会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 5. 发明授权
    • Method and apparatus for endpoint detection for chemical mechanical polishing
    • 用于化学机械抛光的端点检测的方法和装置
    • US06361646B1
    • 2002-03-26
    • US09271729
    • 1999-03-18
    • Thomas Frederick Allen Bibby, Jr.John A. AdamsRobert A. Eaton
    • Thomas Frederick Allen Bibby, Jr.John A. AdamsRobert A. Eaton
    • C23F104
    • B24B37/013B24B49/12B24D7/12H01L21/30625
    • An apparatus to generate an endpoint signal to control the polishing of thin films on a semiconductor wafer surface includes a through-hole in a polish pad, a light source, a fiber optic cable, a light sensor, and a computer. A pad assembly includes the polish pad, a pad backer, and a pad backing plate. The pad backer includes a pinhole and a canal that holds the fiber optic cable. The pad backer holds the polish pad so that the through-hole is coincident with the pinhole opening. A wafer chuck holds a semiconductor wafer so that the surface to be polished is against the polish pad. The light source provides light within a predetermined bandwidth. The fiber optic cable propagates the light through the through-hole opening to illuminate the surface as the pad assembly orbits and the chuck rotates. The light sensor receives reflected light from the surface through the fiber optic cable and generates reflected spectral data. The computer receives the reflected spectral data and calculates an endpoint signal. For metal film polishing, the endpoint signal is based upon the intensities of two individual wavelength bands. For dielectric film polishing, the endpoint signal is based upon fitting of the reflected spectrum to an optical reflectance model to determine remaining film thickness. The computer compares the endpoint signal to predetermined criteria and stops the polishing process when the endpoint signal meets the predetermined criteria.
    • 用于产生端点信号以控制半导体晶片表面上的薄膜抛光的装置包括抛光垫,光源,光纤电缆,光传感器和计算机中的通孔。 衬垫组件包括抛光垫,垫衬垫和衬垫背板。 垫衬垫包括一个针孔和一个保持光缆的运河。 垫垫支撑抛光垫,使得通孔与针孔开口重合。 晶片卡盘夹持半导体晶片,使得待抛光的表面抵靠抛光垫。 光源在预定带宽内提供光。 光纤电缆通过通孔开口传播光线,以便当焊盘组件轨道运动并且卡盘旋转时照亮表面。 光传感器通过光纤电缆接收来自表面的反射光,并产生反射的光谱数据。 计算机接收反射光谱数据并计算端点信号。 对于金属膜抛光,端点信号基于两个单独波长带的强度。 对于介电膜抛光,端点信号基于将反射光谱拟合到光学反射率模型以确定剩余的膜厚度。 计算机将端点信号与预定标准进行比较,并且当端点信号满足预定标准时停止抛光过程。
    • 8. 发明授权
    • Separation and purification of fluoride from industrial wastes
    • 从工业废物中分离和纯化氟化物
    • US5876685A
    • 1999-03-02
    • US707907
    • 1996-09-11
    • Gerald A. KrulikJohn A. AdamsDieter DornischDavid W. PersichiniChristopher S. Blatt
    • Gerald A. KrulikJohn A. AdamsDieter DornischDavid W. PersichiniChristopher S. Blatt
    • B01D15/04C01B7/19C02F1/04C02F1/42C02F1/58C02F1/60C02F1/66C02F9/00
    • C02F9/00C01B7/191C01B7/196C02F1/583C02F1/60C02F1/04C02F1/42C02F1/66C02F2101/14C02F2103/346
    • A method for the removal and purification of substantially all of the fluoride ions contained in a solution containing greater than 10 parts per million (ppm) fluoride ion, a mixture of other anions, silicon in the form of a fluorosilicic acid, silicic acid, silicates, or silicon tetrafluoride, and optionally also containing complex metal fluorides, to produce an ultrapure hydrofluoric acid, comprising the steps of (a) adjusting the pH of the solution to an alkaline pH to hydrolyze the fluorosilicic acid and any complex metal fluorides; (b) removing the fluoride ions and other anions from the solution by passing the solution through an ion exchange resin, where the ion exchange resin is adapted to adsorb substantially all of the fluoride passed over the ion exchange resin; (c) displacing the fluoride ions and other anions bound to the ion exchange resin, thereby forming a mixture of anions in an effluent emanating from resin; (d) optionally concentrating the effluent at a high pH and then lowering the pH; and (e) distilling the mixture of anions in the effluent from a sulfuric acid solution to generate ultrapure hydrofluoric acid. An apparatus useful for practicing the method is also disclosed.
    • 除去和纯化含有大于10ppm(ppm)氟离子,其它阴离子的混合物,氟硅酸形式的硅,硅酸,硅酸盐的溶液中所含的基本上所有的氟离子的方法 ,或四氟化硅,以及任选地还含有复合金属氟化物,以制备超纯氢氟酸,包括以下步骤:(a)将溶液的pH调节至碱性pH以水解氟硅酸和任何复合金属氟化物; (b)通过使溶液通过离子交换树脂从溶液中除去氟离子和其它阴离子,其中离子交换树脂适于吸附通过离子交换树脂的基本上所有的氟化物; (c)置换与离子交换树脂结合的氟离子和其它阴离子,从而在由树脂发出的流出物中形成阴离子的混合物; (d)任选地在高pH下浓缩流出物,然后降低pH值; 和(e)将来自硫酸溶液的流出物中的阴离子混合物蒸馏以产生超纯氢氟酸。 还公开了一种用于实施该方法的装置。
    • 10. 发明授权
    • Continuous linear scan laminography system and method
    • 连续线性扫描系统和方法
    • US5583904A
    • 1996-12-10
    • US419794
    • 1995-04-11
    • John A. Adams
    • John A. Adams
    • G01N23/04G03B42/02H04N7/18G01N23/00
    • G01N23/046G01N2223/419
    • An improved laminography system that allows generation of high speed and high resolution X-ray laminographs by using a continuous scan method with two or more linear detectors and one or more collimated X-ray sources. Discrete X-ray images, with different viewing angles, are generated by each detector. The discrete X-ray images are then combined by a computer to generate laminographic images of different planes in the object under test, or analyzed in such a manner to derive useful data about the object under test. In one embodiment, the improved scanning laminography system does not require any motion of the source or detectors, but simply a coordinated linear motion of the object under test. Higher speed is achieved over conventional laminography systems due to the continuous nature of the scan, and due to the ability to generate any plane of data in the object under test without having to re image the object.
    • 一种改进的层析系统,其允许通过使用具有两个或更多个线性检测器和一个或多个准直X射线源的连续扫描方法产生高速和高分辨率X射线照相机。 具有不同视角的离散X射线图像由每个检测器产生。 然后将离散的X射线图像由计算机组合以产生被测物体中的不同平面的laminographic图像,或以这样的方式分析以得到关于被测物体的有用数据。 在一个实施例中,改进的扫描层析系统不需要源或检测器的任何运动,而是简单地对被测物体的协调线性运动。 由于扫描的连续性,并且由于在被测物体内产生任何数据平面的能力而不必对物体进行成像,因此与传统的层析系统相比,实现了更高的速度。