPECTION IN A CHARGED PARTICLE BEAM 有权
标题翻译：用于充电颗粒束装置的充电颗粒源装置，用于样品检查的带电粒子束装置，以及用于提供用于充电颗粒束中的样品检查的主充电颗粒束的方法
公开(公告)号：US20160240345A1
公开(公告)日：2016-08-18
申请号：US15041008
申请日：2016-02-10
申请人： ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
发明人： Jürgen Frosien
IPC分类号： H01J37/077 , H01J37/18 , H01J37/26
CPC分类号： H01J37/065 , H01J2237/057 , H01J2237/164 , H01J2237/182
摘要： The present disclosure provides a charged particle source arrangement for a charged particle beam device. The charged particle source arrangement includes: a first vacuum region and a second vacuum region; a charged particle source in the first vacuum region wherein the charged particle source is configured to generate a primary charged particle beam; and a membrane configured to provide a gas barrier between the first vacuum region and the second vacuum region, and wherein the membrane is configured to let at least a portion of the primary charged particle beam pass through the membrane, wherein a first vacuum generation device is connectable to the first vacuum region and a second vacuum generation device is connectable to the second vacuum region.
摘要翻译：本公开提供了一种用于带电粒子束装置的带电粒子源装置。带电粒子源装置包括：第一真空区域和第二真空区域; 在第一真空区域中的带电粒子源，其中带电粒子源被配置为产生初级带电粒子束; 以及膜，被配置为在所述第一真空区域和所述第二真空区域之间提供气体阻挡层，并且其中所述膜被配置为使所述初级带电粒子束的至少一部分通过所述膜，其中第一真空产生装置是可连接到第一真空区域，第二真空产生装置可连接到第二真空区域。

7. 发明申请

US20160233051A1 X-RAY ANALYSIS IN AIR 有权
标题翻译：空气中的X射线分析
公开(公告)号：US20160233051A1
公开(公告)日：2016-08-11
申请号：US15024773
申请日：2014-09-25
申请人： OXFORD INSTRUMENTS NANOTECHNOLOGY TOOLS LIMITED
发明人： Peter STATHAM
IPC分类号： H01J37/244 , H01J37/28
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/164 , H01J2237/182 , H01J2237/188 , H01J2237/24415 , H01J2237/2445 , H01J2237/2608
摘要： An x-ray analysis apparatus comprises an electron beam assembly for generating a focused electron beam within a first gas pressure environment. A sample assembly is used for retaining a sample within a second gas pressure environment such that the sample receives the electron beam from the electron beam assembly and such that the gas pressure in the second gas pressure environment is greater than the gas pressure within the first gas pressure environment. An x-ray detector is positioned so as to have at least one x-ray sensor element within the first gas pressure environment. The sensor element is mounted to a part of the electron beam assembly which is proximal to the sample assembly and further arranged in use to receive x-rays generated by the interaction between the electron beam and the sample.
摘要翻译： X射线分析装置包括用于在第一气体压力环境内产生聚焦电子束的电子束组件。样品组件用于将样品保持在第二气体压力环境内，使得样品接收来自电子束组件的电子束，并且使得第二气体压力环境中的气体压力大于第一气体内的气体压力压力环境。 x射线检测器定位成在第一气体压力环境内具有至少一个x射线传感器元件。传感器元件安装到电子束组件的靠近样品组件的一部分，并且在使用中进一步布置以接收由电子束和样品之间的相互作用产生的x射线。

8. 发明申请

US20160203940A1 Anti-Contamination Trap, and Vacuum Application Device 审中-公开
标题翻译：抗污染捕集阱和真空应用装置
公开(公告)号：US20160203940A1
公开(公告)日：2016-07-14
申请号：US14911960
申请日：2014-09-18
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Takashi MIZUO , Yusuke TAMBA , Haruhiko HATANO , Kazutaka NIMURA
IPC分类号： H01J37/18 , F25B45/00 , F25B19/00
CPC分类号： H01J37/18 , F25B19/005 , F25B45/00 , H01J2237/002 , H01J2237/022 , H01J2237/028 , H01J2237/182 , H01J2237/2001 , H01J2237/2002
摘要： In conventional structures, a space between a dual cooling tank is vacuum insulated, and a cooling part is cooled via a highly thermally conductive material connected to an inner container. Such structures are affected by heat infiltrating into the highly thermally conductive material and the cooling part. For instance, in cases when liquid nitrogen is used as a coolant, it takes approximately 30 minutes for the temperature to reach −120° C. Even in cases when a significant amount of time has been spent, the temperature only reaches approximately −150° C., and thus falls significantly short of the temperature of liquid nitrogen, namely −196° C. Accordingly, an anti-contamination trap and a vacuum application device according to the present invention are provided with a structure in which a device-internal cooling part in the vacuum application device is cooled, and are characterized by being provided with: a cooling tank filled with a coolant for cooling a cooling part; and a cooling pipe extending from the cooling tank to the vicinity of the cooling part. The anti-contamination trap and the vacuum application device are further characterized in that: the coolant is supplied to an end of the cooling part; and a tube for releasing air bubbles inside the cooling pipe is inserted so as to extend to the cooling part.
摘要翻译：在常规结构中，双重冷却罐之间的空间是真空绝缘的，并且通过连接到内部容器的高导热性材料冷却冷却部件。这种结构受到热量渗入高导热材料和冷却部分的影响。例如，在使用液氮作为冷却剂的情况下，温度达到-120℃需要约30分钟。即使花费了大量时间的情况下，温度仅达到约-150° 因此，显着低于液氮的温度即-196℃。因此，根据本发明的抗污染捕集器和真空施加装置设置有其中装置内部冷却真空应用装置中的一部分被冷却，其特征在于设有：填充有用于冷却冷却部件的冷却剂的冷却罐; 以及从冷却槽延伸到冷却部附近的冷却管。抗污染捕集器和真空施加装置的特征还在于：将冷却剂供给到冷却部件的一端; 并且用于释放冷却管内的气泡的管被插入以延伸到冷却部。

9. 发明授权

US09318300B2 Charged particle beam instrument 有权
标题翻译：带电粒子束仪
公开(公告)号：US09318300B2
公开(公告)日：2016-04-19
申请号：US14526582
申请日：2014-10-29
申请人： JEOL Ltd.
发明人： Yasushi Hiroki , Mitsuaki Ohsaki
IPC分类号： H01J37/26 , H01J37/18 , H01J37/20 , H01J41/02
CPC分类号： H01J37/18 , H01J37/20 , H01J41/02 , H01J2237/182 , H01J2237/2002 , H01J2237/2605
摘要： A charged particle beam instrument is offered which can easily perform an in situ observation in a gaseous atmosphere. The charged particle beam instrument (100) is used to perform an observation of a specimen (S) placed in a gaseous atmosphere and has a specimen chamber (2), a gas supply portion (6) for supplying a gas into the specimen chamber (2), a venting portion (7) for venting the specimen chamber (2), a gaseous environment adjuster (4), and a gas controller (812) for controlling the gaseous environment adjuster (4). This adjuster (4) has a gas inflow rate adjusting valve (40) for adjusting the flow rate of the gas supplied into the specimen chamber (2) and a first vacuum gauge (CG1) for measuring the pressure of the gas supplied into the specimen chamber (2). The gas controller (812) sets a target value of pressure for the gas supplied into the specimen chamber (2) based on a predetermined relational expression indicating a relationship between the reading of the first vacuum gauge (CG1) and the pressure inside the specimen chamber (2) and on a corrective coefficient for correcting the reading of the first vacuum gauge (CG1) according to the species of the gas supplied into the specimen chamber (2) and controls the gas inflow rate adjusting valve (40) such that the reading of the first vacuum gauge (CG1) reaches the target value of pressure.
摘要翻译：提供了一种带电粒子束仪器，可以在气体气氛中轻松进行原位观察。带电粒子束仪器（100）用于对放置在气体气氛中的样本（S）进行观察，并具有样本室（2），用于向样本室供给气体的气体供给部（6） 2），用于排出样品室（2）的排气部分（7），气体环境调节器（4）和用于控制气体环境调节器（4）的气体控制器（812）。该调节器（4）具有用于调节供给到试样室（2）的气体的流量的气体流入量调节阀（40）和用于测定供给到试样室内的气体的压力的第一真空计（CG1）室（2）。气体控制器（812）基于表示第一真空计（CG1）的读数与试样室内的压力之间的关系的预定关系式，设定供给到试样室（2）的气体的目标值（2），以及根据供给到试样室（2）的气体的种类来校正第一真空计（CG1）的读数的校正系数，并控制气体流入速率调节阀（40），使得读数的第一个真空计（CG1）达到目标压力值。

10. 发明申请

US20160033355A1 METHOD FOR SAFE CONTROL OF GAS DELIVERY TO AN ELECTRON MICROSCOPE SAMPLE HOLDER 有权
标题翻译：气体输送到电子显微镜样品架的安全控制方法
公开(公告)号：US20160033355A1
公开(公告)日：2016-02-04
申请号：US14816332
申请日：2015-08-03
申请人： PROTOCHIPS, INC.
发明人： Daniel S. Gardiner , John Damiano, JR. , David P. Nackashi , William Bradford Carpenter , James Rivenbark , Mark Uebel , Michael Zapata, III , Rebecca Thomas , Franklin Stampley Walden, II
IPC分类号： G01M3/26 , G05B9/02 , G05D7/06 , H01J37/20 , H01J37/18
CPC分类号： G05B9/02 , G01M3/3272 , G05D7/0635 , H01J37/18 , H01J37/20 , H01J2237/006 , H01J2237/182 , H01J2237/2002 , H01J2237/2007 , H01J2237/2802
摘要： System and method for safely controlling the containment of gas within a manifold system and the delivery of gas to a sample holder for an electron microscope for imaging and analysis.
摘要翻译：用于安全地控制歧管系统内的气体容纳的系统和方法，以及将气体输送到用于成像和分析的电子显微镜的样品架上。

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