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1. 发明授权

US08519334B2 Scanning electron microscope and sample observation method 有权
标题翻译：扫描电子显微镜和样品观察法
公开(公告)号：US08519334B2
公开(公告)日：2013-08-27
申请号：US13639999
申请日：2011-04-20
申请人： Satoshi Tadaka , Naomasa Suzuki , Naoma Ban , Tatsuichi Kato
发明人： Satoshi Tadaka , Naomasa Suzuki , Naoma Ban , Tatsuichi Kato
IPC分类号： H01J37/28 , H01J37/256 , G01N23/00
CPC分类号： H01J37/28 , H01J37/026 , H01J2237/2594 , H01J2237/281 , H01J2237/2815
摘要： The present invention provides a contact hole observation technology for avoiding a situation in which it is difficult to observe a contact hole as a nonuniform charge is formed in the contact hole due to a tilted electron beam during a process for forming a preliminary charge on a sample. The present invention also provides a scanning electron microscope based on such a contact hole observation technology. During a preliminary charge process, an electron beam is allowed to become incident in a plurality of directions to perform a precharge, thereby reducing a region within the contact hole that is not irradiated with the electron beam. This reduces the number of secondary electrons that become lost on the wall surface of the contact hole, thereby making it possible to acquire information about the bottom of the contact hole. Further, the precharge is processed by dividing a precharge irradiation region into a plurality of ring-shaped regions concentric with an observation region and precharging each of the ring-shaped regions in a plurality of scanning directions.
摘要翻译：本发明提供一种接触孔观察技术，用于避免在样品中形成初步电荷的过程中由于倾斜的电子束在接触孔中形成不均匀电荷难以观察到接触孔的情况。本发明还提供了一种基于这种接触孔观察技术的扫描电子显微镜。在预充电过程中，允许电子束在多个方向上入射以进行预充电，从而减少接触孔内未被电子束照射的区域。这就减少了在接触孔的壁表面上损失的二次电子的数量，从而可以获得关于接触孔的底部的信息。此外，通过将预充电照射区域划分成与观察区域同心的多个环状区域并且在多个扫描方向上对每个环状区域进行预充电来进行预充电。

2. 发明授权

US08431915B2 Charged particle beam apparatus permitting high resolution and high-contrast observation 有权
标题翻译：带电粒子束装置允许高分辨率和高对比度观察
公开(公告)号：US08431915B2
公开(公告)日：2013-04-30
申请号：US13551452
申请日：2012-07-17
申请人： Muneyuki Fukuda , Naomasa Suzuki , Tomoyasu Shojo , Noritsugu Takahashi
发明人： Muneyuki Fukuda , Naomasa Suzuki , Tomoyasu Shojo , Noritsugu Takahashi
IPC分类号： A61N5/00 , G21G5/00
CPC分类号： H01J37/28 , G01N23/225 , H01J37/145 , H01J2237/21 , H01J2237/28
摘要： A lower pole piece of an electromagnetic superposition type objective lens is divided into an upper magnetic path and a lower magnetic path. A voltage nearly equal to a retarding voltage is applied to the lower magnetic path. An objective lens capable of acquiring an image with a higher resolution and a higher contrast than a conventional image is provided. An electromagnetic superposition type objective lens includes a magnetic path that encloses a coil, a cylindrical or conical booster magnetic path that surrounds an electron beam, a control magnetic path that is interposed between the coil and sample, an accelerating electric field control unit that accelerates the electron beam using a booster power supply, a decelerating electric field control unit that decelerates the electron beam using a stage power supply, and a suppression unit that suppresses electric discharge of the sample using a control magnetic path power supply.
摘要翻译：电磁叠加型物镜的下极片分为上磁路和下磁路。几乎等于延迟电压的电压被施加到下磁路。提供了能够获得具有比常规图像更高分辨率和更高对比度的图像的物镜。电磁叠加型物镜包括包围线圈的磁路，围绕电子束的圆柱形或锥形增强器磁路，介于线圈和样品之间的控制磁路，加速电场控制单元，其加速使用升压电源的电子束，使用级电源使电子束减速的减速电场控制单元，以及抑制使用控制磁路电源对样品进行放电的抑制单元。

3. 发明授权

US08431893B2 Electron beam apparatus and electron beam inspection method 有权
标题翻译：电子束装置和电子束检查方法
公开(公告)号：US08431893B2
公开(公告)日：2013-04-30
申请号：US13530797
申请日：2012-06-22
申请人： Muneyuki Fukuda , Tomoyasu Shojo , Mitsugu Sato , Atsuko Fukada , Naomasa Suzuki , Ichiro Tachibana
发明人： Muneyuki Fukuda , Tomoyasu Shojo , Mitsugu Sato , Atsuko Fukada , Naomasa Suzuki , Ichiro Tachibana
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , H01J37/244 , H01J2237/221 , H01J2237/2444 , H01J2237/2448 , H01J2237/24485 , H01J2237/2449 , H01J2237/24495
摘要： An electron beam apparatus which includes a sample stage on which a sample is placed, and an electron optical system. The electron optical system includes an electron gun that generates a primary electron beam, an immersion objective lens that converges the primary electron beam on the sample, an E×B deflector that separates a secondary particle, which is generated from irradiation of the primary beam to the sample, from an optical axis of the primary beam, a reflecting member to which the secondary particle collides, an assist electrode which is located under the reflecting member, a plurality of incidental particle detectors that selectively detect a velocity component and an azimuth component of a ternary particle which is generated by the secondary particle colliding to the reflecting member, and a center detector that is located above the reflecting member.
摘要翻译：一种电子束装置，包括放置样品的样品台和电子光学系统。电子光学系统包括：电子枪，其产生一次电子束，将一次电子束收敛在样品上的浸没物镜;将主光束照射产生的二次粒子分离的E×B偏转器; 来自主光束的光轴的样品，二次粒子碰撞的反射部件，位于反射部件下方的辅助电极，多个附带的粒子检测器，其选择性地检测速度分量和方位分量由二次粒子与反射部件碰撞产生的三元粒子，以及位于反射部件上方的中心检测器。

4. 发明申请

US20120280126A1 CHARGED PARTICLE BEAM APPARATUS PERMITTING HIGH RESOLUTION AND HIGH-CONTRAST OBSERVATION 有权
标题翻译：充电颗粒光束设备允许高分辨率和高对比度观察
公开(公告)号：US20120280126A1
公开(公告)日：2012-11-08
申请号：US13551452
申请日：2012-07-17
申请人： Muneyuki FUKUDA , Naomasa SUZUKI , Tomoyasu SHOJO , Noritsugu TAKAHASHI
发明人： Muneyuki FUKUDA , Naomasa SUZUKI , Tomoyasu SHOJO , Noritsugu TAKAHASHI
IPC分类号： H01J37/26
CPC分类号： H01J37/28 , G01N23/225 , H01J37/145 , H01J2237/21 , H01J2237/28
摘要： A lower pole piece of an electromagnetic superposition type objective lens is divided into an upper magnetic path and a lower magnetic path. A voltage nearly equal to a retarding voltage is applied to the lower magnetic path. An objective lens capable of acquiring an image with a higher resolution and a higher contrast than a conventional image is provided. An electromagnetic superposition type objective lens includes a magnetic path that encloses a coil, a cylindrical or conical booster magnetic path that surrounds an electron beam, a control magnetic path that is interposed between the coil and sample, an accelerating electric field control unit that accelerates the electron beam using a booster power supply, a decelerating electric field control unit that decelerates the electron beam using a stage power supply, and a suppression unit that suppresses electric discharge of the sample using a control magnetic path power supply.
摘要翻译：电磁叠加型物镜的下极片分为上磁路和下磁路。几乎等于延迟电压的电压被施加到下磁路。提供了能够获得具有比常规图像更高分辨率和更高对比度的图像的物镜。电磁叠加型物镜包括包围线圈的磁路，围绕电子束的圆柱形或锥形增强器磁路，介于线圈和样品之间的控制磁路，加速电场控制单元，其加速使用升压电源的电子束，使用级电源减速电子束的减速电场控制部，以及抑制使用控制磁路电源对样品进行放电的抑制部。

5. 发明授权

US08153969B2 Inspection method and inspection system using charged particle beam 有权
标题翻译：使用带电粒子束的检查方法和检查系统
公开(公告)号：US08153969B2
公开(公告)日：2012-04-10
申请号：US12323167
申请日：2008-11-25
申请人： Atsuko Fukada , Mitsugu Sato , Naomasa Suzuki , Hidetoshi Nishiyama , Muneyuki Fukuda , Noritsugu Takahashi
发明人： Atsuko Fukada , Mitsugu Sato , Naomasa Suzuki , Hidetoshi Nishiyama , Muneyuki Fukuda , Noritsugu Takahashi
IPC分类号： G01N23/00
CPC分类号： G01N23/2251 , H01J37/147 , H01J37/244 , H01J37/28 , H01J2237/1501 , H01J2237/1508 , H01J2237/2449 , H01J2237/24507
摘要： In an electric immersion lens having high resolution capability, secondary electrons generated from a specimen are accelerated to suppress the dependency of rotational action of the secondary electrons applied thereto by an objective lens upon energy levels of the secondary electrons and when selectively detecting low and high angle components of elevation and azimuth as viewed from a secondary electron generation site by means of an annular detector interposed between an electron source and the objective lens, the secondary electrons are adjusted and deflected by means of an E×B deflector such that the center axis of secondary electrons converged finely under acceleration is made to be coincident with the center axis of a low elevation signal detection system and the secondary electrons are deviated from an aperture of a high elevation signal detection system.
摘要翻译：在具有高分辨能力的电浸透镜中，加速从样本产生的二次电子，以抑制由物镜施加到其上的二次电子的旋转作用对二次电子的能级的依赖性，并且当选择性地检测低角度和高角度时通过设置在电子源和物镜之间的环形检测器从二次电子产生位置观察的仰角和方位的分量，二次电子通过E×B偏转器被调节和偏转，使得中心轴线在加速度下精细收敛的二次电子与低仰角信号检测系统的中心轴一致，二次电子偏离高仰角信号检测系统的孔径。

6. 发明授权

US07772553B2 Scanning electron microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：US07772553B2
公开(公告)日：2010-08-10
申请号：US11835697
申请日：2007-08-08
申请人： Naomasa Suzuki
发明人： Naomasa Suzuki
IPC分类号： H01J37/26
CPC分类号： H01J37/09 , H01J37/28 , H01J2237/0458 , H01J2237/0492
摘要： Disclosed is a scanning electron microscope capable of checking an abrupt change of probe current due to changes in intensities of the respective condenser lenses when the probe current is intended to be changed by changing the intensities of the respective condenser lenses. The scanning electron microscope includes: an electron source for generating a beam of electrons; a first and second condenser lenses each for condensing the beam of electrons; an object lens for narrowly focusing the beam of electrons on a sample; a deflecting system for two-dimensionally scanning over the sample; and a detecting system for detecting secondary electrons generated from the sample due to the irradiation of the beam of electrons on the sample. In the scanning electron microscope, a first and second aperture plates each for blocking parts of the beam of electrons unnecessary for the sample are sequentially arranged between the first and second condenser lenses.
摘要翻译：公开了一种扫描电子显微镜，其能够通过改变各个聚光透镜的强度来检查当想要改变探针电流时由于各个聚光透镜的强度变化而引起的探针电流的突然变化。扫描电子显微镜包括：用于产生电子束的电子源; 每个用于冷凝电子束的第一和第二聚光透镜; 用于将电子束窄聚焦在样品上的物镜; 用于在样品上二维扫描的偏转系统; 以及用于检测由于样品上的电子束的照射而从样品产生的二次电子的检测系统。在扫描电子显微镜中，分别用于阻挡样品不需要的电子束的部分的第一和第二孔板依次布置在第一和第二聚光透镜之间。

7. 发明授权

US07399966B2 Scanning electron microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：US07399966B2
公开(公告)日：2008-07-15
申请号：US11802738
申请日：2007-05-24
申请人： Hideo Todokoro , Makoto Ezumi , Yoichi Ose , Naomasa Suzuki
发明人： Hideo Todokoro , Makoto Ezumi , Yoichi Ose , Naomasa Suzuki
IPC分类号： H01J37/20
CPC分类号： H01J37/244 , G01N23/225 , G01R31/307 , H01J37/05 , H01J37/28 , H01J2237/004 , H01J2237/04735 , H01J2237/04756 , H01J2237/053 , H01J2237/0535 , H01J2237/24475 , H01J2237/2448 , H01J2237/24485 , H01J2237/2449 , H01J2237/24495 , H01J2237/24585 , H01J2237/24592 , H01J2237/281 , H01J2237/2817
摘要： A scanning electron microscope with an energy filter which can positively utilize secondary electrons and/or reflected electrons which collide against a mesh electrode and are lost. The scanning electron microscope which has a porous electrode for producing an electric field for energy-filtering electrons produced by applying a primary electron beam to a sample and a 1st electron detector which detects electrons passing through the porous electrode is characterized by further having a porous structure provided near the sample, a deflector which deflects electrons from the axis of the primary electron beam, and a 2nd electron detector which detects the electrons deflected by the deflector.
摘要翻译：具有能量过滤器的扫描电子显微镜，其能够正确地利用与网状电极碰撞而损失的二次电子和/或反射电子。具有用于产生用于对样品施加一次电子束产生的电子能量的电场的多孔电极的扫描电子显微镜和检测通过多孔电极的电子的第一电子检测器的特征在于还具有多孔结构设置在样品附近，偏转器从一次电子束的轴线偏转电子;以及第二电子检测器，其检测偏转器偏转的电子。

8. 发明申请

US20070221846A1 Scanning electron microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：US20070221846A1
公开(公告)日：2007-09-27
申请号：US11802738
申请日：2007-05-24
申请人： Hideo Todokoro , Makoto Ezumi , Yoichi Ose , Naomasa Suzuki
发明人： Hideo Todokoro , Makoto Ezumi , Yoichi Ose , Naomasa Suzuki
IPC分类号： G01N23/00
CPC分类号： H01J37/244 , G01N23/225 , G01R31/307 , H01J37/05 , H01J37/28 , H01J2237/004 , H01J2237/04735 , H01J2237/04756 , H01J2237/053 , H01J2237/0535 , H01J2237/24475 , H01J2237/2448 , H01J2237/24485 , H01J2237/2449 , H01J2237/24495 , H01J2237/24585 , H01J2237/24592 , H01J2237/281 , H01J2237/2817
摘要： A scanning electron microscope with an energy filter which can positively utilize secondary electrons and/or reflected electrons which collide against a mesh electrode and are lost. The scanning electron microscope which has a porous electrode for producing an electric field for energy-filtering electrons produced by applying a primary electron beam to a sample and a 1st electron detector which detects electrons passing through the porous electrode is characterized by further having a porous structure provided near the sample, a deflector which deflects electrons from the axis of the primary electron beam, and a 2nd electron detector which detects the electrons deflected by the deflector.
摘要翻译：具有能量过滤器的扫描电子显微镜，其能够正确地利用与网状电极碰撞而损失的二次电子和/或反射电子。具有用于产生用于对样品施加一次电子束产生的电子能量的电场的多孔电极的扫描电子显微镜和检测通过多孔电极的电子的第一电子检测器的特征在于进一步具有多孔结构设置在样品附近，偏转器从一次电子束的轴线偏转电子;以及第二电子检测器，其检测偏转器偏转的电子。

9. 发明授权

US08405026B2 Charged particle beam apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US08405026B2
公开(公告)日：2013-03-26
申请号：US12554275
申请日：2009-09-04
申请人： Tomoyasu Shojo , Muneyuki Fukuda , Naomasa Suzuki , Noritsugu Takahashi
发明人： Tomoyasu Shojo , Muneyuki Fukuda , Naomasa Suzuki , Noritsugu Takahashi
IPC分类号： H01J3/14 , G01N23/00
CPC分类号： H01J37/153 , H01J37/04 , H01J37/28
摘要： Disclosed herewith is a charged particle beam apparatus capable of controlling each of the probe current and the objective divergence angle to obtain a desired probe current and a desired objective divergence angle in accordance with the diameter of the subject objective aperture. The apparatus is configured to include an objective aperture between first and second condenser lenses to calculate and set a control value of a first condenser lens in accordance with the diameter of the hole of the objective aperture so as to obtain a desired probe current and calculate a control value of a second condenser lens setting device in accordance with the diameter of the hole of the objective divergence angle and the control value of the second condenser lens setting device, thereby setting the calculated control value for the second condenser lens setting device to control the objective divergence angle.
摘要翻译：本文公开了一种带电粒子束装置，其能够根据目标物镜孔径来控制探针电流和物镜发散角度，以获得所需的探针电流和期望的物体发散角。该装置被配置为在第一和第二聚光透镜之间包括物镜孔，以根据物镜孔的直径来计算和设置第一聚光透镜的控制值，以获得所需的探针电流，并计算根据目标发散角的孔的直径和第二聚光透镜设定装置的控制值的第二聚光透镜设定装置的控制值，由此设定计算出的第二聚光透镜设定装置的控制值，客观发散角。

10. 发明申请

US20120261574A1 Electron Beam Apparatus and Electron Beam Inspection Method 有权
标题翻译：电子束设备和电子束检测方法
公开(公告)号：US20120261574A1
公开(公告)日：2012-10-18
申请号：US13530797
申请日：2012-06-22
申请人： Muneyuki Fukuda , Tomoyasu Shojo , Mitsugu Sato , Atsuko Fukada , Naomasa Suzuki , Ichiro Tachibana
发明人： Muneyuki Fukuda , Tomoyasu Shojo , Mitsugu Sato , Atsuko Fukada , Naomasa Suzuki , Ichiro Tachibana
IPC分类号： H01J37/26
CPC分类号： H01J37/28 , H01J37/244 , H01J2237/221 , H01J2237/2444 , H01J2237/2448 , H01J2237/24485 , H01J2237/2449 , H01J2237/24495
摘要： An electron beam apparatus which includes a sample stage on which a sample is placed, and an electron optical system. The electron optical system includes an electron gun that generates a primary electron beam, an immersion objective lens that converges the primary electron beam on the sample, an E×B deflector that separates a secondary particle, which is generated from irradiation of the primary beam to the sample, from an optical axis of the primary beam, a reflecting member to which the secondary particle collides, an assist electrode which is located under the reflecting member, a plurality of incidental particle detectors that selectively detect a velocity component and an azimuth component of a ternary particle which is generated by the secondary particle colliding to the reflecting member, and a center detector that is located above the reflecting member.
摘要翻译：一种电子束装置，包括放置样品的样品台和电子光学系统。电子光学系统包括：电子枪，其产生一次电子束，将一次电子束收敛在样品上的浸没物镜;将主光束照射产生的二次粒子分离的E×B偏转器; 来自主光束的光轴的样品，二次粒子碰撞的反射部件，位于反射部件下方的辅助电极，多个附带的粒子检测器，其选择性地检测速度分量和方位分量由二次粒子与反射部件碰撞产生的三元粒子，以及位于反射部件上方的中心检测器。

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