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21. 发明授权

US07166392B2 Halftone type phase shift mask blank and halftone type phase shift mask 有权
标题翻译：半色调型相移掩模和半色调型相移掩模
公开(公告)号：US07166392B2
公开(公告)日：2007-01-23
申请号：US10375063
申请日：2003-02-28
申请人： Masao Ushida , Minoru Sakamoto , Naoki Nishida
发明人： Masao Ushida , Minoru Sakamoto , Naoki Nishida
IPC分类号： G03F1/00
CPC分类号： G03F1/32 , G03F1/84
摘要： A halftone type phase shift mask having a semitranslucent film pattern and a shielding film pattern provided on a transparent substrate in this order is constituted in such a manner that each of the reflectances of the transparent substrate, the semitranslucent film pattern and the shielding film pattern for an inspecting light represents a difference which can detect the semitranslucent film pattern and the shielding film pattern based on a reflected light generated when the inspecting light is irradiated on the mask.
摘要翻译：以透明基板，半透明膜图案和半透明膜图案和屏蔽膜图案中的每一个反射的方式构成具有半透明膜图案和设置在透明基板上的屏蔽膜图案的半色调型相移掩模检查光表示可以基于在检查光照射在掩模上时产生的反射光来检测半透明膜图案和屏蔽膜图案的差异。

22. 发明授权

US06807330B2 Optical switch using an optical waveguide 失效
标题翻译：使用光波导的光开关
公开(公告)号：US06807330B2
公开(公告)日：2004-10-19
申请号：US10037976
申请日：2002-01-03
申请人： Naoki Nishida , Takuji Hatano , Koji Takahara , Shinji Maruyama , Miyuki Teramoto , Koujirou Sekine
发明人： Naoki Nishida , Takuji Hatano , Koji Takahara , Shinji Maruyama , Miyuki Teramoto , Koujirou Sekine
IPC分类号： G02B635
CPC分类号： G02B6/3538 , G02B6/12007 , G02B6/125 , G02B6/29368 , G02B6/355 , G02B6/3578
摘要： Disclosed herein is an optical switch for changing over a running direction of a light passing through an optical waveguide between a first direction and a second direction by moving a switching member disposed on an optical path of an optical waveguide. The switching member has a plurality of switching positions for selectively guiding each of lights of at least two different wavelengths into the first direction or second direction.
摘要翻译：这里公开了一种光开关，用于通过移动设置在光波导的光路上的切换构件来改变通过光波导的光在第一方向和第二方向之间的行进方向。切换构件具有多个切换位置，用于选择性地将至少两个不同波长的每一个光导向第一方向或第二方向。

23. 发明申请

US20090303858A1 OPTICAL RECORDING HEAD, MAGNETO-OPTICAL RECORDING HEAD AND OPTICAL RECORDING APPARATUS 审中-公开
标题翻译：光记录头，磁光记录头和光记录装置
公开(公告)号：US20090303858A1
公开(公告)日：2009-12-10
申请号：US12300353
申请日：2007-05-11
申请人： Manami Kuiseko , Hiroaki Ueda , Naoki Nishida , Kenji Konno , Koujirou Sekine , Masahiro Okitsu , Hiroshi Hatano
发明人： Manami Kuiseko , Hiroaki Ueda , Naoki Nishida , Kenji Konno , Koujirou Sekine , Masahiro Okitsu , Hiroshi Hatano
IPC分类号： G11B7/135
CPC分类号： G11B11/10536 , B82Y10/00 , G11B5/02 , G11B5/4866 , G11B7/08576 , G11B7/1384 , G11B7/1387 , G11B11/10554 , G11B11/1058 , G11B2005/0005 , G11B2005/0021
摘要： An optical recording head simply structured, enabling a reduction in thickness, and having sufficient efficiency even if a light source with small output is used when a plasmon probe is used. The optical recording head includes a light source section for emitting light, a slider moving relative to a recording medium, and an optical waveguide disposed in the slider, guiding the light from the light source section and irradiating the surface of the recording medium with the light, and having a light emission angle not perpendicular to the surface, of the slider, facing the surface of the recording medium.
摘要翻译：即使在使用等离子体探针的情况下，即使使用小输出的光源，简单地构造了光学记录头，能够减小厚度，并具有足够的效率。光记录头包括用于发射光的光源部分，相对于记录介质移动的滑块和设置在滑块中的光波导，引导来自光源部分的光并用光照射记录介质的表面并且具有与垂直于记录介质表面的滑块的表面不垂直的发光角。

24. 发明申请

US20090196127A1 OPTICAL RECORDING HEAD AND OPTICAL RECORDING APPARATUS 有权
标题翻译：光学记录头和光学记录装置
公开(公告)号：US20090196127A1
公开(公告)日：2009-08-06
申请号：US12297072
申请日：2007-04-02
申请人： Kenji Konno , Hiroaki Ueda , Manami Kuiseko , Naoki Nishida , Koujirou Sekine , Masahiro Okitsu , Hiroshi Hatano
发明人： Kenji Konno , Hiroaki Ueda , Manami Kuiseko , Naoki Nishida , Koujirou Sekine , Masahiro Okitsu , Hiroshi Hatano
IPC分类号： G11B11/00 , G11B7/135
CPC分类号： G11B5/314 , G11B5/4866 , G11B7/1384 , G11B11/1055 , G11B2005/001 , G11B2005/0021
摘要： Provided is an optical recording head in which a light beam from a light source is collected by an optical element and reflected on a reflecting surface to be formed into a spot light. Since a support portion for supporting the light source of the optical element at a predetermined position and the reflection surface for reflecting the light beam are formed integrally with each other, it is not required to perform the positioning thereof, and light can be collected to a very small spot with high efficiency, and an optical recording head and an optical recording apparatus having low heights can be provided.
摘要翻译：提供了一种光学记录头，其中来自光源的光束被光学元件收集并在反射表面上反射以形成点光。由于用于将光学元件的光源支撑在预定位置的支撑部分和用于反射光束的反射表面彼此一体地形成，因此不需要进行定位，并且可以将光收集到可以提供高效率的非常小的斑点，并且可以提供具有低高度的光学记录头和光学记录装置。

25. 发明申请

US20070195413A1 Birefringence optical element and manufacturing method thereof 审中-公开
公开(公告)号：US20070195413A1
公开(公告)日：2007-08-23
申请号：US11786237
申请日：2007-04-11
申请人： Mitsuru Yokoyama , Naoki Nishida
发明人： Mitsuru Yokoyama , Naoki Nishida
IPC分类号： G02B5/30
CPC分类号： G02B1/02 , G02B5/3083
摘要： A mask with an opening pattern is placed on a substrate, and etching is carried out by use of anisotropy etching of crystal. The opening pattern of the mask is composed of broken lines, each of which is discontinued by discontinuing portions. By the etching, a birefringence optical element with a fine structure, in which trenches, each of which is discontinued by discontinuing portions, are juxtaposed periodically at a specified pitch, is obtained.

26. 发明申请

US20070093062A1 Semiconductor device fabrication method 有权
标题翻译：半导体器件制造方法
公开(公告)号：US20070093062A1
公开(公告)日：2007-04-26
申请号：US11357139
申请日：2006-02-21
申请人： Naoki Nishida
发明人： Naoki Nishida
IPC分类号： H01L21/302
CPC分类号： H01L21/02063 , H01L21/76814
摘要： A method for fabricating a semiconductor device with a borderless via/wiring structure includes the steps of performing borderless via etching using a resist mask to form a contact hole in an interlevel dielectric layer over a semiconductor substrate so as to expose two different metal materials of lower layer patterns in the contact hole; and performing plasma irradiation using an H2O-containing gas prior to a wet process when removing the resist mask.
摘要翻译：一种制造具有无边界通孔/布线结构的半导体器件的方法包括以下步骤：使用抗蚀剂掩模进行无边界通孔蚀刻，以在半导体衬底上的层间电介质层中形成接触孔，以暴露两种不同的金属材料接触孔中的层图案; 并且在去除抗蚀剂掩模之前，在湿法处理之前，使用含H 2 O的气体进行等离子体照射。

27. 发明申请

US20070070824A1 Thermal-assisted magnetic recording head and magnetic recording apparatus 失效
标题翻译：热辅助磁记录头和磁记录装置
公开(公告)号：US20070070824A1
公开(公告)日：2007-03-29
申请号：US11520519
申请日：2006-09-13
申请人： Naoki Nishida , Manami Kuiseko
发明人： Naoki Nishida , Manami Kuiseko
IPC分类号： G11B11/00
CPC分类号： G11B5/127 , G11B2005/0005 , G11B2005/0021
摘要： A thermal-assisted magnetic recording head which heats a magnetic bit of a magnetic disk by light radiation in recording magnetic data into the magnetic disk with a magnetic writing element. The magnetic recording head has a reflecting converging element with a surface emitting laser incorporated therein, and a transparent plate serving as a slider. A laser beam emitted from the surface emitting laser is reflected by a mirror surface of the reflecting converging element and is converged on a plasmon probe formed on a bottom surface of the transparent plate. Thereby, near-field light effuses from the plasmon probe into a very small area and heats the magnetic bit of the magnetic disk.
摘要翻译：一种热辅助磁记录头，其用磁写入元件将磁数据记录到磁盘中，通过光辐射加热磁盘的磁头。磁记录头具有并入其中的表面发射激光器的反射会聚元件和用作滑块的透明板。从表面发射激光器发射的激光束被反射会聚元件的镜面反射并会聚在形成在透明板的底面上的等离子体激元探针上。因此，近场光从等离子体探测器流出到非常小的区域并加热磁盘的磁头。

28. 发明授权

US06671446B1 Optical waveguide and method of manufacturing same 有权
标题翻译：光波导及其制造方法
公开(公告)号：US06671446B1
公开(公告)日：2003-12-30
申请号：US09533947
申请日：2000-03-23
申请人： Naoki Nishida
发明人： Naoki Nishida
IPC分类号： G02B610
CPC分类号： G02B6/13
摘要： A plurality of top waveguides and bottom waveguides are formed on a substrate. The pitch of the light exit end of the top waveguide and the light exit end of the bottom waveguide at the light exit side of the substrate is narrower than the pitch of the light entrance end of the top waveguide and the light entrance end of the bottom waveguide at the light entrance side of the substrate. The light exit end of the waveguide on the light exit side of the substrate and the light exit end of the waveguide indicated by the dashed line are arranged as single rows forming a core row in two layers in a staggered layout. This optical waveguide produces ideally overlapping laser beam spots on the surface of a photosensitive body.
摘要翻译：多个顶部波导和底部波导形成在基板上。顶部波导的光出射端的间距和底部波导的光出射侧的光出射端的距离比顶部波导的光入射端的间距和底部波导的光入射端窄波导在基板的光入射侧。基板的光出射侧的波导的光出射端和虚线所示的波导的光出射端排列为以交错布置形成两层的芯列的单列。该光波导在感光体的表面上产生理想的重叠的激光束斑点。

29. 发明授权

US06587629B1 Optical waveguide channel device 失效
标题翻译：光波导通道器件
公开(公告)号：US06587629B1
公开(公告)日：2003-07-01
申请号：US09576317
申请日：2000-05-22
申请人： Shinji Maruyama , Naoki Nishida
发明人： Shinji Maruyama , Naoki Nishida
IPC分类号： G02B610
CPC分类号： G02B6/12004 , G02B6/1228 , G02B6/132 , G02B6/136 , G02B2006/12119 , G02B2006/12195
摘要： In an optical waveguide channel device equipped with multiple cores, the distances between cores at the entry edge must be large in order to cause a laser beam to enter each core. On the other hand, the distances at the exit edge must be small. Therefore, the core must have a curved area at which the axis is curved. Further, in order to make it easier to match the spot of the entering beam and the core, the core diameter of the optical waveguide channel device and the beam spot diameter of the entering light are made large. However, in a core having a multi-mode curved area, high-order light is easily excited at the curved area. Therefore, the curved area from the entry edge to the exit edge of each core is made to have a single mode. Consequently, exit light having an essentially Gaussian profile may be obtained.
摘要翻译：在配备有多个芯的光波导通道装置中，入射边缘处的芯之间的距离必须大，以使激光束进入每个芯。另一方面，出口边缘处的距离必须很小。因此，芯必须具有弯曲的区域，在该区域轴线是弯曲的。此外，为了使入射光束和光纤的点更容易匹配，光波导通道器件的芯径和入射光的光束直径变大。然而，在具有多模弯曲区域的芯中，在弯曲区域容易激发高阶光。因此，从每个核心的进入边缘到出口边缘的弯曲区域被制成具有单一模式。因此，可以获得具有基本高斯分布的出射光。

30. 发明授权

US6044850A Semiconductor device manufacturing method including ashing process 失效
标题翻译：包括灰化处理的半导体器件制造方法
公开(公告)号：US6044850A
公开(公告)日：2000-04-04
申请号：US961242
申请日：1997-10-30
申请人： Soichiro Ozawa , Satoru Mihara , Kunihiko Nagase , Masaaki Aoyama , Naoki Nishida
发明人： Soichiro Ozawa , Satoru Mihara , Kunihiko Nagase , Masaaki Aoyama , Naoki Nishida
IPC分类号： C23F4/00 , H01L21/02 , H01L21/027 , H01L21/302 , H01L21/3065 , H01L21/3205 , H01L21/3213 , H01L23/52 , B08B6/00
CPC分类号： H01L21/02071
摘要： Ashing process of a resist pattern used in a semiconductor device manufacturing method is conducted by exposing the resist, the wirings, and their peripheral regions to a first atmosphere which includes a first product obtained by plasmanizing a gas containing water at a rate of more than 30 flow rate %, and placing the resist in a second atmosphere which includes a second product obtained by plasmanizing an oxygen mixed gas which contains an oxygen gas as a principal component before or after or before and after the exposing step.
摘要翻译：在半导体器件制造方法中使用的抗蚀剂图案的灰化处理通过将抗蚀剂，布线及其周边区域暴露于第一气氛来进行，该第一气氛包括通过使含有水的气体以大于30的比例等离子化而获得的第一产物流量％，并将抗蚀剂置于第二气氛中，该第二气氛包括在暴露步骤之前或之后或之前或之后使包含氧气的氧气混合气体作为主要组分而得到的第二产物。

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