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    • 2. 发明授权
    • Intermediary signal conditioning device with interruptible detection mode
    • 具有可中断检测模式的中间信号调理装置
    • US08804792B1
    • 2014-08-12
    • US13766647
    • 2013-02-13
    • Pericom Semiconductor
    • Hung-Yan CheungMichael Yimin Zhang
    • H04L25/00
    • H04L25/20H04L25/03885
    • Disclosed are embodiments for an intermediary signal conditioning device with an input adaptable detection mode. In one embodiment, an intermediary signal conditioning device has a control module, an input module, and an output module. The input module and the control module are for receiving an input signal. The control module is configured to interrupt the output module within a duration of time to allow at least a minimum pulse length of the input signal to be output as an output signal from the output module. The intermediary signal conditioning device is configured to condition the input signal for retransmission as the output signal.
    • 公开了具有输入适应性检测模式的中间信号调节装置的实施例。 在一个实施例中,中间信号调节装置具有控制模块,输入模块和输出模块。 输入模块和控制模块用于接收输入信号。 控制模块被配置为在一段持续时间内中断输出模块,以允许将输入信号的至少最小脉冲长度输出为来自输出模块的输出信号。 中间信号调节装置被配置为将用于重传的输入信号调节为输出信号。
    • 3. 发明授权
    • Reducing effects of parasitic transistors in thyristor-based memory using local thinning or implanting
    • 使用局部变薄或植入,减少寄生晶体管在基于晶闸管的存储器中的影响
    • US08174046B1
    • 2012-05-08
    • US11362285
    • 2006-02-23
    • Marc Laurent TarabbiaMaxim ErshovRajesh N. Gupta
    • Marc Laurent TarabbiaMaxim ErshovRajesh N. Gupta
    • H01L29/74
    • H01L29/66393H01L27/1027H01L27/105H01L29/7436
    • Method and apparatus for an integrated circuit having memory including thyristor-based memory cells is described. A pair of the thyristor-based memory cells are commonly coupled via a bitline region, where a parasitic bipolar junction transistor is defined therebetween responsive to the bitline region being common. In another implementation, the pair of the thyristor-based memory cells are commonly coupled via the anode region, where a parasitic bipolar junction transistor is defined therebetween responsive to the anode region being common. The common bitline or anode region, respectively, has a locally thinned region to inhibit charge transfer between the pair via the parasitic bipolar junction transistor. Moreover, a method for forming a field-effect transistor on a silicon-on-insulator wafer is described, where charge transfer facilitated by a parasitic bipolar transistor is reduced responsive to an increase in dopants at least proximate to an insulator layer.
    • 描述了具有包括基于晶闸管的存储器单元的存储器的集成电路的方法和装置。 一对基于晶闸管的存储单元通常经由位线区域耦合,其中响应于位线区域是共同的,限定了寄生双极结型晶体管。 在另一个实施方案中,一对基于晶闸管的存储单元通常经由阳极区耦合,其中响应于阳极区域是共同的,限定了寄生双极结型晶体管。 公共位线或阳极区域分别具有局部变薄的区域,以通过寄生双极结型晶体管抑制该对之间的电荷转移。 此外,描述了在绝缘体上硅晶片上形成场效应晶体管的方法,其中响应于至少接近绝缘体层的掺杂剂的增加,由寄生双极晶体管促进电荷转移。
    • 5. 发明授权
    • Serial link driver interface for a communication system
    • 用于通信系统的串行链路驱动程序接口
    • US07915923B1
    • 2011-03-29
    • US12400708
    • 2009-03-09
    • Tony YeungMichael Yimin Zhang
    • Tony YeungMichael Yimin Zhang
    • H03K19/0175
    • H04L25/0264
    • Method and apparatus for a communication system (100) using a driver block (200) are described. The driver block includes memory having programmable non-volatile memory cells for storing configuration settings associated with operation of the driver block (200). The driver block (200) is programmable for a selected interface protocol for operation in an adaptive equalization mode to obtain an adaptive equalization value. The adaptive equalization value is stored as a fixed equalization value for operating the driver block in a fixed equalization mode. The driver block may be used as a serial link driver interface.
    • 描述使用驱动块(200)的通信系统(100)的方法和装置。 驱动器块包括具有用于存储与驱动器块(200)的操作相关联的配置设置的可编程非易失性存储器单元的存储器。 驱动器块(200)可编程为用于在自适应均衡模式下操作的选定接口协议以获得自适应均衡值。 自适应均衡值被存储为用于以固定均衡模式操作驱动器块的固定均衡值。 驱动程序块可以用作串行链路驱动程序接口。
    • 6. 发明授权
    • Sense amplifiers
    • 感应放大器
    • US07859929B1
    • 2010-12-28
    • US12422152
    • 2009-04-10
    • Richard Roy
    • Richard Roy
    • G11C7/02
    • G11C7/065G11C11/39
    • Sense logic, and associated signaling, for dynamic thyristor-based memory cells is described. A first supply voltage level is greater than a second supply voltage level. In an embodiment, cross-coupled inverters of a sense amplifier are operatively coupled between a ground node and the second supply for sensing voltage. The first supply voltage is pass gate coupled to a first sense node and a second sense node. The pass gating is responsive to sample signaling. A first supply transistor is gated by a transfer bus. A second supply transistor is gated by a sense reference voltage that is between the first supply voltage level and the second supply voltage level. Each of the first supply transistor and the second supply transistor is back body biased with a write voltage level that is between the second supply voltage level and the ground voltage level.
    • 描述了用于基于动态可控硅的存储器单元的检测逻辑和相关联的信号。 第一电源电压电平大于第二电源电压电平。 在一个实施例中,读出放大器的交叉耦合反相器可操作地耦合在接地节点和第二电源之间以感测电压。 第一电源电压是通过栅极耦合到第一感测节点和第二感测节点。 通过门控对样本信号进行响应。 第一电源晶体管由传输总线门控。 第二电源晶体管由位于第一电源电压电平和第二电源电压电平之间的感测参考电压门控。 第一电源晶体管和第二电源晶体管中的每一个都以在第二电源电压电平和接地电压电平之间的写入电压电平进行背部主体偏置。
    • 7. 发明授权
    • Thyristor semiconductor device and method of manufacture
    • 晶闸管半导体器件及其制造方法
    • US07804107B1
    • 2010-09-28
    • US11906619
    • 2007-10-03
    • Andrew E. HorchFred Hause
    • Andrew E. HorchFred Hause
    • H01L31/111
    • H01L21/84H01L21/823814H01L21/823835H01L27/1027H01L27/1203H01L29/66378
    • In a method of processing a semiconductor device, a silicide-blocking layer may be formed over a semiconductor material. After defining the silicide-blocking layer, impurities may be implanted into portions of the semiconductor material as defined by the silicide-blocking layer. After the implant, silicide may be formed in a surface region of the semiconductor material as permitted by the silicide-blocking layer. Regions of the impurity implant may comprise boundaries that are related to the outline of the silicide formed thereover. In a further embodiment, the implant may define a base region to a thyristor device. The implant may be performed with an angle of incidence to extend portions of the base region beneath a peripheral edge of the blocking mask. Next, an anode-emitter region may be formed using an implant of a substantially orthogonal angle of incidence and self-aligned to the mask. Epitaxial material may then be formed selectively over exposed regions of the semiconductor material as defined by the silicide-blocking mask. Silicide might also be formed after select exposed regions as defined by the silicide-blocking mask. The silicide-blocking mask may thus be used for alignment of implants, and also for defining epitaxial and silicide alignments.
    • 在半导体器件的处理方法中,可以在半导体材料上形成硅化物阻挡层。 在限定硅化物阻挡层之后,可以将杂质注入半导体材料的部分,如由硅化物阻挡层所限定的。 在植入之后,硅化物可以形成在半导体材料的表面区域,如硅化物阻挡层所允许的。 杂质植入物的区域可以包括与其上形成的硅化物的轮廓相关的边界。 在另一实施例中,植入物可以限定到晶闸管器件的基极区域。 可以以入射角来执行植入物,以将阻挡掩模的外围边缘下方的基底区域的部分延伸。 接下来,可以使用基本上正交的入射角并与掩模自对准的植入物形成阳极 - 发射极区域。 然后可以在由硅化物阻挡掩模限定的半导体材料的暴露区域上选择性地形成外延材料。 也可以在由硅化物阻挡掩模定义的选择的暴露区域之后形成硅化物。 硅化物阻挡掩模因此可用于植入物的对准,并且还用于限定外延和硅化物对准。