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1. 发明申请

US20160211115A1 METHOD FOR THE CORRECTION OF ELECTRON PROXIMITY EFFECTS 审中-公开
标题翻译：用于校正电子近似效应的方法
公开(公告)号：US20160211115A1
公开(公告)日：2016-07-21
申请号：US14915288
申请日：2014-08-28
申请人： ASELTA NANOGRAPHICS
发明人： Nader JEDIDI , Patrick SCHIAVONE , Jean-Hervé TORTAI , Thiago FIGUEIRO
IPC分类号： H01J37/304 , H01J37/317 , H01J37/285
CPC分类号： H01J37/304 , G03F7/70441 , G03F7/705 , H01J37/285 , H01J37/3174 , H01J37/3175 , H01J2237/2487
摘要： A method for projecting an electron beam onto a target includes correction of the scattering effects of the electrons in the target. This correction is made possible by a calculation step of a point spread function having a radial variation according to a piecewise polynomial function.
摘要翻译：用于将电子束投射到目标上的方法包括校正目标中的电子的散射效应。通过具有根据分段多项式函数的径向变化的点扩展函数的计算步骤，可以进行该校正。

2. 发明申请

US20140291517A1 Dynamic Focus Adjustment with Optical Height Detection Apparatus in Electron Beam System 有权
标题翻译：电子束系统中光学高度检测装置的动态聚焦调整
公开(公告)号：US20140291517A1
公开(公告)日：2014-10-02
申请号：US14306298
申请日：2014-06-17
申请人： Hermes Microvision, Inc.
发明人： JOE WANG , VAN-DUC NGUYEN , YI-XIANG WANG , JACK JAU , ZHONG-WEI CHEN
IPC分类号： H01J37/21 , G01B11/22
CPC分类号： G01B11/22 , G01N23/04 , G01N23/20058 , G01N2223/32 , G01N2223/3301 , G01N2223/3302 , G01N2223/646 , H01J37/21 , H01J37/28 , H01J2237/216 , H01J2237/2482 , H01J2237/2487
摘要： The present invention generally relates to dynamic focus adjustment for an image system. With the assistance of a height detection sub-system, present invention provides an apparatus and methods for micro adjusting an image focusing according the specimen surface height variation by altering the field strength of an electrostatic lens between objective lens and sample stage/or a bias voltage applied to the sample surface. Merely by way of example, the invention has been applied to a scanning electron inspection system. But it would be recognized that the invention could apply to other system using charged particle beam as observation tool with a height detection apparatus.
摘要翻译：本发明一般涉及图像系统的动态聚焦调整。本发明借助于高度检测子系统，提供了一种用于通过改变物镜和样品台之间的静电透镜的场强/或偏置电压来根据样本表面高度变化来微调整图像聚焦的装置和方法应用于样品表面。仅作为示例，本发明已经应用于扫描电子检查系统。但是应当认识到，本发明可以应用于使用带有带电粒子束的其它系统作为具有高度检测装置的观察工具。

3. 发明申请

US20140270055A1 X-RAY CT APPARATUS 有权
标题翻译： X射线CT装置
公开(公告)号：US20140270055A1
公开(公告)日：2014-09-18
申请号：US14288753
申请日：2014-05-28
申请人： Kabushiki Kaisha Toshiba , Toshiba Medical Systems Corporation
发明人： Daizo OIKAWA , Fumio Ishiyama
IPC分类号： H05G1/30 , A61B6/03
CPC分类号： H01J35/025 , A61B6/032 , A61B6/405 , A61B6/4241 , A61B6/54 , A61B6/542 , A61B6/58 , G05F1/10 , G05F1/565 , H01J37/241 , H01J37/248 , H01J37/3023 , H01J2237/2487 , H05G1/32 , H05G1/46
摘要： X-ray CT apparatus is provided in which the photon energy distribution of X-rays to be radiated is flattened. X-ray CT apparatus includes an X-ray tube, a detector, a data acquisition system, a tube voltage generator, and a grid controller. The X-ray tube radiates X-rays onto a subject. The detector includes multiple detection elements for detecting photons forming the X-rays. The data acquisition system counts the number of the detected photons to acquire projection data based on the counted photons. The tube voltage generator applies the tube voltage to the X-ray tube while changing the tube voltage of the X-ray tube in a predetermined cycle. A tube current controller decreases the tube current upon an increase in the tube voltage, and increases the tube current upon a decrease in the tube voltage. Thus, the photon energy distribution of the X-rays radiated from the X-ray tube is flattened.
摘要翻译：提供X射线CT装置，其中要辐射的X射线的光子能量分布变平。 X射线CT装置包括X射线管，检测器，数据采集系统，管电压发生器和电网控制器。 X射线管将X射线照射到被摄体上。检测器包括用于检测形成X射线的光子的多个检测元件。数据采集系统根据计数的光子计算检测到的光子数以获得投影数据。管电压发生器将管电压施加到X射线管，同时以预定的周期改变X射线管的管电压。管电流控制器在管电压增加时降低管电流，并且在管电压降低时增加管电流。因此，从X射线管辐射的X射线的光子能量分布变平。

4. 发明授权

US08304723B2 Defect inspection and charged particle beam apparatus 有权
标题翻译：缺陷检查和带电粒子束装置
公开(公告)号：US08304723B2
公开(公告)日：2012-11-06
申请号：US12725857
申请日：2010-03-17
申请人： Toshihide Agemura , Mitsugu Sato
发明人： Toshihide Agemura , Mitsugu Sato
IPC分类号： H01J37/04 , H01J37/28
CPC分类号： G01R31/307 , G01N23/2251 , H01J37/28 , H01J2237/15 , H01J2237/24564 , H01J2237/24592 , H01J2237/2487 , H01J2237/28 , H01J2237/2817
摘要： In a defect inspection apparatus which combines a plurality of probes for measuring electric properties of a specimen including a fine circuit line pattern with a charged particle beam apparatus, the charged particle beam apparatus reduces a degradation in resolution even with an image-shift of ±75 μm or more. The defect inspection apparatus has a CAD navigation function associated with an image-shift function. The CAD navigation function uses coordinates for converting an image-shift moving amount to a DUT stage moving amount in communications between an image processing unit for processing charged particle beam images and a memory for storing information on circuit line patterns. The defect inspection provides the user with significantly improved usability.
摘要翻译：在将包含精细电路线图案的样本的电特性的多个探针与带电粒子束装置组合的缺陷检查装置中，带电粒子束装置即使图像偏移为±75，也降低了分辨率的劣化 μm以上。缺陷检查装置具有与图像移位功能相关联的CAD导航功能。 CAD导航功能在用于处理带电粒子束图像的图像处理单元和用于存储关于电路线图案的信息的存储器之间的通信中使用用于将图像移位移动量转换为DUT阶段移动量的坐标。缺陷检查为用户提供了显着提高的可用性。

5. 发明授权

US08124934B2 Scanning electron microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：US08124934B2
公开(公告)日：2012-02-28
申请号：US12264605
申请日：2008-11-04
申请人： Tatsuya Maeda
发明人： Tatsuya Maeda
IPC分类号： G01N23/00
CPC分类号： H04N5/76 , H01J37/265 , H01J37/28 , H01J2237/2487 , H01J2237/2817 , H04N5/772 , H04N5/775 , H04N5/781 , H04N5/907 , H04N9/8205
摘要： It is facilitated in a scanning electron microscope to save the labor of executing the reproduction test, conduct basic analysis on a problem caused in execution of the automatic observation process, and confirm details resulting in the error. Upon detecting an error from an abnormality, the scanning electron microscope extracts a sample image lm(t2) obtained by retroceding from a sample image lm(te) stored so as to be associated with time te of error occurrence by a predetermined video quantity (for example, total recording time period t2) previously set and registered by an input-output device, from sample images stored in a recording device while being overwritten, and stores a resultant sample image in another recording device.
摘要翻译：在扫描电子显微镜中便于执行再现测试的劳动，对执行自动观察过程所引起的问题进行基本分析，并确认导致错误的细节。扫描电子显微镜从检测到异常的误差时，提取通过从存储的与样品图像lm（te）相反的获得的样本图像lm（t2），以使与出现错误的时间t相关联的预定视频量（对于例如，由输入 - 输出设备预先设置和登记的总记录时间段t2）从存储在记录设备中的样本图像被重写，并将所得到的样本图像存储在另一个记录设备中。

6. 发明授权

US07923701B2 Charged particle beam equipment 有权
标题翻译：带电粒子束设备
公开(公告)号：US07923701B2
公开(公告)日：2011-04-12
申请号：US12081969
申请日：2008-04-24
申请人： Hiromi Inada , Hiroyuki Tanaka , Shun-ichi Watanabe , Shigeto Isakozawa , Mitsugu Sato , Atsushi Takane , Satoshi Yamaguchi
发明人： Hiromi Inada , Hiroyuki Tanaka , Shun-ichi Watanabe , Shigeto Isakozawa , Mitsugu Sato , Atsushi Takane , Satoshi Yamaguchi
IPC分类号： G01N23/00
CPC分类号： H01J37/28 , H01J37/222 , H01J37/265 , H01J2237/15 , H01J2237/2487 , H01J2237/2826
摘要： Charged particle beam equipment has a processing unit for calibrating dimension values of an enlarged specimen image, and means for changing the amount by which a charged particle beam is scanned. Also, a specimen stand has a mechanism for holding a specimen having a periodical structure or a specimen simultaneously having a periodical structure and a non-periodical structure, and a storage device for automatically changing a magnification for an enlarged specimen image, and storing measured values at all magnifications.
摘要翻译：带电粒子束设备具有用于校准放大的标本图像的尺寸值的处理单元和用于改变扫描带电粒子束的量的装置。此外，试样架具有用于保持具有周期性结构的试样或同时具有周期性结构和非周期性结构的试样的机构，以及用于自动改变放大的试样图像的倍率并存储测量值的存储装置在所有放大倍率。

7. 发明授权

US07807966B2 Scanning electron microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：US07807966B2
公开(公告)日：2010-10-05
申请号：US12250763
申请日：2008-10-14
申请人： Hirohiko Kitsuki , Kazuo Aoki , Mitsugu Sato
发明人： Hirohiko Kitsuki , Kazuo Aoki , Mitsugu Sato
IPC分类号： G01N23/00
CPC分类号： H01J37/28 , H01J37/04 , H01J37/263 , H01J2237/21 , H01J2237/2487 , H01J2237/2809
摘要： A scanning electron microscope for digitally processing an image signal to secure the largest focal depth and the best resolution in accordance with the magnification for observation is disclosed. The angle of aperture of an optical system having a plurality of convergence lenses is changed by changing the convergence lenses and the hole diameter of a diaphragm. The angle α of aperture of the electron beam is changed in accordance with the visual field range corresponding to a single pixel, i.e. what is called the pixel size.
摘要翻译：公开了一种用于数字处理图像信号以确保最大焦深和根据观察放大率的最佳分辨率的扫描电子显微镜。具有多个会聚透镜的光学系统的光圈角度通过改变会聚透镜和光阑的孔径而改变。根据与单个像素对应的视场范围，即所谓的像素大小，改变电子束的孔径的角度α。

8. 发明申请

US20100187416A1 DEFECT INSPECTION AND CHARGED PARTICLE BEAM APPARATUS 有权
标题翻译：缺陷检查和充电颗粒光束装置
公开(公告)号：US20100187416A1
公开(公告)日：2010-07-29
申请号：US12725857
申请日：2010-03-17
申请人： Toshihide AGEMURA , Mitsugu Sato
发明人： Toshihide AGEMURA , Mitsugu Sato
IPC分类号： H01J37/26 , G01N23/22
CPC分类号： G01R31/307 , G01N23/2251 , H01J37/28 , H01J2237/15 , H01J2237/24564 , H01J2237/24592 , H01J2237/2487 , H01J2237/28 , H01J2237/2817
摘要： In a defect inspection apparatus which combines a plurality of probes for measuring electric properties of a specimen including a fine circuit line pattern with a charged particle beam apparatus, the charged particle beam apparatus reduces a degradation in resolution even with an image-shift of ±75 μm or more. The defect inspection apparatus has a CAD navigation function associated with an image-shift function. The CAD navigation function uses coordinates for converting an image-shift moving amount to a DUT stage moving amount in communications between an image processing unit for processing charged particle beam images and a memory for storing information on circuit line patterns. The defect inspection provides the user with significantly improved usability.
摘要翻译：在将包含精细电路线图案的样本的电特性的多个探针与带电粒子束装置组合的缺陷检查装置中，带电粒子束装置即使图像偏移为±75，也降低了分辨率的劣化 μm以上。缺陷检查装置具有与图像移位功能相关联的CAD导航功能。 CAD导航功能在用于处理带电粒子束图像的图像处理单元和用于存储关于电路线图案的信息的存储器之间的通信中使用用于将图像移位移动量转换为DUT阶段移动量的坐标。缺陷检查为用户提供了显着提高的可用性。

9. 发明授权

US07705303B2 Defect inspection and charged particle beam apparatus 有权
标题翻译：缺陷检查和带电粒子束装置
公开(公告)号：US07705303B2
公开(公告)日：2010-04-27
申请号：US12068789
申请日：2008-02-12
申请人： Toshihide Agemura , Mitsugu Sato
发明人： Toshihide Agemura , Mitsugu Sato
IPC分类号： H01J37/304
CPC分类号： G01R31/307 , G01N23/2251 , H01J37/28 , H01J2237/15 , H01J2237/24564 , H01J2237/24592 , H01J2237/2487 , H01J2237/28 , H01J2237/2817
摘要： In a defect inspection apparatus which combines a plurality of probes for measuring electric properties of a specimen including a fine circuit line pattern with a charged particle beam apparatus, the charged particle beam apparatus reduces a degradation in resolution even with an image-shift of ±75 μm or more. The defect inspection apparatus has a CAD navigation function associated with an image-shift function. The CAD navigation function uses coordinates for converting an image-shift moving amount to a DUT stage moving amount in communications between an image processing unit for processing charged particle beam images and a memory for storing information on circuit line patterns. The defect inspection provides the user with significantly improved usability.
摘要翻译：在将包含精细电路线图案的样本的电特性的多个探针与带电粒子束装置组合的缺陷检查装置中，带电粒子束装置即使图像偏移为±75，也降低了分辨率的劣化 μm以上。缺陷检查装置具有与图像移位功能相关联的CAD导航功能。 CAD导航功能在用于处理带电粒子束图像的图像处理单元和用于存储关于电路线图案的信息的存储器之间的通信中使用用于将图像移位移动量转换为DUT阶段移动量的坐标。缺陷检查为用户提供了显着提高的可用性。

10. 发明授权

US07615746B2 Method and apparatus for evaluating pattern shape of a semiconductor device 失效
标题翻译：用于评估半导体器件的图案形状的方法和装置
公开(公告)号：US07615746B2
公开(公告)日：2009-11-10
申请号：US11599343
申请日：2006-11-15
申请人： Wataru Nagatomo , Atsushi Miyamoto , Ryoichi Matsuoka
发明人： Wataru Nagatomo , Atsushi Miyamoto , Ryoichi Matsuoka
IPC分类号： G01N23/00 , G01B11/14
CPC分类号： H01J37/28 , B82Y10/00 , B82Y40/00 , G03F7/70525 , G03F7/70625 , G06T7/0006 , G06T2207/30148 , H01J37/222 , H01J37/265 , H01J37/3174 , H01J2237/216 , H01J2237/24578 , H01J2237/2487 , H01J2237/2817
摘要： The present invention provides a semiconductor pattern shape evaluating apparatus using a critical dimension SEM, which eliminates the necessity of data conversion corresponding to each process of semiconductor manufacturing conventionally required; controls possessed data integratedly; can select data effective for use in each process from the possessed data easily; if the shape of formed pattern changes with time, can create a photographing recipe which enables stable measurement by correcting the photographing recipe based on time-series data. Specifically, the semiconductor pattern shape evaluating apparatus correlates coordinate systems among diversified data to control the diversified data stored in a database integratedly, selects part or all of the diversified data arbitrarily and creates a photographing recipe for observing a semiconductor pattern with a critical dimension SEM using selected data.
摘要翻译：本发明提供一种使用临界尺寸SEM的半导体图案形状评估装置，其消除了对应于常规所需的半导体制造的每个处理的数据转换的必要性; 控制统计数据; 可以轻松地从拥有的数据中选择有效用于每个进程的数据; 如果形成的图案的形状随着时间而变化，则可以创建通过基于时间序列数据校正摄影配方而能够进行稳定测量的拍摄配方。具体地，半导体图案形状评估装置将多个数据中的坐标系统相互关联，以一体化地存储在数据库中控制多样化数据，任意地选择部分或全部多样化数据，并使用临界尺寸SEM创建用于观察半导体图案的拍摄配方选择的数据。

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