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    • 6. 发明授权
    • Method for laterally cutting through a semiconductor wafer and optoelectronic component
    • 用于横向切割半导体晶片和光电子部件的方法
    • US07943484B2
    • 2011-05-17
    • US11991488
    • 2006-08-07
    • Christoph EichlerVolker Härle
    • Christoph EichlerVolker Härle
    • H01L21/30
    • H01S5/0201H01L33/0079H01L33/16H01L33/32H01L2924/0002H01L2924/00
    • A method for laterally dividing a semiconductor wafer (1) comprises the method steps of: providing a growth substrate (2); epitaxially growing a semiconductor layer sequence (3), which comprises a functional semiconductor layer (5), onto the growth substrate (2); applying a mask layer (10) to partial regions of the semiconductor layer sequence (3) in order to produce masked regions (11) and unmasked regions (12); implanting ions through the unmasked regions (12) in order to produce implantation regions (13) in the semiconductor wafer (1); and dividing the semiconductor wafer (1) along the implantation regions (13), wherein the growth substrate (2) or at least one part of the growth substrate (2) is separated from the semiconductor wafer.
    • 一种用于横向分割半导体晶片(1)的方法包括以下方法步骤:提供生长衬底(2); 在生长衬底(2)上外延生长包括功能半导体层(5)的半导体层序列(3); 将掩模层(10)施加到所述半导体层序列(3)的部分区域以产生掩蔽区域(11)和未屏蔽区域(12); 通过未掩模区域(12)注入离子,以便在半导体晶片(1)中产生注入区域(13); 以及沿着所述注入区域(13)划分所述半导体晶片(1),其中所述生长衬底(2)或所述生长衬底(2)的至少一部分与所述半导体晶片分离。