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    • 3. 发明申请
    • Optical Head and Optical Recording Device
    • 光头和光记录装置
    • US20100208557A1
    • 2010-08-19
    • US12738962
    • 2008-10-09
    • Manami KuisekoNaoki NishidaKenji KonnoKoujirou Sekine
    • Manami KuisekoNaoki NishidaKenji KonnoKoujirou Sekine
    • G11B7/00G11B7/135G11B11/00
    • G11B5/02G11B5/314G11B5/4866G11B5/6088G11B7/08576G11B7/1359G11B7/1384G11B2005/0005G11B2005/0021
    • An optical head includes: a slider which moves relative to a recording medium while the slider is floating above the recording medium; an optical waveguide which is provided on a side surface of an end portion of the slider and which has the focusing function of forming a light spot on the recording medium; and a light guide optical system that guides a light pencil to the optical waveguide. A light pencil coupling portion which receives the light pencil from the light guide optical system is provided in a surface parallel to a direction in which the light pencil is guided by the optical waveguide; and a reflective surface which deflects the light pencil to the light pencil coupling portion is provided in the light guide optical system. The light pencil coupling portion has the function of correcting aberration resulting from oblique incidence of the light pencil obliquely incident from the light guide optical system. A medium member which has a refractive index of more than one is provided between the reflective surface and the light pencil coupling portion.
    • 光学头包括:当滑动器浮动在记录介质上方时相对于记录介质移动的滑块; 光波导,其设置在滑块的端部的侧表面上,并且具有在记录介质上形成光斑的聚焦功能; 以及将光笔引导到光波导的导光光学系统。 从光导光学系统接收光笔的光笔耦合部分设置在平行于光笔被光波导引导的方向的表面上; 并且在光导光学系统中设置将光笔偏转到光笔耦合部分的反射表面。 光笔耦合部具有校正从导光光学系统倾斜入射的光笔倾斜入射引起的像差的功能。 在反射表面和光笔耦合部分之间设置折射率大于1的介质构件。
    • 7. 发明授权
    • Method of manufacturing a transfer mask and method of manufacturing a semiconductor device
    • 制造转印掩模的方法和制造半导体器件的方法
    • US08609304B2
    • 2013-12-17
    • US13436132
    • 2012-03-30
    • Masaru TanabeHideaki MitsuiNaoki NishidaSatoshi Iwashita
    • Masaru TanabeHideaki MitsuiNaoki NishidaSatoshi Iwashita
    • G03F1/50
    • G03F1/84G03F1/70G03F1/72
    • An internal defect or the like of a transfer mask is detected using transmitted light quantity distribution data of an inspection apparatus. Using a die-to-die comparison inspection method, inspection light is irradiated to a first region of a thin film to obtain a first transmitted light quantity distribution, the inspection light is also irradiated to a second region of the thin film to obtain a second transmitted light quantity distribution, a predetermined-range difference distribution is produced by plotting coordinates at which difference light quantity values calculated from a comparison between the first transmitted light quantity distribution and the second transmitted light quantity distribution are each not less than a first threshold value and less than a second threshold value, and a selection is made of a transfer mask in which a region with high density of plotting is not detected in the predetermined-range difference distribution.
    • 使用检查装置的透射光量分布数据检测转印掩模的内部缺陷等。 使用管芯间的比较检查方法,将检查光照射到薄膜的第一区域以获得第一透射光量分布,也将检查光照射到薄膜的第二区域,以获得第二透射光 通过绘制从第一透射光量分布和第二透射光量分布之间的比较计算出的差光量值分别不小于第一阈值的坐标,并产生预定范围的差分布, 小于第二阈值,并且选择在预定范围差分布中未检测到具有高密度绘图密度的区域的转印掩模。