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    • 4. 发明申请
    • BIOSENSOR AND METHOD OF DRIVING THE SAME
    • 生物传感器及其驱动方法
    • US20110068015A1
    • 2011-03-24
    • US12703939
    • 2010-02-11
    • Chan Woo ParkChang Geun AhnChil Seong AhTae Youb KimAn Soon KimJong Heon YangGun Yong Sung
    • Chan Woo ParkChang Geun AhnChil Seong AhTae Youb KimAn Soon KimJong Heon YangGun Yong Sung
    • G01N27/26G01F1/64
    • G01N27/4145
    • Provided are a biosensor and a method of driving the same. The biosensor includes a transistor including a substrate including a source, a drain, and a channel formed between the source and the drain, a gate insulating layer formed on the channel, and a source electrode and a drain electrode respectively connected with the source and the drain, a fluid line for covering the transistor to have an inner space together with the transistor and in which a sample solution including target molecules flows, a reference electrode formed on an inner wall of the fluid line, and a probe molecule layer attached on the reference electrode and reacting with the target molecules. Accordingly, the reference electrode is formed on the inner wall of the fluid line, enabling miniaturization of the bio device. Also, the probe molecules are formed on the reference electrode to measure a change in threshold voltage according to a change in electric potential between the reference electrode and the gate insulating layer, such that the sensitivity and reaction rate can be remarkably improved.
    • 提供了一种生物传感器及其驱动方法。 生物传感器包括晶体管,其包括基板,该基板包括源极,漏极和形成在源极和漏极之间的沟道,形成在沟道上的栅极绝缘层以及分别与源极和漏极连接的源极和漏极 漏极,用于覆盖晶体管的流体线,其与晶体管一起具有内部空间,并且其中包含目标分子的样品溶液流动,形成在流体管线的内壁上的参考电极和附着在该流体管线上的探针分子层 参考电极并与靶分子反应。 因此,参考电极形成在流体管线的内壁上,使生物装置能够小型化。 此外,探针分子形成在参考电极上,以根据参考电极和栅极绝缘层之间的电位的变化来测量阈值电压的变化,从而可以显着提高灵敏度和反应速率。
    • 10. 发明申请
    • Method of Manufacturing Semiconductor Device
    • 制造半导体器件的方法
    • US20080254606A1
    • 2008-10-16
    • US12090891
    • 2006-12-04
    • In Bok BaekSeong Jae LeeJong Heon YangChang Geun AhnHan Young YuKi Ju Im
    • In Bok BaekSeong Jae LeeJong Heon YangChang Geun AhnHan Young YuKi Ju Im
    • H01L21/28
    • H01L29/66439B82Y10/00H01L21/0273H01L21/28123H01L29/66484H01L29/66545H01L29/66575H01L29/66772H01L29/7613H01L29/7831
    • Provided is a method of manufacturing a semiconductor device in which properties of photoresist through a lithography process are changed to form a dummy structure, and the structure is applied to a process of forming a gate electrode. The method includes the steps of: forming a buffer layer on the top of a semiconductor substrate; applying an inorganic photoresist on the buffer layer, and forming a photoresist pattern using a lithography process; thermally treating the photoresist pattern using a predetermined gas; uniformly depositing an insulating layer on the thermally treated structure, and etching the deposited layer by the deposited thickness in order to expose the thermally treated photoresist pattern; depositing an insulating layer on the etched structure, and etching the deposited insulating layer to expose the thermally treated photoresist pattern; removing the exposed photoresist pattern using an etching process; forming a gate oxide layer in the portion in which the photoresist pattern is removed; and forming a gate electrode on the gate oxide layer. Accordingly, in forming a structure for manufacturing a nano-sized device, the properties of the layer formed by a lithography process are improved through thermal treatment, and thus the structure used to manufacture various devices can be easily formed.
    • 提供了通过光刻处理改变光致抗蚀剂的特性以形成虚拟结构的半导体器件的制造方法,并且将该结构应用于形成栅电极的工艺。 该方法包括以下步骤:在半导体衬底的顶部上形成缓冲层; 在缓冲层上施加无机光致抗蚀剂,并使用光刻工艺形成光致抗蚀剂图案; 使用预定气体热处理光刻胶图案; 在热处理结构上均匀沉积绝缘层,并通过沉积的厚度蚀刻沉积层,以暴露热处理的光致抗蚀剂图案; 在蚀刻的结构上沉积绝缘层,并蚀刻沉积的绝缘层以暴露热处理的光致抗蚀剂图案; 使用蚀刻工艺去除曝光的光致抗蚀剂图案; 在除去光致抗蚀剂图案的部分中形成栅氧化层; 以及在所述栅极氧化物层上形成栅电极。 因此,在形成纳米尺寸器件的制造结构时,通过热处理提高了通过光刻工艺形成的层的性质,因此可以容易地形成用于制造各种器件的结构。