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    • 3. 发明授权
    • Process for fabricating a nanowire-based vertical transistor structure
    • 用于制造基于纳米线的垂直晶体管结构的工艺
    • US08138046B2
    • 2012-03-20
    • US12278173
    • 2007-02-05
    • Didier PribatCostel-Sorin Cojocaru
    • Didier PribatCostel-Sorin Cojocaru
    • H01L21/336
    • H01L51/0512B82Y10/00H01L29/0665H01L29/0673H01L29/0676H01L29/7827H01L29/78642H01L51/0048
    • The invention relates to a process for fabricating a vertical transistor structure. On a substrate (10), is a first conductive layer (11), providing the source or drain electrode function, and an upper conductive layer (17), providing the drain or source electrode function. The production of a membrane includes a stack of porous layers including a first insulating layer (20), a second conductive layer (12), providing the gate electrode function, and an upper insulating layer (13′) on the surface of the substrate covered with the first conductive layer (11) providing the drain or source electrode function. The porous layers having substantially stacked pores. The production of filaments made of a semiconductor material is inside some of the stacked pores of the porous layers. The production of the upper conductive layer provides the source or drain electrode function on the surface of the stack of porous layers filled with filaments made of semiconductor material.
    • 本发明涉及制造垂直晶体管结构的方法。 在基板(10)上,提供源极或漏极功能的第一导电层(11)和提供漏极或源极功能的上导电层(17)。 膜的制造包括一堆多孔层,包括提供栅电极功能的第一绝缘层(20),第二导电层(12)和覆盖在衬底的表面上的上绝缘层(13') 其中第一导电层(11)提供漏极或源极电极功能。 多孔层具有基本上层叠的孔。 由半导体材料制成的细丝的制造在多孔层的一些堆叠的孔内。 上导电层的制造在填充有由半导体材料制成的细丝的多孔层的堆叠的表面上提供源极或漏极功能。
    • 4. 发明授权
    • Method for catalytic growth of nanotubes or nanofibers comprising a NiSi alloy diffusion barrier
    • 包含NiSi合金扩散阻挡层的纳米管或纳米纤维的催化生长方法
    • US07491269B2
    • 2009-02-17
    • US10497079
    • 2002-12-03
    • Pierre LegagneuxDidier PribatYannig Nedellec
    • Pierre LegagneuxDidier PribatYannig Nedellec
    • C30B29/62
    • B82Y30/00B82Y40/00C01B32/162C30B11/00C30B11/12C30B29/36C30B29/52C30B29/605D01F9/127
    • The invention relates to a process for the growth of nanotubes or nanofibers on a substrate comprising at least an upper layer made of a first material, wherein: the formation, on the surface of the upper layer, of a barrier layer made of an alloy of the first material and of a second material, said alloy being stable at a first temperature; the formation of spots of catalyst that are made of the second material, on the surface of the alloy layer; and the growth of nanotubes or nanofibers at a second temperature below said first temperature. The alloy layer allows effective growth of nanotubes/nanofibers from catalyst spots on the surface of said alloy layer. This is because the alloy layer constitutes a diffusion barrier preventing the catalyst from diffusing into the growth substrate, which barrier is stable at the catalytic nanotube/nanofiber growth temperature.
    • 本发明涉及一种用于在基材上生长纳米管或纳米纤维的方法,该方法至少包括由第一材料制成的上层,其中:在上层的表面上形成由合金形成的阻挡层 所述第一材料和第二材料,所述合金在第一温度下是稳定的; 在合金层的表面上形成由第二材料制成的催化剂斑点; 以及在低于所述第一温度的第二温度下纳米管或纳米纤维的生长。 合金层允许纳米管/纳米纤维从所述合金层表面上的催化剂点有效生长。 这是因为合金层构成阻止催化剂扩散到生长衬底中的扩散阻挡层,该阻挡层在催化纳米管/纳米纤维生长温度下是稳定的。
    • 6. 发明授权
    • Method for the controlled growth of a graphene film
    • 石墨烯薄膜受控生长的方法
    • US09206509B2
    • 2015-12-08
    • US13124413
    • 2009-10-16
    • Laurent BaratonCostel Sorin CojocaruDidier Pribat
    • Laurent BaratonCostel Sorin CojocaruDidier Pribat
    • B05D5/12B05D3/10B05D3/06B05D3/02C23C14/48C23C14/58B32B38/10C23C16/26C23C16/02C23C16/56C30B25/02C30B29/02
    • C23C16/26C23C16/0281C23C16/56C30B25/02C30B29/02
    • The invention includes a controlled graphene film growth process including the production on the surface of a substrate of a layer of a metal having with carbon a phase diagram such that, above a molar concentration threshold ratio CM/CM+CC, where CM is the molar metal concentration in a metal/carbon mixture and CC is the molar carbon concentration in the mixture, a homogeneous solid solution is obtained. The metal layer is exposed to a controlled flux of carbon atoms or carbon-containing radicals or carbon-containing ions at a temperature such that the molar concentration ratio obtained is greater than the threshold ratio to obtain a solid solution of carbon in the metal. The process further includes an operation for modifying the phase of the mixture into two phases, a metal phase and a graphite phase, leading to the formation of at least a lower graphene film at the metal layer incorporating carbon atoms-substrate interface and an upper graphene film at the surface of the metal layer.
    • 本发明包括受控的石墨烯薄膜生长工艺,其包括在具有碳的金属层的基底的表面上生产相图,使得高于摩尔浓度阈值比CM / CM + CC,其中CM是摩尔 金属/碳混合物中的金属浓度,CC是混合物中的摩尔碳浓度,得到均匀的固溶体。 在使得所得到的摩尔浓度比大于阈值比以获得金属中的固溶体的温度的温度下,将金属层暴露于受控的碳原子或含碳自由基或含碳离子的流量。 该方法还包括将混合物相变成两相的操作,金属相和石墨相,导致在包含碳原子 - 基底界面的金属层和上部石墨烯上形成至少一个下部石墨烯膜 膜在金属层的表面。
    • 7. 发明申请
    • METHOD FOR THE CONTROLLED GROWTH OF A GRAPHENE FILM
    • 石墨膜的控制生长方法
    • US20110198313A1
    • 2011-08-18
    • US13124413
    • 2009-10-16
    • Laurent BaratonCostel-Sorin CojocaruDidier Pribat
    • Laurent BaratonCostel-Sorin CojocaruDidier Pribat
    • B05D5/12B05D3/10B05D3/06B05D3/02C23C14/48C23C14/58B32B37/14B32B38/10
    • C23C16/26C23C16/0281C23C16/56C30B25/02C30B29/02
    • The invention relates to a controlled graphene film growth process characterized in that it comprises the following steps: the production on the surface of a substrate (S1) of a layer of a metal having with carbon a phase diagram such that above a molar concentration threshold ratio CM/CM+CC, where CM is the molar metal concentration in a metal/carbon mixture and CC is the molar carbon concentration in said mixture, a homogeneous solid solution is obtained; the exposure of the metal layer to a controlled flux of carbon atoms or carbon-containing radicals or carbon-containing ions at a temperature such that the molar concentration ratio obtained is greater than the threshold ratio so as to obtain a solid solution of carbon in the metal; and an operation for modifying the phase of the mixture into two phases, a metal phase and a graphite phase respectively, leading to the formation of at least a lower graphene film (31) located at the (metal layer incorporating carbon atoms)/substrate interface and an upper graphene film (30) at the surface of the metal layer.
    • 本发明涉及一种受控石墨烯薄膜生长方法,其特征在于其包括以下步骤:在具有碳的金属层的基底(S1)的表面上生产相图,使得高于摩尔浓度阈值比 CM / CM + CC,其中CM是金属/碳混合物中的摩尔金属浓度,CC是所述混合物中的摩尔碳浓度,获得均匀的固溶体; 在使所获得的摩尔浓度比大于阈值比的温度下将金属层暴露于受控的碳原子或含碳基团或含碳离子的流量,从而获得碳的固溶体 金属; 以及分别将金属相和石墨相改变为两相的相的操作,导致至少形成位于(含有碳原子的金属层)/基板界面的至少一个下部石墨烯膜(31) 和在金属层表面的上部石墨烯膜(30)。