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    • 3. 发明申请
    • Megasonic cleaning using supersaturated cleaning solution
    • 超声波清洗使用过饱和清洗液
    • US20050161059A1
    • 2005-07-28
    • US10864929
    • 2004-06-10
    • Cole FranklinYi WuBrian Fraser
    • Cole FranklinYi WuBrian Fraser
    • B08B3/00B08B7/00
    • B08B3/12H01L21/67051Y10S438/906
    • A method and system for the megasonic cleaning of one or more substrates that reduces damage to the substrate(s) resulting from the megasonic energy. The substrates are supported in a process chamber and contacted with a cleaning solution comprising a cleaning liquid having carbon dioxide gas dissolved in the cleaning liquid in such amounts that the carbon dioxide gas is at a supersaturated concentration for the conditions within the process chamber. Megasonic energy is then transmitted to the substrate. The cleaning solution provides protection from damage resulting from the application of megasonic/acoustical energy. In another aspect, the invention is a system for carrying out the method. The invention is not limited to carbon dioxide but can be used in conjunction with any gas that, when so dissolved in a cleaning liquid, protects substrates from being damaged by the application of megasonic/acoustical energy.
    • 用于超声波清洗一个或多个基板的方法和系统,其减少由兆声波能量引起的对基板的损坏。 基板被支撑在处理室中,并与包括清洁液体的清洁溶液接触,所述清洗溶液包含溶解在清洗液体中的二氧化碳气体的清洗液体,其量使二氧化碳气体处于处理室内的条件的过饱和浓度。 然后将兆声波能量传输到基板。 清洁液可以防止因应用超声波/声能造成的损坏。 另一方面,本发明是一种执行该方法的系统。 本发明不限于二氧化碳,而是可以与任何气体一起使用,当这些气体溶解在清洁液体中时,可以保护基材免受应用兆声/声能的损害。
    • 5. 发明授权
    • Megasonic cleaning using supersaturated cleaning solution
    • 超声波清洗使用过饱和清洗液
    • US07156111B2
    • 2007-01-02
    • US10864929
    • 2004-06-10
    • Cole S. FranklinYi WuBrian Fraser
    • Cole S. FranklinYi WuBrian Fraser
    • B08B3/00
    • B08B3/12H01L21/67051Y10S438/906
    • A method and system for the megasonic cleaning of one or more substrates that reduces damage to the substrate(s) resulting from the megasonic energy. The substrates are supported in a process chamber and contacted with a cleaning solution comprising a cleaning liquid having carbon dioxide gas dissolved in the cleaning liquid in such amounts that the carbon dioxide gas is at a supersaturated concentration for the conditions within the process chamber. Megasonic energy is then transmitted to the substrate. The cleaning solution provides protection from damage resulting from the application of megasonic/acoustical energy. In another aspect, the invention is a system for carrying out the method. The invention is not limited to carbon dioxide but can be used in conjunction with any gas that, when so dissolved in a cleaning liquid, protects substrates from being damaged by the application of megasonic/acoustical energy.
    • 用于超声波清洗一个或多个基板的方法和系统,其减少由兆声波能量引起的对基板的损坏。 基板被支撑在处理室中,并与包括清洁液体的清洁溶液接触,所述清洗溶液具有溶解在清洗液中的二氧化碳气体,其量使二氧化碳气体处于处理室内的条件的过饱和浓度。 然后将兆声波能量传输到基板。 清洁液可以防止因应用超声波/声能造成的损坏。 另一方面,本发明是一种执行该方法的系统。 本发明不限于二氧化碳,而是可以与任何气体一起使用,当这些气体溶解在清洁液体中时,可以保护基材免受应用兆声/声能的损害。
    • 7. 发明授权
    • Megasonic cleaning using supersaturated solution
    • 超声波清洗使用过饱和溶液
    • US07578302B2
    • 2009-08-25
    • US11595029
    • 2006-11-09
    • Cole S. FranklinYi WuBrian Fraser
    • Cole S. FranklinYi WuBrian Fraser
    • B08B3/00
    • B08B3/12H01L21/67051Y10S438/906
    • A method and system for the megasonic cleaning of one or more substrates that reduces damage to the substrate(s) resulting from the megasonic energy. The substrates are supported in a process chamber and contacted with a cleaning solution comprising a cleaning liquid having carbon dioxide gas dissolved in the cleaning liquid in such amounts that the carbon dioxide gas is at a supersaturated concentration for the conditions within the process chamber. Megasonic energy is then transmitted to the substrate. The cleaning solution provides protection from damage resulting from the application of megasonic/acoustical energy. The invention is not limited to carbon dioxide but can be used in conjunction with any gas that, when so dissolved in a cleaning liquid, protects substrates from being damaged by the application of megasonic/acoustical energy.
    • 用于超声波清洗一个或多个基板的方法和系统,其减少由兆声波能量引起的对基板的损坏。 基板被支撑在处理室中,并与包括清洁液体的清洁溶液接触,所述清洗溶液具有溶解在清洗液中的二氧化碳气体,其量使二氧化碳气体处于处理室内的条件的过饱和浓度。 然后将兆声波能量传输到基板。 清洁液可以防止因应用超声波/声能造成的损坏。 本发明不限于二氧化碳,而是可以与任何气体一起使用,当这些气体溶解在清洁液体中时,可以保护基材免受应用兆声/声能的损害。
    • 8. 发明申请
    • Megasonic cleaning using supersaturated solution
    • 超声波清洗使用过饱和溶液
    • US20070056605A1
    • 2007-03-15
    • US11595029
    • 2006-11-09
    • Cole FraklinYi WuBrian Fraser
    • Cole FraklinYi WuBrian Fraser
    • B08B3/12C23G1/00B08B6/00
    • B08B3/12H01L21/67051Y10S438/906
    • A method and system for the megasonic cleaning of one or more substrates that reduces damage to the substrate(s) resulting from the megasonic energy. The substrates are supported in a process chamber and contacted with a cleaning solution comprising a cleaning liquid having carbon dioxide gas dissolved in the cleaning liquid in such amounts that the carbon dioxide gas is at a supersaturated concentration for the conditions within the process chamber. Megasonic energy is then transmitted to the substrate. The cleaning solution provides protection from damage resulting from the application of megasonic/acoustical energy. The invention is not limited to carbon dioxide but can be used in conjunction with any gas that, when so dissolved in a cleaning liquid, protects substrates from being damaged by the application of megasonic/acoustical energy.
    • 用于超声波清洗一个或多个基板的方法和系统,其减少由兆声波能量引起的对基板的损坏。 基板被支撑在处理室中,并与包括清洁液体的清洁溶液接触,所述清洗溶液具有溶解在清洗液中的二氧化碳气体,其量使二氧化碳气体处于处理室内的条件的过饱和浓度。 然后将兆声波能量传输到基板。 清洁液可以防止因应用超声波/声能造成的损坏。 本发明不限于二氧化碳,而是可以与任何气体一起使用,当这些气体溶解在清洁液体中时,可以保护基材免受应用兆声/声能的损害。